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51. 发明授权

US09085758B2 Method of culturing vascular smooth muscle cells, culture device and medical material obtained by the culture 有权
公开(公告)号：US09085758B2
公开(公告)日：2015-07-21
申请号：US13613206
申请日：2012-09-13
申请人： Keiichi Miyamoto , Takashi Horiuchi
发明人： Keiichi Miyamoto , Takashi Horiuchi
IPC分类号： C12N5/00 , A01N1/00 , C12N5/071 , A61L27/22 , A61L27/38 , A61L27/50 , C12M1/12 , A61K35/12
CPC分类号： C12N5/0691 , A61K35/12 , A61L27/227 , A61L27/3826 , A61L27/383 , A61L27/3895 , A61L27/507 , C12M25/02 , C12N2533/50
摘要： There is provided a method for culturing vascular smooth muscle cells while maintaining their normal function, and a culture device and regenerative medical material for the same. The method takes advantage of vascular smooth muscle cell recognition of elastin as an extracellular matrix. The invention provides a method for culturing vascular smooth muscle cells on elastin, a culture device having elastin anchored on the cell-growing surface, a culture device wherein the cell-growing surface is composed of an elastin molded article, and medical materials obtained by culturing vascular smooth muscle cells using such culture devices.

52. 发明授权

US08755025B2 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method 有权
标题翻译：基板输送装置及方法，曝光装置及曝光方法以及装置的制造方法
公开(公告)号：US08755025B2
公开(公告)日：2014-06-17
申请号：US12929591
申请日：2011-02-02
申请人： Nobuyoshi Tanno , Takashi Horiuchi
发明人： Nobuyoshi Tanno , Takashi Horiuchi
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/7075 , G03F7/70925 , H01L21/67051 , H01L21/68707
摘要： A method for exposing a substrate includes holding the substrate on a substrate holding member, irradiating, via a liquid, a light beam to the substrate on the substrate holding member, and removing, after the exposure of the substrate via the liquid, a liquid remained on the substrate before supporting the substrate by a transferring member. The transferring member transfers the exposed substrate from the substrate holding member to outside of the substrate holding member.
摘要翻译：曝光基板的方法包括将基板保持在基板保持部件上，经由液体将光束照射在基板保持部件上的基板上，在基板经由液体曝光后，除去液体残留在通过转印构件支撑衬底之前在衬底上。转印构件将暴露的基板从基板保持构件转移到基板保持构件的外部。

53. 发明授权

US08536862B2 Apparatus and method of obtaining field by measurement 有权
标题翻译：通过测量获得场的装置和方法
公开(公告)号：US08536862B2
公开(公告)日：2013-09-17
申请号：US12594050
申请日：2008-03-28
申请人： Kenjiro Kimura , Kei Kobayashi , Hirofumi Yamada , Kazumi Matsushige , Takashi Horiuchi , Nobuo Satoh , Akifumi Nakai
发明人： Kenjiro Kimura , Kei Kobayashi , Hirofumi Yamada , Kazumi Matsushige , Takashi Horiuchi , Nobuo Satoh , Akifumi Nakai
IPC分类号： G01R33/02
CPC分类号： G01R33/10 , G01Q30/04 , G01Q60/50 , G01R33/0206 , G01R33/0385
摘要： Above a sample (9) having magnetic domains, a distribution of magnetic force in a measurement plane (91) is obtained as a magnetic force image using a MFM, an auxiliary magnetic force image is obtained by performing measurement in a measurement plane (92) away from the measurement plane (91) by a distance d, and a difference between them is divided by the distance d to obtain a magnetic force gradient image. The magnetic force image and the auxiliary magnetic force image are Fourier transformed and substituted into a three-dimensional field obtaining equation derived from a general solution of the Laplace equation, and the three-dimensional field indicating the magnetic force is obtained. A state of the magnetic domains at the surface (93) of the sample (9) can be obtained with high accuracy by obtaining the three-dimensional field.
摘要翻译：在具有磁畴的样品（9）之上，通过使用MFM获得测量平面（91）中的磁力分布作为磁力图像，通过在测量平面（92）中进行测量来获得辅助磁力图像，离开测量平面（91）距离d，并且将它们之间的差除以距离d以获得磁力梯度图像。将磁力图像和辅助磁力图像进行傅立叶变换并代入由拉普拉斯方程的一般解导出的三维场获得方程式，得到表示磁力的三维场。通过获得三维场，可以高精度地获得样品（9）的表面（93）处的磁畴的状态。

54. 发明授权

US08345216B2 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权
公开(公告)号：US08345216B2
公开(公告)日：2013-01-01
申请号：US11398572
申请日：2006-04-06
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.

55. 发明申请

US20120201646A1 SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理方法
公开(公告)号：US20120201646A1
公开(公告)日：2012-08-09
申请号：US13449409
申请日：2012-04-18
申请人： Hiromitsu Sakaue , Takashi Horiuchi
发明人： Hiromitsu Sakaue , Takashi Horiuchi
IPC分类号： H01L21/677
CPC分类号： H01L21/67748 , H01L21/67742 , H01L21/67778 , H01L21/67781 , Y10S414/137
摘要： A substrate processing method includes transferring unprocessed substrates to a first substrate holder by way of lowering a first substrate accommodation unit and loading the unprocessed substrates into a processing chamber in sequence while sequentially rotating a substrate mounting table at a preset angle in one direction, performing a preset process on substrates in a batch-type, and unloading processed substrates from the processing chamber by the first substrate holder after a completion of the preset process, transferring the processed substrates into the first substrate accommodation unit from the first substrate holder by way of raising the first substrate accommodation unit, transferring unprocessed substrates to a second substrate holder by way of lowering a second substrate accommodation unit and loading the unprocessed substrate into the processing chamber in sequence while sequentially rotating the substrate mounting table at the preset angle in the another direction.
摘要翻译：基板处理方法包括：通过降低第一基板容纳单元并将未处理的基板依次装载到处理室中来将未处理的基板传送到第一基板保持器，同时沿着一个方向以预设角度顺序旋转基板安装台，执行在预定处理完成之后，通过第一基板保持器从处理室中卸载经处理的基板，从第一基板保持器将加工的基板转移到第一基板收纳单元中，通过提升第一基板容纳单元，通过降低第二基板容纳单元将未处理的基板传送到第二基板保持器，并且将未处理的基板顺序地装载到处理室中，同时沿着另一个方向以预定角度顺序旋转基板安装台。

56. 发明申请

US20120043062A1 METHOD FOR COOLING OBJECT TO BE PROCESSED, AND APPARATUS FOR PROCESSING OBJECT TO BE PROCESSED 审中-公开
标题翻译：用于冷却待处理物体的方法以及处理对象要处理的装置
公开(公告)号：US20120043062A1
公开(公告)日：2012-02-23
申请号：US13259805
申请日：2010-03-30
申请人： Noritomo Tada , Takashi Horiuchi
发明人： Noritomo Tada , Takashi Horiuchi
IPC分类号： F28F7/00
CPC分类号： H01L21/67109
摘要： Provided is a method for cooling an object to be processed. The cooling method is provided with a step of placing the object in a heated state on a stage, and a step of cooling the object by blowing a cooling gas to a region the near-center region of the object placed on the stage, including the center thereof.
摘要翻译：提供了一种用于冷却被处理物体的方法。该冷却方法具有将物体处于加热状态放置在台架上的步骤，以及通过将冷却气体吹送到放置在台架上的物体的近中心区域的区域来冷却物体的步骤，包括中心。

57. 外观设计

USD590874S1 Paper cartridge for printer 有权
标题翻译：打印机用墨盒
公开(公告)号：USD590874S1
公开(公告)日：2009-04-21
申请号：US29317209
申请日：2008-04-24
申请人： Takashi Horiuchi , Yasunori Nakamura , Yoshikatsu Suito
设计人： Takashi Horiuchi , Yasunori Nakamura , Yoshikatsu Suito

58. 发明申请

US20080087638A1 SELECTIVE-REDEPOSITION SOURCES FOR CALIBRATING A PLASMA PROCESS 失效
标题翻译：用于校准等离子体工艺的选择性还原源
公开(公告)号：US20080087638A1
公开(公告)日：2008-04-17
申请号：US11536758
申请日：2006-09-29
申请人： Jozef Brcka , Rodney L. Robison , Takashi Horiuchi
发明人： Jozef Brcka , Rodney L. Robison , Takashi Horiuchi
IPC分类号： C03C25/68 , G01L21/30 , C03C15/00
CPC分类号： H01J37/3299 , H01J37/32935
摘要： Calibration wafers and methods for calibrating a plasma process performed in a plasma processing apparatus, such as an ionized physical vapor deposition apparatus. The calibration wafer includes one or more selective-redeposition sources that may be used for calibrating a plasma process. The selective-redeposition sources are constructed to promote the redeposition of a controllable and/or measurable amount of material during the plasma process.
摘要翻译：用于校准在诸如电离物理气相沉积装置的等离子体处理装置中进行的等离子体处理的校准晶片和方法。校准晶片包括可用于校准等离子体工艺的一个或多个选择性再沉积源。构建选择性再沉积源以在等离子体工艺期间促进可控和/或可测量的材料的再沉积。

59. 发明授权

US07271819B2 Thermal printer that effectively controls heat buildup 有权
标题翻译：热敏打印机可有效控制热量积聚
公开(公告)号：US07271819B2
公开(公告)日：2007-09-18
申请号：US11092604
申请日：2005-03-29
申请人： Megumi Matsutani , Takashi Horiuchi
发明人： Megumi Matsutani , Takashi Horiuchi
IPC分类号： B41J2/00
CPC分类号： B41J2/38
摘要： A thermal head has heating elements and is movable relative to a printing medium. A pulse application portion applies a drive voltage pulse selectively to the heating elements. A voltage measurement portion measures a head voltage applied to the thermal head. A total-dot counting portion adds a number of dots which are printed from a reference time point, thereby obtaining a total dot count. An adjustment portion adjusts the total dot count based on a predetermined adjustment dot count corresponding to an ambient temperature. A heat-buildup-coefficient storing portion stores a heat buildup coefficient corresponding both to the ambient temperature and to an excess dot count. A pulse-width setting portion sets the width of the drive voltage pulse based on the head voltage and the heat buildup coefficient. A pulse-width correction portion corrects the width of the drive voltage pulse based on the head voltage measured by the voltage measurement portion.
摘要翻译：热敏头具有加热元件并且可相对于打印介质移动。脉冲施加部分选择性地将加热元件施加驱动电压脉冲。电压测量部分测量施加到热敏头的头电压。总点计数部添加从参考时间点打印的多个点，从而获得总点数。调整部根据与环境温度对应的规定的调整点数来调整总点数。积热系数存储部分存储对应于环境温度和多余点数的热积聚系数。脉冲宽度设定部根据磁头电压和发热系数来设定驱动电压脉冲的宽度。脉冲宽度校正部分根据由电压测量部分测量的磁头电压校正驱动电压脉冲的宽度。

60. 发明申请

US20060257553A1 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method 有权
公开(公告)号：US20060257553A1
公开(公告)日：2006-11-16
申请号：US11398572
申请日：2006-04-06
申请人： Atsushi Ohta , Takashi Horiuchi
发明人： Atsushi Ohta , Takashi Horiuchi
IPC分类号： C23C16/52 , B05C11/00
CPC分类号： G03F7/70341 , G03B27/42 , G03D3/00 , G03F7/2041 , G03F7/7075
摘要： A substrate conveyance device that conveys a substrate having been exposed with a pattern image via a projection optical system and a liquid, the substrate conveyance device comprising: a liquid detector that detects the liquid adhering on the substrate.

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