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    • 51. 发明申请
    • Access control apparatus
    • 门禁控制装置
    • US20070288714A1
    • 2007-12-13
    • US11634100
    • 2006-12-06
    • Takahiro Nakamura
    • Takahiro Nakamura
    • G06F12/14
    • H04L63/102G06F21/604G06F21/6218
    • An access management apparatus manages access to stored files from information processing apparatuses. The access management apparatus includes a network communication section, an access privilege policy setting section and an access control section. The network communication section has a plurality of protocols for accepting access to the files from the information processing apparatuses. The access privilege policy setting section enables one of the protocols when limitation of access to the files is started. The access control section limits access to be accepted when the one of the protocols is enabled, in accordance with settings stored in the access control section.
    • 访问管理装置管理来自信息处理装置的存储文件的访问。 访问管理装置包括网络通信部分,访问权限策略设置部分和访问控制部分。 网络通信部具有用于接受来自信息处理装置的文件的多个协议。 访问权限策略设置部分在启动对文件访问的限制时启用其中一个协议。 根据访问控制部分中存储的设置,访问控制部分限制当启用协议之一时被接受的访问。
    • 59. 发明授权
    • Semiconductor laser
    • 半导体激光器
    • US5936990A
    • 1999-08-10
    • US877514
    • 1997-06-17
    • Takahiro Nakamura
    • Takahiro Nakamura
    • H01S5/00H01S5/22H01S5/227H01S5/343H01S3/19
    • B82Y20/00H01S5/227H01S5/2206H01S5/2226H01S5/2275H01S5/34306H01S5/3434
    • A semiconductor laser includes an active layer and a current block structure where a p-type InP layer (a first layer), an n-type InP layer (a second layer), a p-type InP layer (a third layer) and an n-type InP layer (a fourth layer) are laminated, at least one layer selected from a non-doped InP layer, an n-type InP impurity controlled layer and a p-type InP impurity controlled layer being interposed in at least one interface selected from that between the p-type InP layer (the first layer) and the n-type InP layer (the second layer) and that between the n-type InP layer (the second layer) and the p-type InP layer (the third layer); where, the n-type or p-type InP impurity controlled layer is a layer having such an n-type or p-type, respectively, impurity concentration profile in the layer that the impurity concentration continuously decreases from the n-type InP layer (the second layer) side or from the p-type InP layer (the first or the third layer) side, respectively, to the other side until the concentration of the impurity reaches equal to or below 1.times.10.sup.17 cm.sup.-3, and the n-type or p-type , respectively, InP impurity controlled layer is formed so as to be adjacent to the same type InP layer.
    • 半导体激光器包括有源层和当前块结构,其中p型InP层(第一层),n型InP层(第二层),p型InP层(第三层)和 n型InP层(第四层)层叠,选自非掺杂InP层,n型InP杂质控制层和p型InP杂质控制层中的至少一层插入至少一个界面 选自p型InP层(第一层)和n型InP层(第二层)之间以及n型InP层(第二层)和p型InP层(第二层)之间 第三层); 其中,n型或p型InP杂质控制层是在杂质浓度从n型InP层连续降低的层中具有这样的n型或p型杂质浓度分布的层( 第二层)侧或p型InP层(第一或第三层)侧分别延伸到另一侧,直到杂质的浓度达到等于或低于1×10 17 cm -3,并且n型 或p型,分别形成InP杂质控制层,以便与相同类型的InP层相邻。