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51. 发明授权

US08238151B2 Transient heat assisted STTRAM cell for lower programming current 有权
标题翻译：瞬态热辅助STTRAM电池用于较低的编程电流
公开(公告)号：US08238151B2
公开(公告)日：2012-08-07
申请号：US12642533
申请日：2009-12-18
申请人： Jun Liu , Gurtej Sandhu
发明人： Jun Liu , Gurtej Sandhu
IPC分类号： G11C11/14
CPC分类号： G11C11/1675 , G11C11/161
摘要： A memory cell including magnetic materials and heating materials, and methods of programming the memory cell are provided. The memory cell includes a free region, a pinned region, and a heating region configured to generate and transfer heat to the free region when a programming current is directed to the cell. The heat transferred from the heating region increases the temperature of the free region, which decreases the magnetization and the critical switching current density of the free region. In some embodiments, the heating region may also provide a current path to the free region, and the magnetization of the free region may be switched according to the spin polarity of the programming current, programming the memory cell to a high resistance state or a low resistance state.
摘要翻译：提供包括磁性材料和加热材料的存储单元，以及编程存储单元的方法。存储单元包括自由区域，固定区域和加热区域，该区域被配置成当编程电流被引导到单元时，产生和传递热量到自由区域。从加热区域传递的热量增加了自由区域的温度，这降低了自由区域的磁化强度和临界开关电流密度。在一些实施例中，加热区域还可以提供到自由区域的电流路径，并且可以根据编程电流的自旋极性来切换自由区域的磁化，将存储器单元编程为高电阻状态或低电平状态电阻状态。

52. 发明授权

US08216949B2 Method for integrated circuit fabrication using pitch multiplication 有权
标题翻译：使用音调倍数的集成电路制作方法
公开(公告)号：US08216949B2
公开(公告)日：2012-07-10
申请号：US12707560
申请日：2010-02-17
申请人： Mirzafer K Abatchev , Gurtej Sandhu , Luan Tran , William T Rericha , D. Mark Durcan
发明人： Mirzafer K Abatchev , Gurtej Sandhu , Luan Tran , William T Rericha , D. Mark Durcan
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01L21/0337 , H01L21/0332 , H01L21/0338 , H01L21/3081 , H01L21/3086 , H01L21/3088 , H01L21/31144 , H01L21/32139 , Y10S438/947 , Y10S438/95
摘要： A method lor integrated circuit fabrication is disclosed. A spacer pattern is provided including a plurality ot spacers in an array region of a partially-fabricated integrated circuit. Each spacer is at least partly defined by opposing open volumes extending along lengths of the spacers. A pattern is subsequently defined in a periphery region of the partially-fabricated integrated circuit. A consolidated pattern is formed by concurrently transferring the spacer pattern and the pattern in the periphery region into an underlying masking layer. The consolidated pattern is transferred to an underlying substrate.
摘要翻译：公开了一种用于集成电路制造的方法。提供了一种间隔图案，其包括在部分制造的集成电路的阵列区域中的多个间隔物。每个间隔物至少部分地通过沿间隔物的长度延伸的相对的开放体积限定。随后在部分制造的集成电路的外围区域中限定图案。通过将间隔物图案和外围区域中的图案同时转移到下面的掩模层中形成固结图案。固结图案转移到下面的基底。

53. 发明授权

US08189450B2 Method and apparatus providing high density chalcogenide-based data storage 有权
标题翻译：提供高密度硫属元素化数据存储的方法和装置
公开(公告)号：US08189450B2
公开(公告)日：2012-05-29
申请号：US12837984
申请日：2010-07-16
申请人： Jun Liu , Mike Violette , Gurtej Sandhu
发明人： Jun Liu , Mike Violette , Gurtej Sandhu
IPC分类号： B11B9/00
CPC分类号： G11B9/04
摘要： A data storage device and methods for storing and reading data are provided. The data storage device includes a data storage medium and second device. The data storage medium has an insulating layer, a first electrode layer over the insulating layer and at least one layer of resistance variable material over the first electrode layer. The second device includes a substrate and at least one conductive point configured to electrically contact the data storage medium.
摘要翻译：提供了一种用于存储和读取数据的数据存储装置和方法。数据存储装置包括数据存储介质和第二装置。数据存储介质具有绝缘层，绝缘层上的第一电极层和第一电极层上的至少一层电阻可变材料。第二装置包括基板和被配置为电接触数据存储介质的至少一个导电点。

54. 发明申请

US20120120721A1 UNIDIRECTIONAL SPIN TORQUE TRANSFER MAGNETIC MEMORY CELL STRUCTURE 有权
标题翻译：单向转子扭矩传递磁性记忆体结构
公开(公告)号：US20120120721A1
公开(公告)日：2012-05-17
申请号：US13357527
申请日：2012-01-24
申请人： Jun Liu , Gurtej Sandhu
发明人： Jun Liu , Gurtej Sandhu
IPC分类号： G11C11/16 , H01L29/82
CPC分类号： G11C11/1675 , G11C11/16 , G11C11/161 , G11C11/1695 , H01L43/02
摘要： Spin torque transfer magnetic random access memory devices configured to be programmed unidirectionally and methods of programming such devices. The devices include memory cells having two pinned layers and a free layer therebetween. By utilizing two pinned layers, the spin torque effect on the free layer from each of the two pinned layers, respectively, allows the memory cells to be programmed with unidirectional currents.
摘要翻译：配置为单向编程的自旋扭矩传递磁性随机存取存储器件以及编程这种器件的方法。这些装置包括具有两个钉扎层和其间的自由层的存储单元。通过利用两个固定层，分别从两个固定层中的每一个自由层上的自旋转矩效应允许以单向电流编程存储器单元。

55. 发明授权

US08173550B2 Method for positioning spacers for pitch multiplication 有权
标题翻译：定位用于间距乘法的间隔物的方法
公开(公告)号：US08173550B2
公开(公告)日：2012-05-08
申请号：US13179851
申请日：2011-07-11
申请人： Sanket Sant , Gurtej Sandhu , Neal R. Rueger
发明人： Sanket Sant , Gurtej Sandhu , Neal R. Rueger
IPC分类号： H01L21/302
CPC分类号： H01L21/3088 , H01L21/0337 , H01L21/3085 , H01L21/3086 , H01L21/76802 , H01L27/1052
摘要： Multiple pitch-multiplied spacers are used to form mask patterns having features with exceptionally small critical dimensions. One of each pair of spacers formed around a plurality of mandrels is removed and alternating layers, formed of two mutually selectively etchable materials, are deposited around the remaining spacers. Layers formed of one of the materials are then etched, leaving behind vertically-extending layers formed of the other of the materials, which form a mask pattern. Alternatively, instead of depositing alternating layers, amorphous carbon is deposited around the remaining spacers followed by a plurality of cycles of forming pairs of spacers on the amorphous carbon, removing one of the pairs of spacers and depositing an amorphous carbon layer. The cycles can be repeated to form the desired pattern. Because the critical dimensions of some features in the pattern can be set by controlling the width of the spaces between spacers, exceptionally small mask features can be formed.
摘要翻译：使用多个间距倍数的间隔物来形成具有特别小的临界尺寸的特征的掩模图案。去除围绕多个心轴形成的每对间隔件中的一个，并且由两个相互选择性可蚀刻的材料形成的交替层围绕剩余的间隔物沉积。然后蚀刻由一种材料形成的层，留下由形成掩模图案的另一种材料形成的垂直延伸层。或者，代替沉积交替的层，非晶碳沉积在剩余的间隔物周围，随后在无定形碳上形成成对隔离物的多个循环，去除一对隔离物之一并沉积无定形碳层。可以重复循环以形成所需的图案。由于图案中的某些特征的临界尺寸可以通过控制间隔物之间的间隔的宽度来设定，所以可以形成特别小的掩模特征。

56. 发明申请

US20110149637A1 METHOD AND APPARATUS PROVIDING HIGH DENSITY CHALCOGENIDE-BASED DATA STORAGE 有权
标题翻译：提供高密度基于氯化氢的数据存储的方法和装置
公开(公告)号：US20110149637A1
公开(公告)日：2011-06-23
申请号：US12837984
申请日：2010-07-16
申请人： Jun Liu , Mike Violette , Gurtej Sandhu
发明人： Jun Liu , Mike Violette , Gurtej Sandhu
IPC分类号： G11C11/21 , H01L45/00 , B82Y10/00
CPC分类号： G11B9/04
摘要： A data storage device and methods for storing and reading data are provided. The data storage device includes a data storage medium and second device. The data storage medium has an insulating layer, a first electrode layer over the insulating layer and at least one layer of resistance variable material over the first electrode layer. The second device includes a substrate and at least one conductive point configured to electrically contact the data storage medium.
摘要翻译：提供了一种用于存储和读取数据的数据存储装置和方法。数据存储装置包括数据存储介质和第二装置。数据存储介质具有绝缘层，绝缘层上的第一电极层和第一电极层上的至少一层电阻可变材料。第二装置包括基板和被配置为电接触数据存储介质的至少一个导电点。

57. 发明申请

US20110130006A1 MASK MATERIAL CONVERSION 有权
标题翻译：掩模材料转换
公开(公告)号：US20110130006A1
公开(公告)日：2011-06-02
申请号：US13024166
申请日：2011-02-09
申请人： Mirzafer K. Abatchev , Gurtej Sandhu
发明人： Mirzafer K. Abatchev , Gurtej Sandhu
IPC分类号： H01L21/306
CPC分类号： H01L21/308 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/32139
摘要： The dimensions of mask patterns, such as pitch-multiplied spacers, are controlled by controlled growth of features in the patterns after they are formed. To form a pattern of pitch-multiplied spacers, a pattern of mandrels is first formed overlying a semiconductor substrate. Spacers are then formed on sidewalls of the mandrels by depositing a blanket layer of material over the mandrels and preferentially removing spacer material from horizontal surfaces. The mandrels are then selectively removed, leaving behind a pattern of freestanding spacers. The spacers comprise a material, such as polysilicon and amorphous silicon, known to increase in size upon being oxidized. The spacers are oxidized to grow them to a desired width. After reaching the desired width, the spacers can be used as a mask to pattern underlying layers and the substrate. Advantageously, because the spacers are grown by oxidation, thinner blanket layers can be deposited over the mandrels, thereby allowing the deposition of more conformal blanket layers and widening the process window for spacer formation.
摘要翻译：掩模图案的尺寸，例如间距倍数的间隔物，通过形成图案之后的特征的受控生长来控制。为了形成间距倍数间隔物的图案，首先形成芯片图案，覆盖半导体衬底。然后通过在心轴上沉积覆盖层材料并优先从水平表面去除间隔物材料，将垫片形成在心轴的侧壁上。然后选择性地去除心轴，留下独立间隔物的图案。间隔物包括已知在氧化时尺寸增加的材料，例如多晶硅和非晶硅。间隔物被氧化以使它们生长成所需的宽度。在达到期望的宽度之后，间隔物可以用作掩模以对下面的层和基底进行图案化。有利地，由于间隔物通过氧化生长，较薄的橡皮布层可以沉积在心轴上，从而允许沉积更多共形的覆盖层并加宽用于间隔物形成的工艺窗口。

58. 发明授权

US07944738B2 Spin torque transfer cell structure utilizing field-induced antiferromagnetic or ferromagnetic coupling 有权
标题翻译：使用场诱导反铁磁或铁磁耦合的自旋转矩传递单元结构
公开(公告)号：US07944738B2
公开(公告)日：2011-05-17
申请号：US12265340
申请日：2008-11-05
申请人： Jun Liu , Gurtej Sandhu
发明人： Jun Liu , Gurtej Sandhu
IPC分类号： G11C11/00
CPC分类号： H01F10/329 , B82Y25/00 , G01R33/093 , G01R33/1284 , G11C11/161 , G11C11/1675 , H01F10/3254 , H01F10/3268
摘要： A magnetic memory cell including a soft magnetic layer and a coupling layer, and methods of operating the memory cell are provided. The memory cell includes a stack with a free ferromagnetic layer and a pinned ferromagnetic layer, and a soft magnetic layer and a coupling layer may also be formed as layers in the stack. The coupling layer may cause antiferromagnetic coupling to induce the free ferromagnetic layer to be magnetized in a direction antiparallel to the magnetization of the soft magnetic layer, or the coupling layer may cause ferromagnetic coupling to induce the free ferromagnetic layer to be magnetized in a direction parallel to the magnetization of the soft magnetic layer. The coupling layer, through a coupling effect, reduces the critical switching current of the memory cell.
摘要翻译：提供了包括软磁性层和耦合层的磁存储单元，以及操作存储单元的方法。存储单元包括具有自由铁磁层和钉扎铁磁层的堆叠，并且软磁层和耦合层也可以形成为堆叠中的层。耦合层可以引起反铁磁耦合以使自由铁磁层在与软磁层的磁化方向反平行的方向上被磁化，或者耦合层可以引起铁磁性耦合，以使得自由铁磁层在平行方向上被磁化到软磁层的磁化。耦合层通过耦合效应降低了存储单元的关键开关电流。

59. 发明授权

US07923373B2 Pitch multiplication using self-assembling materials 有权
标题翻译：使用自组装材料进行倍增
公开(公告)号：US07923373B2
公开(公告)日：2011-04-12
申请号：US11757846
申请日：2007-06-04
申请人： Gurtej Sandhu
发明人： Gurtej Sandhu
IPC分类号： H01L21/311
CPC分类号： H01L21/0337 , H01L21/3086 , H01L21/31116 , H01L21/31144
摘要： Self-assembling materials, such as block copolymers, are used as mandrels for pitch multiplication. The copolymers are deposited over a substrate and directed to self-assemble into a desired pattern. One of the blocks forming the block copolymers is selectively removed. The remaining blocks are used as mandrels for pitch multiplication. Spacer material is blanket deposited over the blocks. The spacer material is subjected to a spacer etch to form spacers on sidewalls of the mandrels. The mandrels are selectively removed to leave free-standing spacers. The spacers may be used as pitch-multiplied mask features to define a pattern in an underlying substrate.
摘要翻译：自组装材料，如嵌段共聚物，被用作螺距倍增的心轴。共聚物沉积在衬底上并指向自组装成所需的图案。选择性地除去形成嵌段共聚物的块之一。其余块用作俯仰倍增的心轴。垫片材料被覆盖在块上。间隔物材料经受间隔物蚀刻以在心轴的侧壁上形成间隔物。选择性地去除心轴以留下独立的间隔物。间隔物可以用作间距倍增掩模特征以在下面的基底中限定图案。

60. 发明授权

US07910288B2 Mask material conversion 有权
标题翻译：面膜材质转换
公开(公告)号：US07910288B2
公开(公告)日：2011-03-22
申请号：US10932993
申请日：2004-09-01
申请人： Mirzafer K. Abatchev , Gurtej Sandhu
发明人： Mirzafer K. Abatchev , Gurtej Sandhu
IPC分类号： G03F1/00
CPC分类号： H01L21/308 , H01L21/0337 , H01L21/0338 , H01L21/31144 , H01L21/32139
摘要： The dimensions of mask patterns, such as pitch-multiplied spacers, are controlled by controlled growth of features in the patterns after they are formed. To form a pattern of pitch-multiplied spacers, a pattern of mandrels is first formed overlying a semiconductor substrate. Spacers are then formed on sidewalls of the mandrels by depositing a blanket layer of material over the mandrels and preferentially removing spacer material from horizontal surfaces. The mandrels are then selectively removed, leaving behind a pattern of freestanding spacers. The spacers comprise a material, such as polysilicon and amorphous silicon, known to increase in size upon being oxidized. The spacers are oxidized to grow them to a desired width. After reaching the desired width, the spacers can be used as a mask to pattern underlying layers and the substrate. Advantageously, because the spacers are grown by oxidation, thinner blanket layers can be deposited over the mandrels, thereby allowing the deposition of more conformal blanket layers and widening the process window for spacer formation.
摘要翻译：掩模图案的尺寸，例如间距倍数的间隔物，通过形成图案之后的特征的受控生长来控制。为了形成间距倍数间隔物的图案，首先形成芯片图案，覆盖半导体衬底。然后通过在心轴上沉积覆盖层材料并优先从水平表面去除间隔物材料，将垫片形成在心轴的侧壁上。然后选择性地去除心轴，留下独立间隔物的图案。间隔物包括已知在氧化时尺寸增加的材料，例如多晶硅和非晶硅。间隔物被氧化以使它们生长成所需的宽度。在达到期望的宽度之后，间隔物可以用作掩模以对下面的层和基底进行图案化。有利地，由于间隔物通过氧化生长，较薄的橡皮布层可以沉积在心轴上，从而允许沉积更多共形的覆盖层并加宽用于间隔物形成的工艺窗口。

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