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51. 发明授权

US08343387B2 Oxide evaporation material and high-refractive-index transparent film 有权
$Oxide evaporation material and high-refractive-index transparent film$
标题翻译：氧化物蒸发材料和高折射率透明膜
公开(公告)号：US08343387B2
公开(公告)日：2013-01-01
申请号：US12939403
申请日：2010-11-04
申请人： Yoshiyuki Abe , Riichiro Wake , Masakazu Kuwahara , Yasuyuki Maeno
发明人： Yoshiyuki Abe , Riichiro Wake , Masakazu Kuwahara , Yasuyuki Maeno
IPC分类号： H01B1/08
CPC分类号： H01B1/08 , C04B35/01 , C04B35/6261 , C04B2235/3229 , C04B2235/3286 , C04B2235/5445 , C04B2235/6562 , C04B2235/6565 , C04B2235/6585 , C04B2235/6586 , C04B2235/77 , C04B2235/786 , C23C14/0015 , C23C14/08
摘要： An oxide evaporation material in the present invention comprises a sintered body containing indium oxide as a main component thereof and cerium with the Ce/In atomic ratio of more than 0.110 and equal to or less than 0.538, and has an L* value of 62 to 95 in the CIE 1976 color space. The oxide evaporation material with the L* value of 62 to 95 has an optimal oxygen amount. Accordingly, even when a small amount of oxygen gas is introduced into a film-formation vacuum chamber, a high-refractive-index transparent film having a refractive index of 2.15 to 2.51 at a wavelength of 550 nm, a low resistance, and a high transmittance in the visible to near-infrared region is formed by vacuum deposition methods. Since the introduced oxygen gas amount is small, the difference in composition between the film and the evaporation material is made small.
摘要翻译：本发明的氧化物蒸镀材料包含以氧化铟为主要成分的烧结体和Ce / In原子比大于0.110且等于或小于0.538的铈，其L *值为62〜 95在CIE 1976色彩空间。 L *值为62〜95的氧化物蒸发材料具有最佳的氧量。因此，即使在成膜真空室中引入少量的氧气的情况下，在波长550nm下折射率为2.15〜2.51的高折射率透明膜，低电阻，高通过真空沉积法形成可见光到近红外区域的透射率。由于引入的氧气量少，所以膜和蒸发材料之间的组成差异变小。

52. 发明授权

US08222667B2 Semiconductor light-emitting element, method for manufacturing the semiconductor light-emitting element and lamp that uses the semiconductor light-emitting element 有权
标题翻译：半导体发光元件，使用半导体发光元件的半导体发光元件和灯的制造方法
公开(公告)号：US08222667B2
公开(公告)日：2012-07-17
申请号：US12920949
申请日：2009-03-05
申请人： Tokuyuki Nakayama , Yoshiyuki Abe
发明人： Tokuyuki Nakayama , Yoshiyuki Abe
IPC分类号： H01L33/42
CPC分类号： H01L33/42 , H01L2224/48091 , H01L2224/48247 , H01L2224/48257 , H01L2924/00014
摘要： Provided are a semiconductor light-emitting element that is capable of efficiently outputting blue color or ultraviolet light, and a lamp using the semiconductor light-emitting element.The semiconductor light-emitting element is obtained by a manufacturing method that, when manufacturing the semiconductor light-emitting element that comprises a compound semiconductor layer that includes at least a p-type semiconductor layer, and a transparent electrode that is provided on the p-type semiconductor layer, includes a step of forming a film comprising an oxide of indium and gallium, or forming a film comprising an oxide of indium, gallium and tin, in an amorphous state on the p-type semiconductor layer, so as to form a transparent conductive film, followed by a step of performing an annealing process on the transparent conductive film at a temperature of 200° C. to 480° C.
摘要翻译：提供能够有效地输出蓝色或紫外光的半导体发光元件和使用该半导体发光元件的灯。半导体发光元件是通过以下制造方法获得的：当制造包括至少包含p型半导体层的化合物半导体层的半导体发光元件和设置在p型半导体层上的透明电极时，型半导体层包括形成包含铟和镓的氧化物的膜或在p型半导体层上形成非晶状态的包含铟，镓和锡的氧化物的膜的步骤，以形成透明导电膜，然后在200℃至480℃的温度下对透明导电膜进行退火处理的步骤。

53. 发明申请

US20120145187A1 METHOD FOR TREATMENT OF IRON-BASED METAL SURFACE EXPOSED TO SUPERHEATED STEAM 审中-公开
标题翻译：用于处理暴露于超级蒸汽的基于铁的金属表面的方法
公开(公告)号：US20120145187A1
公开(公告)日：2012-06-14
申请号：US13377851
申请日：2010-07-01
申请人： Yoshiyuki Abe , Masamichi Miyajima , Kazuo Marugame , Masaki Yoshida , Yuji Shimizu
发明人： Yoshiyuki Abe , Masamichi Miyajima , Kazuo Marugame , Masaki Yoshida , Yuji Shimizu
IPC分类号： C23G1/02
CPC分类号： C23F11/10 , C23F11/08 , C23F14/02 , F22B37/025
摘要： The present invention provides a surface treatment method for suppressing the formation and growth of superheated steam oxide scale on an iron-based metal surface exposed to superheated steam, comprising treating said iron-based metal surface with a surface-treatment agent which comprises a polyoxy saturated aliphatic mono- or di-carboxylic acid or a salt thereof and an amine compound represented by the following formula (I): Z(CH2CH2NH)nCH2CH2NH2 (I) wherein Z represents H or OH or NH2 group, and n is an integer of 0-5.
摘要翻译：本发明提供一种表面处理方法，用于抑制暴露于过热蒸汽的铁基金属表面上的过热蒸汽氧化皮的形成和生长，包括用表面处理剂处理所述铁基金属表面，所述表面处理剂包括聚氧饱和脂肪族单羧酸或二羧酸或其盐和下式（I）表示的胺化合物：Z（CH2CH2NH）nCH2CH2NH2（I）其中Z表示H或OH或NH2基，n为整数0 -5。

54. 发明申请

US20120111550A1 EBULLIENT COOLING DEVICE 审中-公开
标题翻译： EBULLI冷却装置
公开(公告)号：US20120111550A1
公开(公告)日：2012-05-10
申请号：US13254680
申请日：2010-03-09
申请人： Hiromichi Kuno , Yasuji Taketsuna , Mikio Shirai , Hideo Nakamura , Takeshi Yamazaki , Haruhiko Ohta , Yasuhisa Shinmoto , Koichi Suzuki , Yoshiyuki Abe , Osamu Kawanami
发明人： Hiromichi Kuno , Yasuji Taketsuna , Mikio Shirai , Hideo Nakamura , Takeshi Yamazaki , Haruhiko Ohta , Yasuhisa Shinmoto , Koichi Suzuki , Yoshiyuki Abe , Osamu Kawanami
IPC分类号： F28F1/10
CPC分类号： H01L23/427 , F28D15/0266 , F28F3/12 , H01L2924/0002 , H05K7/20936 , H01L2924/00
摘要： An ebullient cooling device having a simple structure and capable of limiting the bubbles to an appropriate volume. The ebullient cooling device for cooling a heat generating element is provided with a plurality of vertically arranged cooling channels comprising a lower channel (2), a middle channel (3) and un upper channel (4). Each cooling channel has cooling fins (12) for guiding a refrigerant to flow in a vertical direction, and a vapor discharge path (16) formed at the side of the cooling fins (12) that is opposite the side in contact with the heat generating element. Furthermore, flow path partition/vapor discharge guiding plates (18) are provided between the cooling channels so that the bubbles that have been generated are guided to the vapor discharge path (16) and prevented from moving into the subsequent cooling channel.
摘要翻译：一种沸腾冷却装置，具有简单的结构并且能够将气泡限制到适当的体积。用于冷却发热元件的沸腾冷却装置设置有多个垂直布置的冷却通道，其包括下通道（2），中间通道（3）和非上通道（4）。每个冷却通道具有用于引导制冷剂沿垂直方向流动的冷却片（12）和形成在与发热量接触的一侧相反的散热片（12）侧的蒸汽排出通道（16）元件。此外，在冷却通道之间设置有流路分隔/蒸汽排出引导板（18），使得已经产生的气泡被引导到蒸气排放路径（16）并阻止其进入随后的冷却通道。

55. 发明申请

US20120024381A1 TRANSPARENT CONDUCTIVE FILM AND TRANSPARENT CONDUCTIVE FILM LAMINATED BODY AND PRODUCTION METHOD OF SAME, AND SILICON-BASED THIN FILM SOLAR CELL 审中-公开
标题翻译：透明导电膜和透明导电膜层压体及其生产方法，以及基于硅的薄膜太阳能电池
公开(公告)号：US20120024381A1
公开(公告)日：2012-02-02
申请号：US13255749
申请日：2010-03-10
申请人： Yoshiyuki Abe , Tokuyuki Nakayama
发明人： Yoshiyuki Abe , Tokuyuki Nakayama
IPC分类号： H01L31/0224 , H01L31/0264 , H01L31/02 , B32B3/00 , C23C14/34
CPC分类号： H01L31/022466 , C04B35/453 , C04B2235/3217 , C04B2235/3284 , C04B2235/3286 , C23C14/0036 , C23C14/086 , H01B1/08 , H01L31/022483 , H01L31/0236 , H01L31/02363 , H01L31/1884 , Y02E10/50 , Y10T428/24355
摘要： A transparent conductive film, useful in producing a highly efficient silicon-based thin film solar cell, superior in hydrogen reduction resistance and superior in optical confinement effect; a transparent conductive film laminated body using the same; a production method therefor; and a silicon-based thin film solar cell using this transparent conductive film or the transparent conductive film laminated body, as an electrode. It is provided by a transparent conductive film or the like, characterized by containing zinc oxide as a major component and at least one or more kinds of added metal elements selected from aluminum and gallium, whose content being within a range shown by the following expression (1), and having a surface roughness (Ra) of equal to or larger than 35.0 nm, and a surface resistance of equal to or lower than 65 Ω/□ —[Al]+0.30≦[Ga]≦−2.68×[Al]+1.74 (1) (wherein [Al] represents aluminum content expressed as atomicity ratio (%) of Al/(Zn+Al); while [Ga] represents gallium content expressed as atomicity ratio (%) of Ga/(Zn+Ga)).
摘要翻译：一种透明导电膜，可用于制造高效的硅基薄膜太阳能电池，具有优异的耐氢化还原性和优异的光学限制效果; 使用其的透明导电膜层叠体; 一种生产方法; 以及使用该透明导电膜或透明导电膜层叠体的硅系薄膜太阳能电池作为电极。由透明导电膜等提供，其特征在于含有氧化锌作为主要成分，以及选自铝和镓中的至少一种或多种添加的金属元素，其含量在下述表达式所示的范围内（表面粗糙度（Ra）等于或大于35.0nm，表面电阻等于或低于65°OHgr /□ - [Al] + 0.30＆nlE; [Ga]＆nlE; -2.68 ×[Al] +1.74（1）（其中[Al]表示以Al /（Zn + Al）的原子数比（％）表示的铝含量;而[Ga]表示以Ga / （Zn + Ga））。

56. 发明授权

US08080182B2 Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing it 有权
标题翻译：氧化物烧结体和使用它得到的氧化膜，以及含有它的透明基材
公开(公告)号：US08080182B2
公开(公告)日：2011-12-20
申请号：US12560887
申请日：2009-09-16
申请人： Tokuyuki Nakayama , Yoshiyuki Abe
发明人： Tokuyuki Nakayama , Yoshiyuki Abe
IPC分类号： H01B1/08
CPC分类号： C23C14/3414 , C03C17/3417 , C03C17/3435 , C03C17/3441 , C03C2217/23 , C03C2218/154 , C03C2218/365 , C04B35/01 , C04B35/645 , C04B2235/3286 , C04B2235/656 , C04B2235/658 , C04B2235/77 , C04B2235/80 , C23C14/086 , Y10T428/265 , Y10T428/30 , Y10T428/31507 , Y10T428/31616 , Y10T428/31645 , Y10T428/31667 , Y10T428/31786 , Y10T428/31938
摘要： The oxide sintered body mainly consists of gallium, indium, and oxygen, and a content of the gallium is more than 65 at. % and less than 100 at. % with respect to all metallic elements, and the density of the sintered body is 5.0 g/cm3 or more. The oxide film is obtained using the oxide sintered body as a sputtering target, and the shortest wavelength of the light where the light transmittance of the film itself except the substrate becomes 50% is 320 nm or less. The transparent base material is obtained by forming the oxide film on one surface or both surfaces of a glass plate, a quartz plate, a resin plate or resin film where one surface or both surfaces are covered by a gas barrier film, or on one surface or both surfaces of a transparent plate selected from a resin plate or a resin film where the gas barrier film is inserted in the inside.
摘要翻译：氧化物烧结体主要由镓，铟和氧组成，镓的含量大于65at。％和小于100。相对于所有金属元素，烧结体的密度为5.0g / cm 3以上。使用氧化物烧结体作为溅射靶获得氧化膜，并且除了衬底之外的膜本身的透光率为50％的光的最短波长为320nm以下。透明基材通过在玻璃板，石英板，树脂板或树脂膜的一个表面或两个表面上形成氧化膜而获得，其中一个表面或两个表面被阻气膜覆盖，或在一个表面上或选自树脂板或阻气膜插入内侧的树脂膜的透明板的两面。

57. 发明授权

US08067102B2 Absorption type multi-layer film ND filter 有权
标题翻译：吸收型多层膜ND滤膜
公开(公告)号：US08067102B2
公开(公告)日：2011-11-29
申请号：US12585722
申请日：2009-09-23
申请人： Hideharu Okami , Yoshiyuki Abe , Tokuyuki Nakayama
发明人： Hideharu Okami , Yoshiyuki Abe , Tokuyuki Nakayama
IPC分类号： B32B15/04 , B32B17/06
CPC分类号： G02B5/205 , Y10T428/24975 , Y10T428/31678
摘要： In an absorption type multi-layer film ND filter having a thin substrate and provided thereon first and second absorption type multi-layer films which attenuate transmitted light, the first and second absorption type multi-layer films are constituted of multi-layer films each consisting essentially of dielectric layers formed of SiO2, Al2O3 or a mixture of these and metal film layers formed of Ni alone or an Ni alloy; the layers being alternately layered on the substrate; and the first and second absorption type multi-layer films are so formed on one side and the other side, respectively, of the substrate as to have a film structure in which they are symmetrical to each other interposing the substrate between them, and the warpage of the substrate has been controlled at a curvature of radius of 500 mm or more.
摘要翻译：在具有薄基板并在其上设置有衰减透射光的第一和第二吸收型多层膜的吸收型多层膜ND滤光器中，第一和第二吸收型多层膜由多层膜构成，每层包括基本上由SiO 2，Al 2 O 3或这些与由Ni单独或Ni合金形成的金属膜层的混合物形成的电介质层; 层交替层叠在基板上; 并且第一和第二吸收型多层膜分别如此形成在基板的一侧和另一侧上，以具有其中它们之间彼此对称的膜结构，并且在其之间插入基板，并且翘曲的基板被控制在半径为500mm以上的曲率。

58. 发明授权

US08061414B2 Boil cooling method, boil cooling apparatus, flow channel structure, and applied technology field thereof 失效
标题翻译：沸腾冷却方法，沸腾冷却装置，流路结构及其应用技术领域
公开(公告)号：US08061414B2
公开(公告)日：2011-11-22
申请号：US11793535
申请日：2005-12-21
申请人： Koichi Suzuki , Hiroshi Kawamura , Haruhiko Ohta , Yoshiyuki Abe
发明人： Koichi Suzuki , Hiroshi Kawamura , Haruhiko Ohta , Yoshiyuki Abe
IPC分类号： H05K7/20
CPC分类号： F28F13/02 , F24F5/0035 , F25B2339/021 , F25D7/00 , H01L23/427 , H01L2924/0002 , Y10S165/908 , H01L2924/00
摘要： A boil cooling method forms, with a surface of an object to be cooled or a surface of a heating member in close contact with the surface of the object to be cooled made to serve as a cooling surface, a main flow channel and a sub-flow channel for a cooling liquid from the side of the cooling surface in the above-described order, arranges a plurality of nozzles penetrating a partition wall separating the sub-flow channel and the main flow channel and protruding into the main flow channel in a flow channel direction of the main flow channel, causes tip end parts of individual nozzles to be in the vicinity of or in contact with the cooling surface, causes a cooling liquid to circulate to the main flow channel and the sub-flow channel, and cools the cooling surface by boiling of the cooling liquid flowing through the main flow channel, and at the same time, supplies the cooling liquid from the side of the sub-flow channel through each of the nozzles to the vicinity of the cooling surface, and cools the cooling liquid in the main flow channel.
摘要翻译：沸腾冷却方法形成为待冷却物体的表面或加热构件的表面与要冷却的物体的表面紧密接触以用作冷却表面，主流道和子流道，以从上述顺序的冷却表面一侧的冷却液流通道，配置多个喷嘴，贯通分隔副流路和主流路的分隔壁，并以流动方式突出到主流路主流路的通道方向使各个喷嘴的前端部与冷却面接近或接触，使冷却液循环到主流路和副流路，冷却通过流过主流路的冷却液的沸腾而冷却表面，同时将冷却液从副流路的一侧通过各喷嘴供给到冷却面附近，并冷却主流路中的冷却液。

59. 发明申请

US20110164297A1 BLACK COATING FILM AND PRODUCTION METHOD THEREFOR, BLACK LIGHT SHADING PLATE, AND DIAPHRAGM, DIAPHRAGM DEVICE FOR LIGHT INTENSITY ADJUSTMENT, SHUTTER USING THE SAME, AND HEAT RESISTANT LIGHT SHADING TAPE 有权
标题翻译：黑色涂膜及其生产方法，黑色遮光板和透明膜，用于轻度强度调节的透镜装置，使用其的快门和耐热的光泽胶带
公开(公告)号：US20110164297A1
公开(公告)日：2011-07-07
申请号：US13062435
申请日：2009-08-11
申请人： Yoshiyuki Abe , Katsushi Ono , Yukio Tsukakoshi
发明人： Yoshiyuki Abe , Katsushi Ono , Yukio Tsukakoshi
IPC分类号： G02B26/02 , B32B3/30 , C23C14/34 , C09J7/02
CPC分类号： G03B9/02 , C23C14/0015 , C23C14/0036 , C23C14/083 , C23C14/3414 , G02B5/003 , G02B5/005 , G02B5/22 , G03B9/08 , Y02T50/67 , Y10T428/24355 , Y10T428/2848
摘要： A heat resistant black coating film which is capable of making the surface of optical members to be low reflection property and black property, a black light shading plate having a resin film using the same as a base substrate, and a diaphragm, a diaphragm device for light intensity adjustment and a shutter using the same, and heat resistant light shading tape.They are provided by a black coating film (A), where a titanium oxide film containing titanium and oxygen as main components, and having an oxygen content of from 0.7 to 1.4, as atomicity ratio O/Ti, is formed on an opaque or translucent substrate, characterized in that the titanium oxide film takes a constitution of fine columnar crystals assembled, where the longitudinal direction of the crystal extends in a film thickness direction, has protrusions at the film surface, and has a film thickness of equal to or thicker than 50 nm; and a black light shading plate, wherein the metallic light shading film (B), having a film thickness of equal to or thicker than 40 nm, is formed onto at least one surface of the substrate, and still more the black coating film (A) is laminated and formed on the surface of the metallic light shading film (B), or the like.
摘要翻译：能够使光学部件的表面具有低反射性和黑色特性的耐热黑色涂膜，具有使用其作为基底基板的树脂膜的黑色遮光板和隔膜，隔膜装置光强度调节和使用其的快门，以及耐热遮光带。它们由黑色涂膜（A）提供，其中以不透明或半透明的形式形成含有钛和氧作为主要成分并且具有0.7至1.4的氧含量为0.7-1.4的氧化钛膜，作为原子数比O / Ti 基板，其特征在于，所述氧化钛膜具有以下结构：晶体的长度方向在膜厚方向延伸的微细柱状晶体，所述微细柱状晶体在所述膜表面具有突起，并且具有等于或大于 50nm; 和黑色遮光板，其中，在基板的至少一个表面上形成膜厚度等于或大于40nm的金属遮光膜（B），还有更多的黑色涂膜（A ）层压并形成在金属遮光膜（B）的表面上等。

60. 发明授权

US07670673B2 Heat-resistant, light-shielding film, production thereof, and aperture and light intensity adjusting device using the same 有权
标题翻译：耐热，遮光膜，其制造方法以及使用其的孔径光强度调节装置
公开(公告)号：US07670673B2
公开(公告)日：2010-03-02
申请号：US11984938
申请日：2007-11-26
申请人： Katsushi Ono , Yoshiyuki Abe , Yukio Tsukakoshi
发明人： Katsushi Ono , Yoshiyuki Abe , Yukio Tsukakoshi
IPC分类号： B32B15/04 , B32B15/08
CPC分类号： C23C14/205 , C23C14/0036 , C23C14/085 , C23C14/562 , Y10T428/12771 , Y10T428/12826 , Y10T428/12861 , Y10T428/12944 , Y10T428/24967 , Y10T428/26
摘要： A heat-resistant, light-shielding film having high light shielding capacity, high heat resistance, high sliding characteristics, low surface gloss and high electroconductivity, and useful for optical device parts, e.g., shutter or aperture blades for digital cameras and digital video cameras, and aperture blades for adjusting light intensity for projectors; method for producing the film; and aperture and light intensity adjusting device using the film.The heat-resistant, light-shielding film comprising a heat-resistant resin film base (A) resistant to 200° C. or higher, coated, on one or both sides, with an Ni-base metallic film (B) having a thickness of 50 nm or more by sputtering and then with a low-reflectivity film (C) of Ni-base oxide also by sputtering, and having a surface roughness (arithmetic average height Ra) of 0.1 to 0.7 μm.
摘要翻译：具有高遮光能力，高耐热性，高滑动特性，低表面光泽度和高导电性的耐热遮光膜，并且可用于光学器件部件，例如用于数码相机和数字摄像机的快门或光圈叶片和用于调节投影仪光强度的光圈叶片; 膜的制造方法; 和光圈和光强度调节装置使用该膜。耐热遮光膜包含耐200℃以上的耐热性树脂膜基材（A），在一面或两面涂覆有Ni基金属膜（B），其厚度通过溅射进行50nm以上的溅射，然后通过溅射在Ni基氧化物的低反射率膜（C）上，并且具有0.1〜0.7μm的表面粗糙度（算术平均高度Ra）。

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