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    • 55. 发明申请
    • SEMICONDUCTOR EMBEDDED RESISTOR GENERATION
    • 半导体嵌入式电阻发生器
    • US20100197106A1
    • 2010-08-05
    • US12364764
    • 2009-02-03
    • Choongryul RyouSeunghwan LeeJun YuanVictor ChanManfred EllerNam Sung KimNarasimhulu KanikeSrikanth Balaji Samavedam
    • Choongryul RyouSeunghwan LeeJun YuanVictor ChanManfred EllerNam Sung KimNarasimhulu KanikeSrikanth Balaji Samavedam
    • H01L21/76G06F17/50
    • H01L27/0629H01L23/5256H01L28/20H01L2924/0002H01L2924/00
    • A method for generating an embedded resistor in a semiconductor device and related computer-readable storage medium are provided, the method and program steps of the medium including forming a shallow trench isolation (STI) region in a substrate; forming a pad oxide on the STI region and substrate; depositing a silicon layer on the pad oxide; forming a photo-resist mask on a portion of the silicon layer disposed substantially above the STI region.; etching the silicon layer to yield a polyconductor (PC) disposed substantially above the STI region; oxidizing the PC; depositing at least one of an oxide material or a metal gate material on the oxidized surface; depositing a silicon layer on the at least one oxide material or metal gate material; depositing additional silicon on a portion of the silicon layer disposed substantially above the STI region; patterning a transistor gate with a photo-resist mask disposed on another portion of the silicon layer disposed substantially away from the STI region; and etching the silicon layer to yield at least one transistor structure disposed substantially away from the STI region and at least one resistor structure disposed substantially above the STI region.
    • 提供了一种用于在半导体器件和相关的计算机可读存储介质中产生嵌入式电阻器的方法,所述介质的方法和程序步骤包括在衬底中形成浅沟槽隔离(STI)区域; 在STI区和衬底上形成衬垫氧化物; 在衬垫氧化物上沉积硅层; 在基本上位于STI区域上方的硅层的一部分上形成光刻胶掩模; 蚀刻硅层以产生基本上位于STI区域上方的多导体(PC); 氧化PC; 在氧化表面上沉积氧化物材料或金属栅极材料中的至少一种; 在所述至少一种氧化物材料或金属栅极材料上沉积硅层; 在基本上位于STI区域上方的硅层的一部分上沉积附加的硅; 图案化具有设置在基本上远离STI区域设置在硅层的另一部分上的光致抗蚀剂掩模的晶体管栅极; 并且蚀刻所述硅层以产生基本上远离所述STI区域布置的至少一个晶体管结构以及基本上设置在所述STI区域上的至少一个电阻器结构。