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51. 发明专利

JP2009117772A Treatment device and treatment method for to-be-treated object 审中-公开
标题翻译：用于待处理物体的处理装置和处理方法
公开(公告)号：JP2009117772A
公开(公告)日：2009-05-28
申请号：JP2007292246
申请日：2007-11-09
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a treatment device and a treatment method for a to-be-treated object capable of suppressing the diffusion of gas from liquid without sealing the liquid.
SOLUTION: After the to-be-treated object 9 is soaked in liquid 8 in a reservoir 1 as shown in a second figure, a valve 3a and a valve 5a are opened, and a valve 6a and a valve 4a are closed. Thereby, liquid 7 supplied through liquid supplying piping 3 to the reservoir 1 floods from an opening 1a of the reservoir 1 and is reserved in a sub-reservoir 2, and a liquid level is raised up to a connection height of piping 5 as shown in a third figure. Then, as shown in a fourth figure, the valve 3a, the valve 6a and the valve 4a are opened. Thereby, the liquid 7 in the sub-reservoir 2 is discharged through liquid discharging piping 6, the liquid level in the sub-reservoir 2 is gradually lowered, and balls 7 which have existed above the opening 1a are soon inserted in the reservoir 1. In this process, the balls 7 densely float on the liquid surface of the reservoir 1 and the sub-reservoir 2, so that the diffusion of the gas to the atmosphere from the liquid surface is suppressed.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种能够抑制气体从液体扩散而不密封液体的待处理物体的处理装置和处理方法。解决方案：待处理物体9如图二所示浸入储液器1中的液体8中后，打开阀3a和阀5a，阀6a和阀4a关闭。由此，通过液体供给配管3供给到储存器1的液体7从储存器1的开口部1a溢出并被保留在副储存器2中，并且将液面升高到配管5的连接高度，如第三个数字。然后，如第四图所示，阀3a，阀6a和阀4a打开。因此，副储存器2中的液体7通过液体排放管道6排出，副贮存器2中的液面逐渐降低，并且已经存在于开口1a上方的球7很快插入到储存器1中。在该过程中，球7密集地浮在储存器1和副储存器2的液面上，从而抑制气体从液面向大气的扩散。版权所有（C）2009，JPO＆INPIT

52. 发明专利

JP2007266495A Cleaning system 有权
标题翻译：清洁系统
公开(公告)号：JP2007266495A
公开(公告)日：2007-10-11
申请号：JP2006092114
申请日：2006-03-29
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI , NAGAI TATSUO , IKEMIYA NORITO , YAMAKAWA HARUYOSHI
IPC分类号： H01L21/304 , C25B1/28
摘要： PROBLEM TO BE SOLVED: To provide a cleaning system which repeats electrolyzation and cleaning by circulating a cleaning liquid to cut down the running cost.
SOLUTION: This cleaning system comprises cleaning liquid lines 1, 2 for circulating a heated cleaning liquid via a cleaner 10 for cleaning an object 100 to be cleaned and electrolytic solution lines 7, 7a, 7b, 1, 6 for circulating an electrolytic solution via an electrolytic reactor 30 for passing and electrolyzing the target liquid. The cleaning and electrolytic solution lines have a mixed common line 1 which involves a diffluence in a downstream of the cleaner and a confluence of the downstream of the electrolytic reactor for the electrolytic solution in the upstream or downstream of the cleaner and lies in the upstream of the diffluence. In this way, the amount of cleaning liquid to be heated and that to be electrolyzed are both decreased without negating cleaning effects, resulting in running cost reduction.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种清洁系统，其通过循环清洁液体来重复进行电解和清洁以降低运行成本。解决方案：该清洁系统包括清洁液体管线1,2，用于通过清洁器10循环加热的清洁液体，以清洁待清洁的物体100和用于循环电解液的电解液管线7,7a，7b，1,6 溶液经由用于使目标液体通过和电解的电解反应器30。清洗和电解液管线具有混合公共管线1，其包括在清洁器的下游处的分流和用于电解液的下游的电解反应器的下游，用于在清洁器的上游或下游的电解液，并且位于上游分流。以这种方式，待加热清洁液体和被电解的液体量都减少，而不影响清洁效果，导致运行成本降低。版权所有（C）2008，JPO＆INPIT

53. 发明专利

JP2004091224A Recovery apparatus of fluorine aqueous solution or hydrofluoric acid aqueous solution, its recovery method, and circulating and using system of the same 有权
公开(公告)号：JP2004091224A
公开(公告)日：2004-03-25
申请号：JP2002251550
申请日：2002-08-29
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI
IPC分类号： B01D61/44 , B01D19/00 , C01B7/19 , C01B7/20 , C02F1/20 , C02F1/42 , C02F1/44 , C02F1/469 , C02F1/58 , C02F9/00 , C23G1/36
摘要： PROBLEM TO BE SOLVED: To provide a method for purifying and recovering a fluorine aqueous solution or a hydrofluoric acid aqueous solution of high purity from fluorine-containing waste water or hydrofluoric acid-containing waste water and to provide a system of circulating and using the recovered fluorine aqueous solution or hydrofluoric acid aqueous solution. SOLUTION: The apparatus is equipped with a purifying means (electrodialysis apparatus 22) to purify fluorine-containing waste water or hydrofluoric acid-containing waste water (4) to extract fluorine concentrated water (24) and with an impurity removing means (filtration means 42) to remove impurities from the fluorine concentrated water obtained by the purifying means. Thus, fluorine concentrated water is extracted from the fluorine-containing waste water or hydrofluoric acid-containing waste water to remove impurities. COPYRIGHT: (C)2004,JPO

54. 发明专利

JP2004033817A Chemical liquid supply apparatus and washing water manufacturing apparatus 有权
公开(公告)号：JP2004033817A
公开(公告)日：2004-02-05
申请号：JP2002190789
申请日：2002-06-28
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： MORITA HIROSHI
IPC分类号： B08B3/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid supply apparatus capable of rapidly changing over the injection or stop of a chemical liquid, and a washing water manufacturing apparatus capable of manufacturing a plurality of kinds of washing waters in which different chemical liquids are injected by rapidly changing over.
SOLUTION: In the chemical liquid supply apparatus for injecting a chemical liquid in main piping through which a raw material liquid flows, a chemical liquid injection valve, a chemical liquid injection pipe and back flow liquid discharge pipe are provided. The chemical liquid injection valve is opened when the chemical liquid is injected to inject the chemical liquid in the main pipe from the chemical liquid injection pipe. The chemical liquid injection valve is closed when the injection of the chemical liquid is stopped to allow the raw material liquid to flow backward from the main pipe to discharge the chemical liquid present between the main pipe and the chemical liquid injection valve through the back flow liquid discharge pipe. Further, the chemical liquid supply device is provided to the washing water manufacturing apparatus and the chemical liquid is injected in the main pipe through which the raw material liquid flows.
COPYRIGHT: (C)2004,JPO

55. 发明专利

JP2013111537A Method and device for cleaning equipment 审中-公开
标题翻译：清洁设备的方法和装置
公开(公告)号：JP2013111537A
公开(公告)日：2013-06-10
申请号：JP2011260554
申请日：2011-11-29
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： B08B9/02 , B08B3/04
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for cleaning equipment capable of sufficiently cleaning the cleaning equipment in a short time.SOLUTION: After ultrapure water is made to flow from an ultrapure water line 2 to pipes 3, 5 and 8, a semiconductor cleaning machine 10, a pipe 15 and a circulation water tank 17, the water in the circulation water tank 17 is circulated through a circulation pump 20 and a pipe 21, and a chemical is added from chemical tanks 11-13. The main pipes, the chemical tanks 11-13, the circulation water tank 17, columns 30 and 33, and a filter 6 are arranged in a casing 50 and are unitized.
摘要翻译：要解决的问题：提供一种能够在短时间内清洁清洁设备的清洁设备的方法和装置。解决方案：超纯水从超纯水管2流到管3,5,5时，半导体清洗机10，管15和循环水箱17，循环水箱17中的水通过循环泵20和管道21循环，并且从化学罐11-13添加化学品。主管道，化学池11-13，循环水箱17，立柱30和33以及过滤器6布置在壳体50中并被组合。版权所有（C）2013，JPO＆INPIT

56. 发明专利

JP2010129590A Substrate cleaning method and electrostatic charging suppression effect monitor 审中-公开
标题翻译：基板清洁方法和静电充电抑制效应监视器
公开(公告)号：JP2010129590A
公开(公告)日：2010-06-10
申请号：JP2008299669
申请日：2008-11-25
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI
IPC分类号： H01L21/304 , B08B3/08
摘要： PROBLEM TO BE SOLVED: To easily and accurately monitor electrostatic charging suppression effect by a cleaning liquid when a substrate is cleaned with the liquid having higher conductivity than pure water so as to prevent electrostatic charging of the substrate. SOLUTION: A substrate cleaning method includes portioning out part of the cleaning liquid, bringing it into contact with a model piece of the same material with the substrate to be cleaned, and measuring the electrostatic potential of the model piece to monitor an electrostatic charging state of the substrate. An electrostatic charging suppression effect monitor includes: a liquid contacting means for bringing the cleaning liquid into contact with the model piece of the same material with the substrate to be cleaned; and an electrostatic potential measuring means for measuring the electrostatic potential of the model piece brought into contact with the cleaning liquid by the liquid contacting means. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了容易且准确地监测当用比纯水更高的导电性的液体清洗基板时清洁液体的静电充电抑制效果，以防止基板的静电充电。解决方案：一种基板清洗方法，包括分离清洗液的一部分，使其与待清洗的基板与相同材料的模型件接触，并测量模型件的静电电位以监测静电基板的充电状态。静电充电抑制效果监视器包括：液体接触装置，用于使清洗液体与待清洁的基板与相同材料的模型片接触; 以及静电电位测量装置，用于通过液体接触装置测量与清洁液体接触的模型件的静电电位。版权所有（C）2010，JPO＆INPIT

57. 发明专利

JP2009219995A Gas-dissolved water supply system 有权
标题翻译：气体溶解水供应系统
公开(公告)号：JP2009219995A
公开(公告)日：2009-10-01
申请号：JP2008066269
申请日：2008-03-14
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI , KAMETANI SHIGEJI
IPC分类号： B08B3/08 , H01L21/304
CPC分类号： C02F1/68 , C02F1/66 , C02F1/685 , C02F1/727 , C02F1/74
摘要： PROBLEM TO BE SOLVED: To provide a gas-dissolved water supply system which can efficiently produce gas-dissolved water of a high concentration and can circulate and supply the water to a use point.
SOLUTION: Waste water (or rinsing waste water) after washing a material to be washed with gas (oxygen)-dissolved water is stored into a storage tank 1 via a pipe 15, and make-up water is supplied via a make-up water pipe 1a. Water in the storage tank 1 is fed to a purifying device 4 via a forced feed pump 2 and a heat-exchanger 3 for keeping water temperature constant. Water wherein foreign matters are removed by the purifying device 4 is fed to a degassing device 6 via a flow meter 5. Thereafter, gas is dissolved into the water by a gas dissolving device 7, chemical is added thereto and, thereafter, the water is fed to a use point.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够有效地生产高浓度的溶解溶解水的气体溶解的供水系统，并且可以将水循环并供给到使用点。
解决方案：用气体（氧）溶解的水洗涤待洗涤物质后的废水（或漂洗废水）通过管道15储存在储罐1中，补给水通过制造水管1a。储罐1中的水通过强制供给泵2和用于保持水温恒定的热交换器3供给到净化装置4。由净化装置4除去异物的水通过流量计5供给到脱气装置6.然后，通过气体溶解装置7将气体溶解在水中，向其中加入化学物质，喂给使用点。版权所有（C）2010，JPO＆INPIT

58. 发明专利

JP2009044042A Immersing type processing apparatus of object to be processed, and method of processing the object 有权
标题翻译：要处理的对象类型处理装置，以及处理对象的方法
公开(公告)号：JP2009044042A
公开(公告)日：2009-02-26
申请号：JP2007209204
申请日：2007-08-10
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , MORITA HIROSHI , KUROBE HIROSHI , KAMETANI SHIGEJI
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide an immersing type processing apparatus and method which can suppress a gas from dispersing into the atmosphere outside the processing apparatus when extracting the object from a liquid.
SOLUTION: In the processing apparatus and method, the air blown from an air blower 5 is sent to first and second gas jetting nozzles 4a, 5a. The airs jetted out respectively from the first and second gas jetting nozzles 4a, 5a are sucked respectively into first and second gas sucking nozzles 4b, 5b so as to form two sets of air curtains in a releasing portion 1a. When extracting the object 32 from the releasing portion 1a to the outside of a container 1, a liquid 31 left on the whole surface of the object 32 is blown away enough by the airs blown down respectively from the first and second gas jetting nozzles 4a, 5a.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种浸渍型处理装置和方法，当从液体中提取物体时，可以抑制气体分散到处理装置外部的大气中。解决方案：在处理设备和方法中，从吹风机5吹出的空气被送到第一和第二气体喷射喷嘴4a，5a。分别从第一和第二气体喷射喷嘴4a，5a喷出的空气被分别吸入第一和第二气体吸入喷嘴4b，5b，以便在释放部分1a中形成两组气帘。当将物体32从释放部分1a提取到容器1的外部时，残留在物体32的整个表面上的液体31被分别从第一和第二气体喷射喷嘴4a吹出的空气吹走， 5a。版权所有（C）2009，JPO＆INPIT

59. 发明专利

JP2008053484A Persulfuric acid cleaning system 有权
标题翻译：全自动清洁系统
公开(公告)号：JP2008053484A
公开(公告)日：2008-03-06
申请号：JP2006228614
申请日：2006-08-25
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： YAMAKAWA HARUYOSHI , MORITA HIROSHI , NAGAI TATSUO
IPC分类号： H01L21/304 , B01D61/44 , B08B3/08 , C02F1/42 , C02F1/469 , C02F1/72 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a cleaning system which can effectively remove an organic contaminant or the like deposited on such an electronic material substrate as a silicon wafer with a cleaning solution and can prolong the quality life of the cleaning solution.
SOLUTION: The cleaning system comprises a cleaning bath 1 for a cleaning target material with a cleaning solution 16 containing a sulfuric acid solvent, a means 20 for preparing a persulfuric acid solution, and a persulfuric acid adding means (switching valve 14, persulfuric acid adding line 15) for adding the cleaning solution to the persulfuric acid solution. It is desirable that the persulfuric acid solution preparing means 20 comprise an electrodialysis device suitably using a persulfate solution, the cleaning solution be adjusted at a temperature of 80 to 200°C, and the persulfuric acid be kept at a concentration of 8 to 17 M. Since the persulfuric acid solution is added to the sulfuric acid solvent as the cleaning solution, a high level of cleaning can be attained and the throughput of a cleaning process can be improved. Further, the life of the cleaning solution can be prolonged.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种清洁系统，其可以用清洁溶液有效地去除沉积在诸如硅晶片的电子材料基板上的有机污染物等，并且可以延长清洁溶液的质量寿命。解决方案：清洁系统包括用于清洁目标材料的清洁浴1，其具有含有硫酸溶剂的清洗溶液16，用于制备过硫酸溶液的装置20和过硫酸添加装置（切换阀14，过硫酸添加管线15），用于将清洗溶液加入到过硫酸溶液中。过硫酸溶液制备装置20最好包括适合使用过硫酸盐溶液的电渗析装置，将清洗液调节至80至200℃，并将过硫酸保持在8至17M的浓度由于将硫酸溶液作为清洗液添加到硫酸溶剂中，所以可以实现高水平的清洗，并且可以提高清洗处理的生产量。此外，可以延长清洁溶液的寿命。版权所有（C）2008，JPO＆INPIT

60. 发明专利

JP2007319843A Gas dissolving module 审中-公开
标题翻译：气体解析模块
公开(公告)号：JP2007319843A
公开(公告)日：2007-12-13
申请号：JP2006156404
申请日：2006-06-05
申请人： Kurita Water Ind Ltd , 栗田工業株式会社
发明人： TOKOSHIMA HIROTO , KAMETANI SHIGEJI , MORITA HIROSHI
IPC分类号： B01D53/22 , B01F1/00 , B01F15/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a gas dissolving module which can stably discharge a condensate collected in a gas chamber over a long period, is free from troubles accompanying the discharge of the condensate, and can produce gas-dissolved water with a desired concentration.
SOLUTION: The gas dissolving module is divided into a water chamber and the gas chamber by a gas-permeable membrane. Water to be treated is fed to the water chamber, and gas to be dissolved in the water to be treated is fed to the gas chamber. One end of a condensate discharge pipe is made to communicate with the gas chamber, and the other end is connected to a pressure reducing device without a mechanical driving part, for example, an aspirator, to discharge the condensate collected in the gas chamber.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够长时间稳定地排出收集在气室中的冷凝物的气体溶解组件，没有伴随排出冷凝物的问题，并且可以产生气体溶解的水，所需浓度。解决方案：气体溶解模块通过透气膜分为水室和气室。待处理的水被送入水室，待溶解在被处理水中的气体被供给至气室。使冷凝水排出管的一端与气室连通，另一端与没有机械驱动部件例如吸气器的减压装置连接，以排出收集在气室中的冷凝物。版权所有（C）2008，JPO＆INPIT

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