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51. 发明申请

US20060043866A1 Image display apparatus 失效
标题翻译：图像显示装置
公开(公告)号：US20060043866A1
公开(公告)日：2006-03-02
申请号：US11210814
申请日：2005-08-25
申请人： Hisanori Tsuda , Masaru Kamio , Ihachiro Gofuku , Yasue Sato , Yoshiyuki Shimada , Hiromasa Mitani , Kazuyuki Seino , Takashi Nishimura
发明人： Hisanori Tsuda , Masaru Kamio , Ihachiro Gofuku , Yasue Sato , Yoshiyuki Shimada , Hiromasa Mitani , Kazuyuki Seino , Takashi Nishimura
IPC分类号： H01J31/00 , H01J31/26
CPC分类号： H01J31/123 , H01J29/867 , H01J2329/868 , H01J2329/943
摘要： In an image display apparatus composed of a vacuum container having an electron source composed of multiple electron-emitting devices and a phosphor film that is irradiated with an electron from the electron source to emit light for display, an ion pump for exhausting the vacuum container through a communicating path by virtue of an action of a magnetism forming portion is arranged. A magnetic shielding member is arranged in a space where the ion pump and the electron-emitting devices are in communication with each other, whereby an influence of a magnetic field generated by the magnetism forming portion on the trajectory of an electron emitted from any one of the electron-emitting devices and display luminance unevenness incidental to the influence are removed.
摘要翻译：在由具有由多个电子发射器件组成的电子源的真空容器和从电子源照射电子以发光的荧光膜构成的图像显示装置中，用于通过以下方式排出真空容器的离子泵配置由磁性形成部的作用而形成的连通路径。磁性屏蔽构件布置在离子泵和电子发射器件彼此连通的空间中，由此磁性形成部分产生的磁场对从任何一个发射的电子的轨迹的影响去除了与影响有关的电子发射器件和显示器亮度不均匀。

52. 发明授权

US5962194A Processing method and apparatus 失效
标题翻译：加工方法及装置
公开(公告)号：US5962194A
公开(公告)日：1999-10-05
申请号：US251666
申请日：1994-05-31
申请人： Toshiyuki Komatsu , Yasue Sato , Shin-Ichi Kawate
发明人： Toshiyuki Komatsu , Yasue Sato , Shin-Ichi Kawate
IPC分类号： C23C16/04 , G03F1/00 , G03F7/00 , G03F7/004 , G03F7/20 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/02 , H01L21/033 , H01L21/285 , H01L21/308 , H01L21/311 , H01L21/316 , H01L21/32 , H01L21/321 , H01L21/3213
CPC分类号： H01L21/02071 , C23C16/047 , G03F1/68 , G03F7/2002 , G03F7/201 , G03F7/2022 , G03F7/2043 , G03F7/2053 , G03F7/265 , G03F7/36 , G03F7/38 , G03F7/7005 , G03F7/70841 , G03F7/70866 , G03F7/70875 , G03F7/70991 , H01L21/033 , H01L21/0332 , H01L21/0337 , H01L21/28556 , H01L21/28562 , H01L21/3086 , H01L21/31116 , H01L21/31144 , H01L21/31662 , H01L21/31683 , H01L21/32 , H01L21/321 , H01L21/32139 , G03F7/00 , G03F7/0035 , G03F7/0042
摘要： A processing method comprises:a first step of depositing on a substrate which is a specimen a film of any one of a semiconductor, a metal and an insulator;a second step of subjecting the surface of the film deposited in the first step, to irradiation with a beam having a given energy to produce a physical damage on the surface;a third step of subjecting the film surface on which the physical damage is produced in the second step, to selective irradiation with light to partially cause a photochemical reaction so that a mask pattern depending on the desired device structure is formed on the film surface; anda fourth step of carrying out photoetching using as a shielding member the mask pattern formed in the third step.
摘要翻译：一种处理方法，包括：第一步，在半导体，金属和绝缘体中的任一个的膜上沉积作为样本的基板; 在第一步骤中沉积的膜的表面经受具有给定能量的束照射以在表面上产生物理损伤的第二步骤; 在第二步骤中对产生物理损伤的膜表面进行第三步的选择性照射以部分地引起光化学反应，使得在膜表面上形成根据期望的器件结构的掩模图案; 以及第四步骤，使用在第三步骤中形成的掩模图案作为屏蔽构件进行光刻。

53. 发明授权

US5952775A Image-forming apparatus having vent tubes 失效
标题翻译：具有放气管的图像形成装置
公开(公告)号：US5952775A
公开(公告)日：1999-09-14
申请号：US479372
申请日：1995-06-07
申请人： Yasue Sato , Shinichi Kawate , Kazuyuki Ueda
发明人： Yasue Sato , Shinichi Kawate , Kazuyuki Ueda
IPC分类号： H01J9/18 , H01J9/24 , H01J9/385 , H01J29/02 , H01J29/08 , H01J29/86 , H01J29/87 , H01J31/08 , H01J31/12 , H01J28/70
CPC分类号： H01J9/242 , H01J29/028 , H01J29/864 , H01J31/127 , H01J9/385 , H01J2329/8625
摘要： An image-forming apparatus has a rear plate including electron-emitting devices formed thereon, a face plate including a fluorescent film formed thereon and being disposed to face the rear plate, flat plate spacers disposed between the rear plate and the face plate, and an outer frame surrounding peripheral edges of the rear plate and the face plate. Electrons emitted from the electron-emitting devices are irradiated to the fluorescent film to thereby display an image under condition where an inner space of a container constructed by the rear plate, the face plate and the outer frame is evacuated through a vent tube into a depressurized state. The vent tube is attached to a side of the outer frame that is positioned across an imaginary extension of the flat-plate spacer in the longitudinal direction thereof, or to the face plate or the rear plate in the vicinity of that side of the outer frame. With such arrangements, evacuation conductance is increased to reduce an evacuation time, and a higher vacuum level is achieved in the container so that an image can be stably displayed for a long time.
摘要翻译：图像形成装置具有包括形成在其上的电子发射器件的后板，包括形成在其上并设置成面向后板的荧光膜的面板，设置在后板和面板之间的平板间隔件，外框围绕后板和面板的周边边缘。从电子发射器件发射的电子被照射到荧光膜上，从而在由后板，面板和外框架构成的容器的内部空间通过排气管排出到减压的状态下显示图像州。排气管附接到外框架的横向于平板隔离件的纵向方向的假想延伸部分的侧面，或者连接到外框架的该侧附近的面板或后板。通过这样的布置，提高排气电导以减少排气时间，并且在容器中实现更高的真空度，使得图像可以长时间稳定地显示。

54. 发明授权

US5573891A Method and apparatus for fine processing 失效
标题翻译：精细加工的方法和装置
公开(公告)号：US5573891A
公开(公告)日：1996-11-12
申请号：US393562
申请日：1995-02-23
申请人： Yasue Sato , Toshiyuki Komatsu , Shinichi Kawate
发明人： Yasue Sato , Toshiyuki Komatsu , Shinichi Kawate
IPC分类号： H01L21/28 , G03F7/004 , G03F7/16 , H01L21/027 , H01L21/033 , H01L21/302 , H01L21/3065 , H01L21/308 , G03C5/00
CPC分类号： G03F7/0041 , G03F7/167 , H01L21/0337 , H01L21/3086 , Y10S430/146
摘要： An apparatus for fine processing includes a support for supporting a material to be processed, an active layer forming device for forming an active layer on the surface of the material by irradiating the material with light in a reaction gas, a latent image forming device for selectively irradiating the active layer with energy in the reaction gas to form a latent image, a shield mask forming device for removing either the latent image layer or the active layer to form a shield mask and an etching device for etching the portion other than the mask portion using the portion left unetched as the shield mask.
摘要翻译：一种微细加工装置，其特征在于，包括支撑被处理材料的支撑体，通过在反应气体中照射光而在材料的表面形成有源层的有源层形成装置，选择性地形成潜像在反应气体中照射活性层以形成潜像，用于去除潜像层或活性层以形成屏蔽掩模的屏蔽掩模形成装置和用于蚀刻除了掩模部分之外的部分的蚀刻装置使用未蚀刻的部分作为屏蔽掩模。

55. 发明授权

US5413664A Apparatus for preparing a semiconductor device, photo treatment apparatus, pattern forming apparatus and fabrication apparatus 失效
标题翻译：用于制备半导体器件的设备，光处理设备，图案形成设备和制造设备
公开(公告)号：US5413664A
公开(公告)日：1995-05-09
申请号：US275757
申请日：1994-07-20
申请人： Takayuki Yagi , Toshiyuki Komatsu , Yasue Sato , Shinichi Kawate
发明人： Takayuki Yagi , Toshiyuki Komatsu , Yasue Sato , Shinichi Kawate
IPC分类号： G03F1/68 , G03F7/16 , G03F7/20 , H01L21/308 , H01L21/311 , H01L21/3213 , H01L21/3065 , B44C1/22 , C23F1/02
CPC分类号： G03F1/68 , G03F7/16 , G03F7/167 , G03F7/2043 , H01L21/3081 , H01L21/31144 , H01L21/32139 , Y10S438/908 , Y10T29/41
摘要： A process for forming an etching pattern, which includes selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having an etching resistance at a photo-irradiated portion of the surface, and then subjecting an unmodified portion of the surface of the material to be worked to an etching treatment, thereby forming an etching pattern corresponding to a pattern formed by the irradiation.
摘要翻译：一种用于形成蚀刻图案的工艺，其包括通过蚀刻选择性地将光照射到待加工材料的清洁表面，以在物质的气氛中从光自由基形成物质形成自由基，形成具有蚀刻的改性部分在表面的光照射部分的电阻，然后对被处理材料的未修饰部分进行蚀刻处理，从而形成与通过照射形成的图案相对应的蚀刻图案。

56. 发明授权

US5344522A Pattern forming process and process for preparing semiconductor device utilizing said pattern forming process 失效
标题翻译：图案形成工艺和利用所述图案形成工艺制备半导体器件的工艺
公开(公告)号：US5344522A
公开(公告)日：1994-09-06
申请号：US13180
申请日：1993-01-29
申请人： Takayuki Yagi , Toshiyuki Komatsu , Yasue Sato , Shinichi Kawate
发明人： Takayuki Yagi , Toshiyuki Komatsu , Yasue Sato , Shinichi Kawate
IPC分类号： G03F1/68 , G03F7/16 , G03F7/20 , H01L21/308 , H01L21/311 , H01L21/3213 , H01L21/306 , B44C1/22 , C23F1/00
CPC分类号： G03F1/68 , G03F7/16 , G03F7/167 , G03F7/2043 , H01L21/3081 , H01L21/31144 , H01L21/32139 , Y10S438/908 , Y10T29/41
摘要： A process for forming an etching pattern, which includes selectively irradiating a light to a clean surface of a material to be worked by etching so as to form radicals from a photoradical forming substance in an atmosphere of the substance, forming a modified portion having an etching resistance at a photo-irradiated portion of the surface, and then subjecting an unmodified portion of the surface of the material to be worked to an etching treatment, thereby forming an etching pattern corresponding to a pattern formed by the irradiation.
摘要翻译：一种用于形成蚀刻图案的工艺，其包括通过蚀刻选择性地将光照射到待加工材料的清洁表面，以在物质的气氛中从光自由基形成物质形成自由基，形成具有蚀刻的改性部分在表面的光照射部分的电阻，然后对被处理材料的未修饰部分进行蚀刻处理，从而形成与通过照射形成的图案相对应的蚀刻图案。

57. 发明授权

US09570264B2 X-ray generator and X-ray imaging apparatus 有权
标题翻译： X射线发生器和X射线成像装置
公开(公告)号：US09570264B2
公开(公告)日：2017-02-14
申请号：US14241417
申请日：2012-08-29
申请人： Takao Ogura , Yasue Sato
发明人： Takao Ogura , Yasue Sato
IPC分类号： H01J35/02 , H01J35/08 , G01N23/04 , H01J35/14
CPC分类号： H01J35/02 , G01N23/04 , H01J35/08 , H01J35/14 , H01J2235/087 , H01J2235/186
摘要： Provided is an X-ray generator which includes:an electron path 8; a target 9c disposed on a substrate 9a, in which electrons having passed through the electron path 8 are made to emit at the target 9c and to generate an X-ray, wherein: the target 9c is disposed at the central area of the substrate 9a; at least a part of a peripheral area of the substrate 9a which is not covered with the target 9c has higher transmittance than that of the central area of the substrate 9a covered with the target 9c, with respect to the X-ray generated when electrons having reflected from the target enter an inner wall of the electron path. X-ray generation efficiency may be improved by effectively using electrons reflected off the target 9c.
摘要翻译：电子通路8; 设置在基板9a上的目标9c，其中通过电子通道8的电子在靶9c处发射并产生X射线，其中：靶9c设置在基板9a的中心区域 ; 基板9a的未被靶9c覆盖的周边区域的至少一部分相对于被靶9c覆盖的基板9a的中心区域的透射率的透射率高于电子具有的X射线从目标反射进入电子通道的内壁。可以通过有效地使用从靶9c反射的电子来提高X射线产生效率。

58. 发明申请

US20090291611A1 MANUFACTURING METHODS OF AIRTIGHT CONTAINER AND IMAGE DISPLAY APPARATUS 失效
标题翻译：空气容器和图像显示装置的制造方法
公开(公告)号：US20090291611A1
公开(公告)日：2009-11-26
申请号：US12465198
申请日：2009-05-13
申请人： Takayuki Sekine , Yoichi Ando , Yasue Sato , Makoto Kojima , Kota Iwasaki
发明人： Takayuki Sekine , Yoichi Ando , Yasue Sato , Makoto Kojima , Kota Iwasaki
IPC分类号： H01J9/26 , B65B55/00
CPC分类号： H01J9/261 , H01J9/385 , H01J9/39 , H01J31/123 , H01J2209/385 , H01J2209/389
摘要： Provided is a manufacturing method of an airtight container, comprising: an electron beam irradiation process for irradiating an electron beam to a non-evaporable type getter that has not been activated so as not to activate the non-evaporable type getter; and a sealing process for sealing a seal portion after the electron beam irradiation process, and thereby forming the airtight container.
摘要翻译：本发明提供一种气密性容器的制造方法，其特征在于，包括：电子束照射工序，用于向不能活化所述非蒸发型吸气剂的未活化的非蒸发型吸气剂照射电子束; 以及在电子束照射处理之后密封密封部分的密封方法，从而形成气密容器。

59. 发明授权

US07446467B2 Image display apparatus with particular ion pump location 失效
标题翻译：具有特定离子泵位置的图像显示装置
公开(公告)号：US07446467B2
公开(公告)日：2008-11-04
申请号：US11203196
申请日：2005-08-15
申请人： Hisanori Tsuda , Masaru Kamio , Ihachiro Gofuku , Yasue Sato
发明人： Hisanori Tsuda , Masaru Kamio , Ihachiro Gofuku , Yasue Sato
IPC分类号： H01J1/62 , H01J63/04
CPC分类号： H01J9/385 , H01J7/14 , H01J7/18 , H01J29/94 , H01J31/127
摘要： An image display apparatus for forming an image in an image displaying region provided with a vacuum chamber having an electron source substrate and an image forming substrate has an ion pump for evacuating the vacuum chamber by an action of a magnet-filed-forming portion through an aperture portion formed in the electron source substrate or an image displaying substrate, wherein the magnet-filed-forming portion is arranged so that a shadow formed by perpendicularly projecting the magnet-filed-forming portion onto the electron source substrate or the image forming substrate can be located outside the image displaying region.
摘要翻译：一种用于在具有电子源基板和图像形成基板的真空室的图像显示区域中形成图像的图像显示装置具有用于通过磁场形成部分的作用将真空室抽真空的离子泵形成在电子源基板或图像显示基板中的开口部分，其中磁体形成部分被布置成使得通过将磁体形成部分垂直投影到电子源基板或图像形成基板上形成的阴影位于图像显示区域的外部。

60. 发明授权

US07308819B2 Gas measuring method inside a sealed container 失效
标题翻译：密封容器内的气体测量方法
公开(公告)号：US07308819B2
公开(公告)日：2007-12-18
申请号：US11417059
申请日：2006-05-04
申请人： Masaru Kamio , Yasue Sato , Kazuyuki Seino , Hiromasa Mitani
发明人： Masaru Kamio , Yasue Sato , Kazuyuki Seino , Hiromasa Mitani
IPC分类号： G01M3/00 , G01M3/04
CPC分类号： H01J29/865 , H01J9/241 , H01J9/42
摘要： A gas measuring method performs a gas measurement inside a sealed container provided with a pair of plates and an exhaust pipe having a breakable vacuum isolating member on at least one of the plates. The method includes the steps of connecting the sealed container to a gas measuring apparatus through the exhaust pipe, and breaking the breakable vacuum isolating member.
摘要翻译：气体测量方法在设置有至少一个板上的一对板和具有可破坏真空隔离构件的排气管的密封容器内进行气体测量。该方法包括以下步骤：通过排气管将密封容器连接到气体测量装置，并断开可破坏的真空隔离构件。

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