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61. 发明授权

US07047625B2 Planarizing process 有权
标题翻译：平面化过程
公开(公告)号：US07047625B2
公开(公告)日：2006-05-23
申请号：US10647762
申请日：2003-08-25
申请人： Cherng-Chyi Han , Mao-Min Chen , Po Kang Wang
发明人： Cherng-Chyi Han , Mao-Min Chen , Po Kang Wang
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/295 , G11B5/11 , G11B5/17 , G11B5/1871 , Y10T29/49002 , Y10T29/49021 , Y10T29/49041 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Present processes used for planarizing a cavity filled with a coil and hard baked photoresist require that a significant amount of the thickness of the coils be removed. This increases the DC resistance of the coil. In the present invention, cavity and coil are overfilled with photoresist which is then hard baked. A layer of alumina is then deposited onto the surface of the excess photoresist, following which CMP is initiated. The presence of the alumina serves to stabilize the photoresist so that it does not delaminate. CMP is terminated as soon as the coils are exposed, allowing their full thickness to be retained and resulting in minimum DC resistance.
摘要翻译：用于平坦化填充有线圈和硬烘烤光致抗蚀剂的空腔的现有方法需要去除大量的线圈厚度。这增加了线圈的直流电阻。在本发明中，腔和线圈被光致抗蚀剂过度填充，然后被硬烘烤。然后将一层氧化铝沉积到多余光致抗蚀剂的表面上，随后开始CMP。氧化铝的存在用于使光致抗蚀剂稳定，使其不分层。一旦线圈被暴露，CMP就被终止，允许其保持其全部厚度并导致最小的直流电阻。

62. 发明授权

US06960281B2 Method to make a wider trailing pole structure by self-aligned pole trim process 失效
标题翻译：通过自对准极修剪工艺制作更宽的尾柱结构的方法
公开(公告)号：US06960281B2
公开(公告)日：2005-11-01
申请号：US10394098
申请日：2003-03-21
申请人： Cherng-Chyi Han , Mao-Min Chen , Po Kang Wang , Fenglin Liu
发明人： Cherng-Chyi Han , Mao-Min Chen , Po Kang Wang , Fenglin Liu
IPC分类号： G11B5/31 , G11B5/39 , C23C14/34
CPC分类号： G11B5/3163 , G11B5/3116 , G11B5/3967 , Y10T29/49032
摘要： A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a tapered profile that is widest at its trailing edge. Such a pole piece is capable of writing narrow tracks with sharply and well defined patterns and minimal overwriting of adjacent tracks. The present method produces the necessary taper by using NiCr, NiFeCr, Rh or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant. As a result, the write gap does not protrude to mask the effects of the ion-beam etch used to form the taper.
摘要翻译：一种用于形成用于磁性写入头的修整的上极片的方法，所述极片具有在其后缘处最宽的锥形轮廓。这样的极片能够以清晰明确的图案和相邻轨迹的最小重写来写入窄轨道。本方法通过使用NiCr，NiFeCr，Rh或Ru作为写入间隙填充材料产生必要的锥度，其具有基本上等于形成极片的其它层的蚀刻速率的蚀刻速率，并且具有高耐腐蚀性。结果，写入间隙不突出以掩盖用于形成锥形的离子束蚀刻的效果。

63. 发明授权

US06887355B2 Self-aligned pole trim process 失效
标题翻译：自对准极修整过程
公开(公告)号：US06887355B2
公开(公告)日：2005-05-03
申请号：US10284848
申请日：2002-10-31
申请人： Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
发明人： Cherng-Chyi Han , Mao-Min Chen , Fenglin Liu
IPC分类号： G11B5/31 , C23C14/34 , B05D1/40 , B05D3/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/23 , G11B5/3163
摘要： A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.
摘要翻译：一种用于形成用于磁性写入头的修整的上极片的方法，所述极片在写间隙层上方和下方具有均匀的宽度。使用离子束蚀刻将极片修剪到最终宽度的现有技术方法由于氧化铝写入间隙填充材料的耐蚀刻性质而产生具有厚度差异的极片。本方法使用NiCr，NiFeCr或Ru作为写入间隙填充材料，其蚀刻速率基本上等于形成极片的其它层的蚀刻速率，并且具有高度耐腐蚀性。

64. 发明申请

US20050047011A1 Short yoke stitched writer with low DC coil resistance 有权
标题翻译：具有低直流线圈电阻的短轭缝编写器
公开(公告)号：US20050047011A1
公开(公告)日：2005-03-03
申请号：US10647762
申请日：2003-08-25
申请人： Cherng-Chyi Han , Mao-Min Chen , Po-Kang Wang
发明人： Cherng-Chyi Han , Mao-Min Chen , Po-Kang Wang
IPC分类号： G11B5/11 , G11B5/147 , G11B5/17 , G11B5/187 , G11B5/29
CPC分类号： G11B5/295 , G11B5/11 , G11B5/17 , G11B5/1871 , Y10T29/49002 , Y10T29/49021 , Y10T29/49041 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： Present processes used for planarizing a cavity filled with a coil and hard baked photoresist require that a significant amount of the thickness of the coils be removed. This increases the DC resistance of the coil. In the present invention, cavity and coil are overfilled with photoresist which is then hard baked. A layer of alumina is then deposited onto the surface of the excess photoresist, following which CMP is initiated. The presence of the alumina serves to stabilize the photoresist so that it does not delaminate. CMP is terminated as soon as the coils are exposed, allowing their full thickness to be retained and resulting in minimum DC resistance.
摘要翻译：用于平坦化填充有线圈和硬烘烤光致抗蚀剂的空腔的现有方法需要去除大量的线圈厚度。这增加了线圈的直流电阻。在本发明中，腔和线圈被光致抗蚀剂过度填充，然后被硬烘烤。然后将一层氧化铝沉积到多余光致抗蚀剂的表面上，随后开始CMP。氧化铝的存在用于使光致抗蚀剂稳定，使其不分层。一旦线圈被暴露，CMP就被终止，允许其保持其全部厚度并导致最小的直流电阻。

65. 发明授权

US06596468B1 Process to form a flux concentration stitched write head 失效
标题翻译：形成通量集中缝合写头的工艺
公开(公告)号：US06596468B1
公开(公告)日：2003-07-22
申请号：US09659790
申请日：2000-09-11
申请人： Cherng-Chyi Han , Mao-Min Chen , Kochan Ju
发明人： Cherng-Chyi Han , Mao-Min Chen , Kochan Ju
IPC分类号： G03C556
CPC分类号： G11B5/313 , G11B5/3116 , G11B5/3163
摘要： A general process for filling a trench is described with particular emphasis on the formation of step P1 during the manufacture of a magnetic write head. The main feature of this process is that a liftoff mask is used for both the trench formation and the filling processes. As a result of this approach, the area surrounding the trench is not disturbed, the trench depth is not reduced, and the original overall planarity, prior to etching and filling, is maintained.
摘要翻译：描述了用于填充沟槽的一般过程，其特别强调在制造磁写头期间形成步骤P1。该过程的主要特征是使用剥离掩模进行沟槽形成和填充过程。作为这种方法的结果，沟槽周围的区域不受干扰，沟槽深度不减小，并且在蚀刻和填充之前保持原始的整体平面度。

66. 发明授权

US06556377B2 Stitched write head design having a sunken shared pole 失效
公开(公告)号：US06556377B2
公开(公告)日：2003-04-29
申请号：US10236580
申请日：2002-09-06
申请人： Mao-Min Chen , Po-Kang Wang , Cherng-Chyi Han
发明人： Mao-Min Chen , Po-Kang Wang , Cherng-Chyi Han
IPC分类号： G11B5147
CPC分类号： B82Y25/00 , B82Y10/00 , G11B5/3163 , G11B5/3903 , G11B5/3967 , G11B2005/3996 , Y10T29/49048
摘要： A structure and a method for a stitched write head having a sunken share pole. The method includes forming a bottom coil dielectric layer over the first half shared pole. Coils are formed over the bottom coil dielectric layer. Next, second half shared poles (P1) are formed over the first half shared pole (S2). We form a top coil dielectric layer over the structure. In a key step, we chemical-mechanical polish the top coil dielectric layer. A write gap layer (WG) is formed over the front second half shared pole and the top coil dielectric layer over the coils. An upper pole (P3) and hard mask are formed over the write gap layer. We etch the write gap layer and the second half shared pole (P1) using the upper pole as an etch mask to remove a portion of the second half shared pole (P1) adjacent to the write gap layer thereby forming a partially trimmed pole.

67. 发明授权

US06504677B1 Multi-layer stitched write head design for high data rate application 失效
标题翻译：多层拼接写头设计，适用于高数据速率应用
公开(公告)号：US06504677B1
公开(公告)日：2003-01-07
申请号：US09472996
申请日：1999-12-28
申请人： Cherng-Chyi Han , Mao-Min Chen
发明人： Cherng-Chyi Han , Mao-Min Chen
IPC分类号： G11B531
CPC分类号： G11B5/313 , G11B5/3116
摘要： A design for a magnetic write head having multi-layer stitched poles, a small throat height, and a recessed yoke design is described. The write head is formed of a number of planar layers and in one embodiment the write head also has a planar top surface. In another embodiment the planarity of the top layer is disturbed in order to provide an additional wiring layer. The magnetic write head is formed on a layer of ferromagnetic material which can also be used as a shield layer for a read head combined with the write head. A first pole piece has a notch which defines the throat height of the write head. A second pole piece, recessed from the air bearing surface plane, is magnetically stitched to the first pole piece. A third pole piece, further recessed from the air bearing surface plane, is magnetically stitched to the second pole piece.
摘要翻译：描述了具有多层缝合磁极，小喉部高度和凹陷磁轭设计的磁性写入头的设计。写头由多个平面层形成，并且在一个实施例中，写入头还具有平坦的顶表面。在另一个实施例中，为了提供附加的布线层，扰乱顶层的平面性。磁写头形成在铁磁材料层上，该层也可以用作与写入头组合的读取头的屏蔽层。第一极片具有限定写头的喉部高度的凹口。从空气轴承表面平面凹入的第二极靴被磁性缝合到第一极靴。进一步从空气轴承面平面凹入的第三极靴被磁性缝合到第二极靴。

68. 发明授权

US06496333B1 Dual stripe magnetoresistive (DSMR) head with co-extensive magnetoresistive (MR)/dielectric/magnetoresistive (MR) stack layer edges 失效
标题翻译：具有共扩散磁阻（MR）/介质/磁阻（MR）堆叠层边缘的双条磁阻（DSMR）磁头
公开(公告)号：US06496333B1
公开(公告)日：2002-12-17
申请号：US09044764
申请日：1998-03-20
申请人： Cherng-Chyi Han , Mao-Min Chen
发明人： Cherng-Chyi Han , Mao-Min Chen
IPC分类号： G11B539
CPC分类号： G11B5/3954 , G11B5/3903
摘要： The invention comprises a pair of dual stripe magnetoresistive (DSMR) sensor elements with aligned edges of a pair of patterned magnetoresistive (MR) layers within the pair of dual stripe magnetoresistive (DSMR) sensor elements. A first embodiment of the dual stripe magnetoresistive (DSMR) sensor element employs a patterned first magnetoresistive (MR) layer, a patterned inter stripe dielectric layer and a patterned second magnetoresistive (MR) layer which are areally co-extensive, and thus have all edges thereof fully aligned. A second embodiment of the dual stripe magnetoresistive (DSMR) sensor element employs a patterned first magnetoresistive (MR) layer, a pattern ed inter stripe dielectric layer and a patterned second magnetoresistive (MR) layer, where: (1) at least a portion of an edge of the patterned first magnetoresistive (MR) layer, the pattern ed inter stripe dielectric layer and the patterned second magnetoresistive (MR layer opposite an air bearing surface (ABS) of the dual stripe magnetoresistive (DSMR) sensor element are fully aligned; and (2) there is employed a patterned backfilling dielectric layer covering those fully aligned edges of the patterned first magnetoresistive (MR) layer, the pattern ed inter stripe dielectric layer and the patterned second magnetoresistive (MR) layer, where the patterned backfilling dielectric layer does not completely cover a top surface of the patterned second magnetoresistive (MR) layer.
摘要翻译：本发明包括一对双条带磁阻（DSMR）传感器元件，其在一对双条磁阻（DSMR）传感器元件内具有一对图案化磁阻（MR）层的对准边缘。双条带磁阻（DSMR）传感器元件的第一实施例采用图案化的第一磁阻（MR）层，图案化的条带间介电层和图案化的第二磁阻（MR）层，其被共同共同扩展，因此具有所有边缘完全对齐。双条带磁阻（DSMR）传感器元件的第二实施例采用图案化的第一磁阻（MR）层，图案化的条纹间介质层和图案化的第二磁阻（MR）层，其中：（1）至少部分图案化的第一磁阻（MR）层的边缘，图案化的条带间介电层和图案化的第二磁阻（MR层与双条磁阻（DSMR）传感器元件的空气轴承表面（ABS）相对）完全对准;以及（2）使用覆盖图案化的第一磁阻（MR）层，图案化的条纹间介电层和图案化的第二磁阻（MR）层的完全对准的边缘的图案化回填电介质层，其中图案化的回填电介质层不完全覆盖图案化的第二磁阻（MR）层的顶表面。

69. 发明授权

US07979978B2 Method for manufacturing a self-aligned full side shield PMR 有权
标题翻译：制造自对准全侧护罩PMR的方法
公开(公告)号：US07979978B2
公开(公告)日：2011-07-19
申请号：US11728910
申请日：2007-03-27
申请人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
发明人： Cherng-Chyi Han , Min Li , Fenglin Liu , Chen-Jung Chien
IPC分类号： G11B5/187
CPC分类号： G11B5/1278 , G11B5/112 , G11B5/3146 , G11B5/315 , G11B5/3163 , G11B5/3169 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T428/1193
摘要： A process for forming the write pole of a PMR head is described. This write pole is symmetrically located relative to its side shields, This is accomplished, not through optical alignment, but by coating the pole with a uniform layer of non-magnetic material of a predetermined and precise thickness, followed by the formation of the shield layer around this.
摘要翻译：描述了用于形成PMR头的写入极的过程。该写入极相对于其侧屏对称地定位，这不是通过光学对准而是通过用预定和精确厚度的均匀的非磁性材料层涂覆极，然后形成屏蔽层围绕这一点。

70. 发明授权

US07773341B2 Laminated film for head applications 有权
标题翻译：用于头部应用的层压膜
公开(公告)号：US07773341B2
公开(公告)日：2010-08-10
申请号：US11825034
申请日：2007-07-03
申请人： Kunliang Zhang , Min Zheng , Min Li , Chen-Jung Chien , Cherng-Chyi Han
发明人： Kunliang Zhang , Min Zheng , Min Li , Chen-Jung Chien , Cherng-Chyi Han
IPC分类号： G11B5/33
CPC分类号： G11B5/3116 , G11B5/1278
摘要： A laminated main pole layer is disclosed in which a non-AFC scheme is used to break the magnetic coupling between adjacent high moment layers and reduce remanence in a hard axis direction while maintaining a high magnetic moment and achieving low values for Hch, Hce, and Hk. An amorphous material layer with a thickness of 3 to 20 Angstroms and made of an oxide, nitride, or oxynitride of one or more of Hf, Zr, Ta, Al, Mg, Zn, or Si is inserted between adjacent high moment stacks. The laminated structure also includes an alignment layer below each high moment layer within each stack. In one embodiment, a Ru coupling layer is inserted between two high moment layers in each stack to introduce an AFC scheme. An uppermost Ru layer is used as a CMP stop layer. A post annealing process may be employed to further reduce the anisotropy field (Hk).
摘要翻译：公开了一种层叠主极层，其中使用非AFC方案来破坏相邻的高力矩层之间的磁耦合，并且在保持高磁矩的同时降低硬轴方向的剩磁，并实现Hch，Hce和 Hk。由Hf，Zr，Ta，Al，Mg，Zn或Si中的一种或多种的氧化物，氮化物或氧氮化物形成的厚度为3〜20埃的无定形材料层插入相邻的高强度叠层之间。层叠结构还包括在每个堆叠内的每个高力矩层下面的对准层。在一个实施例中，Ru耦合层插入每个堆叠中的两个高矩层之间以引入AFC方案。使用最上层的Ru层作为CMP停止层。可以采用后退火工艺来进一步降低各向异性场（Hk）。

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