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61. 发明专利

JP2008280541A Antistatic resin composition, its formed material and method for forming the same 审中-公开
标题翻译：抗静电树脂组合物，其形成的材料及其形成方法
公开(公告)号：JP2008280541A
公开(公告)日：2008-11-20
申请号：JP2008163878
申请日：2008-06-23
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA , ANDO MASAYUKI
IPC分类号： C08G73/10 , C08J7/04 , C09K3/16
摘要： PROBLEM TO BE SOLVED: To provide an antistatic resin composition having heat resistance up to 350°C and stable antistatic property without using electroconductive fine particles to cause a haze and without giving rise to breeze, to provide its molding and to provide a method for molding the material.
SOLUTION: The first antistatic resin composition is an antistatic polyamic acid composition containing a sulfonic acid group and/or a sulfinic acid group introduced into a polyamic acid skeleton. The second antistatic resin composition is an antistatic polyimide composition containing the sulfonic acid group and/or the sulfinic acid group introduced into a polyimide skelton. The third antistatic resin composition is an antistatic polyamic acid-imide composition containing the sulfonic acid group and/or the sulfinic acid group introduced into a polyamic acid-imide skelton having a partially imidated amic acid site. The surface resistivity value of a molding of these antistatic resin composition has a surface resistivity value of ≤10
10 Ω.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供耐热性高达350℃的抗静电树脂组合物，并且具有稳定的抗静电性，而不使用导电细颗粒引起雾度并且不产生微风，从而提供其成型材料成型方法解决方案：第一抗静电树脂组合物是含有导入聚酰胺酸骨架中的磺酸基和/或亚磺酸基的抗静电聚酰胺酸组合物。第二抗静电树脂组合物是含有引入到聚酰亚胺骨架中的磺酸基和/或亚磺酸基的抗静电聚酰亚胺组合物。第三种抗静电树脂组合物是含有磺酰基和/或亚磺酸基的聚氨酯酰亚胺组合物，其具有部分酰胺化的酰胺酸位点的聚酰胺酸 - 酰亚胺骨架。这些抗静电树脂组合物的成型体的表面电阻率值的表面电阻率值为≤1010Ω。版权所有（C）2009，JPO＆INPIT

62. 发明专利

JP2008248051A Alkaline-soluble half ester compound, resin composition using it, and articles 有权
标题翻译：碱可溶性半酯化合物，使用它的树脂组合物和文章
公开(公告)号：JP2008248051A
公开(公告)日：2008-10-16
申请号：JP2007090223
申请日：2007-03-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA
IPC分类号： C08F8/14 , C08F265/06 , G03F7/004 , G03F7/033 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an alkaline-soluble compound hardly decomposable at the time of heating, having the excellent affinity and dissolvability to an aqueous alkaline solution. SOLUTION: The alkaline-soluble half ester compound is obtained by reacting a compound having a hydroxy group and an acid anhydride represented by formula (1), (wherein R 1 -R 4 , which may be same or different, are a hydrogen atom, a halogen atom or a monovalent organic group, Z, which may be same or different, are a nitrogen atom or a carbon atom with a substituent R bonded, R, which may be same or different, are a hydrogen atom, a halogen atom or a monovalent organic group, and any of R 1 -R 4 and substutient R may form a cyclic structure via a bond). COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供在加热时难以分解的碱溶性化合物，对碱性水溶液具有优异的亲和力和溶解性。解决方案：碱溶性半酯化合物通过使具有羟基的化合物和由式（1）表示的酸酐（其中R 1 -R 4）可以相同或不同的是氢原子，卤素原子或一价有机基团Z可以相同或不同，是氮原子或具有取代基R键合的碳原子，R 可以相同或不同的是氢原子，卤素原子或一价有机基团，并且任选的R 1和R 2可以形成通过键的环状结构）。版权所有（C）2009，JPO＆INPIT

63. 发明专利

JP2008247794A Polymerizable compound, polymer compound produced by using the same, resin composition and article 有权
标题翻译：可聚合化合物，使用它们的聚合物化合物，树脂组合物和物品
公开(公告)号：JP2008247794A
公开(公告)日：2008-10-16
申请号：JP2007090225
申请日：2007-03-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA
IPC分类号： C07C69/80 , C07C67/08 , C07C69/54 , C07C69/767 , C08F20/30 , C09D4/00 , C09D11/02 , C09D11/03 , G02B1/04 , G02B5/20 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide a polymerizable compound resistant to decomposition during heating, having excellent solubility and soluble in an alkali.
SOLUTION: The polymerizable compound comprises a compound having one or more polymerizable unsaturated bonds in one molecule and expressed by formula (1). In the formula (1), at least one of R
1 to R
4 is a substituent containing a polymerizable unsaturated bond; the other groups of R
1 to R
4 are each independently a hydrogen atom, a halogen atom, a hydroxy group, an amino group or a univalent organic group; and R
5 to R
10 are each independently a hydrogen atom, a halogen atom or a univalent organic group.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供耐热分解的可聚合化合物，其溶解性和溶解性优异。解决方案：可聚合化合物包括在一个分子中具有一个或多个可聚合不饱和键并由式（1）表示的化合物。在式（1）中，R“SP”至R“SP”中的至少一个是含有可聚合不饱和键的取代基; R 1 的其他基团各自独立地为氢原子，卤素原子，羟基，氨基或一价有机基团; R 10和R 10相互独立地为氢原子，卤素原子或一价有机基团。版权所有（C）2009，JPO＆INPIT

64. 发明专利

JP2008076956A Method for forming polyimide pattern, article and suspension for hard disk 有权
标题翻译：形成聚酰胺图案的方法，用于硬盘的物品和悬挂
公开(公告)号：JP2008076956A
公开(公告)日：2008-04-03
申请号：JP2006258753
申请日：2006-09-25
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA , SEKI MIKIO , MOMOSE TERUHISA
IPC分类号： G03F7/11 , G03F7/40 , G03F7/42 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a polyimide pattern containing no photosensitive agent by using a negative resist without using a nonaqueous soluble organic solvent. SOLUTION: The method for forming a polyimide pattern includes: (A) a step of forming a polyimide precursor layer on a substrate; (B) a step of forming a negative resist layer on the polyimide precursor layer; (C) a pattern exposure step of selectively exposing the negative resist layer; (D) a developing step of selectively removing the underlay polyimide precursor layer while or after developing the negative resist layer; (E) a step of at least partially imidizing the patterned polyimide precursor layer to decrease the solubility with a basic aqueous solution or a water-soluble basic substance; and (E) a stripping step of stripping the patterned negative resist layer by using a basic aqueous solution or a water-soluble basic substance. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：解决的问题：提供一种通过使用不含非水溶性有机溶剂的负性抗蚀剂形成不含感光剂的聚酰亚胺图案的方法。聚酰亚胺图案的形成方法包括：（A）在基材上形成聚酰亚胺前体层的工序; （B）在聚酰亚胺前体层上形成负光刻胶层的工序; （C）选择性曝光负光刻胶层的图案曝光步骤; （D）显影步骤，在显影所述负光刻胶层的同时或之后选择性地除去所述底层聚酰亚胺前体层; （E）至少部分酰亚胺化所述图案化的聚酰亚胺前体层以降低与碱性水溶液或水溶性碱性物质的溶解度的步骤; 和（E）通过使用碱性水溶液或水溶性碱性物质剥离图案化的抗蚀剂层的剥离步骤。版权所有（C）2008，JPO＆INPIT

65. 发明专利

JP2007262276A Photosensitive resin composition, article and method for forming negative type pattern 有权
标题翻译：感光树脂组合物，形成负型图案的文章和方法
公开(公告)号：JP2007262276A
公开(公告)日：2007-10-11
申请号：JP2006090497
申请日：2006-03-29
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C08G73/10 , C07D335/16 , C08G73/22 , G02B5/20 , G03F7/004 , G03F7/037 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity, obtaining a large dissolution contrast irrespective to the kind of a polymer precursor, and as a result, obtaining a pattern having a good shape while keeping a sufficient process margin. SOLUTION: This photosensitive resin composition is characterized by containing a salt of a carboxylic acid expressed by formula (1) [wherein, X 1 , X 2 are each independently O or S; R 1 to R 9 are each independently H, a halogen atom, hydroxy, mercapto, nitro, silyl, silanol or a monovalent organic group; R 10 to R 12 are each H or a monovalent organic group, provided that at least one of R 10 to R 12 is the monovalent organic group] with an amine, and the polymer precursor. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有高灵敏度的感光性树脂组合物，与聚合物前体的种类无关地获得大的溶解对比度，结果获得具有良好形状的图案，同时保持足够的加工边缘。解决方案：该感光性树脂组合物的特征在于含有式（1）表示的羧酸盐[其中，X 1 ，X 2 各自独立地 O或S; R 1 至R 9各自独立地为H，卤素原子，羟基，巯基，硝基，甲硅烷基，硅烷醇或一价有机基团; R 10 至R 12 各自为H或一价有机基团，条件是R 10和R 12中至少有一个< / SP>是具有胺的单价有机基团和聚合物前体。版权所有（C）2008，JPO＆INPIT

66. 发明专利

JP2007249013A Photosensitive resin composition, article and negative pattern forming method 有权
标题翻译：光敏树脂组合物，文章和负面图案形成方法
公开(公告)号：JP2007249013A
公开(公告)日：2007-09-27
申请号：JP2006074980
申请日：2006-03-17
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA , FUKUDA TOSHIHARU
IPC分类号： G03F7/004 , G02B5/20 , G03F7/037 , G03F7/38 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which ensures a high solubility contrast regardless of the kind of polymer precursor, and consequently can provide a pattern of a good profile while retaining a sufficient process margin, and which is inexpensive. SOLUTION: The photosensitive resin composition contains an oxime ester derivative (A) containing a structure represented by formula (1') and a polymer precursor, wherein R 1 and R 2 are each a hydrogen or a monovalent organic group, they may be the same or different, and these two may bond to each other to form a cyclic structure. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种确保高溶解度对比度的光敏树脂组合物，而不管聚合物前体的种类如何，因此可以提供良好轮廓的图案，同时保持足够的加工余量，并且便宜。解决方案：感光性树脂组合物含有含有式（1'）表示的结构的肟酯衍生物（A）和高分子前体，其中R 1和R 2均为氢， SP>各自为氢或一价有机基团，它们可以相同或不同，并且这两个可以彼此键合以形成环状结构。版权所有（C）2007，JPO＆INPIT

67. 发明专利

JP2007119766A Photosensitive resin composition and article 有权
标题翻译：光敏树脂组合物及其制品
公开(公告)号：JP2007119766A
公开(公告)日：2007-05-17
申请号：JP2006266499
申请日：2006-09-29
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA , FUKUDA TOSHIHARU
IPC分类号： C08L79/08 , C08K5/17 , C09D4/00 , C09D179/04 , C09D179/08 , G02B5/20 , G03F7/004 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which shows a great contrast of a solubility rate regardless of the kind of a polymer precursor, especially of a polyimide precursor, and consequently can give a pattern with an excellent shape at a low cost while retaining a sufficient process margin. SOLUTION: The photosensitive resin composition comprises benzhydryl ammonium salt of formula (1) and a polymer precursor. In the formula, R 1 -R 13 are each independently hydrogen or a monovalent organic group. R 14 is hydrogen or a monovalent organic group. A is a compound or an element which can become an anion. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种感光树脂组合物，其与聚合物前体的种类，特别是聚酰亚胺前体的种类无关，表现出很好的溶解度对比度，因此可以在低成本，同时保留足够的加工余量。解决方案：感光性树脂组合物包含式（1）的二苯甲基铵盐和聚合物前体。在该式中，R 1和R 2各自独立地为氢或一价有机基团。 R 14是氢或一价有机基团。 A是可以成为阴离子的化合物或元素。版权所有（C）2007，JPO＆INPIT

68. 发明专利

JP2006282880A Photosensitive resin composition and article 有权
标题翻译：光敏树脂组合物及其制品
公开(公告)号：JP2006282880A
公开(公告)日：2006-10-19
申请号：JP2005105443
申请日：2005-03-31
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA
IPC分类号： C08L79/04 , C08K5/16 , G02B5/20 , G03F7/004 , G03F7/037 , G03H1/02
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which can obtain significant solubility contrast regardless of kind of a polymer precursor, especially a polyimide precursor, consequently which can obtain good profile patterns while maintaining an enough process margin. SOLUTION: The photosensitive resin composition comprises an N-aromatic glycine derivative expressed by formula (1) and a polymer precursor. In the formula, a circle circumscribing symbol A expresses an aromatic ring, R a , R b , R c , R d and R e is hydrogen or a monovalent organic group, m is an integer of zero or more, n is an integer of one or more, and the sum total of m and n is a number of the position on an aromatic ring which can be substituted. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够获得显着的溶解度对比度的光敏树脂组合物，而不管聚合物前体，特别是聚酰亚胺前体的种类如何，因此可以在保持足够的工艺余量的同时获得良好的轮廓图案。光敏树脂组合物包含由式（1）表示的N-芳族甘氨酸衍生物和聚合物前体。在该公式中，限定符号A的圆表示芳香环，R a ，R b ，R c ，R / SP>且R e 为氢或一价有机基团，m为0以上的整数，n为1以上的整数，m和n的总和为数在可被取代的芳香环上的位置。版权所有（C）2007，JPO＆INPIT

69. 发明专利

JP2005202252A Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter 审中-公开
标题翻译：用于固态成像装置彩色滤光片，固态成像装置彩色滤光片，固态成像装置的感光性着色组合物和固态成像装置彩色滤光片的制造方法
公开(公告)号：JP2005202252A
公开(公告)日：2005-07-28
申请号：JP2004009873
申请日：2004-01-16
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： MAENO YOSHITO , SAKAYORI KATSUYA , IKEGAMI KEI
IPC分类号： G03F7/004 , C08F2/50 , G02B5/20 , G03F7/029 , H01L27/14
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive coloring composition which has an extremely high sensitivity and is capable of precisely forming a fine pattern in an exposure process for forming a pattern. SOLUTION: The photosensitive coloring composition for solid-state imaging device color filter contains at least a reactive monomer, a photopolymerization initiator, a colorant and an organic solvent, wherein the photopolymerization initiator comprises a compound expressed by the formula (1). In the formula (1), each of R 1 to R 14 is independently either of hydrogen, hydroxyl group, amino group, carboxyl group, halogen, ketone group, aromatic group and aliphatic group. Therein, the aromatic group and aliphatic group preferably contain a structure selected from branched structure and alicyclic structure, preferably contain, in the way of the group, one or more kinds selected from ether bond, ester bond, amino bond, amide bond, thioether bond and unsaturated bond and preferably contain, on the terminal of the group, one or more kinds selected from hydroxyl group, amino group, carboxyl group, halogen, carbonyl group and aromatic group. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种感光性着色组合物，其具有极高的灵敏度，并且能够在用于形成图案的曝光过程中精确地形成精细图案。固体成像装置彩色滤光片的感光性着色组合物至少含有反应性单体，光聚合引发剂，着色剂和有机溶剂，其中，光聚合引发剂包含式（1）表示的化合物。在式（1）中，R 1至R 14中的每一个独立地为氢，羟基，氨基，羧基，卤素，酮基，芳族基团和脂族基团。其中，芳香族基团和脂肪族基团优选含有选自支链结构和脂环结构的结构，优选以该基团的方式含有选自醚键，酯键，氨基键，酰胺键，硫醚键中的一种或多种和不饱和键，并且优选在基团的末端含有选自羟基，氨基，羧基，卤素，羰基和芳族基团中的一种或多种。版权所有（C）2005，JPO＆NCIPI

70. 发明专利

JP2005126687A Photoradical generator, photosensitive resin composition and article 有权
标题翻译：光电发生器，光敏树脂组合物和文章
公开(公告)号：JP2005126687A
公开(公告)日：2005-05-19
申请号：JP2004274246
申请日：2004-09-21
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： SAKAYORI KATSUYA
IPC分类号： C07D295/10 , C07C69/54 , C07C225/22 , C08F2/50 , H05K3/28 , H05K3/46
摘要： PROBLEM TO BE SOLVED: To obtain a radical generator which is a self-cleavage initiator but is reduced in volatilization of low molecular decomposed products and generation of odor during light irradiation or postbaking and leaves no low molecular decomposition products in the final product and provide a photosensitive resin composition and articles using the radical generator. SOLUTION: The photoradical generator comprises one or more self-cleavage photoradical generating sites in one molecule and a compound (a) having one or more ethylenically unsaturated groups. COPYRIGHT: (C)2005,JPO&NCIPI

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