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51. 外观设计

USD514618S1 Ink jet liquid injector 失效
标题翻译：喷墨液注射器
公开(公告)号：USD514618S1
公开(公告)日：2006-02-07
申请号：US29177390
申请日：2003-03-11
申请人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami
设计人： Shinichi Nakamura , Yoshiaki Yamada , Tsuyoshi Kitahara , Satoru Katagami

52. 发明授权

US06991315B2 Ejecting method and ejecting apparatus 有权
公开(公告)号：US06991315B2
公开(公告)日：2006-01-31
申请号：US10301569
申请日：2002-11-22
申请人： Shinichi Nakamura , Yoshiaki Yamada
发明人： Shinichi Nakamura , Yoshiaki Yamada
IPC分类号： B41J2/145 , B41J2/15 , B41J29/38
CPC分类号： H05B33/10
摘要： In an ink jet apparatus for manufacturing a color filter 1, ink jet heads 22 having a plurality of nozzle 27 are disposed in a linear manner. Filter element member is ejected to a motherboard 12 from a plurality of nozzles 27 four times so as to form the filter element 3 in a predetermined thickness. By doing this, it is possible to prevent difference in the thickness in a plurality of the filter elements 3 and to equalize light transparency in planar manner. Thus, in an ejecting apparatus, a color filter can be formed in more common way at low cost and more efficiently. Also, it is possible to provide an ejecting apparatus which can equalize factors such as electrooptic characteristics of the electrooptic members, color displaying characteristics by the liquid crystal apparatuses, and illuminating characteristics by an EL surface.

53. 发明授权

US06959502B2 Drying apparatus and workpiece processing apparatus having the same 失效
标题翻译：干燥装置和具有该干燥装置的工件处理装置
公开(公告)号：US06959502B2
公开(公告)日：2005-11-01
申请号：US10715347
申请日：2003-11-17
申请人： Shinichi Nakamura , Yoshiaki Yamada
发明人： Shinichi Nakamura , Yoshiaki Yamada
IPC分类号： F26B3/18 , F26B3/20 , F26B9/06 , F26B25/00 , F26B25/06 , G02B5/20 , H01L51/50 , H05B33/10
CPC分类号： G02B5/201
摘要： A drying furnace contains therein hot plates which are disposed in a plurality of stages in a vertical direction, on each of which is seated a platelike workpiece. A gateway for the workpiece is disposed on a front side of the drying furnace and is normally left open to face the plurality of stages of hot plates. A chamber casing is disposed on a rear side of the drying furnace. An exhaust chamber is defined in the chamber casing and has a flow dividing plate which has formed therein a plurality of ventilation holes each facing a gap between the plurality of stages of hot plates. The exhaust chamber is forcibly exhausted by an exhaust blower.
摘要翻译：干燥炉中装有热板，它们沿垂直方向设置成多个阶段，每个阶段都安置在板状工件上。工件的通道设置在干燥炉的前侧，通常保持打开以面对多个阶段的热板。室外壳设置在干燥炉的后侧。排气室被限定在腔室中，并且具有分流板，该分流板在其中形成有多个通气孔，每个通风孔面对多个热板之间的间隙。排气室被排气鼓风机强制排空。

54. 发明申请

US20050231555A1 Member to be recognized for alignment; head unit and electronic device provided therewith; method of manufacturing LCD, organic EL device, electron emission device, PDP device, electrophoretic display device, color filter, and organic EL; method of forming spacer, metallic wire, lens, resist, and light diffusion member, each of said methods using said head unit 有权
标题翻译：会员被认可为对齐; 头单元和电子设备; 制造LCD，有机EL器件，电子发射器件，PDP器件，电泳显示器件，滤色器和有机EL的方法; 形成间隔物，金属线，透镜，抗蚀剂和光漫射构件的方法，每种所述方法使用所述头单元
公开(公告)号：US20050231555A1
公开(公告)日：2005-10-20
申请号：US11150104
申请日：2005-06-13
申请人： Shinichi Nakamura , Yoshiaki Yamada
发明人： Shinichi Nakamura , Yoshiaki Yamada
IPC分类号： B41J2/01 , B41J25/304 , B41J25/34 , G02B3/00 , G02B5/02 , G02B5/20 , G02F1/1335 , H01J9/227 , H01L23/544 , H01L51/00 , H01L51/40 , B41J2/14 , B41J2/16
CPC分类号： H01L23/544 , H01L51/0005 , H01L2223/54473 , H01L2924/0002 , H01L2924/12044 , H01L2924/00
摘要： A member to be recognized for alignment is disposed in an object to be set in position and having formed therein a mark for image-wise recognition. The member is made up of a member main body formed substantially in a columnar shape and having a mirror-finished front end surface. The mark is formed into a depressed shape in substantially central part of the front end surface of the member main body.
摘要翻译：要被识别用于对准的构件被布置在待设置的对象中并且在其中形成有用于图像识别的标记。该构件由基本上形成为柱状的构件主体构成，具有镜面前端面。标记在构件主体的前端面的大致中央部形成为凹陷状。

55. 发明授权

US06922185B2 Inputting device and electronic instrument using this inputting device and inputting method thereof 失效
标题翻译：使用该输入装置的输入装置和电子仪器及其输入方法
公开(公告)号：US06922185B2
公开(公告)日：2005-07-26
申请号：US10202874
申请日：2002-07-26
申请人： Yoshiaki Yamada , Michio Nagai , Midori Tanaka , Yoko Arimitsu , Tatsuya Uchikawa
发明人： Yoshiaki Yamada , Michio Nagai , Midori Tanaka , Yoko Arimitsu , Tatsuya Uchikawa
IPC分类号： G06F3/033 , G06F3/038 , H01H25/00 , G09G5/00
CPC分类号： G06F3/0338 , H01H25/002 , H01H2025/004
摘要： An inputting device, an electronic instrument using this inputting device, and an inputting method thereof, in which displacement of an operating section in the direction slanting for the X or the Y direction is detected and the movement of a moving object such as a cursor on a display can be controlled easily and precisely, are provided. The operating section is displaced about in the horizontal direction and the vertical direction for a plane being almost parallel to the surface of a cabinet. In case that orthogonal coordinates having the X axis and the Y axis are set on the plane being almost parallel to the surface of the cabinet, horizontal direction sensors detect the displacement of the operating section in the direction slanting for the X or Y direction, in addition to in the X or Y direction. The cursor moves on the display based on the displacement of the operating section about in the horizontal direction. Information being selected by the cursor on the display is decided by the displacement of the operating section about in the vertical direction.
摘要翻译：使用该输入装置的输入装置，电子仪器及其输入方法，其中检测到在X或Y方向上倾斜的方向上的操作部分的位移和诸如光标的移动物体的移动可以容易且准确地控制显示。操作部分在水平方向和垂直方向上位移大致平行于机柜表面。在具有X轴和Y轴的正交坐标被设置在几乎平行于机柜表面的平面上的情况下，水平方向传感器检测操作部分在X或Y方向的倾斜方向上的位移，除了在X或Y方向。基于操作部分在水平方向上的位移，光标在显示器上移动。由显示器上的光标选择的信息由操作部分在垂直方向上的位移决定。

56. 发明授权

US06866356B2 System and methods for providing a head drive unit 有权
标题翻译：用于提供头驱动单元的系统和方法
公开(公告)号：US06866356B2
公开(公告)日：2005-03-15
申请号：US10379579
申请日：2003-03-06
申请人： Hidenori Usuda , Yoshiaki Yamada
发明人： Hidenori Usuda , Yoshiaki Yamada
IPC分类号： B41J2/01 , B05C5/00 , B41J2/045 , B41J2/055 , G02B5/20 , G02F1/13 , G02F1/1335 , G02F1/1343 , H01L51/50 , H05B33/10 , B41J29/38
CPC分类号： B41J2/04541 , B41J2/04573 , B41J2/04581 , B41J2/04588 , B41J2/04593
摘要： The present invention provides a head drive unit capable of discharging a required amount of viscous body from a head having a pressure generating element, such as a piezoelectric element, and a method of the same, a droplet discharge unit having the head drive unit, a head drive program, and a device manufacturing method having a process of discharging the viscous body by the method as one of manufacturing processes. In the invention, a driving signal is a signal to be applied to a pressure generating element, such as a piezoelectric element, provided to a head and is generated in synchronization with a clock signal. The driving signal has a period to vary the voltage and a period to hold the voltage. The present invention can vary the rate of change in the voltage of the driving signal per unit time by setting a voltage variation during the period and the number of clocks of the clock signal held in the period as appropriate depending on the rate of deformation of the pressure generating element per unit time.
摘要翻译：本发明提供一种头驱动单元，其能够从具有诸如压电元件的压力产生元件的头部排出所需量的粘性体及其方法，具有头驱动单元的液滴喷射单元，头驱动程序，以及具有通过作为制造过程之一的方法将粘性体排出的过程的装置制造方法。在本发明中，驱动信号是施加到诸如压电元件的压力产生元件提供给头部并且与时钟信号同步产生的信号。驱动信号具有改变电压和保持电压的周期的周期。本发明可以通过在该周期内设定电压变化以及在该周期内保持的时钟信号的时钟数根据该变化的速率来改变每单位时间的驱动信号的电压变化率压力发生元件每单位时间。

57. 发明授权

US06787913B2 Ohmic contact plug having an improved crack free TiN barrier metal in a contact hole and method of forming the same 失效
标题翻译：在接触孔中具有改进的无裂纹TiN阻挡金属的欧姆接触塞及其形成方法
公开(公告)号：US06787913B2
公开(公告)日：2004-09-07
申请号：US09974808
申请日：2001-10-12
申请人： Yoshiaki Yamada , Takashi Yokoyama
发明人： Yoshiaki Yamada , Takashi Yokoyama
IPC分类号： H01L2348
CPC分类号： H01L21/76849 , C23C14/0641 , C23C14/541 , H01L21/2855 , H01L21/28568 , H01L21/76838 , H01L21/76843 , H01L21/7685 , H01L21/76855 , H01L21/76856 , H01L21/76864 , H01L21/76877
摘要： A sputtering method of depositing a titanium nitride film on a titanium film in contact with a silicon at a bottom of a contact hole is provided, wherein the sputtering method is carried out at a temperature of the silicon region of not less than 450° C., so that the titanium nitride film has a compressive stress of not higher than 5×109 dyne/cm2 whereby the titanium film has such a high stability as preventing any crack upon changing the compressive stress to a tensile stress by a heat treatment.
摘要翻译：提供了在接触孔底部与硅接触的钛膜上沉积氮化钛膜的溅射方法，其中溅射方法在硅区域的温度不低于450℃下进行。，使得氮化钛膜具有不高于5×10 9达因/ cm 2的压缩应力，由此钛膜具有如下稳定性：当通过热量将压缩应力改变为拉伸应力时，可以防止任何裂纹治疗。

58. 发明授权

US06627996B1 Semiconductor device having fluorine containing silicon oxide layer as dielectric for wiring pattern having anti-reflective layer and insulating layer thereon 有权
标题翻译：具有含氟氧化硅层的半导体器件作为具有抗反射层和绝缘层的布线图案的电介质
公开(公告)号：US06627996B1
公开(公告)日：2003-09-30
申请号：US09680437
申请日：2000-10-06
申请人： Takashi Yokoyama , Yoshiaki Yamada , Koji Kishimoto
发明人： Takashi Yokoyama , Yoshiaki Yamada , Koji Kishimoto
IPC分类号： H01L2348
CPC分类号： H01L21/02131 , H01L21/02211 , H01L21/02274 , H01L21/02304 , H01L21/02362 , H01L21/31629 , H01L21/76829 , H01L21/76834 , H01L21/76837 , H01L2924/0002 , H01L2924/00
摘要： A semiconductor device with satisfactory bonding ability of a plasma SiOF oxide layer on a wiring and satisfactory burying ability for burying wiring space portions. The semiconductor substrate, forming an anti-reflection layer of a refractory metal or compound thereof, on the metal layer, and forming an insulation layer on the anti-reflection layer. There after, the insulation layer is patterned and a wiring is formed by etching the anti-reflection layer and the metal layer while taking the patterned insulation layer as a mask and leaving the anti-reflection layer and the insulation layer on the wiring. Subsequently, the patterned wiring is buried with an SiOF layer as an Si oxide layer containing fluorine, together with the anti-reflection layer and the insulation layer on the upper surface thereby.
摘要翻译：一种半导体器件，其具有令人满意的布线空间部分等离子体SiOF氧化物层的接合能力和掩埋能力。半导体衬底，在金属层上形成难熔金属或其化合物的抗反射层，并在抗反射层上形成绝缘层。之后，对绝缘层进行构图，并且通过在将图案化绝缘层作为掩模并且将抗反射层和绝缘层留在布线上的同时蚀刻抗反射层和金属层来形成布线。随后，图案化的布线被掩埋成SiOF层作为含氟的Si氧化物层，以及上表面上的防反射层和绝缘层。

59. 发明授权

US06395456B1 Semiconductor device achieving higher integration, method of manufacturing thereof, and method of forming resist pattern used therefor 失效
标题翻译：实现更高集成度的半导体器件，其制造方法以及用于形成抗蚀剂图案的方法
公开(公告)号：US06395456B1
公开(公告)日：2002-05-28
申请号：US09342895
申请日：1999-06-29
申请人： Naohisa Tamada , Yoshiaki Yamada
发明人： Naohisa Tamada , Yoshiaki Yamada
IPC分类号： G03F722
CPC分类号： G03F7/70466
摘要： A semiconductor device achieving higher integration without deterioration of electrical characteristics thereof, a method of manufacturing the semiconductor device, and a method of forming a resist pattern used for that can be obtained. According to the method of forming a resist pattern used for the method of manufacturing a semiconductor device, light is directed via a mask onto a resist film surface formed on a substrate to project a first optical image having a width equal to or less than the wavelength of the light onto the resist surface. The mask is shifted relative to the substrate. Via the shifted mask, light is directed onto the resist film surface to project a second optical image having a width equal to or less than the wavelength of the light onto the resist surface such that the second optical image partially overlaps faith a region where the first optical image is projected.
摘要翻译：可以获得实现更高集成度而不劣化其电特性的半导体器件，制造半导体器件的方法以及形成用于其的抗蚀剂图案的方法。根据形成用于该方法的抗蚀剂图案的方法制造半导体器件时，将光通过掩模引导到形成在基板上的抗蚀剂膜表面上，以将具有等于或小于光的波长的宽度的第一光学图像投影到抗蚀剂表面上。掩模相对于基底移动。通过移动的掩模，光被引导到抗蚀剂膜表面上，以将具有等于或小于光的波长的宽度的第二光学图像投影到抗蚀剂表面上，使得第二光学图像部分地与第一光学图像的第一投影光学图像。

60. 发明授权

US5900645A Semiconductor device and method of testing the same 失效
标题翻译：半导体器件及其测试方法
公开(公告)号：US5900645A
公开(公告)日：1999-05-04
申请号：US976082
申请日：1997-11-21
申请人： Yoshiaki Yamada
发明人： Yoshiaki Yamada
IPC分类号： H01L21/3205 , H01L21/66 , H01L23/52 , H01L23/544 , H01L23/58
CPC分类号： H01L22/14 , H01L22/34 , H01L22/12 , H01L2924/0002
摘要： A semiconductor device is tested without destroying a substrate immediately after a formation of a metal film and before patterning the metal film.To this end, the substrate is first divided into a product region and a test pattern region. Next, an insulating film is formed on the substrate. Thereafter, openings are formed in the insulating film and on the product region and the test pattern region. Subsequently, the metal film is formed in the openings and on the insulating film. Finally, the metal film is patterned to form a wiring pattern.Under these circumstances, a forming state of the metal film in the opening on the test pattern region is actually tested. Specifically, the presence or absence of a void is checked. In accordance with this test result, a forming state of the metal film in the opening in the product region is evaluated.
摘要翻译：在形成金属膜之后并且在图案化金属膜之前，测试半导体器件而不破坏基板。为此，首先将基板分成产品区域和测试图案区域。接下来，在基板上形成绝缘膜。此后，在绝缘膜和产品区域和测试图案区域上形成开口。接着，在开口部和绝缘膜上形成金属膜。最后，将金属膜图案化以形成布线图案。在这些情况下，实际上测试了测试图案区域中的开口中的金属膜的形成状态。具体地说，检查是否存在空隙。根据该测试结果，评估产品区域中的开口中的金属膜的形成状态。

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