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51. 发明申请

US20120241317A1 Sputtering Target Comprising Oxide Phase Dispersed in Co or Co Alloy Phase, Magnetic Thin Film Made of Co or Co Alloy Phase and Oxide Phase, and Magnetic Recording Medium Using the Said Thin Film 审中-公开
标题翻译：包含在Co或Co合金相中分散的氧化物相的溅射靶，由Co或Co合金相和氧化物相制成的磁性薄膜，以及使用所述薄膜的磁记录介质
公开(公告)号：US20120241317A1
公开(公告)日：2012-09-27
申请号：US13513898
申请日：2010-10-13
申请人： Yuki Ikeda , Yuichiro Nakamura , Shin-ichi Ogino
发明人： Yuki Ikeda , Yuichiro Nakamura , Shin-ichi Ogino
IPC分类号： C23C14/08 , H01F1/01 , C23C14/34
CPC分类号： G11B5/851 , C23C14/3414 , G11B5/65 , H01F10/16 , H01F41/183
摘要： A sputtering target comprising an oxide phase is dispersed in Co or a Co alloy phase, wherein the sputtering target is configured from a metal matrix phase containing Co, and a phase containing SiO2 and having an oxide which forms particles and is dispersed in an amount of 6 to 14 mol % (hereinafter referred to as the “oxide phase”), the sputtering target contains, in addition to components configuring the metal matrix phase and the oxide phase, a Cr oxide scattered in or on a surface of the oxide phase in an amount of 0.3 mol % or more and less than 1.0 mol %, and an average area of the respective particles contained in the oxide phase is 2.0 μm2 or less. The provided sputtering target comprising an oxide phase is dispersed in Co or a Co alloy phase can reduce arcing, obtain a stable discharge in a magnetron sputtering device, and reduce the amount of particles that is generated during high density sputtering.
摘要翻译：包含氧化物相的溅射靶分散在Co或Co合金相中，其中溅射靶由含有Co的金属基体相和含有SiO 2的相构成，并且具有形成颗粒的氧化物并以一定量的 6〜14摩尔％（以下称为“氧化物相”），溅射靶除了构成金属基体相和氧化物相的成分以外还含有分散在氧化物相的表面上或其表面的Cr氧化物 0.3摩尔％以上且小于1.0摩尔％，氧化物相中所含的各粒子的平均面积为2.0μm2以下。提供的包含氧化物相的溅射靶分散在Co或Co合金相中可以减少电弧，在磁控溅射装置中获得稳定的放电，并且减少在高密度溅射期间产生的颗粒的量。

52. 发明申请

US20110162971A1 Sputtering Target and Process for Producing Same 有权
标题翻译：溅射目标和生产过程
公开(公告)号：US20110162971A1
公开(公告)日：2011-07-07
申请号：US13119867
申请日：2010-02-24
申请人： Yuichiro Nakamura , Akira Hisano , Junnosuke Sekiguchi
发明人： Yuichiro Nakamura , Akira Hisano , Junnosuke Sekiguchi
IPC分类号： C23C14/34 , C25D5/00 , C25D7/00 , B05D5/12 , C23C16/06 , B05D3/00 , C23C16/44
CPC分类号： C23C14/3414
摘要： A sputtering target with low generation of particles in which oxides, carbides, nitrides, borides, intermetallic compounds, carbonitrides, and other substances without ductility exist in a matrix phase made of a highly ductile substance at a volume ratio of 1 to 50%, wherein a highly ductile and conductive metal coating layer is formed on an outermost surface of the target. Provided are a sputtering target capable of improving the target surface in which numerous substances without ductility exist and preventing or inhibiting the generation of nodules and particles during sputtering, and a method of producing such a sputtering
摘要翻译：在体积比为1〜50％的高延展性物质的基体相中，存在低产生粒子的溅射靶，其中氧化物，碳化物，氮化物，硼化物，金属间化合物，碳氮化物和其他物质不具有延性，其中在目标的最外表面上形成高度延展且导电的金属涂层。提供能够改善目前表面的溅射靶，其中存在许多无延展性的物质，并且防止或抑制溅射期间结核和颗粒的产生，以及制造这种溅射的方法

53. 发明授权

US07909949B2 Sputtering target with few surface defects, and surface processing method thereof 有权
标题翻译：表面缺陷少的溅射靶及其表面处理方法
公开(公告)号：US07909949B2
公开(公告)日：2011-03-22
申请号：US10598502
申请日：2005-02-15
申请人： Yuichiro Nakamura , Akira Hisano
发明人： Yuichiro Nakamura , Akira Hisano
IPC分类号： C22F1/16 , C22C19/07
CPC分类号： C23C14/3414 , C23C14/3407 , Y10T29/49989
摘要： Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the primary processing of cutting work, then subsequently subject to finish processing via polishing. The sputtering target subject to this surface processing method is able to improve the target surface having numerous substances without ductility, and prevent or suppress the generation of nodules and particles upon sputtering.
摘要翻译：提供一种溅射靶的表面处理方法，其中在高度延性基体相中以1〜50％的体积比存在金属间化合物，氧化物，碳化物，碳氮化物和其它没有延展性的物质的目标表面预先受主要加工切割工作，然后经抛光处理。经受该表面处理方法的溅射靶能够改善具有无延展性的多种物质的目标表面，并且可防止或抑制溅射时产生结节和颗粒。

54. 发明申请

US20070187236A1 Co-cr-pt-b alloy sputtering target 有权
标题翻译： Co-cr-pt-b合金溅射靶
公开(公告)号：US20070187236A1
公开(公告)日：2007-08-16
申请号：US10598997
申请日：2005-02-15
申请人： Yuichiro Nakamura , Akira Hisano
发明人： Yuichiro Nakamura , Akira Hisano
IPC分类号： C23C14/00
CPC分类号： C22C19/07 , C22F1/10 , C23C14/3414 , H01F10/16 , H01F41/183
摘要： Provided is a Co—Cr—Pt—B alloy sputtering target comprising an island-shaped rolled structure formed from a Co-rich phase based on the primary crystal formed upon casting, and a Co—Cr—Pt—B alloy sputtering target in which the island-shaped rolled structure has an average size of 200 μm or less. This Co—Cr—Pt—B alloy sputtering target has an uniform and fine rolled structure with minimal segregation and residual stress upon casting, and the present invention aims to enable the stable and inexpensive manufacture of the target, prevent or suppress the generation of particles, and to improve the production yield of deposition.
摘要翻译：提供了一种Co-Cr-Pt-B合金溅射靶，其包括由铸造时形成的基体上的富Co相形成的岛状卷绕结构和Co-Cr-Pt-B合金溅射靶，其中岛状轧制结构的平均尺寸为200μm以下。该Co-Cr-Pt-B合金溅射靶具有均匀且细小的轧制结构，铸造时的偏析和残余应力极小，本发明的目的在于能够稳定且廉价地制造靶，防止或抑制颗粒的产生，并提高沉积的产量。

55. 发明申请

US20070125645A1 Sputtering target with few surface defects, and surface processing method thereof 有权
标题翻译：表面缺陷少的溅射靶及其表面处理方法
公开(公告)号：US20070125645A1
公开(公告)日：2007-06-07
申请号：US10598502
申请日：2005-02-15
申请人： Yuichiro Nakamura , Akira Hisano
发明人： Yuichiro Nakamura , Akira Hisano
IPC分类号： C23C14/00
CPC分类号： C23C14/3414 , C23C14/3407 , Y10T29/49989
摘要： Provided is a surface processing method of a sputtering target, wherein a target surface in which intermetallic compounds, oxides, carbides, carbonitrides and other substances without ductility exist in a highly ductile matrix phase at a volume ratio of 1 to 50% is preliminarily subject to the primary processing of cutting work, then subsequently subject to finish processing via polishing. The sputtering target subject to this surface processing method is able to improve the target surface having numerous substances without ductility, and prevent or suppress the generation of nodules and particles upon sputtering.
摘要翻译：提供一种溅射靶的表面处理方法，其中在高度延性基体相中以1〜50％的体积比存在金属间化合物，氧化物，碳化物，碳氮化物和其它没有延展性的物质的目标表面预先受主要加工切割工作，然后经抛光处理。经受该表面处理方法的溅射靶能够改善具有无延展性的多种物质的目标表面，并且可防止或抑制溅射时产生结节和颗粒。

56. 发明申请

US20070086612A1 Cushion and acoustic system with the cushion 有权
标题翻译：垫子和声学系统与缓冲垫
公开(公告)号：US20070086612A1
公开(公告)日：2007-04-19
申请号：US10573423
申请日：2004-09-27
申请人： Sadao Nishibori , Iwao Kouno , Yuichiro Nakamura
发明人： Sadao Nishibori , Iwao Kouno , Yuichiro Nakamura
IPC分类号： H04R9/06 , H04R1/02
CPC分类号： H04R5/023 , A47C21/003 , A61H23/0236 , A61H2201/0138 , A61H2201/0142 , A61H2201/0149 , Y10S5/904 , Y10S5/915 , Y10S5/933 , Y10S5/952
摘要： To obtain a to obtain a cushion function and suitable sound effects and a sound pressure effect by containing a speaker without giving sense of incongruity and avoiding impact from an outside to the speaker at the same time. A cushion 20 comprising: a resin body with a spring structure 10 comprising a three-dimensional structure including voids at a predetermined bulk density, the three-dimensional structure being obtained by contacting, entwining, and gathering adjacent ones of random loops or curls of continuous filaments made from a thermoplastic resin in such a manner as to allow the resulting structure to have a layered structure in which oppositely lengthwise disposed superficial layers have a high bulk density, and a core layer having a low bulk density is interposed between the superficial layers, wherein the resin body with the spring structure supports at least an upper half of a human body when using the cushion; and a speaker incorporated in the resin body with the spring structure 10 or oppositely disposed on either of the superficial layers of the resin body with the spring structure 10.
摘要翻译：通过容纳扬声器而不产生不协调的感觉并避免同时从外部到扬声器的影响来获得缓冲功能和合适的声音效果和声压效果。一种衬垫20，包括：具有弹簧结构10的树脂体，其包括具有预定体积密度的空隙的三维结构，所述三维结构通过使连续的随机环或卷曲的相邻接合，以热塑性树脂制造的长丝，使得所得到的结构具有层叠结构，其中相对纵向设置的表面层具有高堆积密度，并且在表层之间插入具有低体积密度的芯层，其中具有弹簧结构的树脂体在使用该衬垫时至少支撑人体的上半部; 以及与弹簧结构10结合在树脂体中的扬声器或者与弹簧结构10相对地设置在树脂体的任一表面层上的扬声器。

57. 发明授权

US06470810B1 Resin pallet having a spring structure and method of producing the resin pallet 有权
标题翻译：具有弹簧结构的树脂托盘和生产树脂托盘的方法
公开(公告)号：US06470810B1
公开(公告)日：2002-10-29
申请号：US09821308
申请日：2001-03-29
申请人： Sadao Nishibori , Yuichiro Nakamura
发明人： Sadao Nishibori , Yuichiro Nakamura
IPC分类号： B65D1938
CPC分类号： B29C47/30 , B29C47/0014 , B65D19/0012 , B65D2519/00034 , B65D2519/00069 , B65D2519/00268 , B65D2519/00288 , B65D2519/00318 , B65D2519/00333 , B65D2519/00462
摘要： A resin pallet having enhanced shock absorbing capability, load capacity and durability comprises a pallet of a three-dimensional structure with a predetermined bulk density and voids, the three dimensional structure being formed by contacting, entwining, and gathering adjacent ones of random loops or curls of continuous filaments and/or short filaments of a thermoplastic resin. A single unit of the pallet is formed with high density portions having an increased bulk density at opposite ends of fork insertion holes of the single unit of the pallet in a direction of length of the fork insertion holes and approximately at a central portion of the single unit of the pallet in the direction, the high density portions extending to the opposite ends of the fork insertion holes in the direction of length of the fork insertion holes and opposite ends of the fork insertion holes in a direction of width thereof, and formed with flat portions having a bulk density not higher than those of the high density portions at least inner surfaces of the fork insertion holes or an outer periphery and the inner surfaces of the fork insertion holes being formed.
摘要翻译：具有增强的冲击吸收能力，负载能力和耐久性的树脂托盘包括具有预定体积密度和空隙的三维结构的托盘，三维结构通过使随机环或卷曲相邻的相互缠绕和收集而形成的连续长丝和/或热塑性树脂的短丝。托盘的单个单元形成有高密度部分，其具有在托盘插入孔的长度方向上并且大致在单个单元的中心部分处的托盘的单个单元的叉插入孔的相对端处的体积密度增加托盘的方向上的单位，高密度部分沿着叉插入孔的长度方向延伸到叉插入孔的相对端，并且在宽度方向上延伸叉插入孔的相对端，并形成有至少形成有叉形插入孔的内表面或外周以及叉插入孔的内表面的高密度部分的堆积密度的平坦部分。

58. 发明授权

US09683284B2 Sputtering target for magnetic recording film 有权
公开(公告)号：US09683284B2
公开(公告)日：2017-06-20
申请号：US13982051
申请日：2012-03-23
申请人： Shin-ichi Ogino , Yuichiro Nakamura
发明人： Shin-ichi Ogino , Yuichiro Nakamura
IPC分类号： C23C14/34 , C22C1/04 , C22C1/10 , C22C5/04 , C22C30/00 , C22C33/02 , G11B5/851 , C22C38/00 , C22F1/14 , C22C1/00 , C22C1/02
CPC分类号： C23C14/3407 , C22C1/00 , C22C1/02 , C22C1/0466 , C22C1/10 , C22C5/04 , C22C30/00 , C22C33/0228 , C22C33/0278 , C22C38/002 , C22F1/14 , C23C14/3414 , G11B5/851
摘要： A sputtering target for a magnetic recording film which contains carbon, the sputtering target is characterized in that the ratio (IG/ID) of peak intensities of the G-band to the D-band in Raman scattering spectrometry is 5.0 or less. The sputtering target for a magnetic recording film, which contains carbon powders dispersed therein, makes it possible to produce a magnetic thin film having a granular structure without using an expensive apparatus for co-sputtering; and in particular, the target is an Fe—Pt-based sputtering target. Carbon is a material which is difficult to sinter and has a problem that carbon particles are apt to form agglomerates. There is hence a problem that carbon masses are readily detached during sputtering to generate a large number of particles on the film after sputtering. The high-density sputtering target can solve these problems.

59. 发明授权

US09326198B2 Communication system, mobile station, and switching control method 有权
标题翻译：通信系统，移动台和切换控制方法
公开(公告)号：US09326198B2
公开(公告)日：2016-04-26
申请号：US13981839
申请日：2012-01-16
申请人： Yuichiro Nakamura , Kenichiro Aoyagi , Hideyuki Matsutani
发明人： Yuichiro Nakamura , Kenichiro Aoyagi , Hideyuki Matsutani
IPC分类号： H04W36/00 , H04W76/02
CPC分类号： H04W36/0066 , H04W8/22 , H04W48/06 , H04W48/16 , H04W48/18 , H04W76/18 , H04W88/06
摘要： A UE 300 is connectable to a first radio communication system and a second radio communication system which differs from the first radio communication system and uses multiple frequency bands. The UE 300 receives RRC CONNECTION REJECT which gives an instruction to switch from the first radio communication system to the second radio communication system and an indication on multiple switching target frequencies included in the frequency bands used by the second radio communication system, and, if the multiple switching target frequencies include an unavailable frequency at which the UE 300 is incapable of transmission/reception, searches for only a cell of a switching target frequency among the multiple switching target frequencies exclusive of the unavailable frequency.
摘要翻译： UE 300可连接到与第一无线电通信系统不同并且使用多个频带的第一无线电通信系统和第二无线电通信系统。 UE 300接收RRC连接拒绝，该RRC连接拒绝指示从第一无线通信系统切换到第二无线通信系统，以及包括在第二无线通信系统使用的频带中的多个切换目标频率的指示，如果多个切换目标频率包括UE 300不能进行发送/接收的不可用频率，仅搜索不同于不可用频率的多个切换目标频率之间的切换目标频率的小区。

60. 发明授权

US08953558B2 Mobile communication system, radio control apparatus, core network apparatus, mobile communication terminal and mobile communication method 有权
标题翻译：移动通信系统，无线控制装置，核心网络装置，移动通信终端和移动通信方式
公开(公告)号：US08953558B2
公开(公告)日：2015-02-10
申请号：US13508423
申请日：2010-11-05
申请人： Kenichiro Aoyagi , Yuichiro Nakamura , Yasuhiro Kawabe , Hideyuki Matsutani
发明人： Kenichiro Aoyagi , Yuichiro Nakamura , Yasuhiro Kawabe , Hideyuki Matsutani
IPC分类号： H04W4/00 , H04W36/00 , H04W48/02
CPC分类号： H04W48/02 , H04W88/06
摘要： The first communication system is configured to determine whether or not to provide information that instructs the UE 10 to connect to the second communication system, based on a subscriber identifier allocated to the UE 10. The subscriber identifier is configured to identify whether or not the UE 10 is allowed to utilize the second communication system.
摘要翻译：第一通信系统被配置为基于分配给UE 10的用户标识来确定是否提供指示UE 10连接到第二通信系统的信息。用户标识符被配置为识别UE是否 10被允许利用第二通信系统。

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