专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

51. 发明授权

US06647766B2 Device for contacting and/or modifying a surface having a cantilever and a method for production of said cantilever 有权
标题翻译：用于接触和/或改变具有悬臂的表面的装置和用于生产所述悬臂的方法
公开(公告)号：US06647766B2
公开(公告)日：2003-11-18
申请号：US09745273
申请日：2000-12-20
申请人： Michel Despont , Ute Drechsler , Mark I. Lutwyche , Hugo E. Rothuizen , Peter Vettiger
发明人： Michel Despont , Ute Drechsler , Mark I. Lutwyche , Hugo E. Rothuizen , Peter Vettiger
IPC分类号： H01L2100
CPC分类号： B81B1/008 , B81B3/0035 , G11B9/1409 , G11B9/1427 , G11B11/007 , G11B2005/0021
摘要： A device for contacting and/or modifying a surface having a cantilever connected to an almost plane carrier element staying apart from said surface, said cantilever having a tip at its loose end being in close contact to said surface. It is proposed that the cantilever stand out of the plane of said carrier element. Further, a method for producing the cantilever having a tip at its loose end. The device is suitable for thermomechanical writing and thermal readout of binary information, lithographic and imaging techniques, and for surface modification.
摘要翻译：一种用于接触和/或改变表面的装置，其具有连接到与所述表面分开的几乎平面的载体元件的悬臂，所述悬臂在其松动端具有尖端，与所述表面紧密接触。建议悬臂从所述载体元件的平面外突出。此外，一种制造悬臂的方法，其在其松动端具有尖端。该器件适用于二元信息的热机械写入和热读出，光刻和成像技术以及表面改性。

52. 发明授权

US6092422A Mechanical signal producer based on micromechanical oscillators and intelligent acoustic detectors and systems based thereon 失效
标题翻译：基于微机械振荡器和基于其的智能声学检测器和系统的机械信号生成器
公开(公告)号：US6092422A
公开(公告)日：2000-07-25
申请号：US29894
申请日：1998-03-10
申请人： Gerd K. Binnig , Pierre L. Gueret , Heinrich Rohrer , Peter Vettiger
发明人： Gerd K. Binnig , Pierre L. Gueret , Heinrich Rohrer , Peter Vettiger
IPC分类号： A61F11/00 , G01H11/00 , G10L11/02 , G10L15/28 , H04R25/00 , G01D21/00
CPC分类号： G01H11/00
摘要： The present invention concerns mechanical signal processing comprising a mechanical adder as a basic building block. Such a mechanical adder (40), which is a basic element of the present invention, comprises a first micromechanical member (40.1) being sensitive to a first frequency (f.sub.1) and a second micromechanical member (40.2) being sensitive to a second frequency (f.sub.2). The two micromechanical members (40.1, 40.2) are coupled via a linear coupling (41) to provide a superposition (sum) of the two frequencies (f.sub.1 and f.sub.2). Based on the adder, AND-gates and OR-gates can be realized by adding further micromechanical members and appropriate linear and non-linear coupling elements.
摘要翻译： PCT No.PCT / IB95 / 00817 Sec。 371日期1998年3月10日 102（e）1998年3月10日PCT PCT 1995年9月29日PCT公布。公开号WO97 / 13127 日期1997年04月10日本发明涉及机械信号处理，其包括作为基本构建块的机械加法器。作为本发明的基本元件的这种机械加法器（40）包括对第一频率（f1）敏感的第一微机械构件（40.1）和对第二频率敏感的第二微机械构件（40.2） f2）。两个微机械构件（40.1,40.2）经由线性耦合（41）耦合以提供两个频率（f1和f2）的叠加（和）。基于加法器，可以通过添加更多的微机械构件和适当的线性和非线性耦合元件来实现与门和OR门。

53. 发明授权

US6080513A Mask and method for modification of a surface 失效
标题翻译：用于修饰表面的掩模和方法
公开(公告)号：US6080513A
公开(公告)日：2000-06-27
申请号：US072534
申请日：1998-05-04
申请人： Juergen Brugger , Michel Despont , Peter Vettiger
发明人： Juergen Brugger , Michel Despont , Peter Vettiger
IPC分类号： G03F1/00 , G03F9/00
CPC分类号： G03F9/00 , C23C14/042
摘要： A surface of a substrate (3) is to be exposed to a medium (11) directed towards said surface and which modifies said surface. A mask (4) to be used therefor has at least one opening (9) through which said medium (11) is allowed to reach said surface. The opening (9) is located in a protrusion (10) of said mask (4) which is directed versus said surface.
摘要翻译：衬底（3）的表面将暴露于指向所述表面的介质（11）并且修改所述表面。用于其的掩模（4）具有至少一个开口（9），所述介质（11）可以通过所述开口到达所述表面。开口（9）位于所述面罩（4）的与所述表面相对的突起（10）中。

54. 发明授权

US5103493A Improved planar etched mirror facets 失效
标题翻译：改进的平面蚀刻镜面
公开(公告)号：US5103493A
公开(公告)日：1992-04-07
申请号：US669817
申请日：1991-03-15
申请人： Peter L. Buchmann , Peter Vettiger , Otto Voegeli , David J. Webb
发明人： Peter L. Buchmann , Peter Vettiger , Otto Voegeli , David J. Webb
IPC分类号： H01L21/302 , G02B6/122 , H01L21/3065 , H01L27/15 , H01S5/00 , H01S5/02 , H01S5/028 , H01S5/16 , H01S5/22
CPC分类号： H01S5/22 , H01S5/028 , H01S5/16 , H01S5/0202 , H01S5/0203
摘要： A method, and device produced therewith, for improving the planarity of etched mirror facets 18 of integrated optic structures with non-planar stripe waveguides, such as ridge or groove diode lasers or passive devices such as modulators and switches. The curvature of the mirror facet surface at the edges of the waveguide due to topographical, lithographical and etch process effects, causes detrimental phase distortions, and is avoided by widening the waveguide end near the mirror surface thereby shifting the curved facet regions away from the light mode region to surface regions where curvature is not critical.
摘要翻译：一种用于改进具有非平面条纹波导的集成光学结构的蚀刻镜面18（例如脊或沟槽二极管激光器）或无源器件（诸如调制器和开关）的平面度的方法和装置。由于地形，光刻和蚀刻过程效应，波导边缘处的镜面表面的曲率造成有害的相位失真，并且通过加宽靠近镜面的波导端来避免，从而使弯曲的小面区域远离光线模式区域到曲面不重要的表面区域。

55. 发明授权

US4803181A Process for forming sub-micrometer patterns using silylation of resist side walls 失效
标题翻译：使用抗蚀剂侧壁的甲硅烷基化形成亚微米图案的方法
公开(公告)号：US4803181A
公开(公告)日：1989-02-07
申请号：US26799
申请日：1987-03-17
申请人： Peter L. Buchmann , Peter Vettiger , Bart J. Van Zeghbroech
发明人： Peter L. Buchmann , Peter Vettiger , Bart J. Van Zeghbroech
IPC分类号： H01L21/30 , G03F7/40 , H01L21/027 , H01L21/302 , H01L21/3065 , H01L21/265
CPC分类号： G03F7/405 , Y10S148/051 , Y10S148/111 , Y10S148/137 , Y10S438/947 , Y10S438/948 , Y10S438/949 , Y10S438/95
摘要： A process for forming sidewalls for use in the fabrication of semiconductor structures, where the thin, vertical sidewalls are "image transferred" to define sub-micron lateral dimensions.First, a patterned resist profile with substantially vertical edges is formed on a substrate on which the sidewalls are to be created. Then, the profile is soaked in a reactive organometallic silylation agent to silylate the top and the vertical edges of the resist to a predetermined depth, thereby rendering the profile surfaces highly oxygen etch resistant. In a subsequent anisotropic RIE process, the horizontal surfaces of the silylated profile and the unsilylated resist are removed, leaving the silylated vertical edges, that provide the desired free-standing sidewalls, essentially unaffected.
摘要翻译：用于形成用于制造半导体结构的侧壁的方法，其中薄的垂直侧壁被“图像转印”以限定亚微米横向尺寸。首先，在其上将形成侧壁的基板上形成具有基本垂直边缘的图案化抗蚀剂轮廓。然后，将该轮廓浸泡在反应性有机金属硅烷化剂中以将抗蚀剂的顶部和垂直边缘甲硅烷化至预定深度，从而使轮廓表面具有高耐氧蚀刻性。在随后的各向异性RIE过程中，去除了甲硅烷基化曲线和未磺酰化的抗蚀剂的水平表面，留下提供所需的独立侧壁的甲硅烷基化的垂直边缘基本上不受影响。

56. 发明授权

US4732871A Process for producing undercut dummy gate mask profiles for MESFETs 失效
标题翻译：用于生产MESFET的底切伪栅掩模轮廓的工艺
公开(公告)号：US4732871A
公开(公告)日：1988-03-22
申请号：US31648
申请日：1987-03-30
申请人： Peter L. Buchmann , Volker Graf , Peter D. Hoh , Theodor O. Mohr , Peter Vettiger
发明人： Peter L. Buchmann , Volker Graf , Peter D. Hoh , Theodor O. Mohr , Peter Vettiger
IPC分类号： H01L21/033 , H01L21/285 , H01L21/311 , H01L21/318 , H01L21/336 , H01L21/338 , H01L29/812 , H01L21/265
CPC分类号： H01L29/66871 , H01L21/0337 , H01L21/28587 , H01L21/31111 , H01L21/3185 , H01L29/66545
摘要： Process for producing temperature-stable undercut profiles for use in semiconductor fabrication. The process is based on the phenomenon of high etch-rate selectivity between RF- and LF- PECVD-grown silicon nitride films (12G and 13G, respectively) that are deposited on top of each other. By choosing proper film and process parameters, these PECVD nitride structures can be made stress-free: the tensile stress of the RF film (12G) compensates the compressive stress of the LF film (13G).Also disclosed is an application of a T-shaped structure (15), produced with the new process, in a method for fabricating fully self-aligned "dummy" gate sub-micron MESFETs.

57. 发明授权

US4475037A Method of inspecting a mask using an electron beam vector scan system 失效
标题翻译：使用电子束矢量扫描系统检查掩模的方法
公开(公告)号：US4475037A
公开(公告)日：1984-10-02
申请号：US377102
申请日：1982-05-11
申请人： Peter Vettiger , Alan D. Wilson
发明人： Peter Vettiger , Alan D. Wilson
IPC分类号： G01N21/88 , G01B15/00 , G01N21/956 , H01J37/304 , H01L21/027 , H01L21/66 , G01N21/00 , G01D18/00
CPC分类号： H01J37/304
摘要： An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system.
摘要翻译：用于集成电路生产中使用的电子束制造掩模通过一种方法来测试，该方法包括以下步骤：形成掩模的印刷，然后通过在打印和检测图案符合上书写相同的电子束图案或其补体来检查印刷品与矢量扫描系统不一致。

58. 发明授权

US4086447A Electronic hybrid circuit for connecting a two-wire line to switching system 失效
标题翻译：用于将双线线路连接到交换系统的电子混合电路
公开(公告)号：US4086447A
公开(公告)日：1978-04-25
申请号：US769247
申请日：1977-02-16
申请人： Hans Rudolf Schindler , Peter Vettiger
发明人： Hans Rudolf Schindler , Peter Vettiger
IPC分类号： H04B3/03 , H04B1/58 , H04M19/00
CPC分类号： H04M19/005 , H04B1/587
摘要： This invention comprises a telephone hybrid circuit having two opto-coupler arrangements for transferring voice signals from the two-wire line to a port of the switching system on one hand and from a port of the switching system to the two-wire line on the other hand. In addition, a pair of feeder circuits in the form of current sources comprising active elements are provided for feeding a constant positive direct current to one wire of the two-wire line and a negative direct current of equal magnitude to the other wire of the two-wire line. Each of the current sources includes control circuitry for maintaining a constant ratio between the current furnished by the current source and a control current common to both current sources. A control current path is connected to the output of one of the opto-coupler arrangements for generating a common control current in response to a dc signal and a superimposed voice signal received from a port of the switching system. The other opto-coupler arrangement couples the signals from the two-wire line to a port of the switching system.
摘要翻译：本发明包括具有两个光耦合装置的电话混合电路，用于一方面将语音信号从双线线路传送到交换系统的端口，另一方面从另一方面将交换系统的端口传输到双线线路手。另外，提供了包括有源元件的电流源形式的一对馈电电路，用于将恒定的正直流电流馈送到双线线路的一条线路，并且向两条线路的另一条线路提供等量的负直流电流一线。每个电流源包括用于维持由电流源提供的电流与两个电流源公共的控制电流之间的恒定比率的控制电路。控制电流路径连接到光耦合装置之一的输出，以响应于从交换系统的端口接收的直流信号和叠加的语音信号而产生公共控制电流。另一个光耦合装置将来自双线线路的信号耦合到交换系统的端口。

59. 发明申请

US20120255073A1 SCANNING PROBE LITHOGRAPHY APPARATUS AND METHOD, AND MATERIAL ACCORDINGLY OBTAINED 审中-公开
标题翻译：扫描探针平移装置和方法以及根据实际获得的材料
公开(公告)号：US20120255073A1
公开(公告)日：2012-10-04
申请号：US13501487
申请日：2010-10-13
申请人： Michel Despont , Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , David Santos Pires , Peter Vettiger
发明人： Michel Despont , Urs T. Duerig , Bernd W. Gotsmann , Armin W. Knoll , David Santos Pires , Peter Vettiger
IPC分类号： G01Q80/00 , G01Q70/10
CPC分类号： G03F7/0002
摘要： A scanning probe lithography (SPL) apparatus, an SPL method, and a material having a surface thickness patterned according to the SPL method. The apparatus includes: two or more probes with respective shapes, where the respective shapes are different and the respective shapes form, in operation, different patterns in a thickness of a surface of a material processed with the apparatus.
摘要翻译：扫描探针光刻（SPL）装置，SPL法和具有根据SPL方法图案化的表面厚度的材料。该装置包括：具有相应形状的两个或更多个探针，其中各个形状不同，并且各个形状在操作中形成在用该装置处理的材料的表面的厚度上的不同图案。

60. 发明授权

US07889629B2 High density data storage medium 失效
标题翻译：高密度数据存储介质
公开(公告)号：US07889629B2
公开(公告)日：2011-02-15
申请号：US12275547
申请日：2008-11-21
申请人： Jane Frommer , Robert D. Miller , Craig Hawker , Urs T. Duerig , Bernd Gotsmann , Peter Vettiger , Mark A. Lantz
发明人： Jane Frommer , Robert D. Miller , Craig Hawker , Urs T. Duerig , Bernd Gotsmann , Peter Vettiger , Mark A. Lantz
IPC分类号： G11B9/00
CPC分类号： G11B9/14 , B82Y10/00 , G11B9/1409 , G11B9/1472 , G11B9/149
摘要： A data storage system includes a read/write head having a tip connected to a resistive path locally exerting heat at the tip when an electrical current is applied; and a data storage medium from which information is reproduced by scanning a surface of the medium with a tip positioned in contact therewith, the medium comprising: a substrate; and a polymer recording surface within which data bit values are determined by the topographical state at the bit location, characterized in that the polymer contains thermally reversible crosslinkages.
摘要翻译：数据存储系统包括读/写头，其具有连接到电阻路径的尖端，当施加电流时局部地在顶端施加热量; 以及数据存储介质，其中通过用与其接触的尖端扫描介质的表面来再现信息，所述介质包括：基板; 以及聚合物记录表面，其中数据位值由比特位置处的形貌状态确定，其特征在于，所述聚合物含有热可逆交联。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式