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51. 发明授权

US06643604B1 System for uniformly heating photoresist 有权
标题翻译：光刻胶均匀加热系统
公开(公告)号：US06643604B1
公开(公告)日：2003-11-04
申请号：US09608091
申请日：2000-06-30
申请人： Ramkumar Subramanian , Michael K. Templeton , Bharath Rangarajan
发明人： Ramkumar Subramanian , Michael K. Templeton , Bharath Rangarajan
IPC分类号： G01K100
CPC分类号： H01L21/67115
摘要： A system for regulating heating temperature of a material is provided. The material may be a photoresist, a top or bottom anti-reflective coating, a low K dielectric material, SOG or other spin-on material, for example. The system includes a plurality of lamps and optical fibers, each optical fiber directing radiation to and heating a respective portions of a bakeplate on which the material is to be placed. In one embodiment, the temperature at various locations on the material placed on the bakeplate is determined and the heating rates are controlled in response to those measurements. In another aspect of the invention, the temperature at various portions of the bakeplate is determined and controlled. In this latter aspect, uniform heating of the material is a consequence of uniform bakeplate temperature.
摘要翻译：提供了用于调节材料的加热温度的系统。该材料可以是例如光致抗蚀剂，顶部或底部抗反射涂层，低K电介质材料，SOG或其它旋涂材料。该系统包括多个灯和光纤，每个光纤将辐射引导到其上放置材料的面板的相应部分并加热。在一个实施例中，确定放置在面板上的材料上的各个位置处的温度，并响应于这些测量来控制加热速率。在本发明的另一方面中，确定并控制了木板的不同部分的温度。在后一方面，材料的均匀加热是均匀烘烤温度的结果。

52. 发明授权

US06573498B1 Electric measurement of reference sample in a CD-SEM and method for calibration 失效
标题翻译： CD-SEM中参考样品的电测量和校准方法
公开(公告)号：US06573498B1
公开(公告)日：2003-06-03
申请号：US09608096
申请日：2000-06-30
申请人： Bharath Rangarajan , Bhanwar Singh , Khoi Phan , Michael K. Templeton
发明人： Bharath Rangarajan , Bhanwar Singh , Khoi Phan , Michael K. Templeton
IPC分类号： G01N2300
CPC分类号： G01N23/225 , H01J2237/2826
摘要： The present invention relates to a system and method for calibrating a scanning electron microscope (SEM). The method comprises measuring an electrical characteristic of a calibration standard reference sample feature and correlating the electrical measurement with an SEM measurement thereof. The correlation of the electrical and SEM measurements provides a critical dimension (CD) for the reference sample feature which can then be used to correlate SEM measurements of workpiece features. The system provides a reference sample having a measurable feature electrically connected to a probe. The probe provides an electrical measurement of the reference sample feature. The system further comprises a scanning electron microscope (SEM) adapted to provide an optical measurement of the reference sample feature. A processor is provided to correlate the optical and electrical measurements of the reference sample feature, whereby a reference feature CD is obtained. The system may further correlate workpiece feature measurements with the reference feature CD in order to determine or obtain a workpiece feature CD.
摘要翻译：本发明涉及一种用于校准扫描电子显微镜（SEM）的系统和方法。该方法包括测量校准标准参考样本特征的电特性并将电测量与其SEM测量相关联。电和SEM测量的相关性为参考样品特征提供了临界尺寸（CD），然后可以将其用于关联工件特征的SEM测量。该系统提供具有电连接到探针的可测量特征的参考样本。探头提供参考样品特征的电气测量。该系统还包括适于提供参考样品特征的光学测量的扫描电子显微镜（SEM）。提供处理器以使参考样本特征的光学和电学测量相关，由此获得参考特征CD。该系统可以进一步将工件特征测量与参考特征CD相关联，以便确定或获得工件特征CD。

53. 发明授权

US06573497B1 Calibration of CD-SEM by e-beam induced current measurement 失效
标题翻译：通过电子束感应电流测量校正CD-SEM
公开(公告)号：US06573497B1
公开(公告)日：2003-06-03
申请号：US09607628
申请日：2000-06-30
申请人： Bharath Rangarajan , Bhanwar Singh , Khoi Phan , Michael K. Templeton
发明人： Bharath Rangarajan , Bhanwar Singh , Khoi Phan , Michael K. Templeton
IPC分类号： G01R3126
CPC分类号： H01J37/265 , H01J37/244 , H01J2237/24564 , H01J2237/2803 , H01J2237/2817 , H01J2237/2826
摘要： The present invention relates to a system and method for calibrating a scanning electron microscope (SEM). The method comprises measuring an electrical characteristic of a calibration standard reference sample feature via a current induced by an electron beam (e-beam) and correlating the e-beam induced current measurement with an SEM measurement thereof. The correlation of the e-beam induced current and SEM measurements provides a critical dimension (CD) for the reference sample feature which can then be used to correlate SEM measurements of workpiece features. The system provides a reference sample having a measurable feature electrically connected to a probe. The probe provides an electrical measurement of the reference sample feature based on an e-beam induced current. The system further comprises a scanning electron microscope (SEM) adapted to provide an optical measurement of the reference sample feature and workpiece features. A processor is provided to correlate the optical and e-beam induced current measurements of the reference sample feature, whereby a reference feature CD is obtained. The system may further correlate workpiece feature measurements with the reference feature CD in order to determine or obtain a workpiece feature CD.
摘要翻译：本发明涉及一种用于校准扫描电子显微镜（SEM）的系统和方法。该方法包括通过由电子束（电子束）感应的电流测量校准标准参考样本特征的电特性，并将电子束感应电流测量与其SEM测量相关联。电子束感应电流和SEM测量的相关性为参考样品特征提供了临界尺寸（CD），然后可以将其用于关联工件特征的SEM测量。该系统提供具有电连接到探针的可测量特征的参考样本。探针基于电子束感应电流提供参考样品特征的电测量。该系统还包括适于提供参考样品特征和工件特征的光学测量的扫描电子显微镜（SEM）。提供处理器以使参考样本特征的光束和电子束感应电流测量值相关，从而获得参考特征CD。该系统可以进一步将工件特征测量与参考特征CD相关联，以便确定或获得工件特征CD。

54. 发明授权

US06541184B1 Nozzle arm movement for resist development 有权
标题翻译：喷嘴臂运动用于抗蚀剂开发
公开(公告)号：US06541184B1
公开(公告)日：2003-04-01
申请号：US09655979
申请日：2000-09-06
申请人： Ramkumar Subramanian , Khoi A. Phan , Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur
发明人： Ramkumar Subramanian , Khoi A. Phan , Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur
IPC分类号： G03C556
CPC分类号： H01L21/6715 , G03F7/3028
摘要： A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a multiple tip nozzle and a movement system that moves the nozzle to an operating position above a central region of a photoresist material layer located on a substrate, and applies a volume of developer as the nozzle scan moves across a predetermined path. The movement system moves the nozzle in two dimensions by providing an arm that has a first arm member that is pivotable about a first rotational axis and a second arm member that is pivotable about a second rotational axis or is movable along a translational axis. The system also provides a measurement system that measures the thickness uniformity of the developed photoresist material layer disposed on a test wafer. The thickness uniformity data is used to reconfigure the predetermined path of the nozzle as the developer is applied. The thickness uniformity data can also be used to adjust the volume of developer applied along the path and/or the volume flow rate.
摘要翻译：提供了一种有助于在光致抗蚀剂材料层上施加均匀的显影剂材料层的系统和方法。该系统包括多个尖端喷嘴和运动系统，该运动系统将喷嘴移动到位于基板上的光致抗蚀剂材料层的中心区域上方的操作位置，并且当喷嘴扫描移动穿过预定路径时施加一定体积的显影剂。移动系统通过提供具有第一臂构件的臂来移动喷嘴，该臂具有可围绕第一旋转轴线枢转的第一臂构件和可围绕第二旋转轴线枢转或可沿着平移轴线移动的第二臂构件。该系统还提供了测量设置在测试晶片上的显影的光致抗蚀剂材料层的厚度均匀性的测量系统。当施加显影剂时，厚度均匀性数据用于重新配置喷嘴的预定路径。厚度均匀性数据也可用于调节沿路径施加的显影剂的体积和/或体积流量。

55. 发明授权

US06455416B1 Developer soluble dyed BARC for dual damascene process 有权
标题翻译：开发可溶染色的BARC用于双镶嵌工艺
公开(公告)号：US06455416B1
公开(公告)日：2002-09-24
申请号：US09706967
申请日：2000-11-06
申请人： Ramkumar Subramanian , Bhanwar Singh , Bharath Rangarajan , Michael K. Templeton
发明人： Ramkumar Subramanian , Bhanwar Singh , Bharath Rangarajan , Michael K. Templeton
IPC分类号： H01L214763
CPC分类号： H01L21/76808 , G03F7/091 , H01L21/31144
摘要： One aspect of the present invention relates to a method of processing a semiconductor structure, involving the steps of providing a substrate having an insulation layer thereover; forming a first antireflection coating over the insulation layer; patterning a first resist over the antireflection coating; forming a plurality of vias in the insulation layer and the first antireflection coating, the vias having a first width; filling the via with a second antireflection coating, the second antireflection coating comprising a dye and a film forming material; patterning a second resist over the structure and removing the second antireflection coating from the via; forming a trench over the plurality of vias in the insulation layer, the trench having a width that is larger than the average width of the vias; and filling the trench and vias with a conductive material. The present invention provides improved dual damascene methods for substrates by using a developer soluble ARC containing a dye to facilitate the formation of trenches directly over the previously formed vias.
摘要翻译：本发明的一个方面涉及一种处理半导体结构的方法，包括以下步骤：提供其上具有绝缘层的基板; 在所述绝缘层上形成第一抗反射涂层; 在抗反射涂层上图案化第一抗蚀剂; 在所述绝缘层和所述第一抗反射涂层中形成多个通孔，所述通孔具有第一宽度; 用第二抗反射涂层填充通孔，第二抗反射涂层包含染料和成膜材料; 在所述结构上形成第二抗蚀剂并从所述通孔去除所述第二抗反射涂层; 在所述绝缘层中的多个通孔上形成沟槽，所述沟槽的宽度大于所述通孔的平均宽度; 并用导电材料填充沟槽和通孔。本发明通过使用含有染料的显影剂可溶性ARC来促进直接在先前形成的通孔上形成沟槽，从而为衬底提供改进的双镶嵌方法。

56. 发明授权

US06451512B1 UV-enhanced silylation process to increase etch resistance of ultra thin resists 失效
标题翻译： UV增强的硅烷化方法，以增加超薄抗蚀剂的耐蚀刻性
公开(公告)号：US06451512B1
公开(公告)日：2002-09-17
申请号：US09565691
申请日：2000-05-01
申请人： Bharath Rangarajan , Ramkumar Subramanian , Khoi A. Phan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur , Bryan K. Choo
发明人： Bharath Rangarajan , Ramkumar Subramanian , Khoi A. Phan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur , Bryan K. Choo
IPC分类号： G03F700
CPC分类号： G03F7/265 , H01L21/0273 , H01L21/31144 , H01L21/32139
摘要： In one embodiment, the present invention relates to a method of processing an ultrathin resist, involving the steps of depositing the ultra-thin photoresist over a semiconductor substrate, the ultra-thin resist having a thickness less than about 3,000 Å; irradiating the ultra-thin resist with electromagnetic radiation having a wavelength of about 250 nm or less; developing the ultra-thin resist; and contacting the ultra-thin resist with a silicon containing compound in an environment of at least one of ultraviolet light and ozone, wherein contact of the ultra-thin resist with the silicon containing compound is conducted between irradiating and developing the ultra-thin resist or after developing the ultra-thin resist.
摘要翻译：在一个实施方案中，本发明涉及一种处理超薄抗蚀剂的方法，包括以下步骤：在半导体衬底上沉积超薄光致抗蚀剂，超薄抗蚀剂的厚度小于约; 用波长约250nm或更小的电磁辐射照射超薄抗蚀剂; 开发超薄抗蚀剂; 以及在紫外光和臭氧中的至少一种的环境下使超薄抗蚀剂与含硅化合物接触，其中超薄抗蚀剂与含硅化合物的接触在照射和显影超薄抗蚀剂之间进行，或在开发超薄抗蚀剂后。

57. 发明授权

US06329124B1 Method to produce high density memory cells and small spaces by using nitride spacer 有权
标题翻译：通过使用氮化物间隔物生产高密度存储单元和小空间的方法
公开(公告)号：US06329124B1
公开(公告)日：2001-12-11
申请号：US09320417
申请日：1999-05-26
申请人： Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton
发明人： Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton
IPC分类号： G03F726
CPC分类号： H01L21/3088 , H01L21/0337 , H01L21/0338 , H01L21/3086
摘要： The present invention relates to a method for forming an etch mask. A photoresist layer is patterned, wherein d1 is a smallest space dimension of an exposed area of a layer underlying the photoresist layer. An ARC layer under the photoresist layer is etched. A nitride layer is formed to be conformal to the patterned ARC layer and exposed portions of an underlayer underying the patterned ARC layer. The nitride layer is etched to form nitride sidewalls, the nitride sidewalls reducing the smallest space dimension of the exposed underlayer area to d2, wherein d2
摘要翻译：本发明涉及一种形成蚀刻掩模的方法。图案化光致抗蚀剂层，其中d1是光致抗蚀剂层下面的层的暴露区域的最小空间尺寸。蚀刻光刻胶层下方的ARC层。氮化物层形成为与图案化的ARC层一致，并且曝光部分的底层在图案化的ARC层下面。蚀刻氮化物层以形成氮化物侧壁，氮化物侧壁将暴露的底层区域的最小空间尺寸减小到d2，其中d2

58. 发明授权

US06248175B1 Nozzle arm movement for resist development 有权
标题翻译：喷嘴臂运动用于抗蚀剂开发
公开(公告)号：US06248175B1
公开(公告)日：2001-06-19
申请号：US09430001
申请日：1999-10-29
申请人： Ramkumar Subramanian , Khoi A. Phan , Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur
发明人： Ramkumar Subramanian , Khoi A. Phan , Bharath Rangarajan , Bhanwar Singh , Michael K. Templeton , Sanjay K. Yedur
IPC分类号： B05C1100
CPC分类号： H01L21/6715 , G03F7/3021
摘要： A system and method is provided that facilitates the application of a uniform layer of developer material on a photoresist material layer. The system includes a nozzle adapted to apply a predetermined volume of developer material on a photoresist material layer along a linear path having a length approximately equal to the diameter of the photoresist material layer. A movement system moves the nozzle to a first position offset from a central region of the photoresist material layer for applying a first predetermined volume of developer material to the photoresist material layer while the developer material is spin coated. The movement system also moves the nozzle to a second position offset from the central region for applying a second predetermined volume of developer material to the photoresist material layer while the developer is spin coated. The first position is located on an opposite side of the central region with respect to the second position. A method of adjusting the offset position and/or volume of developer material applied at the first and second position is also provided. The method utilizes developed photoresist material layer thickness data provided by a measurement system to adjust the offset position and/or volume of the developer.
摘要翻译：提供了一种有助于在光致抗蚀剂材料层上施加均匀的显影剂材料层的系统和方法。该系统包括适于沿着具有大致等于光致抗蚀剂材料层的直径的直线路径的光致抗蚀剂材料层上施加预定体积的显影剂材料的喷嘴。移动系统将喷嘴移动到偏离光致抗蚀剂材料层的中心区域的第一位置，以在旋转涂覆显影剂材料的同时将第一预定体积的显影剂材料施加到光致抗蚀剂材料层。移动系统还将喷嘴移动到偏离中心区域的第二位置，以在显影剂被旋涂时施加第二预定体积的显影剂材料到光致抗蚀剂材料层。第一位置相对于第二位置位于中心区域的相反侧。还提供了一种调节在第一和第二位置施加的显影剂材料的偏移位置和/或体积的方法。该方法利用由测量系统提供的显影的光致抗蚀剂材料层厚度数据来调节显影剂的偏移位置和/或体积。

59. 发明授权

US06819427B1 Apparatus of monitoring and optimizing the development of a photoresist material 有权
标题翻译：监测和优化光致抗蚀剂材料的发展的装置
公开(公告)号：US06819427B1
公开(公告)日：2004-11-16
申请号：US09973849
申请日：2001-10-10
申请人： Ramkumar Subramanian , Michael K. Templeton , Bharath Rangarajan
发明人： Ramkumar Subramanian , Michael K. Templeton , Bharath Rangarajan
IPC分类号： G01N2155
CPC分类号： G03F7/3028 , G01N21/47 , G01N21/55 , G01N21/8422 , G01N21/9501 , G01N31/007 , G03F7/3071
摘要： A system and method is provided that facilitates the uniform development of a pattern on a photoresist material layer using a developer. The present invention accomplishes this end by considering the acid-base relationship of the photoresist material and developer and monitoring the development of water formed in the development process. Typically, photoresist material is purchased or manufactured with known concentrations of resin and photoacid generator. Therefore, by monitoring the development of water in the development process, the present invention can measure the acid consumption in the development process. The present invention can then utilize this information in optimizing the developer volume, developer concentration and developer time to improve the quality of the developed image pattern on the photoresist material layer.
摘要翻译：提供了一种使用显影剂促进光致抗蚀剂材料层上的图案的均匀显影的系统和方法。本发明通过考虑光致抗蚀剂材料和显影剂的酸碱关系并监测在显影过程中形成的水的发展来实现这一目的。通常，以已知浓度的树脂和光致酸产生剂购买或制造光致抗蚀剂材料。因此，通过监测开发过程中的水的发展，本发明可以测量开发过程中的酸消耗。因此，本发明可以利用该信息来优化显影剂体积，显影剂浓度和显影剂时间，以提高光致抗蚀剂材料层上显影的图像图案的质量。

60. 发明授权

US06641963B1 System and method for in situ control of post exposure bake time and temperature 失效
标题翻译：曝晒后烘烤时间和温度的现场控制系统和方法
公开(公告)号：US06641963B1
公开(公告)日：2003-11-04
申请号：US09845239
申请日：2001-04-30
申请人： Bharath Rangarajan , Michael K. Templeton , Bhanwar Singh , Ramkumar Subramanian
发明人： Bharath Rangarajan , Michael K. Templeton , Bhanwar Singh , Ramkumar Subramanian
IPC分类号： G03F900
CPC分类号： G03F7/38 , G03B27/52
摘要： A system for regulating temperature of a post exposure baking process is provided. The system includes one or more light sources, each light source directing light to one or more gratings being baked and hardened on a wafer. Light reflected from the gratings is collected by a measuring system, which processes the collected light. Light passing through the gratings may similarly be collected by the measuring system, which processes the collected light. The collected light is indicative of the baking and hardening of the respective portions of the wafer. The measuring system provides baking and hardening related data to a processor that determines the baking and hardening of the respective portions of the wafer. The system also includes a plurality of temperature controlling devices, each such device corresponds to a respective portion of the wafer and provides for the heating and/or cooling thereof. The processor selectively controls the temperature controlling devices so as to regulate temperature of the respective portions of the wafer.
摘要翻译：提供了一种用于调节后曝光烘烤处理温度的系统。该系统包括一个或多个光源，每个光源将光引导到在晶片上被烘烤和硬化的一个或多个光栅。从光栅反射的光被测量系统收集，该系统处理收集的光。通过光栅的光可以类似地由处理所收集的光的测量系统收集。所收集的光表示晶片的各个部分的烘烤和硬化。测量系统向处理器提供烘烤和硬化相关数据，该处理器确定晶片的相应部分的烘烤和硬化。该系统还包括多个温度控制装置，每个这样的装置对应于晶片的相应部分并提供其加热和/或冷却。处理器选择性地控制温度控制装置，以调节晶片各部分的温度。

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