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    • 51. 发明授权
    • Semiconductor laser devices
    • 半导体激光器件
    • US4841536A
    • 1989-06-20
    • US850685
    • 1986-04-11
    • Aiko OhishiMotohisa HiraoNaoki ChinoneShinji TsujiHitoshi NakamuraHiroyoshi Matsumura
    • Aiko OhishiMotohisa HiraoNaoki ChinoneShinji TsujiHitoshi NakamuraHiroyoshi Matsumura
    • H01S5/227
    • H01S5/227H01S5/2275
    • This invention discloses a semiconductor laser capable of a high temperature and high output operation by forming a mesa stripe having an active layer in a reverse triangular mesa shape and forming thick semiconductor layers on both sides of the mesa stripe in such a manner that the resulting p-n junctions have a current blocking function. The invention discloses also a semiconductor laser wherein the formation of the p-n junctions described above is made before the formation of the reverse mesa stripe, and ion implantation is introduced in order to form the p-n junctions. Furthermore, the invention relates to transistors and semiconductor lasers using InGaAsP type quaternary compounds as the semiconductor. The quaternary compounds having a composition in which an energy band gap is from 1.2 to 1.4 eV are formed in a thickness of up to 1 .mu.m, and there can be thus obtained semiconductor devices having a small leakage current and being stable with time.
    • 本发明公开了一种能够通过形成具有反三角台面形状的有源层的台面条形状的高温高输出操作的半导体激光器,在台面条的两侧形成厚半导体层,使得所得到的pn 结点具有电流阻塞功能。 本发明还公开了一种半导体激光器,其中在形成反向台面条之前进行上述p-n结的形成,并且引入离子注入以形成p-n结。 此外,本发明涉及使用InGaAsP型四元化合物作为半导体的晶体管和半导体激光器。 形成其能带隙为1.2〜1.4eV的组成的四元化合物的厚度为1μm以下,可以得到漏电流小且时间稳定的半导体器件。