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    • 53. 发明申请
    • CURABLE RESIN COMPOSITION
    • 可固化树脂组合物
    • WO1986006085A1
    • 1986-10-23
    • PCT/JP1986000173
    • 1986-04-09
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.NIPPON SODA CO., LTD.GAKU, MorioKIMBARA, HidenoriMURAMOTO, HirooHIGASHIDA, ShiroSATO, Fumio
    • MITSUBISHI GAS CHEMICAL COMPANY, INC.NIPPON SODA CO., LTD.
    • C08L09/06
    • H05K1/0353C08G59/12C08G59/4014C08L19/006C08L63/00C08L63/10C08L79/06Y10T428/31525Y10T428/31529Y10T428/31645Y10T428/31692C08L2666/14C08L2666/20
    • Thermosetting resin composition comprising a thermosetting cyanate ester resin composition (A) and a butadiene based copolymer (B) (i) or an epoxy resin-modified butadiene based copolymer (B) (ii), in which said component (B) (i) or (B) (ii) are used for modifying said component (A), component (A) and (B) being as follows; (A) a cyanate ester thermosetting resin composition comprising a cyanate ester compound selected from the group consisting of, (i) a polyfunctional cyanate ester having at least two cyanate group in its molecule, (ii) prepolymer of the cyanate ester of (i), (iii) coprepolymer of the cyanate ester of (i) and an amine, and (iv) mixtures thereof, and optionally adding another thermosetting resin, (B) (i) a butadiene based copolymer comprising a butadiene-aromatic vinyl monomer copolymer having 0.5 or more functional groups selected from a group consisting of carboxyl radical, hydroxyl radical, acid anhydride radical, mercapto radical, epoxy radical and amino radical, and a melting point of 10 C or more, in which 1,2-type content in butadiene structure of copolymer chain is 50% or more, (ii) an epoxy resin-modified butadiene based copolymer comprising said butadiene based copolymer (B) (i) having a carboxy radical modified with polyfunctional epoxy resin, and having a melting point of 10 C or more and an epoxy equivalent of 300-8,000.
    • 包含热固性氰酸酯树脂组合物(A)和丁二烯共聚物(B)(i)或环氧树脂改性丁二烯共聚物(B)(ii))的热固性树脂组合物,其中所述组分(B)(i) 或(B)(ii)用于改性所述组分(A),组分(A)和(B)如下: (A)氰酸酯热固性树脂组合物,其包含氰酸酯化合物,所述氰酸酯化合物选自:(i)分子中具有至少两个氰酸酯基的多官能氰酸酯,(ii)(i)的氰酸酯的预聚物, ,(iii)(i)的氰酸酯与胺的共聚物,和(iv)其混合物,和任选地加入另外的热固性树脂,(B)(i)包含丁二烯 - 芳族乙烯基单体共聚物的丁二烯基共聚物,其具有 0.5个以上选自羧基,羟基,酸酐基,巯基,环氧基和氨基的官能团,熔点为10℃以上,其中1,2-型 共聚物链的丁二烯结构中的含量为50%以上,(ii)包含用多官能环氧树脂改性的羧基的所述丁二烯类共聚物(B)(i)的环氧树脂改性丁二烯类共聚物,其熔点 的10 环氧当量为300-8,000。
    • 54. 发明申请
    • 1,2,4-THIADIAZOLE DERIVATIVES
    • 1,2,4-噻二唑衍生物
    • WO1986002927A1
    • 1986-05-22
    • PCT/JP1985000617
    • 1985-11-06
    • NIPPON SODA CO., LTD.TAKIGUCHI, DaigakuKANO, Saburo
    • NIPPON SODA CO., LTD.
    • C07D285/08
    • C07D285/08C07D417/12
    • Compounds represented by formula (I), wherein R represents hydrogen, halogen, C1-4 alkyl, trifluoromethyl, phenyl or C1-4 alkoxy, n represents 0,1 or 2, A represents formula (II), wherein X represents halogen or optionally halogen-substituted C1-4 alkyl, m represents 0,1 or 2, B represents CH, N or (III), W represents -O-, formula (IV) wherein r , r , r , r , r , and r each represents hydrogen, hydroxy or C1-4 alkyl, k and j each represents 1, 2, or 3, l represents 0 or 1, Q represents aryl such as substituted phenyl, substituted pyridyl, etc., E and D each represents CH, N or formula (III) (provided that E and D do not represent N or formula (III) at the same time), and r and r each represents hydrogen, halogen or C1-4 alkyl, and Y represents O, CH2, S or SO2, provided that symbols between positions 1 and 2 and between positions 3 and 4 in the Y-containing tricyclic system each represents a single or double bond have antifungal and antiprotozoan effects against candasis, trichomoniasis, mycosis, etc.
    • 由式(I)表示的化合物,其中R表示氢,卤素,C 1-4烷基,三氟甲基,苯基或C 1-4烷氧基,n表示0,1或2,A表示式(II),其中X表示卤素或任选地 卤素取代的C 1-4烷基,m表示0,1或2,B表示CH,N或(III),W表示-O-,式(IV)其中r 3,r 4,r 5 >,r 6,r 7和r 8分别表示氢,羟基或C 1-4烷基,k和j各自表示1,2或3,l表示0或1,Q表示芳基 作为取代的苯基,取代的吡啶基等,E和D各自表示CH,N或式(III)(条件是E和D不同时表示N或式(III)),并且r 1和 R 2各自表示氢,卤素或C 1-4烷基,Y表示O,CH 2,S或SO 2,条件是在含Y的三环体系中位置1和2之间以及位置3和4之间的符号 每个代表一次或双键再次具有抗真菌和抗原生动物作用 黄疸,毛滴虫病,真菌病等
    • 57. 发明申请
    • (METH)ACRYLIC ESTER COPOLYMERS AND PROCESS FOR PRODUCING THE SAME
    • (METH)丙烯酸酯共聚物及其制备方法
    • WO1998025977A1
    • 1998-06-18
    • PCT/JP1997004509
    • 1997-12-09
    • NIPPON SODA CO., LTD.MURAMOTO, HirooYAMASE, YukioNOBUHARA, YukikazuMATSUMOTO, HitoshiSHIMIZU, Yutaka
    • NIPPON SODA CO., LTD.
    • C08F220/12
    • C08F297/026C08F220/04C08F220/12C08F220/18
    • Random or block copolymers of a (meth)acrylic ester, which comprise structural units represented by general formulae (I) and (II) and have a number-average molecular weight of 1,000 to 50,000, a weight-average molecular weight (Mw) to number-average molecular weight (Mn) ratio, Mw/Mn, of 1.00 to 1.40, and a ratio of the repeating structural units represented by formula (I) to those represented by formula (II) of 1/9 to 9/1 (wherein R1 and R2 each independently represents hydrogen or methyl; R3 represents an optionally substituted C7-15 alicyclic group or an alkyl group having the alicyclic group; and R4 represents hydrogen, an optionally substituted C1-12 alkyl, optionally substituted C3-6 alicyclic or heterocyclic group, or substituted silyl group having a C1-8 alkyl and/or aryl group). The copolymers have each a unimodal narrow molecular weight distribution and an essential skeleton having at least one segment with a controlled structure comprising (meth)acrylic ester units each having an organic group containing a bulky alicyclic group.
    • (甲基)丙烯酸酯的无规或嵌段共聚物,其包含由通式(I)和(II)表示的结构单元,数均分子量为1,000至50,000,重均分子量(Mw)至 数均分子量(Mn)比,Mw / Mn为1.00〜1.40,由式(I)表示的重复结构单元与式(II)表示的重复结构单元的比例为1/9〜9/1 其中R 1和R 2各自独立地表示氢或甲基; R 3表示任选取代的C 7-15脂环基或具有脂环基的烷基; R 4表示氢,任选取代的C 1-12烷基,任选取代的C 3-6脂环族或 杂环基或具有C1-8烷基和/或芳基的取代甲硅烷基)。 共聚物各自具有单峰窄分子量分布和具有至少一个具有受控结构的链段的必需骨架,其包含各自具有含有大体积脂环族基团的有机基团的(甲基)丙烯酸酯单元。
    • 58. 发明申请
    • PHOTOCATALYTIC COMPOSITION
    • 光催化组合物
    • WO1998012232A1
    • 1998-03-26
    • PCT/JP1997003293
    • 1997-09-18
    • NIPPON SODA CO., LTD.TAKAHASHI, Eiji
    • NIPPON SODA CO., LTD.
    • C08F04/00
    • C08G65/18B33Y70/00C08F2/50C08G59/68C08G65/105G03F7/0045G03F7/038
    • A photocatalytic composition characterized by comprising at least one compound which is selected from the group consisting of polycyclic aromatic compounds and carbazole derivatives each having at least one substituent selected from among hydroxyl and optionally substituted aralkyloxy and alkoxy groups and which exhibits an absorption at a wavelength longer than 330 nm in the UV absorption spectrum, and at least one aryl onium salt selected from the group consisting of diphenyl-alkylsulfonium salts and dinaphthylalkylsulfonium salts, triphenylsulfonium salts, diphenyliodonium salts, phenylnaphthyliodonium salts and dinaphthyliodonium salts all of which act as a catalyst for cationic photopolymerization. The composition can cure cationically polymerizable compounds when mixed with the compounds and irradiated with an actinic radiation such as light, electron beam or X-ray. Further, the composition can attain the curing even when irradiated with a ray having a wavelength longer than 330 nm which is not absorbed by triphenylsulfonium salts or diphenyliodonium salts or is little absorbed by them, thus permitting remarkably accelerated curing of a clear composition or effective photocuring of a composition containing a pigment or the like. Thus, this composition is suitably applicable to photocurable coating materials, adhesives, inks and photoresists, photosensitive resins for stereolithography, and so on.
    • 一种光催化组合物,其特征在于包含至少一种选自多环芳族化合物和咔唑衍生物的化合物,所述多环芳族化合物和咔唑衍生物各自具有至少一个选自羟基和任选取代的芳烷氧基和烷氧基的取代基,并且在波长较长时呈现吸收 紫外吸收光谱中的330nm以上,以及选自二苯基 - 烷基锍盐和二萘基烷基锍盐中的至少一种芳基鎓盐,三苯基锍盐,二苯基碘鎓盐,苯基萘基碘盐和二萘基碘鎓盐,其全部用作阳离子的催化剂 光聚合。 组合物可以在与化合物混合时固化可阳离子聚合的化合物,并用光化辐射如光,电子束或X射线照射。 此外,组合物即使当用不超过330nm的波长的光线照射时,也可以获得固化,该光线不被三苯基锍盐或二苯基碘鎓盐吸收,或者很少被它们吸收,因此可以显着加速固化清除组合物或有效的光固化 的含有颜料等的组合物。 因此,该组合物适用于光固化性涂料,粘合剂,油墨和光致抗蚀剂,用于立体光刻的感光性树脂等。