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51. 发明申请

US20110168214A1 SUBSTRATE HOLDING ROTATING MECHANISM, AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板保持旋转机构和基板处理装置
公开(公告)号：US20110168214A1
公开(公告)日：2011-07-14
申请号：US13073340
申请日：2011-03-28
申请人： Hiroyuki KANEKO , Takahiro Ogawa , Kenichi Sugita
发明人： Hiroyuki KANEKO , Takahiro Ogawa , Kenichi Sugita
IPC分类号： B08B3/00 , H01L21/68
CPC分类号： H01L21/68728 , B24B37/345 , B24B41/06 , H01L21/67219 , H01L21/68707 , Y10S134/902 , Y10T29/53091 , Y10T29/5313 , Y10T29/53174 , Y10T29/53196
摘要： A substrate holding rotating mechanism is used to hold and rotate a substrate to be processed. The substrate holding rotating mechanism according to the present invention includes at least three spindles, clamp rollers mounted respectively on the spindles for holding a periphery of a substrate, a rotating device for rotating at least one of the clamp rollers, at least one base member on which at least one of the spindles is installed, and a rotational mechanism adapted to allow the base member to be rotatable.
摘要翻译：使用基板保持旋转机构来保持和旋转待处理的基板。根据本发明的基板保持旋转机构包括至少三个主轴，分别安装在主轴上的用于保持基板周边的夹紧辊，用于使至少一个夹紧辊旋转的旋转装置，至少一个基座部件所述主轴中的至少一个被安装，以及适于允许所述基座构件旋转的旋转机构。

52. 发明申请

US20110098903A1 BRAKE CONTROL DEVICE 审中-公开
标题翻译：制动控制装置
公开(公告)号：US20110098903A1
公开(公告)日：2011-04-28
申请号：US13002191
申请日：2009-04-02
申请人： Takahiro Ogawa , Manabu Kanno
发明人： Takahiro Ogawa , Manabu Kanno
IPC分类号： B60T8/1766 , B60T7/12
CPC分类号： B60T8/1706 , B60T8/1766 , B60T2230/03 , B60T2240/06
摘要： It is an object of the invention to provide a brake control device that can accurately detect a rear wheel lift off state and that is not easily affected by a road surface state, a wear condition of a tire, a slipping state of a front wheel and an operation of a driver etc.In a brake control device that controls a front wheel anti-lock brake system of a front wheel brake of a two-wheel vehicle, it is determined whether the front wheel brake is being braked at equal to or more than a predetermined braking force. If it is determined that braking is being performed at equal to or more than the predetermined braking force, it is determined whether a rear wheel is lifting off in accordance with a slipping state of the rear wheel, and if it is determined that the rear wheel is lifting off, the front wheel anti-lock brake system is activated.
摘要翻译：本发明的目的是提供一种制动控制装置，其能够精确地检测后轮脱离状态，并且不容易受到路面状态，轮胎的磨损状况，前轮的滑动状态和驾驶员的操作等。在控制两轮车辆的前轮制动器的前轮防抱死制动系统的制动控制装置中，判断前轮制动器是否正在制动等于或者等于比预定的制动力。如果确定在等于或大于预定制动力的情况下进行制动，则根据后轮的滑动状态确定后轮是否脱离，并且如果确定后轮正在起吊，前轮防抱死制动系统被激活。

53. 发明申请

US20110094442A1 SUBSTRATE HOLDING APPARATUS, SUBSTRATE HOLDING METHOD, AND SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板保持装置，基板保持方法和基板处理装置
公开(公告)号：US20110094442A1
公开(公告)日：2011-04-28
申请号：US12983474
申请日：2011-01-03
申请人： Masahiko SEKIMOTO , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
发明人： Masahiko SEKIMOTO , Seiji Katsuoka , Naoki Dai , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Suzuki , Kenichi Kobayashi , Yasuyuki Motoshima , Ryo Kato
IPC分类号： B05C3/02 , B05C13/00
CPC分类号： H01L21/67086 , H01L21/67051 , H01L21/687
摘要： A substrate holding apparatus can meet the request for a smaller-sized compact apparatus while ensuring a sufficient immersion depth of a substrate in a processing liquid. The substrate holding apparatus includes: a substrate holder for supporting a substrate (W) by bringing a peripheral portion of a surface of the substrate (W) into contact with a first sealing member; and a substrate pressing section for lowering relative to the substrate holder so as to press the substrate (W) held by the substrate holder downward, thereby bringing a first sealing member into pressure contact with the substrate (W). The substrate pressing section is provided with a second ring-shaped sealing member which makes pressure contact with an upper surface of a ring-shaped holding section of the substrate holder, thereby sealing the peripheral region of the substrate pressing section.
摘要翻译：基板保持装置可以满足对较小尺寸的小型装置的要求，同时确保基板在处理液体中的足够的浸入深度。基板保持装置包括：基板保持件，用于通过使基板（W）的表面的周边部分与第一密封构件接触来支撑基板（W）; 以及基板按压部，其相对于基板保持件下降，以将由基板保持件保持的基板（W）向下压，从而使第一密封部件与基板（W）压力接触。基板按压部设置有与基板保持件的环状保持部的上表面压力接触的第二环状密封部件，从而密封基板按压部的周边区域。

54. 发明申请

US20100221432A1 SUBSTRATE PROCESSING METHOD AND APPARATUS 有权
标题翻译：基板加工方法和装置
公开(公告)号：US20100221432A1
公开(公告)日：2010-09-02
申请号：US12771176
申请日：2010-04-30
申请人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
发明人： Seiji Katsuoka , Masahiko Sekimoto , Toshio Yokoyama , Teruyuki Watanabe , Takahiro Ogawa , Kenichi Kobayashi , Mitsuru Miyazaki , Yasuyuki Motojima
IPC分类号： B05D3/10
CPC分类号： H01L21/68721 , C23C18/163 , C23C18/1632 , C23C18/1886 , C25D7/123 , C25D17/001 , H01L21/67126 , H01L21/67766 , Y10S134/901
摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.
摘要翻译：基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

55. 发明申请

US20100154837A1 Liquid-scattering prevention cup, substrate processing apparatus and method for operating the apparatus 审中-公开
标题翻译：液体散射防止杯，基板处理装置和操作该装置的方法
公开(公告)号：US20100154837A1
公开(公告)日：2010-06-24
申请号：US12654437
申请日：2009-12-18
申请人： Takahiro Ogawa , Naoki Matsuda , Koichi Fukaya , Hiroyuki Kaneko
发明人： Takahiro Ogawa , Naoki Matsuda , Koichi Fukaya , Hiroyuki Kaneko
IPC分类号： B08B3/00
CPC分类号： B08B17/00 , B08B3/02 , B08B17/025 , H01L21/67051 , H01L21/6708
摘要： A liquid-scattering prevention cup, provided in a substrate processing apparatus, is capable of attaching a hydrophilic member, such as a PVA sponge, to an inner surface of a liquid-scattering prevention cup body easily and efficiently. The liquid-scattering prevention cup includes a liquid-scattering prevention cup body, and a liquid-scattering prevention sheet having a surface hydrophilic material layer, attached to an entire area or a predetermined area of the inner surface of the liquid-scattering prevention cup body. The liquid-scattering prevention sheet has been attached to the liquid-scattering prevention cup body by an attachment such that the hydrophilic material layer is exposed.
摘要翻译：设置在基板处理装置中的液体散射防止杯能够容易且有效地将亲水构件如PVA海绵附着到防止液体散射的杯体的内表面。液体散射防止杯包括液体散射防止杯体和具有表面亲水材料层的液体散射防止片，附着在防止液体散射杯体的内表面的整个区域或预定区域。通过使亲水性材料层露出的附着物将液体散射防止片附着在防止散射液体的杯体上。

56. 发明申请

US20100138122A1 Brake Control Method And Brake Control Device For Two-Wheeled Motor Vehicle 有权
标题翻译：双轮汽车制动控制方法及制动控制装置
公开(公告)号：US20100138122A1
公开(公告)日：2010-06-03
申请号：US12528389
申请日：2008-02-21
申请人： Helge Westerfeld , Takahiro Ogawa , Markus Hamm
发明人： Helge Westerfeld , Takahiro Ogawa , Markus Hamm
IPC分类号： G06F19/00
CPC分类号： B60T8/1706 , B60T8/1766 , B60T8/261 , B60T8/3225 , B60T13/686 , B60T2240/06
摘要： To further improve, in a brake control method and device for a two-wheeled motor vehicle that utilizes a wheel cylinder pressure as a parameter for predicting the potential for lifting of a rear wheel, the accuracy of predicting lifting of the rear wheel.A brake control method of the present invention comprises the steps of inputting a signal of an input sensor (step 100); detecting a front wheel cylinder pressure (step 102); detecting an amount of change in the front wheel cylinder pressure (step 104); determining whether or not the front wheel cylinder pressure and the amount of change in the front wheel cylinder pressure that have been detected correspond to a brake condition where lifting of a rear wheel can occur (step 106); and, when it is determined that the front wheel cylinder pressure and the amount of change in the front wheel cylinder pressure that have been detected correspond to the brake condition, reducing a pressure amplification gradient of the front wheel cylinder pressure.
摘要翻译：为了进一步改进，在利用轮缸压力作为预测后轮提升潜力的参数的用于两轮机动车辆的制动控制方法和装置中，预测后轮提升的精度。本发明的制动控制方法包括输入输入传感器的信号的步骤（步骤100）。检测前轮缸压力（步骤102）; 检测前轮缸压力的变化量（步骤104）; 确定前轮缸压力和前轮缸压力的变化量是否与可能发生后轮的提升的制动条件相对应（步骤106）; 并且当确定前轮缸压力和检测到的前轮缸压力的变化量对应于制动条件时，减小前轮缸压力的压力放大梯度。

57. 发明授权

US07663885B2 IC fixing structure 失效
标题翻译： IC固定结构
公开(公告)号：US07663885B2
公开(公告)日：2010-02-16
申请号：US12074158
申请日：2008-02-29
申请人： Takahiro Ogawa , Takahito Yamanaka
发明人： Takahiro Ogawa , Takahito Yamanaka
IPC分类号： H05K7/20
CPC分类号： H01L23/4006 , H01L2023/4031 , H01L2023/405 , H01L2023/4087 , H01L2924/0002 , H01L2924/00
摘要： The IC fixing component includes a locking case accommodating the IC in such a manner that a side of the IC out of a face-to-face contact with the heat dissipation plate is brought into a face-to-face contact with the locking case so as to be covered and a through hole and a rotation stop protrusion inserted into a rotation limiting hole. After the IC has been accommodated in the locking case, the screw member inserted through the through hole is screwed into a screw hole of the heat dissipation plate so that the side of the IC out of face-to-face contact with the locking case is pressed by the locking case thereby to be brought into a face-to-face contact with the heat dissipation plate.
摘要翻译： IC固定部件包括容纳IC的锁定壳体，使得IC的与散热板的面对面接触的一侧与锁定壳体进行面对面接触，以及插入到旋转限制孔中的通孔和旋转止动突起。在IC被容纳在锁定壳体中之后，插入通孔的螺钉构件被拧入散热板的螺纹孔中，使得与锁定壳体面对面接触的IC侧是由锁定壳体按压而与散热板进行面对面的接触。

58. 发明申请

US20090305612A1 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 有权
标题翻译：基板处理装置，基板处理方法，基板保持机构和基板保持方法
公开(公告)号：US20090305612A1
公开(公告)日：2009-12-10
申请号：US12457175
申请日：2009-06-03
申请人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
发明人： Mitsuru Miyazaki , Seiji Katsuoka , Naoki Matsuda , Junji Kunisawa , Kenichi Kobayashi , Hiroshi Sotozaki , Hiroyuki Shinozaki , Osamu Nabeya , Shinya Morisawa , Takahiro Ogawa , Natsuki Makino
IPC分类号： B24B51/00 , B08B3/00 , B08B1/02 , F26B5/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
摘要翻译：公开了一种用于处理衬底的设备。该装置包括：抛光部，其被配置为对基板进行抛光;移动机构，被配置为传送基板;以及清洁部，其构造成清洁和干燥被抛光的基板。清洗部具有多个用于清洗多个基板的清洗线。多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

59. 发明申请

US20090037063A1 TWO-WHEELED MOTOR VEHICLE BRAKE CONTROL METHOD AND SYSTEM 失效
标题翻译：双轮电动车辆制动控制方法与系统
公开(公告)号：US20090037063A1
公开(公告)日：2009-02-05
申请号：US12162220
申请日：2006-01-27
申请人： Takahiro Ogawa , Helge Westerfeld , Manabu Kanno
发明人： Takahiro Ogawa , Helge Westerfeld , Manabu Kanno
IPC分类号： B60T8/1755
CPC分类号： B60T8/1706 , B60T8/1755 , B60T8/1766 , B60T8/261 , B60T8/3225 , B60T2230/03 , B60T2240/06
摘要： To enable, with respect to a vehicle where lifting of the vehicle body easily occurs to a relatively large extent even in a relatively early stage when rear wheel lifting is detected, more rapid and reliable securement of the safety of the vehicle body with respect to that rear wheel lifting.When lifting of a rear wheel is detected, in contrast to what has conventionally been the case, the brake pressure of a front wheel is immediately reduced (S102) regardless of whether or not there is occurrence of skidding of the front wheel, so lifting of the entire vehicle body is rapidly and reliably controlled and prevented particularly in a vehicle whose entire vehicle body is easily lifted even by slight rear wheel lifting.
摘要翻译：为了使得即使在检测到后轮提升时的相对较早的阶段中也容易发生车身的抬起的车辆，相对于该车身的安全性的更快速和可靠地确保后轮提升。当检测到后轮的提升时，与传统的情况相比，前轮的制动压力立即降低（S102），而不管前轮是否发生滑动，因此提升整个车身能够快速可靠地控制和防止，特别是即使通过轻微的后轮提升也能够容易地提升整个车身的车辆。

60. 发明授权

US07471047B2 Plasma television set 失效
标题翻译：等离子电视机
公开(公告)号：US07471047B2
公开(公告)日：2008-12-30
申请号：US11442412
申请日：2006-05-25
申请人： Takahiro Ogawa
发明人： Takahiro Ogawa
IPC分类号： G09G3/10
CPC分类号： H02M1/32 , G09G2330/04 , H02M3/33507
摘要： At a primary power-supply board 40, a Vsus power supply and a Vadd power supply of prescribed voltages are derived and outputted to a plasma display panel 11. Secondary power supplies Vsub1, Vsub2, and Vsub3 are derived from prescribed voltage levels of a transformer 42 for deriving Vsus and Vadd power supplies at the primary power-supply board 40. The secondary power supplies Vsub1, Vsub2, and Vsub3 are outputted to a secondary power-supply board 20 which is a board different from the primary power-supply board 40. Vset, Ve, and Vscan power supplies which can be used by the plasma display panel 11 are derived by regulating the secondary power supplies Vsub1, Vsub2, and Vsub3. Thus, since the primary power-supply board 40 and the secondary power-supply board 20 are provided separately, the secondary power-supply board 20 alone can be replaced to cope with the changes of the plasma display panel 11.
摘要翻译：在主电源板40中，导出Vsus电源和规定电压的Vadd电源并将其输出到等离子体显示面板11.次级电源Vsub1，Vsub2和Vsub3从变压器的规定电压电平导出 42，用于导出主电源板40上的Vsus和Vadd电源。次级电源Vsub1，Vsub2和Vsub3被输出到与主电源板40不同的板的辅助电源板20 可以通过调节次级电源Vsub1，Vsub2和Vsub3来导出可由等离子体显示面板11使用的Vset，Ve和Vscan电源。因此，由于主电源板40和二次电源板20分开设置，所以可以更换二次电源板20以应对等离子体显示面板11的变化。

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