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51. 发明授权

US07443953B1 Structured anode X-ray source for X-ray microscopy 有权
标题翻译：用于X射线显微镜的结构阳极X射线源
公开(公告)号：US07443953B1
公开(公告)日：2008-10-28
申请号：US11609266
申请日：2006-12-11
申请人： Wenbing Yun , Frederick W. Duewer , Michael Feser , Andrei Tkachuk , Srivatsan Seshadri
发明人： Wenbing Yun , Frederick W. Duewer , Michael Feser , Andrei Tkachuk , Srivatsan Seshadri
IPC分类号： G21K5/04
CPC分类号： G21K7/00 , H01J35/08 , H01J2235/088
摘要： An x-ray source comprises a structured anode that has a thin top layer made of the desired target material and a thick bottom layer made of low atomic number and low density materials with good thermal properties. In one example, the anode comprises a layer of copper with an optimal thickness deposited on a layer of beryllium or diamond substrate. This structured target design allows for the use of efficient high energy electrons for generation of characteristic x-rays per unit energy deposited in the top layer and the use of the bottom layer as a thermal sink. This anode design can be applied to substantially increase the brightness of stationary, rotating anode or other electron bombardment-based sources where brightness is defined as number of x-rays per unit area and unit solid angle emitted by a source and is a key figure of merit parameter for a source.
摘要翻译： X射线源包括具有由所需目标材料制成的薄顶层的结构化阳极和由具有良好热性能的低原子序数和低密度材料制成的厚底层。在一个实例中，阳极包括沉积在铍或金刚石基底层上的最佳厚度的铜层。该结构化目标设计允许使用高效的高能电子来产生沉积在顶层中的每单位能量的特征x射线，以及使用底层作为散热器。该阳极设计可以应用于基本上增加固定的，旋转的阳极或其他基于电子轰击的源的亮度，其中亮度被定义为每单位面积的x射线数量和由源发射的单位立体角的数量，并且是来源的优点参数。

52. 发明授权

US07365918B1 Fast x-ray lenses and fabrication method therefor 失效
标题翻译：快速X射线透镜及其制造方法
公开(公告)号：US07365918B1
公开(公告)日：2008-04-29
申请号：US11200654
申请日：2005-08-10
申请人： Wenbing Yun , Michael Feser , Alan Lyon
发明人： Wenbing Yun , Michael Feser , Alan Lyon
IPC分类号： B02B3/08
CPC分类号： G21K1/06 , G02B5/1847 , G02B5/1876
摘要： A fabrication process for zone plate lenses is based on controlled thin layer deposition for fabricating structures as small as 2 nanometers (nm) in width, and potentially smaller. The substrate for deposition will take the form of a precision hole, fabricated in a substrate, such as silicon by electron beam lithography and subsequent reactive ion etching. A controlled layer deposition is then used to form the required zone plate structure. A subsequent thinning process is used to section the hole and produce a zone plate with the required layer thicknesses.
摘要翻译：区域透镜的制造方法基于受控的薄层沉积，用于制造宽度小至2纳米（nm）的结构，并且可能更小。用于沉积的衬底将采用通过电子束光刻和随后的反应离子蚀刻在诸如硅的衬底中制造的精密孔的形式。然后使用受控层沉积来形成所需的区域板结构。随后的变薄过程用于对孔进行切割并产生具有所需层厚度的区域板。

53. 发明授权

US07095822B1 Near-field X-ray fluorescence microprobe 有权
标题翻译：近场X射线荧光微探针
公开(公告)号：US07095822B1
公开(公告)日：2006-08-22
申请号：US11191611
申请日：2005-07-28
申请人： Wenbing Yun
发明人： Wenbing Yun
IPC分类号： G01N23/223 , G01T1/36
CPC分类号： G01N23/223 , G01N2223/076 , Y10S977/863 , Y10S977/95
摘要： This invention pertains to an x-ray microprobe that can be placed very close the sample surface. A practical implementation is an x-ray target material integrated to an atomic force microscope (AFM) tip and an electron beam is focused to the target materials to generate x-ray emission. This microprobe can be combined with energy-resolved detector or a fluorescence imaging system for material analysis applications.
摘要翻译：本发明涉及可以非常靠近样品表面放置的x射线探针。实际的实现是与原子力显微镜（AFM）尖端集成的x射线靶材料，并且电子束被聚焦到目标材料以产生x射线发射。该微探针可与能量分辨检测器或用于材料分析应用的荧光成像系统组合。

54. 发明申请

US20170047191A1 X-RAY FLUORESCENCE SYSTEM WITH HIGH FLUX AND HIGH FLUX DENSITY 有权
标题翻译：具有高通量和高通量密度的X射线荧光系统
公开(公告)号：US20170047191A1
公开(公告)日：2017-02-16
申请号：US15269855
申请日：2016-09-19
申请人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： H01J35/14 , H01J35/18 , H01J35/08 , G01N23/223
CPC分类号： H01J35/14 , G01N23/223 , G21K1/06 , H01J35/08 , H01J35/18 , H01J2235/081 , H01J2235/086
摘要： We present a micro-x-ray fluorescence (XRF) system having a high-brightness x-ray illumination system with high x-ray flux and high flux density. The higher brightness is achieved in part by using x-ray target designs that comprise a number of microstructures of x-ray generating materials fabricated in close thermal contact with a substrate having high thermal conductivity. This allows for bombardment of the targets with higher electron density or higher energy electrons, which leads to greater x-ray flux. The high brightness/high flux x-ray source may then be coupled to an x-ray optical system, which can collect and focus the high flux x-rays to spots that can be as small as one micron, leading to high flux density at the fluorescent sample. Such systems may be useful for a variety of applications, including mineralogy, trace element detection, structure and composition analysis, metrology, as well as forensic science and diagnostic systems.
摘要翻译：我们提出了具有高X射线通量和高通量密度的高亮度x射线照明系统的微X射线荧光（XRF）系统。更高的亮度部分地通过使用包括与具有高导热性的基板紧密热接触制造的x射线产生材料的多个微结构的x射线靶设计来实现。这允许用更高电子密度或更高能量的电子轰击靶，这导致更大的x射线通量。然后可以将高亮度/高通量X射线源耦合到x射线光学系统，其可以将高通量x射线收集并聚焦到可以小到1微米的点，导致高通量密度荧光样品。这些系统可用于各种应用，包括矿物学，微量元素检测，结构和成分分析，计量学以及法医科学和诊断系统。

55. 发明申请

US20150243397A1 X-RAY INTERFEROMETRIC IMAGING SYSTEM 有权
标题翻译： X射线干涉成像系统
公开(公告)号：US20150243397A1
公开(公告)日：2015-08-27
申请号：US14700137
申请日：2015-04-29
申请人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
发明人： Wenbing Yun , Sylvia Jia Yun Lewis , Janos Kirz
IPC分类号： G21K1/06 , H01J35/16 , G01N23/20 , G21K1/10
CPC分类号： G01N23/20075 , A61B6/4007 , A61B6/4291 , A61B6/484 , A61B6/508 , G21K1/02 , G21K2207/005 , H01J35/08 , H01J2235/086 , H01J2235/087
摘要： An x-ray interferometric imaging system in which the x-ray source comprises a target having a plurality of structured coherent sub-sources of x-rays embedded in a thermally conducting substrate. The system additionally comprises a beam-splitting grating G1 that establishes a Talbot interference pattern, which may be a π phase-shifting grating, and an x-ray detector to convert two-dimensional x-ray intensities into electronic signals. The system may also comprise a second analyzer grating G2 that may be placed in front of the detector to form additional interference fringes, a means to translate the second grating G2 relative to the detector. The system may additionally comprise an antiscattering grid to reduce signals from scattered x-rays. Various configurations of dark-field and bright-field detectors are also disclosed.
摘要翻译：一种X射线干涉成像系统，其中x射线源包括具有嵌入在导热衬底中的多个X射线结构化相干子源的靶。该系统还包括分束光栅G1，其形成Talbot干涉图案，其可以是“ 移相光栅和X射线检测器将二维x射线强度转换为电子信号。该系统还可以包括第二分析器光栅G2，其可放置在检测器的前面以形成额外的干涉条纹，相对于检测器平移第二光栅G2的装置。该系统可以另外包括用于减少来自散射的X射线的信号的反散射格栅。还公开了暗场和亮场检测器的各种配置。

56. 发明授权

US08995622B2 X-ray source with increased operating life 有权
标题翻译： X射线源具有更长的使用寿命
公开(公告)号：US08995622B2
公开(公告)日：2015-03-31
申请号：US13373554
申请日：2011-11-18
申请人： David L. Adler , Wenbing Yun , Thomas Anthony Case
发明人： David L. Adler , Wenbing Yun , Thomas Anthony Case
IPC分类号： H01J35/08 , H05G1/52 , H01J35/14
CPC分类号： H01J35/08 , H01J35/14 , H01J2235/087 , H01J2235/186 , H05G1/52
摘要： An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In response to receiving the beam of focused electrons, the target provides a transmission source of x-rays. Moreover, a repositioning mechanism selectively repositions the beam of focused electrons to different locations on a surface of the target based on a feedback parameter associated with operation of the x-ray source. This feedback parameter may be based on: an intensity of the x-rays output by the x-ray source; a position of the x-rays output by the x-ray source; an elapsed time during operation of the x-ray source; a cross-sectional shape of the x-rays output by the x-ray source; and/or a spot size of the x-rays output by the x-ray source.
摘要翻译：描述了x射线源。在x射线源的操作期间，电子源发射电子束。该电子束通过磁聚焦透镜聚焦到目标上的点。响应于接收聚焦电子束，目标提供x射线的透射源。此外，重新定位机构基于与x射线源的操作相关联的反馈参数，有选择地将聚焦电子束重新定位在目标表面上的不同位置。该反馈参数可以基于：由x射线源输出的x射线的强度; 由x射线源输出的x射线的位置; 在x射线源的操作期间经过的时间; 由x射线源输出的x射线的横截面形状; 和/或由x射线源输出的x射线的斑点大小。

57. 发明授权

US08831179B2 X-ray source with selective beam repositioning 有权
标题翻译：具有选择性束重新定位的X射线源
公开(公告)号：US08831179B2
公开(公告)日：2014-09-09
申请号：US13066679
申请日：2011-04-21
申请人： David L. Adler , Wenbing Yun , Thomas Anthony Case
发明人： David L. Adler , Wenbing Yun , Thomas Anthony Case
IPC分类号： H01J35/02 , H01J35/08 , H01J35/14
CPC分类号： H01J35/08 , H01J35/14 , H01J2235/087 , H01J2235/186 , H05G1/52
摘要： During operation of an x-ray source, an electron source emits a beam of electrons. Moreover, a repositioning mechanism selectively repositions the beam of electrons on a surface of a target based on a feedback parameter, where a location of the beam of electrons on the surface of the target defines a spot size of x-rays output by the x-ray source. In response to receiving the beam of electrons, the target provides a transmission source of the x-rays. Furthermore, a beam-parameter detector provides the feedback parameter based on a physical characteristic associated with the beam of electrons and/or the x-rays output by the x-ray source. This physical characteristic may include: at least a portion of an optical spectrum emitted by the target, secondary electrons emitted by the target based on a cross-sectional shape of the beam of electrons; an intensity of the x-rays output by the target; and/or a current from the target.
摘要翻译：在x射线源的操作期间，电子源发射电子束。此外，重新定位机构基于反馈参数选择性地重新定位靶的表面上的电子束，其中目标表面上的电子束的位置限定由x轴输出的x射线的光斑尺寸，射线源。响应于接收到电子束，目标提供x射线的透射源。此外，光束参数检测器基于与电子束相关联的物理特性和/或由x射线源输出的x射线提供反馈参数。该物理特性可以包括：由目标发射的光谱的至少一部分，基于电子束的横截面形状由靶发射的二次电子; 目标输出的x射线的强度; 和/或来自目标的电流。

58. 发明授权

US08602648B1 X-ray microscope system with cryogenic handling system and method 有权
公开(公告)号：US08602648B1
公开(公告)日：2013-12-10
申请号：US12559183
申请日：2009-09-14
申请人： Chris J. Jacobsen , Wenbing Yun
发明人： Chris J. Jacobsen , Wenbing Yun
IPC分类号： G21K7/00
CPC分类号： G01N23/04 , G01N23/046 , G21K7/00
摘要： A cartridge-based cryogenic imaging system includes a sample handling system. This system uses a kinematic base and cold interface system that provides vertical loading to horizontally mounted high-precision rotation stages that are able to facilitate automated high-resolution three-dimensional (3D) imaging with computed tomography (CT). Flexible metal braids are used to provide cooling and also allow a large range of rotation. A robotic sample transfer and loading system provides further automation by allowing a number of samples to be loaded and automatically sequentially placed on the sample stage and imaged. These characteristics provide the capability of high-throughput and highly automated cryogenic x-ray microscopy and computed tomography.

59. 发明授权

US07974379B1 Metrology and registration system and method for laminography and tomography 有权
标题翻译：计量和注册系统和方法进行层析和层析成像
公开(公告)号：US07974379B1
公开(公告)日：2011-07-05
申请号：US12556341
申请日：2009-09-09
申请人： Thomas A. Case , Wenbing Yun , Alan Francis Lyon
发明人： Thomas A. Case , Wenbing Yun , Alan Francis Lyon
IPC分类号： G01N23/04
CPC分类号： G01N23/044 , G01N2223/419
摘要： A metrology system that uses an imaging system to monitor alignment features on the sample or sample holder of an X-ray laminography or tomography system. the metrology system has the capability to provide both sample shift and sample rotation movement data to a data acquisition system. These shift and rotation data can be used in alignment routines to produce 3D reconstructions from the X-ray images/projections. The metrology system is based on an imaging and focusing measurement of intrinsic feature of the sample or artificial features fabricated on the sample or sample holder.
摘要翻译：一种使用成像系统来监测X射线层析成像系统的样品或样品架上的对准特征的计量系统。测量系统具有将采样位移和采样旋转运动数据提供给数据采集系统的能力。这些移位和旋转数据可用于对准程序，以从X射线图像/投影产生3D重建。测量系统基于对样品或样品架上制作的样品或人造特征的固有特征的成像和聚焦测量。

60. 发明申请

US20080192347A1 High Aspect-Ratio X-Ray Diffractive Structure Stabilization Methods and Systems 有权
$High Aspect-Ratio X-Ray Diffractive Structure Stabilization Methods and Systems$
标题翻译：高纵横比X射线衍射结构稳定方法与系统
公开(公告)号：US20080192347A1
公开(公告)日：2008-08-14
申请号：US11674532
申请日：2007-02-13
申请人： Wenbing Yun , Alan Francis Lyon , Yan Feng
发明人： Wenbing Yun , Alan Francis Lyon , Yan Feng
IPC分类号： G02B5/18 , G21K1/06
CPC分类号： G02B5/1876 , G02B5/1857 , G21K1/06
摘要： A method to stabilize planar nanostructures, for example grating and zone plate lenses that are typically used for directing or focusing x-ray radiation, includes the deposition of a top, stabilizing layer. The structures are typically made on a flat substrate, and therefore are only fixed at the bottom. At high aspect ratio, the stability can be poor since small forces such as electrostatic forces and van de Waals forces that are often present can alter the structure. The top coating of a metallic material such as titanium constrains the nanostructures at the top and at the same time eliminates electrostatic forces and reduces any thermal gradient that may be present across the device
摘要翻译：稳定平面纳米结构的方法，例如通常用于引导或聚焦X射线辐射的光栅和区域透镜，包括顶部稳定层的沉积。这些结构通常制成在平坦的基底上，因此仅固定在底部。在高纵横比下，稳定性可能很差，因为通常存在的诸如静电力和范德瓦尔力的小力可能改变结构。金属材料如钛的顶部涂层限制了顶部的纳米结构，同时消除静电力并减少可能存在于该装置上的任何热梯度

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