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51. 发明申请

US20090323037A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090323037A1
公开(公告)日：2009-12-31
申请号：US12476892
申请日：2009-06-02
申请人： Igor Matheus Petronella AARTS , Engelbertus Antonius Fransiscus Van Der Pasch , Johan Hendrik Geerke , Frederik Eduard De Jong , Marc Van De Grift
发明人： Igor Matheus Petronella AARTS , Engelbertus Antonius Fransiscus Van Der Pasch , Johan Hendrik Geerke , Frederik Eduard De Jong , Marc Van De Grift
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F9/7076 , G03F7/70516 , G03F7/70616 , G03F9/7011 , G03F9/7019 , H01L21/02271
摘要： A detection method for detecting a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate or on a substrate table and preferably extends over a length of at least 50× the width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table in a first direction and measuring along that first direction a property of the extended pattern. The property can be a result of a physical property of the extended pattern in a second direction perpendicular to the first direction. In a next step a calibration of the substrate table position can be derived from the measured position of the extended pattern.
摘要翻译：一种用于检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性的检测方法。延伸图案形成在衬底或衬底台上，并且优选地在线的宽度的至少50倍的长度上延伸。扩展模式是对焦点敏感。检测方法包括沿第一方向移动衬底台并沿第一方向测量扩展图案的特性。该性质可以是在垂直于第一方向的第二方向上延伸图案的物理性质的结果。在下一步骤中，可以从扩展图案的测量位置导出衬底台位置的校准。

52. 发明申请

US20090279067A1 Stage System and Lithographic Apparatus Comprising Such Stage System 有权
标题翻译：包括这种舞台系统的舞台系统和平版印刷设备
公开(公告)号：US20090279067A1
公开(公告)日：2009-11-12
申请号：US12408936
申请日：2009-03-23
申请人： Ramidin Izair KAMIDI , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
发明人： Ramidin Izair KAMIDI , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
IPC分类号： G03B27/58 , G03B27/32
CPC分类号： G03F7/70775
摘要： A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
摘要翻译：舞台系统包括可移动舞台，至少两个编码器头，每个编码器头被构造成提供代表可移动平台相对于编码器目标结构的位置的编码器信号，以及控制器来控制舞台的位置。控制器具有每个编码器头的编码器信号。控制器被布置为对编码器信号应用加权函数并且从加权的编码器信号导出级的位置。

53. 发明授权

US07557903B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07557903B2
公开(公告)日：2009-07-07
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

54. 发明申请

US20080316460A1 Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product 有权
标题翻译：控制系统，光刻投影装置，控制支撑结构的方法以及计算机程序产品
公开(公告)号：US20080316460A1
公开(公告)日：2008-12-25
申请号：US11812817
申请日：2007-06-21
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/58 , G05B1/06
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system is provided for controlling a support structure in a lithographic apparatus. The control system includes a first measurement system arranged to measure the position of a substrate supported by the support structure, the position being measured in a first coordinate system. The control system further includes a second measurement system for measuring the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. The control system further comprises a controller configured to control the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure in a manner dependent upon the position error signal.
摘要翻译：提供了一种用于控制光刻设备中的支撑结构的控制系统。控制系统包括第一测量系统，其布置成测量由支撑结构支撑的基板的位置，该位置在第一坐标系中被测量。所述控制系统还包括用于在第二坐标系中测量所述支撑结构的位置的第二测量系统，所述第一测量系统在所述第二坐标系中具有推测位置。所述控制系统还包括控制器，所述控制器被配置为基于所述第二测量系统的测量来控制所述支撑结构的位置，以将所述基板的测量位置转换成所述支撑结构在所述第二坐标系中的转换位置，基于转换位置的支撑结构，接收表示第二坐标系中的第一测量系统的推测位置和实际位置之间的差异的位置误差信号，并且以取决于位置的方式定位支撑结构误差信号。

55. 发明申请

US20080291413A1 Lithographic apparatus having encoder type position sensor system 有权
标题翻译：光刻设备具有编码器型位置传感器系统
公开(公告)号：US20080291413A1
公开(公告)日：2008-11-27
申请号：US11802770
申请日：2007-05-24
申请人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul Steijaert , Wilhelmus Josephus Box , Emiel Jozef Melanie Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/42
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

56. 发明申请

US20080240501A1 Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object 有权
标题翻译：测量系统，光刻设备和用于测量可移动物体的位置相关信号的方法
公开(公告)号：US20080240501A1
公开(公告)日：2008-10-02
申请号：US11730190
申请日：2007-03-29
申请人： Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
发明人： Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
IPC分类号： G06K9/46
CPC分类号： G03F7/7085 , G03F7/70425 , G03F7/70775 , G03F7/70783
摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
摘要翻译：编码器型测量系统被配置为测量可移动物体的位置相关信号，所述测量系统包括可安装在可移动物体上的至少一个传感器，可安装在基本上固定的框架上的传感器目标物体，以及安装装置，传感器目标物体在基本上固定的框架上。测量系统还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。在替代实施例中，补偿装置包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

57. 发明授权

US07408617B2 Lithographic apparatus and device manufacturing method utilizing a large area FPD chuck equipped with encoders an encoder scale calibration method 有权
标题翻译：使用装有编码器的大面积FPD卡盘的光刻设备和器件制造方法进行编码器刻度校准方法
公开(公告)号：US07408617B2
公开(公告)日：2008-08-05
申请号：US11165575
申请日：2005-06-24
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70625
摘要： A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a substrate table, a projection system, a position encoder, an imaging device, and an image processing unit. The illumination system conditions a radiation beam. The array of individually controllable elements modulates the cross-section of the radiation beam. The substrate table supports a substrate. The projection system projects the modulated radiation beam onto a target portion of the substrate, thereby applying a pattern to the target portion of the substrate. The pattern comprises a first line and a second line. The first line is offset from the second line. The position encoder determines a position of the substrate table. The position encoder comprises a position sensor and a scale. The scale comprises a plurality of lines intended to be straight and parallel to one another. The imaging device obtains an image of the first line and the second line. The image processing unit measures the separation between the first line and the second line in a plurality of locations, and determines the non-uniformity of at least a part of the scale from the plurality of separations.
摘要翻译：光刻设备包括照明系统，独立可控元件的阵列，衬底台，投影系统，位置编码器，成像设备和图像处理单元。照明系统调节辐射束。独立可控元件的阵列调制辐射束的横截面。衬底台支撑衬底。投影系统将调制的辐射束投影到基板的目标部分上，从而将图案施加到基板的目标部分。该图案包括第一行和第二行。第一行偏离第二行。位置编码器确定衬底台的位置。位置编码器包括位置传感器和秤。该刻度尺包括多条相互直线并平行的线。成像装置获得第一行和第二行的图像。图像处理单元测量多个位置中第一线和第二线之间的间隔，并且从多个分离中确定刻度的至少一部分的不均匀性。

58. 发明授权

US07177059B2 Device and method for manipulation and routing of a metrology beam 有权
标题翻译：测量光束的操作和布线的装置和方法
公开(公告)号：US07177059B2
公开(公告)日：2007-02-13
申请号：US10793420
申请日：2004-03-05
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen , Engelbertus Johannes Jeroen Klijntunte
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Marcel Hendrikus Maria Beems , Emiel Jozef Melanie Eussen , Engelbertus Johannes Jeroen Klijntunte
IPC分类号： G02B26/08
CPC分类号： G03F7/70775
摘要： A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.
摘要翻译：光刻投影装置配备有用于操纵和布置计量辐射束的至少一部分的装置。该装置包括第一和第二光楔，其中第二光楔和第一光楔相对于彼此具有相对位置。计量光束的至少一部分沿第一光楔的第一主表面处的入射光轴进入器件，穿过第一和第二光楔，并在第二光楔的第二主表面处离开。第一和第二光楔布置成通过改变第一和第二光楔的相对位置而相对于入射光轴旋转和平移测量光束的至少一部分中的至少一个。

59. 发明授权

US07119886B2 Lithographic apparatus, device manufacturing method, and angular encoder 有权
标题翻译：光刻设备，器件制造方法和角度编码器
公开(公告)号：US07119886B2
公开(公告)日：2006-10-10
申请号：US10833340
申请日：2004-04-28
申请人： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
发明人： Martinus Hendrikus Antonius Leenders , Hendricus Johannes Maria Meijer , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Theo Anjes Maria Ruijl
IPC分类号： G01C3/08 , G01B11/14 , G03B27/54
CPC分类号： G03F7/70258 , G03F7/7085
摘要： In a lithographic projection apparatus, a measuring system configured to measure the position of the projection system relative to a reference frame includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table position. An angular encoder which sends light from a target down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system about its optical axis.
摘要翻译：在光刻投影设备中，被配置为测量投影系统相对于参考框架的位置的测量系统包括相对于测量衬底台位置的测量系统的对应传感器刚性地安装的传感器。使用角度编码器，其从目标向下发射具有相对于倾斜的灵敏度的两个光路的光，以测量投影系统绕其光轴的旋转。

60. 发明授权

US08988650B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08988650B2
公开(公告)日：2015-03-24
申请号：US13214289
申请日：2011-08-22
申请人： Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
发明人： Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
摘要： A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
摘要翻译：一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体，与第一流动特性不同，邻近来自第一出口的热调节流体。

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