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    • 64. 发明申请
    • N-way RF power amplifier circuit with increased back-off capability and power added efficiency using selected phase lengths and output impedances
    • N路RF功率放大器电路具有增加的回退能力和功率附加效率,使用选定的相位长度和输出阻抗
    • US20030210096A1
    • 2003-11-13
    • US10430568
    • 2003-05-05
    • Cree Microwave, Inc.
    • Raymond Sydney PengellySimon Maurice Wood
    • H03F003/68
    • H03F1/0288H03F1/0277H03F1/32H03F3/602H03F2201/3203
    • An RF power amplifier circuit for amplifying an RF signal over a broad range of power with improved efficiency includes a carrier amplifier for amplifying an RF signal over a first range of power and with a power saturation level below the maximum of the broad range of power is disclosed. A plurality of peak amplifiers are connected in parallel with the carrier amplifier with each of the peak amplifiers being biased to sequentially provide an amplified output signal after the carrier amplifier approaches saturation. The input signal is applied through a signal splitter to the carrier amplifier and the plurality of peak amplifiers, and an output for receiving amplified output signals from the carrier amplifier and the plurality of peak amplifiers includes a resistive load R/2. The split input signal is applied through a 90null transformer to the carrier amplifier, and the outputs of the peak amplifiers are applied through 90null transformers to a output load. When operating below saturation, the carrier amplifier delivers power to a load of 2R and the carrier amplifier delivers current to the load, which is one-half the current at maximum power when the amplifier is saturated. In one embodiment with the output having an impedance, Z, the carrier amplifier and each peak amplifier is connected to the output through an output-matching network presenting an output impedance of less than Z to each amplifier and with each output-matching network having selected phase length to reduce reactance of the output impedance.
    • 一种RF功率放大器电路,用于在提高效率的宽范围的功率范围内放大RF信号,包括载波放大器,用于在第一功率范围内放大RF信号,并且功率饱和电平低于功率范围宽度的最大值 披露 多个峰值放大器与载波放大器并联连接,每个峰值放大器被偏置以在载波放大器接近饱和之后依次提供放大的输出信号。 输入信号通过信号分离器施加到载波放大器和多个峰值放大器,并且用于从载波放大器和多个峰值放大器接收放大的输出信号的输出包括电阻负载R / 2。 分路输入信号通过90°变压器施加到载波放大器,峰值放大器的输出通过90°变压器施加到输出负载。 当工作在饱和度以下时,载波放大器将功率输送到2R的负载,并且载波放大器将电流传递到负载,当放大器饱和时,其为最大功率时的电流的一半。 在一个实施例中,输出具有阻抗Z,载波放大器和每个峰值放大器通过输出匹配网络连接到输出,输出匹配网络向每个放大器呈现小于Z的输出阻抗,并且每个输出匹配网络已经选择 相位长度,以减少输出阻抗的电抗。
    • 66. 发明授权
    • Silicon on insulator device with improved heat removal
    • 绝缘体上硅器件具有改善的散热性能
    • US06900501B2
    • 2005-05-31
    • US10053424
    • 2001-11-02
    • Johan Agus Darmawan
    • Johan Agus Darmawan
    • H01L27/04H01L21/822H01L23/367H01L27/08H01L27/12H01L29/786H01L27/01
    • H01L29/78603H01L23/3677H01L2924/0002H01L2924/10158H01L2924/3011H01L2924/00
    • A semiconductor device is fabricated in a silicon on insulator (SOI) substrate including a supporting silicon substrate, a silicon oxide layer supported by the substrate, and a silicon layer overlying the silicon oxide layer. An electrical component is fabricated in the silicon layer over a portion of the silicon oxide layer, and then the substrate opposite from the component is masked and etched. A metal layer is then formed in the portion of the substrate which has been removed by etching with the metal layer providing heat removal from the component. In an alternative embodiment, the silicon oxide layer overlying the portion of the substrate is removed with the metal layer abutting the silicon layer. In fabricating the device, preferential etching is employed to remove the silicon in the substrate with the silicon oxide functioning as an etchant stop. A two step process can be employed including a first oxide etch to etch the bulk of the silicon and then a more selective but slower etch. Then, the exposed silicon oxide can then be removed, as in the alternative embodiment, by a preferential etchant of silicon oxide.
    • 在包括支撑硅衬底的硅绝缘体(SOI)衬底,由衬底支撑的氧化硅层和覆盖氧化硅层的硅层上制造半导体器件。 在氧化硅层的一部分上的硅层中制造电气部件,然后对与元件相对的基板进行掩模蚀刻。 然后在衬底的已经通过蚀刻除去金属层的部分中形成金属层,从该部件提供热量去除。 在替代实施例中,覆盖衬底部分的氧化硅层被去除,金属层邻接硅层。 在制造该器件时,采用优先蚀刻来去除衬底中的硅,氧化硅起蚀刻剂停止的作用。 可以采用两步法,包括第一氧化物蚀刻来蚀刻大部分硅,然后进行更多选择性但更慢的蚀刻。 然后,如在替代实施例中那样,可以通过优选的氧化硅蚀刻剂去除暴露的氧化硅。