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    • 51. 发明申请
      US20080191264A1 Non-volatile memory devices and methods of operating and fabricating the same 审中-公开
    • Non-volatile memory devices and methods of operating and fabricating the same
    • 非易失性存储器件及其操作和制造方法
    • US20080191264A1
    • 2008-08-14
    • US12010139
    • 2008-01-22
    • Won-Joo Kim , Yoon-dong Park , June-mo Koo , Suk-pil Kim , Tae-hee Lee
    • Won-Joo Kim , Yoon-dong Park , June-mo Koo , Suk-pil Kim , Tae-hee Lee
    • H01L29/00 , H01L21/3205
    • H01L27/115 , H01L27/11521
    • Non-volatile memory devices highly integrated using an oxide based compound semiconductor and methods of operating and fabricating the same are provided. A non-volatile memory device may include one or more oxide based compound semiconductor layers. A plurality of auxiliary gate electrodes may be arranged to be insulated from the one or more oxide based compound semiconductor layers. A plurality of control gate electrodes may be positioned between adjacent pairs of the plurality of auxiliary gate electrodes at a different level from the plurality of auxiliary gate electrodes. The plurality of control gate electrodes may be insulated from the one or more oxide based compound semiconductor layers. A plurality of charge storing layers may be interposed between the one or more oxide based compound semiconductor layers and the plurality of control gate electrodes.
    • 提供了使用基于氧化物的化合物半导体高度集成的非易失性存储器件及其操作和制造方法。 非易失性存储器件可以包括一个或多个基于氧化物的化合物半导体层。 多个辅助栅极电极可以布置成与一个或多个氧化物基化合物半导体层绝缘。 多个控制栅电极可以位于与多个辅助栅极电极不同的多个辅助栅电极的相邻对之间。 多个控制栅电极可以与一个或多个氧化物基化合物半导体层绝缘。 可以在一个或多个氧化物基化合物半导体层和多个控制栅电极之间插入多个电荷存储层。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 52. 发明申请
      US20080025106A1 Unit cell of a non-volatile memory device, a non-volatile memory device and method thereof 有权
    • Unit cell of a non-volatile memory device, a non-volatile memory device and method thereof
    • 非易失性存储器件的单元，非易失性存储器件及其方法
    • US20080025106A1
    • 2008-01-31
    • US11715404
    • 2007-03-08
    • Won-joo Kim , Suk-pil Kim , Jae-woong Hyun , Yoon-dong Park , June-mo Koo
    • Won-joo Kim , Suk-pil Kim , Jae-woong Hyun , Yoon-dong Park , June-mo Koo
    • G11C11/34
    • G11C16/0433 , G11C16/0491 , G11C16/10 , H01L27/115 , H01L27/11521 , H01L27/11524 , H01L27/11568
    • Unit cells of a non-volatile memory device and a method thereof are provided. In an example, the unit cell may include a first memory transistor and a second memory transistor connected to each other in series and further connected in common to a word line, the first and second memory transistors including first and second storage nodes, respectively, the first and second storage nodes configured to execute concurrent memory operations. In another example, the unit cell may include a semiconductor substrate in which first and second bit line regions are defined. first and second storage node layers respectively formed on the semiconductor substrate between the first and second bit line regions, a first pass gate electrode formed on the semiconductor substrate between the first bit line region and the first storage node layer, a second pass gate electrode formed on the semiconductor substrate between the second bit line region and the second storage node layer, a third pass gate electrode formed on the semiconductor substrate between the first and second storage node layers, a third bit line region formed in a portion of the semiconductor substrate under the third pass gate electrode and a control gate electrode extending across the first and second storage node layers. The example unit cells may be implemented within a non-volatile memory device (e.g., a flash memory device), such that the non-volatile memory device may include a plurality of example unit cells.
    • 提供非易失性存储器件的单元电池及其方法。 在一个示例中，单元可以包括串联连接并进一步连接到字线的第一存储晶体管和第二存储晶体管，第一和第二存储晶体管分别包括第一和第二存储节点， 配置为执行并发存储器操作的第一和第二存储节点。 在另一示例中，单元可以包括其中限定了第一和第二位线区域的半导体衬底。 分别形成在第一和第二位线区域之间的半导体衬底上的第一和第二存储节点层，形成在第一位线区域和第一存储节点层之间的半导体衬底上的第一遍栅极电极，形成的第二遍栅极电极 在第二位线区域和第二存储节点层之间的半导体衬底上，形成在第一和第二存储节点层之间的半导体衬底上的第三遍栅极电极，形成在半导体衬底的一部分中的第三位线区域 所述第三通道栅极电极和跨越所述第一和第二存储节点层延伸的控制栅极电极。 示例性单元单元可以在非易失性存储器件（例如，闪存器件）内实现，使得非易失性存储器件可以包括多个示例单位单元。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
    • 56. 发明授权
      US08148767B2 Semiconductor memory devices including recess-type control gate electrodes and methods of fabricating the semiconductor memory devices 失效
    • Semiconductor memory devices including recess-type control gate electrodes and methods of fabricating the semiconductor memory devices
    • 包括凹型控制栅电极的半导体存储器件和制造半导体存储器件的方法
    • US08148767B2
    • 2012-04-03
    • US11709860
    • 2007-02-23
    • Yoon-dong Park , June-mo Koo , Kyoung-lae Cho
    • Yoon-dong Park , June-mo Koo , Kyoung-lae Cho
    • H01L29/788
    • H01L21/28273 , B82Y10/00 , H01L21/28282 , H01L27/115 , H01L27/11521 , H01L27/11568 , H01L29/66825 , H01L29/66833 , H01L29/7881 , H01L29/792 , H01L29/7923
    • A semiconductor memory device includes a semiconductor substrate, a control gate electrode recessed in the semiconductor substrate, a storage node layer interposed between a sidewall of the control gate electrode and the semiconductor substrate, a tunneling insulation layer interposed between the storage node layer and the semiconductor substrate, a blocking insulation layer interposed between the storage node layer and the control gate electrode, and first and second channel regions formed around a surface of the semiconductor substrate to at least partially surround the control gate electrode. The semiconductor memory device may include a plurality of control gate electrodes, storage node layers, tunneling insulation layers, blocking insulation layers, and continuous first and second channel regions. A method of fabricating the semiconductor memory device includes etching the semiconductor substrate to form a plurality of holes, forming the tunneling insulation layers, storage node layers, blocking insulation layers, and control gate electrodes.
    • 半导体存储器件包括半导体衬底，凹入半导体衬底中的控制栅极电极，插在控制栅电极的侧壁和半导体衬底之间的存储节点层，介于存储节点层和半导体衬底之间的隧道绝缘层 衬底，介于存储节点层和控制栅电极之间的阻挡绝缘层，以及形成在半导体衬底的表面周围以至少部分地围绕控制栅电极的第一和第二沟道区。 半导体存储器件可以包括多个控制栅电极，存储节点层，隧道绝缘层，阻挡绝缘层以及连续的第一和第二沟道区。 制造半导体存储器件的方法包括蚀刻半导体衬底以形成多个孔，形成隧道绝缘层，存储节点层，阻挡绝缘层和控制栅电极。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Espacenet 法律信息 同族专利 专利引用
    • 58. 发明申请
      US20090285027A1 Non-volatile memory devices and methods of operating non-volatile memory devices 有权
    • Non-volatile memory devices and methods of operating non-volatile memory devices
    • 非易失性存储器件和操作非易失性存储器件的方法
    • US20090285027A1
    • 2009-11-19
    • US12318651
    • 2009-01-05
    • Tae-hee Lee , Won-joo Kim , June-mo Koo , Tae-eung Yoon
    • Tae-hee Lee , Won-joo Kim , June-mo Koo , Tae-eung Yoon
    • G11C16/04 , G11C16/06 , G11C7/00
    • G11C16/0483 , G11C16/10 , G11C16/3418 , G11C16/3427
    • A non-volatile memory device, which includes a plurality of memory transistors that are coupled with a plurality of bit lines and a plurality of word lines, and methods of operating a non-volatile memory device are provided. A selected bit line for programming and unselected bit lines for preventing programming are determined from the plurality of bit lines. An inhibiting voltage is applied to at least one inhibiting word line chosen from the plurality of word lines. The at least one inhibiting word line includes a word line positioned closest to a string selection line. A programming voltage is applied to a selected word line chosen from the plurality of word lines. Data is programmed into a memory transistor coupled with the selected word line and the selected bit line while preventing data from being programming into memory transistors coupled with the unselected bit line.
    • 提供了包括与多个位线和多个字线耦合的多个存储晶体管的非易失性存储器件以及操作非易失性存储器件的方法。 从多个位线确定用于编程的选择位线和用于防止编程的未选位线。 对从多个字线中选择的至少一个禁止字线施加抑制电压。 至少一个禁止字线包括最靠近字符串选择线定位的字线。 将编程电压施加到从多个字线中选择的选定字线。 数据被编程到与所选择的字线和所选择的位线耦合的存储晶体管中，同时防止数据被编程到与未选位线耦合的存储晶体管中。
    • 基本信息 添加关注 加入工作空间 PDF全文 PDF下载 全文下载 相似专利 双屏查看 权利要求书 说明书全文 Global Dossier Espacenet 法律信息 同族专利 专利引用
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