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51. 发明授权

US07817244B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07817244B2
公开(公告)日：2010-10-19
申请号：US11585824
申请日：2006-10-25
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

52. 发明申请

US20090186122A1 METHOD OF CONTROLLING THE FLAVOR OF ALCOHOLIC DRINK 审中-公开
标题翻译：控制酒精饮料风味的方法
公开(公告)号：US20090186122A1
公开(公告)日：2009-07-23
申请号：US11817460
申请日：2006-02-27
申请人： Naoyuki Kobayashi , Masahide Sato , Syunsuke Fukuhara , Shigehisa Yokoi
发明人： Naoyuki Kobayashi , Masahide Sato , Syunsuke Fukuhara , Shigehisa Yokoi
IPC分类号： C12C11/00 , C40B30/00 , C40B40/08 , C12G1/00
CPC分类号： C12Q1/6895 , C12C12/004 , C12C12/006 , C12Q2600/158
摘要： It is an object of the present invention to provide a method for identifying brewer's yeast genes associated with alcoholic beverage flavor, to allow production of alcoholic beverages with desirable flavor by controlling the expression of the identified genes. In order to achieve this object, there is provided a method for identifying brewer's yeast genes using gene analysis means employing a DNA array or a DNA array and two-dimensional electrophoresis, a DNA array binding identified genes, and a method of selecting brewer's yeast using the DNA array.
摘要翻译：本发明的目的是提供一种用于鉴定与酒精饮料风味相关的啤酒酵母基因的方法，以通过控制鉴定的基因的表达来生产具有所需风味的酒精饮料。为了达到这个目的，提供了一种使用DNA阵列或DNA阵列和二维电泳的基因分析方法识别啤酒酵母基因的方法，DNA阵列结合鉴定的基因以及使用以下方法选择啤酒酵母的方法 DNA阵列。

53. 发明申请

US20080225250A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080225250A1
公开(公告)日：2008-09-18
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
摘要翻译：液浸曝光装置包括光学元件，在曝光操作中将图案化的光束投射到基板上，液体供应系统具有供给端口，供给端口具有曝光液体，以及具有不同表面的部件从底物。在曝光操作中，液体供应系统将曝光液体从供给口提供到光学元件和基板之间的空间。在清洁操作中，构件移动到构件的表面面向光学元件的位置，并且液体供应系统将曝光液体从供给口提供到光学元件与构件表面之间的空间。

54. 发明授权

US07388649B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07388649B2
公开(公告)日：2008-06-17
申请号：US11284187
申请日：2005-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

55. 发明授权

US07285191B2 Phosphate film processing method and phosphate film processing device 失效
标题翻译：磷酸盐膜处理方法和磷酸盐膜处理装置
公开(公告)号：US07285191B2
公开(公告)日：2007-10-23
申请号：US10473289
申请日：2002-03-26
申请人： Hiroshi Asakawa , Tetsuo Imatomi , Naoyuki Kobayashi , Shigemasa Takagi , Yoshihiro Fujita , Tokujiro Moriyama
发明人： Hiroshi Asakawa , Tetsuo Imatomi , Naoyuki Kobayashi , Shigemasa Takagi , Yoshihiro Fujita , Tokujiro Moriyama
IPC分类号： C25D17/00 , C25D5/00 , C25D9/08 , C25D7/04 , C25D11/00 , C25D11/36
CPC分类号： C25D17/28 , C25D7/04 , C25D11/36 , C25D17/06
摘要： A phosphate coating apparatus for depositing a phosphate coating on a metal material by electrolyzing the metal material in a predetermined electrolysis solution includes a positive electrode and a negative electrode, of which one electrode being disposed in contact with the metal material and the other electrode being disposed away from the metal material with a predetermined distance, and the other electrode being formed into a tubular shape so as to cover the entire length of the metal material.
摘要翻译：通过在预定的电解液中电解金属材料而在金属材料上沉积磷酸盐涂层的磷酸盐涂层装置包括正极和负极，其中一个电极与金属材料接触并且另一个电极被设置远离金属材料预定距离，另一个电极形成为管状，以覆盖金属材料的整个长度。

56. 发明申请

US20060201983A1 Glass cutting method 失效
标题翻译：玻璃切割方法
公开(公告)号：US20060201983A1
公开(公告)日：2006-09-14
申请号：US10551760
申请日：2004-10-25
申请人： Hideaki Kusama , Toshio Inami , Naoyuki Kobayashi
发明人： Hideaki Kusama , Toshio Inami , Naoyuki Kobayashi
IPC分类号： B26F3/00
CPC分类号： C03B33/093 , C03B33/076 , Y10T225/12 , Y10T225/304
摘要： According to the present invention, a first laser beam 2 and a second laser beam 3 composed of an ultraviolet laser are irradiated from a side of a second glass member 5b, allowing the first laser beam 2 to pass through the second glass member 5b so as to condense the first laser beam 2 on the first glass member 5a to form a first scribe line 14, condensing the second laser beam 3 on the second glass member 5b to form a second scribe line 15, and applying a break force to the first scribe line 14 and the second scribe line 15 to cut the glass.
摘要翻译：根据本发明，从第二玻璃构件5b的一侧照射由紫外线激光器构成的第一激光束2和第二激光束3，使第一激光束2通过第二玻璃构件5b 以便将第一激光束2冷凝在第一玻璃部件5a上以形成第一划线14，将第二激光束3会聚在第二玻璃部件5b上以形成第二划线15，并施加断裂力到第一划痕线14和第二划痕线15以切割玻璃。

57. 发明申请

US20060152699A1 Exposure apparatus and method for producing device 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20060152699A1
公开(公告)日：2006-07-13
申请号：US11372269
申请日：2006-03-10
申请人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
发明人： Masahiro Nei , Naoyuki Kobayashi , Hiroshi Chiba , Shigeru Hirukawa
IPC分类号： G03B27/42
CPC分类号： G03F9/7019 , G03F7/70341 , G03F9/7011 , G03F9/7015 , G03F9/7034 , G03F9/7046 , G03F9/7088 , G03F9/7096
摘要： An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.
摘要翻译：曝光装置通过用液体填充投影光学系统和基板之间的空间来对基板进行曝光，并且通过使用投影光学系统通过液体将图案的图像投影到基板上。曝光装置包括用于保持基板的基板台，用于将液体供给到投影光学系统的像面的一侧的液体供应单元，以及用于检测关于投影光学系统的表面的表面信息的聚焦/调平检测系统底物不通过液体。曝光装置在基于通过投影光学系统和液体形成的图像平面之间的位置关系的基础上，对基板进行液浸曝光，基于由聚焦/调平检测系统。可以以令人满意的图案转印精度进行液浸曝光。

58. 发明申请

US20060146305A1 Exposure apparatus, method for producing device, and method for controlling exposure apparatus 有权
公开(公告)号：US20060146305A1
公开(公告)日：2006-07-06
申请号：US11366743
申请日：2006-03-03
申请人： Nobutaka Magome , Naoyuki Kobayashi
发明人： Nobutaka Magome , Naoyuki Kobayashi
IPC分类号： G03B27/42
CPC分类号： G03F7/70866 , G03F7/70341 , G03F7/70525 , G03F7/70725 , G03F7/70858 , G03F7/709
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure device has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.

59. 发明授权

US06235180B1 Method for forming phosphate film on the steel wires and apparatus used therefore 有权
标题翻译：因此，在钢丝上形成磷酸盐膜的方法和使用的装置
公开(公告)号：US06235180B1
公开(公告)日：2001-05-22
申请号：US09343471
申请日：1999-06-30
申请人： Naoyuki Kobayashi , Atsushi Moriyama , Shigemasa Takagi , Tomoaki Katsumata
发明人： Naoyuki Kobayashi , Atsushi Moriyama , Shigemasa Takagi , Tomoaki Katsumata
IPC分类号： C25D706
CPC分类号： C25D11/36 , C25F1/06
摘要： Method and appartus suitable for forming promptly a phosphate film of excellent performance for cold drawing on the steel wires are disclosed. The steel wires are descaled by cathodic electrolysis in acid solution, and thereafter, phosphate film are formed by cathodic electrolysis on the steel wires. Contacting with the solution containing colloidal titanium are preferable to be carried out between cathodic descaling process and phosphate film forming process. Descaling of cathodic electrolysis may preferably be performed in acid solution at a temperature of lower than 90° C. and in 1˜100 A/dm2. Phosphate film forming may preferably be performed by using electrolyte containing Zn ion, phosphoric acid ion and nitric acid ion, at a temperature of lower than 90° C., in 1˜100 A/dm2 and for 1˜30 seconds.
摘要翻译：公开了适用于在钢丝上快速形成具有优异的冷拔性能的磷酸盐膜的方法和装置。在酸性溶液中对钢丝进行阴极电解除去，然后通过阴极电解在钢丝上形成磷酸盐膜。与含有胶体钛的溶液接触，优选在阴极除垢工艺和磷酸盐成膜工艺之间进行。阴极电解除垢可优选在低于90℃和1〜100A / dm 2的温度下在酸性溶液中进行。优选通过使用含有Zn离子，磷酸离子和硝酸离子的电解液，在低于90℃，1〜100A / dm 2的温度和1〜30秒内进行磷酸盐成膜。

60. 发明授权

US6124933A Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus 失效
标题翻译：利用表面位置检测的曝光装置，其方法和使用该装置的半导体器件制造方法
公开(公告)号：US6124933A
公开(公告)日：2000-09-26
申请号：US19565
申请日：1998-02-06
申请人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
发明人： Hideo Mizutani , Naoyuki Kobayashi , Nobutaka Magome
IPC分类号： G01B11/26 , G01B11/00 , G01B11/02 , G01C3/06 , G03F7/20 , G03F7/207 , G03F9/00 , H01L21/027 , H01L21/30 , G01B11/14
CPC分类号： G03F9/7026 , G01B11/026 , G03F7/70358
摘要： In an exposure apparatus and method utilizing a projection system, a surface state relating to an exposure area of the projection system is determined by illuminating the exposure area with light, receiving light from the exposure area, designating positions of a plurality of detection points in the exposure area in accordance with a size of the exposure area, and detecting, based on information of received light corresponding to the plurality of detection points, positions related to the plurality of detection points.
摘要翻译：在利用投影系统的曝光装置和方法中，通过用光照射曝光区域来确定与投影系统的曝光区域相关的表面状态，从曝光区域接收光，指定多个检测点的位置曝光区域，并且根据与所述多个检测点对应的接收光的信息，检测与所述多个检测点相关的位置。

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