专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

61. 发明公开

EP3234213A1 MATERIAL DEPOSITION ARRANGEMENT, A VACUUM DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIAL 审中-公开
标题翻译：材料沉积装置，真空沉积系统和用于沉积材料的方法
公开(公告)号：EP3234213A1
公开(公告)日：2017-10-25
申请号：EP14815340.6
申请日：2014-12-17
申请人： Applied Materials, Inc.
发明人： GEBELE, Thomas , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel , LOPP, Andreas
IPC分类号： C23C14/12 , C23C14/24
CPC分类号： C23C14/243 , C23C14/042 , C23C14/12 , C23C14/24 , H01L51/001 , H01L51/0011
摘要： A material deposition arrangement for depositing evaporated material on a substrate in a vacuum chamber is described. The material deposition arrangement includes a crucible for providing material to be evaporated; a linear distribution pipe in fluid communication with the crucible; and a plurality of nozzles in the distribution pipe for guiding the evaporated material into the vacuum chamber. Each nozzle may have a nozzle inlet for receiving the evaporated material, a nozzle outlet for releasing the evaporated material to the vacuum chamber, and a nozzle passage between the nozzle inlet and the nozzle outlet. The nozzle passage of at least one of the plurality of nozzles includes a first section having a first length and a first size, and a second having a second length and a second size. The ratio of the second size to the first size is between 2 and 10.
摘要翻译：描述了用于将蒸发的材料沉积在真空室（110）中的基板（121）上的材料沉积装置（100）。材料沉积装置包括用于提供待蒸发材料的坩埚（102; 102a; 102b）与所述坩埚（102; 102a; 102b）流体连通的线性分配管（106; 106a; 106b）; 和在分配管（106; 106a; 106b）中的多个喷嘴，用于引导蒸发的材料进入真空室（110）。每个喷嘴（400）可以具有用于接收蒸发材料的喷嘴入口（401），用于将蒸发材料释放到真空室的喷嘴出口（403）以及喷嘴入口（401）和喷嘴入口喷嘴出口（403）。多个喷嘴中的至少一个的喷嘴通道（402）包括具有第一部分长度（412）和第一部分尺寸（411）的第一部分（410），以及具有第二部分（410）的第二部分长度（421）和第二部分尺寸（421）。第二部分尺寸（421）与第一部分尺寸（411）的比率在2和10之间。

62. 发明公开

EP2855729A1 METHOD FOR COATING A SUBSTRATE AND COATER 有权
标题翻译：方法用于涂覆基体与涂层
公开(公告)号：EP2855729A1
公开(公告)日：2015-04-08
申请号：EP12724615.5
申请日：2012-05-29
申请人： Applied Materials, Inc.
发明人： SCHEER, Evelyn , HANIKA, Markus , SCHWANITZ, Konrad , PIERALISI, Fabio , KLÖPPEL, Andreas , LIU, Jian , LOPP, Andreas
IPC分类号： C23C14/35 , H01J37/34
CPC分类号： H01J37/3473 , C23C14/35 , C23C14/352 , H01J37/32568 , H01J37/3405 , H01J37/3417 , H01J2237/3323
摘要： A method for coating a substrate by means of a cathode arrangement including at least two rotatable cathodes is disclosed. The method includes rotating at least one of the at least two rotatable cathodes in a first direction, and, at the same time, rotating at least one of the at least two rotatable cathodes in a second direction. The first direction is opposite to the second direction. Furthermore, a controller for controlling a coating process is disclosed. Furthermore, a coater for coating a substrate is disclosed. The coater includes a cathode arrangement with at least two rotatable cathodes and a controller as disclosed herein.

63. 发明申请

WO2022039966A1 MATERIAL DEPOSITION APPARATUS HAVING AT LEAST ONE HEATING ASSEMBLY AND METHOD FOR PRE-AND/OR POST-HEATING A SUBSTRATE 审中-公开
公开(公告)号：WO2022039966A1
公开(公告)日：2022-02-24
申请号：PCT/US2021/045261
申请日：2021-08-09
申请人： APPLIED MATERIALS, INC.
发明人： LOPP, Andreas , BANGERT, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , C23C14/54 , C23C14/24 , C23C14/02 , C23C14/58 , C23C16/54 , C23C16/46 , C23C16/02 , C23C16/56 , C23C14/16 , C23C14/26 , C23C14/541 , C23C14/562 , H01M4/0423
摘要： One or more heating assemblies for a material deposition apparatus for pre-heating a substrate before entering a material deposition area and/or for post-heating the substrate after exiting the material deposition area are described.

64. 发明申请

WO2014176163A1 ACTIVELY-ALIGNED FINE METAL MASK 审中-公开
标题翻译：精致对准的精细金属面膜
公开(公告)号：WO2014176163A1
公开(公告)日：2014-10-30
申请号：PCT/US2014/034799
申请日：2014-04-21
申请人： APPLIED MATERIALS, INC.
发明人： WHITE, John, M. , VISSER, Robert , HAAS, Dieter , VERCESI, Tommaso , LOPP, Andreas
IPC分类号： H01L51/56 , H01L51/52 , G03F1/42
CPC分类号： H01L51/0012 , C23C14/042 , G02B26/02 , H01L51/0011 , H01L51/56
摘要： The embodiments described herein generally relate to active alignment of a fine metal mask. The fine metal mask is connected with a frame through a plurality of microactuators. The microactuators can act on the fine metal mask to stretch the mask, reposition the mask or both. In this way, the position and size of the fine metal mask can be maintained in relation to the substrate.
摘要翻译：本文描述的实施例通常涉及精细金属掩模的主动对准。细金属掩模通过多个微致动器与框架连接。微致动器可以作用在细金属掩模上以拉伸掩模，重新定位掩模或两者。以这种方式，可以相对于衬底维持细金属掩模的位置和尺寸。

65. 发明公开

EP4172377A1 NOZZLE ASSEMBLY, EVAPORATION SOURCE, DEPOSITION SYSTEM AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL ONTO A SUBSTRATE 审中-实审
公开(公告)号：EP4172377A1
公开(公告)日：2023-05-03
申请号：EP20735377.2
申请日：2020-06-29
申请人： Applied Materials, Inc.
发明人： LOPP, Andreas , BANGERT, Stefan
IPC分类号： C23C14/24 , C23C14/16 , C23C14/56 , H01M4/04 , H01M4/38

66. 发明公开

EP4162094A1 VAPOR DEPOSITION APPARATUS AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER 审中-实审
公开(公告)号：EP4162094A1
公开(公告)日：2023-04-12
申请号：EP21818990.0
申请日：2021-05-27
申请人： Applied Materials, Inc.
发明人： BANGERT, Stefan , LOPP, Andreas
IPC分类号： C23C14/56 , C23C14/24

67. 发明公开

EP3899085A1 VAPOR DEPOSITION APPARATUS AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER 审中-实审
公开(公告)号：EP3899085A1
公开(公告)日：2021-10-27
申请号：EP18826382.6
申请日：2018-12-21
申请人： Applied Materials, Inc.
发明人： LOPP, Andreas , BANGERT, Stefan , ISHIKAWA, David , UPADHYE, Bahubali S. , ACHARYA, Sumedh , SIVARAMAKRISHNAN, Visweswaren
IPC分类号： C23C14/06 , C23C14/14 , C23C14/24 , C23C14/56 , C23C16/44

68. 发明授权

EP2826057B1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 有权
标题翻译：微型可旋转溅射装置用于溅射沉积
公开(公告)号：EP2826057B1
公开(公告)日：2018-01-24
申请号：EP12709309.4
申请日：2012-03-12
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , SCHNAPPENBERGER, Frank , LOPP, Andreas , FLOCK, Annemarie , GÖRISCH, Götz
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.

69. 发明公开

EP3230488A1 MASK ARRANGEMENT FOR MASKING A SUBSTRATE IN A PROCESSING CHAMBER 审中-公开
标题翻译：用于掩盖加工室中衬底的面罩布置
公开(公告)号：EP3230488A1
公开(公告)日：2017-10-18
申请号：EP14821531.2
申请日：2014-12-10
申请人： Applied Materials, Inc.
发明人： BANGERT, Stefan , VERCESI, Tommaso , GISLON, Daniele , HEIMEL, Oliver , LOPP, Andreas , HAAS, Dieter
IPC分类号： C23C14/04 , C23C16/04 , C23C16/458
CPC分类号： C23C14/042 , C23C16/042 , C23C16/4587
摘要： A mask arrangement (100) for masking a substrate (10) in a processing chamber is provided. The mask arrangement (100) includes a mask frame (110) having one or more frame elements (112, 114, 116, 118) and is configured to support a mask device (120), wherein the mask device (120) is connectable to the mask frame (110); and at least one actuator (130) connectable to at least one frame element (112) of the one or more frame elements (112, 114, 116, 118), wherein the at least one actuator (130) is configured to apply a force to the at least one frame element (112).
摘要翻译：提供了用于掩蔽处理室中的衬底（10）的掩模布置（100）。该掩模装置（100）包括具有一个或多个框架元件（112,114,116,118）并被配置为支撑掩模装置（120）的掩模框架（110），其中掩模装置（120）可连接到该面罩框架（110）; 和至少一个可连接到所述一个或多个框架元件（112,114,116,118）的至少一个框架元件（112）的致动器（130），其中所述至少一个致动器（130）构造成施加力到至少一个框架元件（112）。

70. 发明公开

EP2826057A1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 有权
标题翻译：微型可旋转溅射装置用于溅射沉积
公开(公告)号：EP2826057A1
公开(公告)日：2015-01-21
申请号：EP12709309.4
申请日：2012-03-12
申请人： Applied Materials, Inc.
发明人： DEPPISCH, Thomas , SCHNAPPENBERGER, Frank , LOPP, Andreas , FLOCK, Annemarie , GÖRISCH, Götz
IPC分类号： H01J37/34 , H01J37/32
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.
摘要翻译：描述了用于在网上沉积沉积材料的沉积设备和方法。沉积设备包括限定用于第一可旋转溅射装置的第一轴线的第一溅射装置支撑件，限定用于第二可旋转溅射装置的第二轴线的第二溅射装置支撑件以及涂覆窗口。第一溅射装置支撑件和第二溅射装置支撑件适于支撑第一可旋转溅射装置和第二可旋转溅射装置，以便在涂布鼓上提供要沉积在网上的沉积材料的至少一个部件。此外，第一轴线和第二轴线之间的距离小于大约200mm。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式