会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 52. 发明授权
    • Narrowband module inspection device
    • 窄带模块检测装置
    • US06317203B1
    • 2001-11-13
    • US09270656
    • 1999-03-16
    • Osamu WakabayashiTakanori Nakaike
    • Osamu WakabayashiTakanori Nakaike
    • G01J2100
    • G03F7/70575G01M11/00
    • A light that radiates in the wavelength region of a narrowband laser beam is generated, this light is converted to a collimated beam after passing through a slit, and the converted light is incident on a narrowband module. The outputted light from the narrowband module is condensed, and this condensed light is incident on a light detector. A total reflection mirror is provided in a removable manner on the optical path in front of the narrowband module, the ratio between the output of the light detector in a state in which the total reflection mirror is provided on the optical path, and the output of the light detector in a state in which the total reflection mirror is removed, is determined, and the narrowband efficiency of the above-mentioned narrowband module is inspected based on the determined ratio.
    • 产生在窄带激光束的波长区域中发光的光,该光在通过狭缝后转换为准直光束,并且转换的光入射到窄带模块上。 来自窄带模块的输出光被冷凝,并且该会聚的光入射到光检测器上。 在窄带模块前面的光路上以可移动的方式设置全反射镜,在光路上设置全反射镜的状态下的光检测器的输出与输出 确定去除全反射镜的状态下的光检测器,并且基于所确定的比率来检查上述窄带模块的窄带效率。
    • 53. 发明授权
    • Wavelength detector
    • 波长检测器
    • US06243163B1
    • 2001-06-05
    • US09398191
    • 1999-09-17
    • Osamu WakabayashiTatsuo EnamiShinji NagaiToru SuzukiTakeshi OhtaHirokazu Kubo
    • Osamu WakabayashiTatsuo EnamiShinji NagaiToru SuzukiTakeshi OhtaHirokazu Kubo
    • G01J328
    • G01J9/00G01J3/28
    • The present invention can accurately detect a wavelength of a light to be detected, which is output from a source of light to be detected, without an error even if there is a change in the characteristic of a spectroscope due to an individual difference among the spectroscopes or a change in the measuring environment. The device according to the invention emits at least two reference lights (Ln, La) having different wavelengths (&lgr;n, &lgr;a) as the reference lights by reference light source. And, actual characteristic value (D) of spectroscope is calculated on the basis of detection positions (Sn, Sa) of the at least two reference lights (Ln, La) on a sensor and the known wavelengths (&lgr;n, &lgr;a) of the at least two reference lights (Ln, La) (D=(&lgr;a−&lgr;n)/(Sa−Sn)). And, on the basis of the detection positions (Sn, SO) of the reference light (Ln) and the light to be detected (LO) on the sensor (10), the calculated actual characteristic value (D) of the spectroscope and the known wavelength (&lgr;n) of the reference light (Ln), wavelength (&lgr;O) of the light to be detected (LO) is calculated (&lgr;O=&lgr;n+(SO−Sn)·D).
    • 即使由于各分光器之间的个体差异而导致的分光器的特性发生变化,本发明也能够准确地检测从被检测光源输出的被检测光的波长 或测量环境的变化。 根据本发明的装置通过参考光源发射具有不同波长(lambdn,λ))的至少两个参考光(Ln,La)作为参考光。 并且,基于传感器上的至少两个参考光(Ln,La)的检测位置(Sn,Sa)以及在传感器上的已知波长(lambdn,λ)来计算分光计的实际特征值(D) 至少两个参考光(Ln,La)(D =(λ-lambdn)/(Sa-Sn)))。 并且,基于传感器(10)上的基准光(Ln)和被检测光(LO)的检测位置(Sn,SO),计算出的分光器的实际特性值(D)和 计算参考光(Ln)的已知波长(lambdn),待检测光(LO)的波长(lambd0)(lambdO = lambdn +(SO-Sn).D)。
    • 55. 发明授权
    • Excimer laser device
    • 准分子激光装置
    • US5642374A
    • 1997-06-24
    • US420132
    • 1995-04-10
    • Osamu WakabayashiHakaru Mizoguchi
    • Osamu WakabayashiHakaru Mizoguchi
    • H01S3/104H01S3/10H01S3/134H01S3/225H01S3/22H01S3/223
    • H01S3/134H01S3/225
    • Aimed at preventing a laser light beam profile from fluctuating, and by using the fact that there is a substantially proportional relation between the beam profile and the charging voltage as well as between the beam profile and the composition or the total pressure of the laser gases, an excimer laser device comprises a laser chamber containing laser gases which are excited by initiating an electric discharge in the laser chamber to output laser light, a beam profile detector for detecting a beam profile of the output laser light, and a controller for controlling a electric discharge voltage (excitation intensity) and composition or total pressure of the prescribed types of laser gases in such a way that the beam profile is shaped as desired based on detection results of the beam profile detector. An excimer laser feedback control circuit detects the output laser beam width and controls the beam width by controlling one or more of the laser voltage, composition of the laser gas, pressure or partial pressure of the laser gas, or feed rate of a laser gas. The laser gas may comprise a halogen, buffer, or rare gas.
    • 旨在防止激光束轮廓波动,并且通过使用光束轮廓和充电电压之间以及光束轮廓与激光气体的组成或总压力之间存在实质上成比例关系的事实, 准分子激光装置包括激光室,其包含通过在激光室中引发放电而激发的激光气体输出激光,用于检测输出激光的光束分布的光束分布检测器,以及用于控制电 放电电压(激发强度)和规定类型的激光气体的组成或总压力,使得根据光束轮廓检测器的检测结果,根据需要对光束轮廓进行成形。 准分子激光反馈控制电路通过控制激光电压,激光气体的组成,激光气体的压力或分压或激光气体的进给速率中的一个或多个来检测输出激光束宽度并控制光束宽度。 激光气体可以包括卤素,缓冲剂或稀有气体。
    • 56. 发明授权
    • Narrow band excimer laser
    • 窄带准分子激光器
    • US5596596A
    • 1997-01-21
    • US573593
    • 1995-12-15
    • Osamu WakabayashiMasahiko KowakaYukio Kobayashi
    • Osamu WakabayashiMasahiko KowakaYukio Kobayashi
    • G03F7/20H01S3/08H01S3/1055H01S3/225
    • G03F7/70025H01S3/08009H01S3/1055H01S3/225
    • A narrow-band excimer laser employing a diffraction grating as a wavelength selective element, which is particularly suited for a light source of a reduction projection aligner. The grating used in the narrow-band excimer laser of the invention is so disposed that the ruling direction of the grating is nearly perpendicular to the direction of laser discharge. When a beam expander is used to expand laser beam falling on the beam expander is so disposed that the direction of beam expansion is nearly perpendicular to that of discharge of the laser. Further, when an aperture is to be used in the laser cavity, the aperture is placed so that the longitudinal direction may be parallel to the direction of laser discharge. Moreover, the front mirror of the laser cavity is a cylindrical one, whose mechanical axis is in parallel with the direction of laser discharge. This makes it possible to provide a narrow-band excimer laser having very high efficiency and excellent durability.
    • 采用衍射光栅作为波长选择元件的窄带准分子激光器,其特别适用于还原投影对准器的光源。 在本发明的窄带准分子激光器中使用的光栅被布置成使得光栅的光栅方向几乎垂直于激光放电的方向。 当使用光束扩展器来扩展落在光束扩展器上的激光束时,光束扩展的方向几乎垂直于激光放电的方向。 此外,当在激光腔中使用孔时,孔被放置成使得纵向方向可以平行于激光放电的方向。 此外,激光腔的前镜是圆柱形的,其机械轴与激光放电的方向平行。 这使得可以提供非常高的效率和优异的耐久性的窄带准分子激光器。
    • 59. 发明申请
    • METHOD OF CONTROLLING LASER APPARATUS AND LASER APPARATUS
    • 控制激光装置和激光装置的方法
    • US20150188274A1
    • 2015-07-02
    • US14579698
    • 2014-12-22
    • Osamu WakabayashiHiroaki TsushimaKouji Kakizaki
    • Osamu WakabayashiHiroaki TsushimaKouji Kakizaki
    • H01S3/00H01S3/10H01S3/034H01S3/134H01S3/225H01S3/036
    • H01S3/0014H01S3/034H01S3/036H01S3/10069H01S3/134H01S3/225H01S3/2251H01S3/2256H01S3/2258
    • A method of controlling a laser apparatus may include: exchanging a gain medium in a chamber configured to output a laser beam by exciting the gain medium; first measuring, after the exchanging, pulse energy of a laser beam which is oscillated in the chamber under a specific gas pressure and a specific charge voltage; calculating an approximate expression indicating a relationship between the pulse energy of the laser beam and the gas pressure in the chamber and the charge voltage, or a table representing a correlationship between the pulse energy, the gas pressure and the charge voltage, based on the specific pressure, the specific charge voltage and the pulse energy in the first measuring; storing the approximate expression or the table; second measuring, after the first measuring, pulse energy Er of a laser beam oscillated in the chamber; calculating pulse energy Eec which is supposed to be obtained directly after the exchanging under the gas pressure and the charge voltage in the second measuring based on the approximate expression or the table; calculating a reduction amount ΔEd of pulse energy based on the pulse energy Eec and the pulse energy Er using ΔEd=Eec−Er; and calculating a partial gas exchange amount Q for partial gas exchange in the chamber based on the reduction amount ΔEd of pulse energy.
    • 控制激光装置的方法可以包括:在配置成通过激励增益介质输出激光束的腔室中交换增益介质; 在交换之后,首先测量在特定气体压力和特定充电电压下在腔室中振荡的激光束的脉冲能量; 计算表示激光束的脉冲能量与腔室中的气体压力与充电电压之间的关系的近似表达式,或表示脉冲能量,气体压力和充电电压之间的相关性的表格, 压力,第一次测量中的具体充电电压和脉冲能量; 存储近似表达式或表格; 在第一次测量之后,第二次测量激光束的脉冲能量Er在腔室中振荡; 基于近似表达式或表格,计算在气体压力下的交换和第二测量中的充电电压之间直接获得的脉冲能量Eec; 使用&Dgr; Ed = Eec-Er计算基于脉冲能量Eec和脉冲能量Er的脉冲能量的减少量&Dgr; Ed; 并且基于脉冲能量的减少量&Dgr; Ed计算腔室中部分气体交换的部分气体交换量Q。