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51. 发明申请

US20070230396A1 Wireless base station and wireless terminal 审中-公开
标题翻译：无线基站和无线终端
公开(公告)号：US20070230396A1
公开(公告)日：2007-10-04
申请号：US11503755
申请日：2006-08-14
申请人： Masahiro Watanabe
发明人： Masahiro Watanabe
IPC分类号： H04Q7/00
CPC分类号： H04L25/0212 , H04L2027/0065
摘要： A wireless base station receiving packet signals at every timeslot from a plurality of wireless terminals, has a calculating unit calculating, from one packet signal, a parameter used for a process of demodulating the packet signal, a storage unit stored with the parameter, and an averaging processing unit calculating, when executing the demodulating process of the packet signal at a certain timeslot with respect to one of the plurality of wireless terminals, an average value from the parameter obtained from the packet signal and from the parameters stored in the storage unit and obtained from the packet signals at one or more timeslots allocated to one of the plurality of wireless terminals and discontinuous from the certain timeslot, and outputting the average value as the parameter used for the demodulating process.
摘要翻译：从多个无线终端在每个时隙接收分组信号的无线基站具有从一个分组信号计算用于解调分组信号的处理的参数的计算单元，存储有该参数的存储单元，以及平均处理单元，在从所述分组信号得到的参数和从所述存储单元中存储的参数中获得的参数的平均值执行对于所述多个无线终端中的一个无线终端中的一个时隙的分组信号的解调处理时，从分配给所述多个无线终端之一的一个或多个时隙中的分组信号获得并且从所述特定时隙不连续，并输出所述平均值作为用于解调处理的参数。

52. 发明授权

US07266235B2 Pattern inspection method and apparatus 有权
标题翻译：图案检验方法及装置
公开(公告)号：US07266235B2
公开(公告)日：2007-09-04
申请号：US09986577
申请日：2001-11-09
申请人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
发明人： Takashi Hiroi , Masahiro Watanabe , Chie Shishido , Aritoshi Sugimoto , Maki Tanaka , Hiroshi Miyai , Asahiro Kuni , Yasuhiko Nara
IPC分类号： G60K9/00
CPC分类号： G01N21/9501 , G01N21/956 , G01N2021/8854 , G01N2021/8861 , G01N2021/8864 , G01R31/311 , G03F1/86 , G06T1/0007 , G06T7/0002 , G06T7/001 , G06T2200/24 , G06T2207/10061 , G06T2207/30148 , H01J37/222 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/24592 , H01J2237/28
摘要： A pattern inspection method in which an image can be detected without an image detection error caused by an adverse effect to be given by such factors as ions implanted in a wafer, pattern connection/non-connection, and pattern edge formation. A digital image of an object substrate is attained through microscopic observation thereof, the attained digital image is examined to detect defects, while masking a region pre-registered in terms of coordinates, or while masking a pattern meeting a pre-registered pattern, and an image of each of the defects thus detected is displayed. Further, each of the defects detected using the digital image attained through microscopic observation is checked to determine whether its feature meets a pre-registered feature or not. Defects having a feature that meets the pre-registered feature are so displayed that they can be turned on/off, or they are so displayed as to be distinguishable from the other defects.
摘要翻译：图案检查方法，其中可以检测图像，而不会由于植入在晶片中的离子，图案连接/非连接和图案边缘形成等因素所引起的不利影响而引起图像检测误差。通过显微镜观察目标基板的数字图像，检查所获得的数字图像以检测缺陷，同时掩蔽预先登记的区域上的坐标，或者在掩蔽满足预先注册的图案的图案的同时，显示由此检测到的每个缺陷的图像。此外，检查使用通过显微镜观察获得的数字图像检测到的每个缺陷，以确定其特征是否满足预先注册的特征。具有满足预注册特征的特征的缺陷被显示为可以打开/关闭，或者它们被显示为与其他缺陷区分开。

53. 发明申请

US20070195316A1 Pattern defect inspection method and its apparatus 失效
公开(公告)号：US20070195316A1
公开(公告)日：2007-08-23
申请号：US11785432
申请日：2007-04-17
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01N21/00
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.

54. 发明授权

US07236856B2 Operation-assisting system and operation-assisting computer program 有权
公开(公告)号：US07236856B2
公开(公告)日：2007-06-26
申请号：US11506872
申请日：2006-08-21
申请人： Keiko Abe , Yasushi Harada , Masahiro Watanabe , Shouji Matsuzaki , Shinichirou Nakanami , Noriyuki Murakoshi
发明人： Keiko Abe , Yasushi Harada , Masahiro Watanabe , Shouji Matsuzaki , Shinichirou Nakanami , Noriyuki Murakoshi
IPC分类号： G05D11/00
CPC分类号： G06Q10/06 , F01K13/02 , F01K17/025 , G06Q50/06 , Y02E20/14 , Y02P80/11
摘要： An operation assisting system enhances the operator's willingness to participate in energy-saving efforts. The operation assisting system stores information about the actual operation of operated equipment carried out by the operator, evaluates the stored operation information, and displays the results of evaluation. The evaluation results relate to the cost concerning the operated equipment, the cost of supplying energy to the operation target facility, the cost concerning the operated equipment, the amount of emission of carbon dioxide, nitride oxide, and global warming substances, the amount of primary energy consumption, the crude oil-converted amount of energy consumption, the amount of excess or shortage of supply of energy, or electric power quality.

55. 发明授权

US07205549B2 Pattern defect inspection method and its apparatus 有权
标题翻译：图案缺陷检查方法及其装置
公开(公告)号：US07205549B2
公开(公告)日：2007-04-17
申请号：US10765920
申请日：2004-01-29
申请人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
发明人： Minoru Yoshida , Shunji Maeda , Hidetoshi Nishiyama , Masahiro Watanabe
IPC分类号： G01J1/42
CPC分类号： G01N21/8806 , G01N21/956
摘要： The pattern defect inspection apparatus and its method of the present invention comprises: a recipe setting unit for setting an inspection recipe and/or a review recipe; an illumination optical system including: a laser light source for emitting ultraviolet laser light; a quantity-of-light adjusting unit for adjusting a quantity of the ultraviolet laser light emitted from the laser light source; and an illumination range forming unit for forming on a sample an illumination range of the ultraviolet laser light; a coherence reducing system; and a detection optical system including: a condensing optical system; a diffracted-light control optical system; and a detecting unit.
摘要翻译：本发明的图案缺陷检查装置及其方法包括：配方设定单元，用于设定检查食谱和/或检查食谱; 一种照明光学系统，包括：用于发射紫外线激光的激光源; 光量调节单元，用于调节从激光光源发射的紫外激光的量; 以及照明范围形成单元，用于在样品上形成紫外激光的照明范围; 一致性降低系统; 以及检测光学系统，包括：聚光光学系统; 衍射光控制光学系统; 和检测单元。

56. 发明申请

US20070068162A1 Control system and control method for cogeneration system 审中-公开
标题翻译：热电联产系统控制系统及控制方法
公开(公告)号：US20070068162A1
公开(公告)日：2007-03-29
申请号：US11529382
申请日：2006-09-29
申请人： Akiyoshi Komura , Masahiro Watanabe
发明人： Akiyoshi Komura , Masahiro Watanabe
IPC分类号： F01B21/04
CPC分类号： F24D12/02 , F24H2240/00 , Y02B30/14 , Y02E20/14
摘要： A control system for cogeneration system provides operation combination calculating means which calculates the combination of operations capable of keeping the voltage of the distribution line within a predetermined tolerance within voltage tolerance based on following (1)-(3). (1) the predicted value of the electric power demand of each customer calculated by electric power demand predicted value calculating means; (2) the impedance of the distribution line recorded by distribution line information recording means; and (3) the combination of cogeneration systems to be operated, as calculated by operation combination calculating means.
摘要翻译：一种用于热电联产系统的控制系统提供操作组合计算装置，其基于以下（1） - （3）计算能够将分配线的电压保持在预定公差内的电压容差内的操作组合。（1）由电力需求预测值计算单元计算的每个客户的电力需求的预测值; （2）由配线信息记录装置记录的配线的阻抗; 和（3）由操作组合计算装置计算的要运行的热电联产系统的组合。

57. 发明授权

US07127098B2 Image detection method and its apparatus and defect detection method and its apparatus 有权
公开(公告)号：US07127098B2
公开(公告)日：2006-10-24
申请号：US10242362
申请日：2002-09-13
申请人： Atsushi Shimoda , Masahiro Watanabe , Syunji Maeda , Hiroshi Goto , Tadashi Suzuki
发明人： Atsushi Shimoda , Masahiro Watanabe , Syunji Maeda , Hiroshi Goto , Tadashi Suzuki
IPC分类号： G06K9/00 , H01L27/00 , G01J1/42 , G01B11/30
CPC分类号： G02B21/245 , G01N21/95684 , G06T7/0002 , G06T7/001 , G06T7/571 , G06T2207/30148
摘要： The present invention provides an image detection system capable of picking up a high resolution image of the surface condition of a circuit pattern-formed wafer without being affected by steep pattern steps, discontinuous reflectance distributions and optically transparent substances which are formed after resist patterns are formed and removed. A defect detection apparatus using such an image detection apparatus is also provided by the invention. The present invention is implemented by a configuration comprising a scanning stage having a sample mounted thereon, an image pickup system for picking up a surface image of the sample, height detection means for detecting the surface height of the sample at plural points including two points which are respectively on the opposite sides of the image pickup position in the scanning direction, sample height calculation means for calculating the height of the sample at the image pickup position by using the detected heights and focusing means for focusing the image pickup system by using the calculated sample height.

58. 发明授权

US07098132B2 Method of manufacturing flexible wiring board 有权
标题翻译：柔性电路板制造方法
公开(公告)号：US07098132B2
公开(公告)日：2006-08-29
申请号：US11087211
申请日：2005-03-23
申请人： Keiichi Naitoh , Toshihiro Shinohara , Masahiro Watanabe
发明人： Keiichi Naitoh , Toshihiro Shinohara , Masahiro Watanabe
IPC分类号： H01L21/44
CPC分类号： H05K3/423 , H05K1/0393 , H05K3/0017 , H05K3/06 , H05K3/061 , H05K3/421 , H05K3/4652 , H05K2201/0355 , H05K2201/0394 , H05K2201/09563 , H05K2201/096 , H05K2203/0353 , H05K2203/0554 , H05K2203/0733 , H05K2203/1461 , H05K2203/1476 , Y10T29/49126 , Y10T29/49155 , Y10T29/49156 , Y10T29/49165
摘要： In the present invention, a reference conductive layer and a first surface conductive layer are respectively provided on a surface and a back face of a first base film. The first base film includes a first via hole penetrating the first surface conductive layer. After a first electroless plating layer and a first conductive material are sequentially grown on a surface of the first base film, a first coating conductive layer composed of the first electroless plating layer, the first conductive material and the first surface conductive layer, is etched to have a reduced thickness. Then, the first coating conductive layer is patterned to form a first wiring layer. In this manner, a desired pattern width can be obtained even in the case where the first coating conductive layer is patterned by isotropic etching such as wet etching.
摘要翻译：在本发明中，在第一基膜的表面和背面上分别设置参考导电层和第一表面导电层。第一基膜包括贯穿第一表面导电层的第一通孔。在第一基底膜的表面上依次生长第一化学镀层和第一导电材料之后，将由第一化学镀层，第一导电材料和第一表面导电层构成的第一涂层导电层蚀刻到具有减小的厚度。然后，将第一涂层导电层图案化以形成第一布线层。以这种方式，即使在通过诸如湿蚀刻的各向同性蚀刻对第一涂层导电层进行图案化的情况下，也可以获得期望的图案宽度。

59. 发明授权

US07092348B2 Optical recording apparatus capable of changing the length of synchronization portions 有权
标题翻译：能够改变同步部分的长度的光学记录装置
公开(公告)号：US07092348B2
公开(公告)日：2006-08-15
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/24 , G11B5/09
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

60. 发明授权

US07084990B2 Method and its apparatus for measuring size and shape of fine patterns 有权
公开(公告)号：US07084990B2
公开(公告)日：2006-08-01
申请号：US10372270
申请日：2003-02-25
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01B11/03
CPC分类号： G01B11/02 , G01B11/24
摘要： In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and scattered light intensity distributions corresponding to the individual profiles are determined through calculation to form a scattered light library, thereby forming a profile library consisting of the profile matrix and scattered light library. A scattered light intensity distribution of an actually measured pattern is compared with the scattered light intensity distributions of the scattered light library and a profile of profile matrix corresponding to a scattered light intensity distribution of scattered light library having the highest coincidence is determined as a three-dimensional shape of the actually measured pattern.

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