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    • 63. 发明申请
    • SMALL-SIZED FUSE BOX AND SEMICONDUCTOR INTEGRATED CIRCUIT HAVING THE SAME
    • 小尺寸保险丝盒和半导体集成电路
    • US20100165774A1
    • 2010-07-01
    • US12483440
    • 2009-06-12
    • Jong Jin LEE
    • Jong Jin LEE
    • G11C17/16H01H85/00G11C8/00
    • H01H85/0241G11C17/16G11C29/787H01H2085/0275H01L23/5256H01L2924/0002H01L2924/00
    • Disclosed are a fuse box and a semiconductor integrated circuit having the same. The semiconductor integrated circuit includes a plurality of banks, column control blocks, and column fuse blocks. The plurality of banks including a plurality of mat rows and mat columns. The banks are arranged in row and column directions and disposed away from each other. The column control blocks are disposed in a space between the banks which are extended to the column direction. The column fuse blocks are disposed adjacent to the column control blocks and have a plurality of fuse boxes. The fuse boxes include fuse sets arranged in two rows. The fuse boxes are disposed to correspond to the one mat column. Each fuse box has an interconnection fuse and address fuses which are arranged with a constant interval and are the same type.
    • 公开了一种保险丝盒和具有该保险丝盒的半导体集成电路。 半导体集成电路包括多个组,列控制块和列熔丝块。 多个存储体包括多个垫子行和垫子列。 银行按行和列方向排列,彼此远离。 列控制块设置在延伸到列方向的堤之间的空间中。 列保险丝块被布置成与列控制块相邻并且具有多个保险丝盒。 保险丝盒包括两列排列的保险丝套件。 保险丝盒被设置成对应于一个垫柱。 每个保险丝盒具有互连熔断器和地址保险丝,它们以恒定间隔布置并且是相同类型的。
    • 66. 发明申请
    • CMOS IMAGE SENSOR CONFIGURED TO PROVIDE REDUCED LEAKAGE CURRENT
    • CMOS图像传感器被配置为提供减少的漏电流
    • US20090230444A1
    • 2009-09-17
    • US12403794
    • 2009-03-13
    • Ju-hyun KoJong-jin LeeJung-chak Ahn
    • Ju-hyun KoJong-jin LeeJung-chak Ahn
    • H01L31/112
    • H01L27/14603
    • A complementary metal-oxide-semiconductor (CMOS) image sensor (CIS) includes a semiconductor substrate including a photodiode therein as a light sensing unit. A floating diffusion region of a first conductivity type is provided in the semiconductor substrate, and is configured to receive charges generated in the photodiode. A power supply voltage region of the first conductivity type is also provided in the semiconductor substrate. A reset transistor including a reset gate electrode on a surface of the substrate between the floating diffusion region and a power supply voltage region is configured to discharge charges stored in the floating diffusion region in response to a reset control signal. The reset transistor includes a channel region in the substrate extending between the floating diffusion region and the power supply voltage region such that the floating diffusion region and the power supply voltage regions define source/drain regions for the reset transistor. An impurity region is provided in a first portion of the channel region adjacent to the floating diffusion region. The impurity region has a doping such that the first portion of the channel region adjacent to the floating diffusion region has a different built-in potential than a second portion of the channel region adjacent to the power supply voltage region.
    • 互补金属氧化物半导体(CMOS)图像传感器(CIS)包括其中包括其中的光电二极管作为光感测单元的半导体衬底。 第一导电类型的浮动扩散区域设置在半导体衬底中,并且被配置为接收在光电二极管中产生的电荷。 第一导电类型的电源电压区域也设置在半导体衬底中。 包括在浮置扩散区域和电源电压区域之间的衬底表面上的复位栅电极的复位晶体管被配置为响应于复位控制信号而放电存储在浮动扩散区域中的电荷。 所述复位晶体管包括在所述衬底中的在所述浮动扩散区域和所述电源电压区域之间延伸的沟道区域,使得所述浮动扩散区域和所述电源电压区域限定所述复位晶体管的源极/漏极区域。 杂质区设置在与浮动扩散区相邻的沟道区的第一部分中。 杂质区域具有使得与浮动扩散区域相邻的沟道区域的第一部分具有与与电源电压区域相邻的沟道区域的第二部分不同的内置电位的掺杂。