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    • 51. 发明授权
    • Semiconductor display device
    • 半导体显示装置
    • US08415669B2
    • 2013-04-09
    • US13217322
    • 2011-08-25
    • Shunpei YamazakiSatoshi MurakamiMasahiko HayakawaKiyoshi KatoMitsuaki Osame
    • Shunpei YamazakiSatoshi MurakamiMasahiko HayakawaKiyoshi KatoMitsuaki Osame
    • H01L29/786
    • H01L27/1248G02F1/136227H01L27/12H01L27/1214H01L27/124H01L27/1244H01L27/1255H01L27/13H01L27/3246H01L27/3276H01L33/52H01L51/5237H01L51/5253
    • It is an object of the present invention to provide a semiconductor display device having an interlayer insulating film which can obtain planarity of a surface while controlling film formation time, can control treatment time of heating treatment with an object of removing moisture, and can prevent moisture in the interlayer insulating film from being discharged to a film or an electrode adjacent to the interlayer insulating film. An inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover a TFT. Next, an organic resin film containing photosensitive acrylic resin is applied to the organic insulating film, and the organic resin film is partially exposed to light to be opened. Thereafter, an inorganic insulating film containing nitrogen, which is less likely to transmit moisture compared with an organic resin, is formed so as to cover the opened organic resin film. Then, in the opening part of the organic resin film, a gate insulating film and the two layer inorganic insulating film containing nitrogen are opened partially by etching to expose an active layer of the TFT.
    • 本发明的目的是提供一种具有层间绝缘膜的半导体显示装置,其可以在控制成膜时间的同时获得表面的平面性,并且可以控制用于除去水分的加热处理的处理时间,并且可以防止水分 在层间绝缘膜中不被放电到与层间绝缘膜相邻的膜或电极。 形成与有机树脂相比不容易透过水分的含氮的无机绝缘膜,以覆盖TFT。 接着,在有机绝缘膜上涂布含有感光性丙烯酸树脂的有机树脂膜,将有机树脂膜部分地曝光以打开。 此后,形成与有机树脂相比不容易透过水分的含有氮的无机绝缘膜,以覆盖打开的有机树脂膜。 然后,在有机树脂膜的开口部分中,通过蚀刻部分地打开栅极绝缘膜和含氮的两层无机绝缘膜,以暴露TFT的有源层。
    • 53. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20120012837A1
    • 2012-01-19
    • US13175542
    • 2011-07-01
    • Shunpei YamazakiKiyoshi KatoShuhei Nagatsuka
    • Shunpei YamazakiKiyoshi KatoShuhei Nagatsuka
    • H01L27/088
    • H01L27/088G11C16/0433G11C16/26H01L27/11517H01L27/1156H01L27/1211H01L27/1225
    • A semiconductor device with a novel structure in which stored data can be retained even when power is not supplied, and does not have a limitation on the number of write cycles. The semiconductor device includes a memory cell including a first transistor, a second transistor, and an insulating layer placed between a source region or a drain region of the first transistor and a channel formation region of the second transistor. The first transistor and the second transistor are provided to at least partly overlap with each other. The insulating layer and a gate insulating layer of the second transistor satisfy the following formula: (ta/tb)×(εra/εrb)
    • 具有新颖结构的半导体器件,其中即使在未提供电力的情况下也可以保留存储的数据,并且对写入周期的数量没有限制。 半导体器件包括存储单元,其包括第一晶体管,第二晶体管和放置在第一晶体管的源极区域或漏极区域与第二晶体管的沟道形成区域之间的绝缘层。 第一晶体管和第二晶体管被设置为至少部分地彼此重叠。 第二晶体管的绝缘层和栅极绝缘层满足下式:(ta / tb)×(&egr; rb /&egr; ra)<0.1,其中,ta表示栅极绝缘层的厚度,tb表示厚度 绝缘层的介电常数表示绝缘层的介电常数,rb表示绝缘层的介电常数。
    • 59. 发明授权
    • Nonvolatile memory
    • 非易失性存储器
    • US07596024B2
    • 2009-09-29
    • US11776973
    • 2007-07-12
    • Kiyoshi KatoShunpei Yamazaki
    • Kiyoshi KatoShunpei Yamazaki
    • G11C16/04
    • G11C8/10G11C8/12G11C8/14G11C16/0458G11C16/0491H01L27/115H01L27/11526H01L27/11546H01L27/12H01L27/124
    • A highly-integrated nonvolatile memory. A memory cell array where plural memory cells are arranged in matrix in row and column directions, plural first and second word lines, and plural bit lines are included. Each of the plural memory cells includes a first memory transistor and a second memory transistor which are connected in series. A gate electrode of the first memory transistor is connected to the first word line, a gate electrode of the second memory transistor is connected to the second word line, one of source and drain regions of the first memory transistor is connected to the first bit line, and one of source and drain regions of the second memory transistor is connected to the second bit line. Each of the first bit line and the second bit line is provided in common for memory cells in columns which are adjacent to each other.
    • 高度集成的非易失性存储器。 存储单元阵列,其中多个存储单元以行和列方向排列成矩阵,多个第一和第二字线以及多个位线。 多个存储单元中的每一个包括串联连接的第一存储晶体管和第二存储晶体管。 第一存储晶体管的栅电极连接到第一字线,第二存储晶体管的栅电极连接到第二字线,第一存储晶体管的源极和漏极区之一连接到第一位线 并且第二存储晶体管的源极和漏极区中的一个连接到第二位线。 第一位线和第二位线中的每一个被共同地设置在彼此相邻的列中的存储器单元。