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    • 55. 发明申请
    • Connector assembly
    • 连接器组件
    • US20110021058A1
    • 2011-01-27
    • US12804328
    • 2010-07-20
    • Nobuhisa TodoAkira OhnoYuji HamaokaYoshiharu Yamamoto
    • Nobuhisa TodoAkira OhnoYuji HamaokaYoshiharu Yamamoto
    • H01R13/62
    • H01R13/62911H01R13/62944
    • A connector assembly has a first connector, a second connector matable with the first connector along a mating direction, a mating assistance mechanism, a mating maintenance mechanism, and a detection mechanism. The mating assistance mechanism has an operation member and is operable to mate the second connector with the first connector in accordance with an operation of the operation member. The mating maintenance mechanism includes a stopper, an engagement portion and an elastic support. The engagement portion is configured to be engaged with the stopper in a mating state of the first connector and the second connector so as to maintain the mating state. The elastic support is configured to support the engagement portion. The elastic support is elastically deformed and moves the engagement portion along a direction different from the mating direction when the second connector is mated with the first connector. The detection mechanism is operable to detect the mating state and includes a first terminal, a second terminal, and a short-circuit member, The first terminal has a first contacting section extending along the mating direction. The second terminal has a second contacting section extending along the mating direction. The short-circuit member is arranged to establish a short circuit between the first terminal and the second terminal in the mating state. The short-circuit member has a first contact and a second contact which are brought into contact with the first contacting section and the second contacting section in the mating state, respectively. The first contact is directly/indirectly moved by movement and elastic deformation of the elastic support so that the first contact wipes the first contacting section during a mating operation of the first connector and the second connector. The second contact wipes the second contacting section independently of the elastic deformation of the elastic support during the mating operation.
    • 连接器组件具有第一连接器,与配合方向上的第一连接器配合的第二连接器,配合辅助机构,配合维护机构和检测机构。 配合辅助机构具有操作构件,并且可操作以根据操作构件的操作将第二连接器与第一连接器配合。 配合维护机构包括止动件,接合部和弹性支撑件。 接合部构造成在第一连接器和第二连接器的配合状态下与止动件接合,以保持配合状态。 弹性支撑件构造成支撑接合部分。 当第二连接器与第一连接器配合时,弹性支撑件弹性变形并沿着与配合方向不同的方向移动接合部分。 检测机构可操作以检测配合状态,并且包括第一端子,第二端子和短路构件。第一端子具有沿着配合方向延伸的第一接触部分。 第二端子具有沿着配合方向延伸的第二接触部。 短路构件被布置成在配合状态下在第一端子和第二端子之间建立短路。 短路构件具有分别与配合状态的第一接触部和第二接触部接触的第一接触和第二接触。 通过弹性支撑件的移动和弹性变形直接/间接地移动第一触点,使得第一触点在第一连接器和第二连接器的配合操作期间擦拭第一接触部分。 第二接触件在配合操作期间独立于弹性支撑件的弹性变形而擦拭第二接触部分。
    • 57. 发明申请
    • FORMING MEMBER FOR ANTIREFLECTION STRUCTURE, TRANSFER MATERIAL EMPLOYED IN THE SAME, OPTICAL APPARATUS EMPLOYING ANTIREFLECTION STRUCTURE, AND MANUFACTURING METHOD FOR THE SAME
    • 形成抗反射结构的成员,使用该材料的转移材料,采用抗反射结构的光学装置及其制造方法
    • US20090120566A1
    • 2009-05-14
    • US11995641
    • 2006-07-11
    • Hiroaki OkayamaYoshiharu YamamotoMotonobu YoshikawaKeiki Yoshitsugu
    • Hiroaki OkayamaYoshiharu YamamotoMotonobu YoshikawaKeiki Yoshitsugu
    • B29C65/14
    • G02B1/118B29C65/1406B29C65/1409B29C65/1416G02B5/003G02B5/045G03B9/08
    • A forming member for antireflection structure according to the present invention comprises a transfer material and a to-be-transferred material, wherein: the transfer material can be peeled off from the to-be-transferred material; the transfer material is constructed such that a structure having a reversal shape of an antireflection structure in which structural units are arranged in a shape of an array at a period smaller than a minimum wavelength of light whose reflection should be prevented and which has an aspect ratio of unity or greater is formed on a principal surface of a base substrate part having flexibility; the to-be-transferred material is a structure formed from a resin and having the same shape as the antireflection structure; and the transfer material and the to-be-transferred material are arranged such that the structure having the same shape as the antireflection structure fills up the structure having a reversal shape of the antireflection structure. Thus, even in the inside of an assembled optical apparatus, an antireflection structure can easily be formed at a predetermined position. Further, the optical characteristics of the optical apparatus itself is not affected.
    • 根据本发明的抗反射结构用成型构件包括转印材料和待转印材料,其中:转印材料可以从被转印材料剥离; 转印材料被构造成使得具有反射防止结构的反转形状的结构,其中结构单元以小于应该防止反射的光的最小波长的周期排列成阵列形状,并且具有纵横比 在具有柔性的基底部分的主表面上形成一体或更大的一个或多个; 被转印材料是由树脂形成并具有与防反射结构相同形状的结构; 并且转印材料和待转印材料被布置成使得具有与防反射结构相同形状的结构填满具有防反射结构的反转形状的结构。 因此,即使在组装的光学装置的内部,也可以容易地在预定位置形成抗反射结构。 此外,光学设备本身的光学特性不受影响。
    • 58. 发明授权
    • Optical scanner and image forming apparatus
    • 光学扫描仪和图像形成装置
    • US07265886B2
    • 2007-09-04
    • US11006640
    • 2004-12-08
    • Motonobu YoshikawaYoshiharu YamamotoDaizaburo Matsuki
    • Motonobu YoshikawaYoshiharu YamamotoDaizaburo Matsuki
    • G02B26/08B41J27/00
    • G02B26/126G02B26/12
    • The over-field type optical scanner includes a first imaging optical system disposed between a light source and a rotating polygon mirror for forming, on one surface of the rotating polygon mirror, a linear image with a width larger than a width along a main scanning direction of the one surface of the rotating polygon mirror; and a second imaging optical system composed of a curved mirror for focusing, on a scan surface, a light beam having been reflected by the rotating polygon mirror. The first imaging optical system includes a first conversion optical system for converting the light beam emitted from the light source into a divergent light beam with respect to the main scanning direction and into a convergent light beam with respect to the sub scanning direction; and a second conversion optical system having a refracting power in the main scanning direction.
    • 场外型光学扫描仪包括设置在光源和旋转多面镜之间的第一成像光学系统,用于在旋转多面镜的一个表面上形成宽度大于沿主扫描方向的宽度的线性图像 的旋转多面镜的一个表面; 以及第二成像光学系统,其由弯曲镜组成,用于在扫描表面上聚焦已被旋转多面镜反射的光束。 第一成像光学系统包括:第一转换光学系统,用于将从光源发射的光束相对于主扫描方向转换成发散光束,并将其转换成相对于副扫描方向的会聚光束; 以及在主扫描方向上具有折射力的第二转换光学系统。