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    • 51. 发明授权
    • Encoder count error detection circuitry and encoder count error detection method
    • 编码器计数错误检测电路和编码器计数错误检测方法
    • US07397393B2
    • 2008-07-08
    • US11636112
    • 2006-12-08
    • Takeshi Yamamoto
    • Takeshi Yamamoto
    • H03M1/22
    • G01D5/24466G01D5/2451G05B2219/37154H03M1/1071H03M1/143H03M1/30
    • To provide encoder count error detection circuitry and an encoder count error detection method capable of realizing a highly reliable encoder by providing detection of the count errors of count signals used to measure displacement, an encoder count error detection circuitry and detection method configured as count error detection circuitry for an encoder outputting pulse trains according to the displacement of a measured object, doubles, triples, or quadruples one or more fundamental signals used for measuring displacement to convert to count signals, and compares the output signals of the counter counting these count signals with the level of these fundamental signals to detect count errors in the count signals.
    • 为了提供编码器计数错误检测电路和编码器计数错误检测方法,能够通过提供用于测量位移的计数信号的计数误差的检测来实现高度可靠的编码器,编码器计数错误检测电路和配置为计数错误检测的检测方法 用于根据测量对象的位移输出脉冲串的编码器电路,将用于测量位移的一个或多个基本信号加倍,三倍或四倍以转换为计数信号,并将计数这些计数信号的计数器的输出信号与 这些基本信号的电平检测计数信号中的计数误差。
    • 52. 发明授权
    • Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
    • 镜面单元,其制造方法以及使用该镜单元的曝光装置和方法
    • US07311407B2
    • 2007-12-25
    • US11113113
    • 2005-04-22
    • Takeshi YamamotoAkira Miyake
    • Takeshi YamamotoAkira Miyake
    • G02B5/08G02B7/182
    • G02B26/0825G21K1/062Y10S359/90
    • Disclosed are a mirror unit and a method of producing the same. In one preferred embodiment, the mirror unit includes a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred embodiment includes forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and partially removing the multilayered film.
    • 公开了镜单元及其制造方法。 在一个优选实施例中,反射镜单元包括具有在基板上形成的多层膜的反射镜,该多层膜具有在基板上周期层压的两种材料,以及用于产生基板的形状变形的基板变形装置 其特征在于,在所述多层膜中,所述基板的规定区域的层叠层数与所述基板的其他区域的层叠数不同。 根据另一优选实施例的镜单元制造方法包括在基板上形成多层膜,所述多层膜具有在基板上周期层压的两种材料,提供与基板相关联的基板变形装置,变形装置具有 产生基板形状的变形,并且部分地去除多层膜。
    • 54. 发明申请
    • Method for producing high-carbon steel rails excellent in wear resistance and ductility
    • 生产耐磨性和延展性优良的高碳钢轨的方法
    • US20070181231A1
    • 2007-08-09
    • US10590846
    • 2005-03-09
    • Masaharu UedaKazuo PujitaKoichiro MatsushitaTakeshi YamamotoTakuya Satoh
    • Masaharu UedaKazuo PujitaKoichiro MatsushitaTakeshi YamamotoTakuya Satoh
    • C21D9/04
    • C21D9/04B21B1/085C21D2211/009C22C38/02C22C38/04C22C38/18C22C38/24
    • Disclosed are methods of producing steel rails having a high carbon content and being excellent in wear resistance and ductility from the slabs for rails. One method involves producing a steel rail having a high content of carbon, comprising finish rolling the rail in two consecutive passes, with a reduction rate per pass of a cross-section of the rail of 2-30%, wherein the conditions of the finish rolling satisfy the following relationship: S≦800/(C×T), wherein S is the maximum rolling interval time (seconds), C is the carbon content of the steel, wherein the carbon content is 0.85-1.40 mass %, and T is the maximum surface temperature (° C.) of the rail head. Another method involves producing a steel rail with a high content of carbon, comprising: finish rolling the rail in three or more passes, with a reduction rate per pass of a cross-section of the rail of 2-30%, wherein the conditions of the finish rolling satisfy the following relationship: S≦2400/(C×T×P), wherein S is the maximum rolling interval time (seconds), C is the carbon content of the steel rail, wherein the carbon content is 0.85˜1.40 mass %, T is the maximum surface temperature (° C.) of a rail head, and P is the number of passes, which is 3 or more. In addition to above, controlled additional amounts of V, Nb, N may be added to the steel rail and/or controlled rapid cooling of the rail after rolling may be accomplished to provide further improvements.
    • 公开了一种生产具有高碳含量并且具有优异的耐磨性和延展性的钢轨的方法。 一种方法包括生产具有高碳含量的钢轨,其中包括以两次连续的道次精轧轧制轨道,轨道横截面的每次通过的减速率为2-30%,其中完成的条件 轧制满足以下关系:S <= 800 /(C×T),其中S是最大轧制间隔时间(秒),C是钢的碳含量,其中碳含量为0.85-1.40质量%,T为 轨头的最大表面温度(°C)。 另一种方法包括生产具有高碳含量的钢轨,其特征在于:以三次或更多道次精轧轧制轨道,轨道横截面的每次通过的减速率为2-30%,其中条件 精轧满足以下关系:S <= 2400 /(CxTxP)其中S是最大轧制间隔时间(秒),C是钢轨的碳含量,其中碳含量为0.85〜1.40质量% T是轨头的最大表面温度(℃),P是3次以上的通过次数。 除了上述之外,可以在钢轨上加入控制的附加量的V,Nb,N,和/或可以在轧制之后控制轨道的快速冷却,以提供进一步的改进。
    • 57. 发明申请
    • Liquid crystal display device
    • 液晶显示装置
    • US20070040964A1
    • 2007-02-22
    • US11504618
    • 2006-08-16
    • Kiyoshi ShoharaAtsuyuki ManabeMasumi ManabeHiroharu InoueYoshiteru YamadaTakeshi Yamamoto
    • Kiyoshi ShoharaAtsuyuki ManabeMasumi ManabeHiroharu InoueYoshiteru YamadaTakeshi Yamamoto
    • G02F1/1335
    • G02F1/133514G02F1/133345G02F2202/09
    • A liquid crystal display device includes an array substrate, a counter-substrate, first pixel sections, second pixel sections, a liquid crystal layer, a color filter including first color layers, which form the first pixel sections, and second color layers which form the second pixel sections, and an undercoat insulation film including first light-transmissive inorganic parts, which form the first pixel sections and are set at such a film thickness that a wavelength at which a transmittance spectrum of the first pixel sections increases agrees with a wavelength at which a transmittance spectrum of the first color layers increases, and second light-transmissive inorganic parts which form the second pixel sections and are set at such a film thickness that a wavelength at which a transmittance spectrum of the second pixel sections increases agrees with a wavelength at which a transmittance spectrum of the second color layers increases.
    • 液晶显示装置包括阵列基板,对置基板,第一像素部分,第二像素部分,液晶层,形成第一像素部分的包括第一颜色层的滤色器,以及形成第一像素部分的第二彩色层 第二像素部分和包含第一透光性无机部分的底涂层绝缘膜,其形成第一像素部,并且被设定为使得第一像素部的透射光谱增大的波长与第一像素部的透射光谱的波长一致的膜厚, 第一颜色层的透射光谱增加,第二透光性无机部分形成第二像素部分,并且被设定为使得第二像素部分的透射光谱增加的波长增加的膜厚度与波长 其中第二颜色层的透射光谱增加。
    • 58. 发明授权
    • Developing apparatus
    • 开发设备
    • US07072607B2
    • 2006-07-04
    • US10733358
    • 2003-12-12
    • Manami HaraguchiTakeshi YamamotoMakoto Fukatsu
    • Manami HaraguchiTakeshi YamamotoMakoto Fukatsu
    • G03G15/08
    • G03G15/0815
    • A developing apparatus includes a developer carrying member for carrying a developer to develop an electrostatic latent image formed on and image bearing member, the developer carrying member having an elastic property; scraping/supplying member, contacted into the developer carrying member, for supplying the developer to the developer carrying member and for scraping the developer off the developer carrying member, the scraping/supplying member having an elastic property, wherein the developer carrying member has a hardness which is higher than that of the scraping/supplying member, and wherein the developer carrying member and the scraping/supplying member satisfy that in a state in which the scraping/supplying member is out of contact with the developer carrying member, a radius of curvature of the scraping/supplying member is larger than a radius of curvature of the developer carrying member at a position of contact between the scraping/supplying member and the developer carrying member.
    • 显影装置包括用于承载显影剂以显影形成在其上的静电潜像和图像承载部件的显影剂承载部件,显影剂承载部件具有弹性; 刮擦/供给构件,接触到显影剂承载构件中,用于将显影剂供应到显影剂承载构件并将显影剂从显影剂承载构件刮下,刮擦/供给构件具有弹性,其中显影剂承载构件具有硬度 其高于刮削/供给部件,并且其中显影剂承载部件和刮擦/供给部件满足在刮擦/供给部件与显影剂承载部件不接触的状态下,曲率半径 刮削/供给构件的大小大于在刮除/供给构件和显影剂承载构件之间的接触位置处的显影剂承载构件的曲率半径。