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    • 62. 发明专利
    • Metal-containing colloidal grain-carrier, and method for producing the same
    • 含金属的胶体颗粒载体及其生产方法
    • JP2008161857A
    • 2008-07-17
    • JP2007242162
    • 2007-09-19
    • Catalysts & Chem Ind Co Ltd触媒化成工業株式会社
    • TSUKUDA MICHIYOHIRAI TOSHIHARU
    • B01J35/02B01J23/89B01J29/12B01J37/04
    • PROBLEM TO BE SOLVED: To provide a method for producing a metal-containing colloidal grain carrier by an operation simpler than a conventional method for producing a metal-containing colloidal grain carrier where metal-containing colloidal grains are carried on a carrier substance, and to provide a metal-containing grain carrier obtained by the method.
      SOLUTION: The metal-containing colloidal grain carrier is obtained by carrying one or more of metal-containing colloidal grains on an inorganic carrier substance, wherein the average grain diameter of the metal-containing colloidal grains carried on the carrier substance lies in the range of 2 to 200 nm. The method for producing a metal-containing colloidal grain carrier is characterized in that metal-containing colloidal grains with the average grain diameter of 2 to 200 nm are carried on a carrier substance in the presence of the fourth period element ions (selected from Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge and As), the fifth period ions (selected from Zr, Nb, Mo, Tc, Ru, Rh, Pd, Ag, Cd, In, Sn and Sb) or the sixth period ions (selected from Hf, Ta, W, Re, Os, Pt, Au, Ir, Hg, TI, Pb and Bi).
      COPYRIGHT: (C)2008,JPO&INPIT
    • 待解决的问题:提供一种通过比常规的含有金属的胶体粒子载体的含金属的胶体粒子载体的制造方法简单的方法来制造含金属的胶体粒子载体,其中含有金属的胶体粒子载持在载体物质上 ,并提供通过该方法获得的含金属的颗粒载体。 解决方案:含金属的胶体粒子载体是通过在无机载体物质上携带一种或多种含金属的胶体颗粒而获得的,其中承载在载体物质上的含金属胶体颗粒的平均粒径位于 范围为2〜200nm。 含金属的胶体粒子载体的制造方法的特征在于,平均粒径为2〜200nm的含金属的胶体粒子在第四周期元素离子(选自Ti, V,Cr,Mn,Fe,Co,Ni,Cu,Zn,Ga,Ge和As),第五周期离子(选自Zr,Nb,Mo,Tc,Ru,Rh,Pd,Ag,Cd, Sn,Sb)或第六周期离子(选自Hf,Ta,W,Re,Os,Pt,Au,Ir,Hg,TI,Pb和Bi)。 版权所有(C)2008,JPO&INPIT
    • 63. 发明专利
    • Coating for forming transparent film and substrate with film
    • 用薄膜形成透明薄膜和基片
    • JP2008001869A
    • 2008-01-10
    • JP2006175773
    • 2006-06-26
    • Catalysts & Chem Ind Co Ltd触媒化成工業株式会社
    • MATSUDA MASAYUKIKUMAZAWA MITSUAKIHIRAI TOSHIHARU
    • C09D133/00B32B27/00B32B27/30C09D7/12C09D127/14C09D183/04
    • PROBLEM TO BE SOLVED: To provide a coating for forming a transparent film forming a low-refractive index transparent film having excellent adhesiveness to a substrate, strength, water repellency, whitening resistance, etc., and further forming the transparent film reflecting the shape of the surface of the substrate or the lower layer, e.g. the transparent film having similar unevennesses to those of the lower layer surface on the surface when the lower layer surface has the various unevennesses and resultantly suitably usable for forming the transparent film having excellent anti-reflection performances, anti-glaring performances, etc. SOLUTION: The coating for forming the transparent film is composed of low-refractive index micro-particles, a matrix-forming component, a polymerization initiator and a solvent. The coating is characterized as follows. (i) The low-refractive index micro-particles are treated with a silane coupling agent and the refractive index of the surface-treated low-refractive index microparticles is within the range of 1.20-1.45. The concentration of the low-refractive index micro-particles is within the range of 0.1-10 wt.% as solid content. (ii) The matrix-forming component is a silicone-based resin and/or an acrylic resin and the concentration of the matrix-forming component is within the range of 0.5-20 wt.% as the solid content. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:提供一种用于形成透明膜的涂层,该透明​​膜形成具有对基材的粘附性优异的低折射率透明膜,强度,拒水性,耐白化性等,并进一步形成反射的透明膜 衬底或下层的表面的形状,例如, 当下层表面具有各种不均匀性并且因此适合用于形成具有优异的抗反射性能,防眩光性能等的透明膜时,该透明膜具有与表面上的下层表面相似的不均匀性。

      解决方案:用于形成透明膜的涂层由低折射率微粒,基质形成组分,聚合引发剂和溶剂组成。 涂层的特征如下。 (i)低折射率微粒用硅烷偶联剂处理,表面处理的低折射率微粒的折射率在1.20-1.45的范围内。 低折射率微粒子的浓度在固体含量为0.1-10重量%的范围内。 (ii)基质形成成分为硅酮系树脂和/或丙烯酸树脂,基质形成成分的浓度为固体成分的0.5〜20重量%。 版权所有(C)2008,JPO&INPIT

    • 65. 发明专利
    • Method for manufacturing zirconia sol
    • 制造ZIRCONIA SOL的方法
    • JP2005179111A
    • 2005-07-07
    • JP2003421497
    • 2003-12-18
    • Catalysts & Chem Ind Co Ltd触媒化成工業株式会社
    • HIYOUHAKU YUJIHIRAI TOSHIHARU
    • C01G25/02
    • PROBLEM TO BE SOLVED: To manufacture a zirconia sol of a colloid region having a uniform particle size distribution and excellent in stability.
      SOLUTION: This manufacturing method comprises the following steps (a)-(d) and the sol in which fine zirconia particles whose average particle diameter is within a range of 5-100 nm are dispersed is manufactured; (a) a step of preparing a dispersion of a zirconium hydroxide gel by adding an aqueous alkali solution to an aqueous zirconium compound solution in the presence of a particle growth regulator, (b) a step of washing the zirconium hydroxide gel, (c) a step of hydrothermally treating a dispersion of the zirconium hydroxide gel in the presence of a particle growth regulator, (d) a step of washing the hydrothermally treated zirconium hydroxide gel. In the steps, the particle growth regulator is a carboxylic acid or a hydroxycarboxylic acid and the hydrothermal treatment is carried out within a temperature range of 100-250°C.
      COPYRIGHT: (C)2005,JPO&NCIPI
    • 解决的问题:制造具有均匀粒度分布且稳定性优异的胶体区域的氧化锆溶胶。 解决方案:该制造方法包括以下步骤(a) - (d)和平均粒径在5-100nm范围内的细小氧化锆颗粒分散的溶胶; (a)在颗粒生长调节剂的存在下,通过向锆化合物水溶液中加入碱性水溶液制备氢氧化锆凝胶的分散体的步骤,(b)洗涤氢氧化锆凝胶的步骤,(c) 在颗粒生长调节剂的存在下水热处理氢氧化锆凝胶的分散体的步骤,(d)洗涤水热处理的氢氧化锆凝胶的步骤。 在这些步骤中,颗粒生长调节剂是羧酸或羟基羧酸,水热处理在100-250℃的温度范围内进行。 版权所有(C)2005,JPO&NCIPI
    • 70. 发明专利
    • Particle for cleansing substrate and cleanser containing the particle for cleansing substrate, method for cleansing substrate
    • 用于清洁底物和清洁剂的颗粒,其用于清洁基底,用于清洁基底的方法
    • JP2003321700A
    • 2003-11-14
    • JP2002129043
    • 2002-04-30
    • Catalysts & Chem Ind Co Ltd触媒化成工業株式会社
    • KUMAZAWA MITSUAKIHIRAI TOSHIHARUSASAKI MASAKIKOMATSU MICHIO
    • G02F1/13B08B7/04C11D7/20C11D17/00G02F1/1333
    • PROBLEM TO BE SOLVED: To provide particles which are used for cleansing substrates and can efficiently cleanse the surfaces of the substrates without damaging the substrates, to provide a cleanser containing the particles for cleansing the substrates, and to provide a method for cleansing the substrates. SOLUTION: The particles for cleansing substrates are characterized by comprising an inorganic oxide and having an average particle diameter of 2 to 100 μm. The inorganic oxide comprises an inorganic oxide such as silica, alumina, zirconia, titania or ceria, or a compound inorganic oxide such as silica-alumina, or silica-zirconia. The surfaces of the particles are treated with a hydrolysable organic compound represented by formula (1): R n SiX 4-n (1) [R groups are each identically or differently a 1 to 10C non-substituted or substituted hydrocarbon group; X is a 1 to 4C alkoxy, silanol, a halogen, or H; (n) is 1 to 3]. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供用于清洁基材的颗粒,并且可以有效地清洁基材的表面而不损坏基材,以提供含有用于清洁基材的颗粒的清洁剂,并提供一种清洁方法 底物。 解决方案:用于清洁底物的颗粒的特征在于包含无机氧化物,其平均粒径为2〜100μm。 无机氧化物包括无机氧化物如二氧化硅,氧化铝,氧化锆,二氧化钛或二氧化铈,或化合物无机氧化物如二氧化硅 - 氧化铝或二氧化硅 - 氧化锆。 用式(1)表示的可水解有机化合物处理颗粒的表面:(R)各自相同或不同的R基团 1至10个非取代或取代的烃基; X为1至4C烷氧基,硅烷醇,卤素或H; (n)为1〜3]。 版权所有(C)2004,JPO