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51. 发明申请

US20070181832A1 Controlling the characteristics of implanter ion-beams 有权
公开(公告)号：US20070181832A1
公开(公告)日：2007-08-09
申请号：US11784073
申请日：2007-04-05
申请人： Kenneth Purser , Harald Enge , Norman Turner
发明人： Kenneth Purser , Harald Enge , Norman Turner
IPC分类号： H01J37/08
CPC分类号： H01J37/141 , H01J37/14 , H01J37/147 , H01J37/1472 , H01J37/153 , H01J37/315 , H01J37/3171 , H01J2237/141 , H01J2237/1534 , H01J2237/31703
摘要： A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

52. 发明申请

US20050242294A1 Controlling the characteristics of implanter ion-beams 有权
公开(公告)号：US20050242294A1
公开(公告)日：2005-11-03
申请号：US11154085
申请日：2005-06-16
申请人： Kenneth Purser , Harald Enge , Norman Turner
发明人： Kenneth Purser , Harald Enge , Norman Turner
IPC分类号： H01J37/141 , H01J37/08 , H01J37/14 , H01J37/147 , H01J37/315 , H01J37/317 , H01L21/425
CPC分类号： H01J37/141 , H01J37/14 , H01J37/147 , H01J37/1472 , H01J37/153 , H01J37/315 , H01J37/3171 , H01J2237/141 , H01J2237/1534 , H01J2237/31703
摘要： A method and apparatus satisfying growing demands for improving the precision of angle of incidence of implanting ions that impact a semiconductor wafer and the precision of ribbon ion beams for uniform doping of wafers as they pass under an ion beam. The method and apparatus are directed to the design and combination together of novel magnetic ion-optical transport elements for implantation purposes. The design of the optical elements makes possible: (1) Broad-range adjustment of the width of a ribbon beam at the work piece; (2) Correction of inaccuracies in the intensity distribution across the width of a ribbon beam; (3) Independent steering about both X and Y axes; (4) Angle of incidence correction at the work piece; and (5) Approximate compensation for the beam expansion effects arising from space charge. In a practical situation, combinations of the elements allow ribbon beam expansion between source and work piece to 350 millimeter, with good uniformity and angular accuracy. Also, the method and apparatus may be used for introducing quadrupole fields along a beam line.

53. 发明授权

US5869801A Device for manual electron beam processing of materials in space 失效
标题翻译：空间材料手动电子束加工装置
公开(公告)号：US5869801A
公开(公告)日：1999-02-09
申请号：US599971
申请日：1996-02-14
申请人： Boris E. Paton , Vsevolod F. Lapchinskii , Victor V. Stesin , Valeri A. Kryukov , Victor F. Shulim , Sergei S. Gavrish , Alexandr R. Bulatsev , Vladimir V. Demyanenko , Alexandr A. Zagrebelnii , Vladimir P. Nikitskii , Yuri P. Semenov , Svetlana E. Savitskaya , Vladimir A. Dzhanibekov , Alexandr V. Markov , Boris I. Perepechenko
发明人： Boris E. Paton , Vsevolod F. Lapchinskii , Victor V. Stesin , Valeri A. Kryukov , Victor F. Shulim , Sergei S. Gavrish , Alexandr R. Bulatsev , Vladimir V. Demyanenko , Alexandr A. Zagrebelnii , Vladimir P. Nikitskii , Yuri P. Semenov , Svetlana E. Savitskaya , Vladimir A. Dzhanibekov , Alexandr V. Markov , Boris I. Perepechenko
IPC分类号： B23K15/00
CPC分类号： H01J37/305 , B23K15/0046 , B64G1/22 , B64G4/00 , H01J37/16 , H01J37/24 , H01J37/248 , H01J37/31 , H01J37/315 , B64G6/00 , H01J2237/182
摘要： A device for electron beam processing of materials in space designed for the performance of the technical operations of welding, cutting, heating, filler welding, tube welding, brazing, coating deposition by the method of thermal evaporation of materials under vacuum by an operator in a spacesuit during EVA. The device includes a range of replaceable electron beam handtools, control and power supply modules, connection cables and a module for monitoring the condition of the device which is placed inside the space vehicle.
摘要翻译：用于电子束处理的设备，用于通过操作员在真空中的材料的热蒸发方法来实现焊接，切割，加热，填充焊接，管焊，钎焊，涂层沉积技术操作的空间中的材料的设计 EVA中的太空服。该装置包括一系列可替换的电子束手工具，控制和电源模块，连接电缆和用于监测放置在太空车内的装置的状态的模块。

54. 发明授权

US4105890A Device for electron-beam heating of materials 失效
标题翻译：材料电子束加热装置
公开(公告)号：US4105890A
公开(公告)日：1978-08-08
申请号：US792981
申请日：1977-05-02
申请人： Boris A. Movchan , Viktor A. Timashov , Konstantin N. Kljuev
发明人： Boris A. Movchan , Viktor A. Timashov , Konstantin N. Kljuev
IPC分类号： H05B7/00 , H01J37/04 , H01J37/141 , H01J37/315 , B23K9/00
CPC分类号： H01J37/315 , H01J37/141
摘要： A device for electron-beam heating of materials comprises an electron gun and an electromagnetic electron beam control system with a rectangular magnetic circuit. The opposite rods of the magnetic circuit accommodate beam deflection windings as well as beam correction and spreading windings. An additional winding is also provided on each magnetic circuit rod. The magnetic fields created by the current flowing through said additional windings form a magnetic quadrupole lens. The device permits manipulating the electron beam so as to obtain a sufficiently long and narrow focal spot on the surface being heated, and also the beam deflection angles range from 0.degree. to 45.degree..
摘要翻译：用于材料的电子束加热的装置包括电子枪和具有矩形磁路的电磁电子束控制系统。磁路的相对杆适应波束偏转绕组以及光束校正和扩展绕组。每个磁回路杆上还设有一个额外的绕组。由流过所述附加绕组的电流产生的磁场形成磁四极透镜。该装置允许操纵电子束，以便在被加热的表面上获得足够长且窄的焦斑，并且光束偏转角也在0°至45°之间。

55. 发明授权

US4057746A Demountable high power electron beam gun 失效
标题翻译：可拆卸高功率电子束枪
公开(公告)号：US4057746A
公开(公告)日：1977-11-08
申请号：US699246
申请日：1976-06-24
申请人： Paul Dumonte, deceased
发明人： Paul Dumonte, deceased
IPC分类号： H01J37/075 , H01J37/315 , H01J1/00
CPC分类号： H01J37/075 , H01J37/315
摘要： The invention concerns an electron gun for the production of an electron beam designed primarily for welding workpieces and including, in a frame, the mechanical facilities required for holding in a coaxial position and electrically insulating a cathode, a filament, a wehnelt and an anode.Gun featured by the fact that the cathode is held by mechanical systems in the coaxial position via several rods made of conductive material, one end of these rods being rigidly fixed with respect to the frame, the other end being applied against the outer wall of the disc shaped cathode, thus forming a positioning clamp for said cathode.The structure allows for the efficient cooling of the internal parts of the gun.
摘要翻译：本发明涉及一种用于生产主要用于焊接工件的电子束的电子枪，并且在框架中包括保持在同轴位置所需的机械设备并且电绝缘阴极，灯丝，微孔和阳极。

56. 发明授权

US4034256A Electron gun for heating, fusing and vaporizing 失效
标题翻译：电子枪用于加热，熔化和蒸发
公开(公告)号：US4034256A
公开(公告)日：1977-07-05
申请号：US691041
申请日：1976-05-27
申请人： Peter Sommerkamp , Walter Heil
发明人： Peter Sommerkamp , Walter Heil
IPC分类号： H01J37/06 , H01J37/067 , H01J37/30 , H01J37/301 , H01J37/305 , H01J37/315 , H01J7/24 , H01J29/76
CPC分类号： H01J37/301 , H01J37/067 , H01J37/305 , H01J37/315
摘要： An electron gun for heating, fusing and vaporizing having a high voltage portion, an electron emitting cathode and at least one beam forming electrode associated with the cathode. An accelerating anode, a beam guiding tube extending in the direction of the beam path and surrounded by a jacket tube and an electromatic lens are also provided. One or more deflection systems are positioned in the space formed between the beam guiding tube and the jacket tube. The beam guiding tube, the jacket tube, the electromatic lens and the deflection systems are contained in a single, replaceable unit which is joined by a plurality of hollow posts parallel to the gun axis to the high-voltage portion of the gun. The space for the electromagnetic lens and the deflection systems communicates with the atmosphere through at least one of the hollow posts.
摘要翻译：一种用于加热，熔化和汽化具有高电压部分的电子枪，电子发射阴极和与阴极相关的至少一个光束形成电极。还提供加速阳极，沿着光束路径的方向延伸并被套管和电子透镜包围的光束引导管。一个或多个偏转系统定位在形成在光束引导管和护套管之间的空间中。光束引导管，护套管，电子透镜和偏转系统被包含在单个可更换单元中，其通过平行于枪轴线的多个中空柱连接到枪的高压部分。用于电磁透镜和偏转系统的空间通过至少一个空心柱与大气连通。

57. 发明公开

EP2859573A2 DEVICE FOR GENERATING PLASMA AND DIRECTING AN ELECTRON BEAM TOWARDS A TARGET 有权
标题翻译： DEVICE用于等离子体生成与一个目标转向的电子束
公开(公告)号：EP2859573A2
公开(公告)日：2015-04-15
申请号：EP13744816.3
申请日：2013-06-11
申请人： Noivion S.r.l.
发明人： Skocdopolova, Libuse
IPC分类号： H01J3/02 , H01J37/077 , H01J37/34 , H01J37/32
CPC分类号： H01J37/3244 , C23C14/34 , H01J37/077 , H01J37/18 , H01J37/301 , H01J37/3053 , H01J37/315 , H01J37/34 , H01J2237/3137
摘要： A device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) for generating plasma and for directing an electron beam towards a target (3); the device (2; 2I; 2II; 2IV; 2V; 2VI; 2VII; 2VIII) comprises a hollow element (5); an activation group (21), which is designed to impose a difference in potential between the hollow element (5) and another element which is separate from it, in such a way as to direct the electron beam towards said separate element; and a de Laval nozzle (23), having at least one tapered portion (13), which is tapered towards the separate element and is designed to accelerate a gas flow towards the separate element.
摘要翻译：（2; 2I; 2II; 2IV，2V，2VI; 2VII; 2VIII）一种用于产生等离子体和用于引导电子束朝目标装置（3）; 所述装置（2; 2I; 2II; 2IV，2V，2VI; 2VII; 2VIII）包括中空元件（5）; 在其上被设计成在施加电势的中空元件（5）和另一个元件的所有这是与其分离，在寻求一种方式，以引导朝向所述分离元件的电子束之间的差激活组（21），所有的; 和德 - 拉伐尔喷嘴（23），具有至少一个锥形部分（13），所有这些是锥形朝向单独的元件，并且被设计以加速朝向分离元件的气流。

58. 发明授权

EP2549520B1 Teilchenstrahlgenerator mit verbessertem Vakuum 有权
标题翻译：粒子束具有改进的真空
公开(公告)号：EP2549520B1
公开(公告)日：2014-10-08
申请号：EP12400028.2
申请日：2012-07-20
申请人： Zosel, Karsten
发明人： Zosel, Karsten
IPC分类号： H01J37/31 , H01J37/315 , H01J37/06 , H01J37/18 , H01J37/16 , B23K15/10
CPC分类号： H01J37/31 , B23K15/10 , H01J37/06 , H01J37/16 , H01J37/18 , H01J37/315 , H01J2237/188

59. 发明授权

EP1382411B1 Verfahren zum Vermessen des Intensitätsprofils eines Elektronenstrahls, insbesondere eines Strahls eines Elektronenstrahlbearbeitungsgeräts, und/oder zum Vermessen einer Optik für einen Elektronenstrahl und/oder zum Justieren einer Optik für einen elektronenstrahl, Messstruktur für ein solches Verfahren und Elektronenstrahlbearbeitungsgerät 有权
标题翻译：测量的电子束的强度分布，特别是电子束加工装置的光束，和/或用于测量电子束的光学系统和/或用于调节光学系统，用于电子束，测量结构为这样的方法和电子束加工装置的方法
公开(公告)号：EP1382411B1
公开(公告)日：2011-10-05
申请号：EP03015282.1
申请日：2003-07-07
申请人： pro-beam AG & Co. KGaA
发明人： Löwer, Thorsten
IPC分类号： B23K15/00 , H01J37/304 , G01T1/28
CPC分类号： H01J37/315 , B23K15/00 , H01J37/304 , H01J2237/30433 , H01J2237/30455 , H01J2237/30477

60. 发明公开

EP1690626A2 Electron beam welding method and apparatus with a slit plate and measuring device for determining a location of the electron beam 审中-公开
标题翻译：电子束焊接方法和具有槽板的装置和用于电波束Ortbestimmen一个测量装置
公开(公告)号：EP1690626A2
公开(公告)日：2006-08-16
申请号：EP06002757.0
申请日：2006-02-10
申请人： PTR Präzisionstechnik GmbH , Schubert, Guenther G. , Delong, Steven D.
发明人： Schubert, Guenther G. , Delong, Steven D.
IPC分类号： B23K15/00 , B23K15/02 , B23K15/06 , H01J37/304 , G01T1/29 , G01R19/00
CPC分类号： H01J37/3045 , B23K10/00 , B23K15/0013 , B23K15/0046 , B23K15/02 , B23K15/06 , H01J37/305 , H01J37/315 , H01J2237/24405 , H01J2237/30472
摘要： An electron beam welding apparatus (100) includes an electron beam generator (104) for selectively emitting an electron beam (B) into a weld chamber (102). The electron beam welding apparatus (104) further includes a measuring device (108) for detecting an intensity of the electron beam (B) and a slit plate disposed between the electron beam generator (104) and the measuring device (108). The slit plate permits passage of the electron beam (B) through a slit formed in the slit plate, and the measuring device (108) determines a location of the electron beam (B) in dependence upon the detected intensity of the electron beam (B) passing through the slit. The electron beam welding device further includes thermally non-conductive and/or absorbing materials strategically placed between parts to be welded and all components of mechanical assemblies requiring precision location.
摘要翻译：一种电子束焊接装置（100）包括用于发射在选择性电子束（B）到焊接室（102）的电子束发生器（104）。的电子束焊接装置（104）进一步包括用于使电子束（B）和电子束发生器（104）和测量装置（108）之间设置有狭缝板的强度的检测的测量装置（108）。通过在狭缝板上形成的狭缝的电子束（B）的对电子束B的检测强度的狭缝板允许通道，并且测量装置（108）bestimmt电子束（B）的位置（依赖）通过狭缝。电子束焊接装置包括散热部件进一步被焊接和机械组件需要高精度位置的所有部件之间的策略性放置的其它非导电和/或吸收材料。

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