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    • 51. 发明授权
    • Method of determining an indication for estimating item processing times
to model a production apparatus
    • 确定用于估计项目处理时间以对生产设备建模的指示的方法
    • US5768157A
    • 1998-06-16
    • US561638
    • 1995-11-22
    • Akira Sato
    • Akira Sato
    • G05B19/418B65G61/00G05B17/02G06F17/18G06Q50/00G06Q50/04G06F9/455
    • G05B17/02G06F17/18
    • A method is disclosed for determining a regression equation for modeling a production apparatus which processes a plurality of items in lots of different sizes. The regression equation is used to estimate a lot processing time of each of the lots. First, data representing the lot processing times is collected from the apparatus and inputted to a computer. Then, a frequency distribution for the lot processing times is determined in connection with each of the lots. Next, a plurality of sets of lot processing times are extracted from each of the frequency distributions by varying the data extraction rate. An average processing time of each of the plurality of sets of lot processing times is calculated. Then, a plurality of regression lines for the average lot processing times are determined for each of the lots. A degree of departure of each of the average lot processing times is determined based on the regression lines. Finally, the regression equation is selected from the regression lines based on the degree of departure.
    • 公开了一种用于确定用于对处理大量不同尺寸的多个物品的生产设备建模的回归方程式的方法。 回归方程用于估计每个批次的批处理时间。 首先,从装置收集表示批处理时间的数据并输入到计算机。 然后,结合批次确定批次处理时间的频率分布。 接下来,通过改变数据提取率,从每个频率分布中提取多组批次处理时间。 计算多组批处理时间中的每一组的平均处理时间。 然后,针对每个批次确定用于平均批处理时间的多个回归线。 基于回归线确定每个平均批处理时间的偏离程度。 最后,回归方程根据离散程度从回归线中选出。
    • 52. 发明授权
    • Armature resistance measuring apparatus and method
    • 电枢电阻测量装置及方法
    • US5457402A
    • 1995-10-10
    • US232503
    • 1994-04-25
    • Akira Sato
    • Akira Sato
    • G01R27/14G01R31/06
    • G01R31/346G01R27/14
    • A method and apparatus for determining the resistance of the coils and commutator connections in an armature of an electric motor wherein a current is generated between a first commutator segment and a commutator segment located at least three segments beyond said first segment, a first voltage is measured across the first commutator segment and an adjacent second commutator segment, a second voltage is measured across the second commutator segment and an adjacent third commutator segment, and a third voltage is measured across a pair of commutator segments which are adjacent to the first commutator segment. After the three voltages are measured, the current is disconnected, and a voltage is generated across two commutator segments spaced at least three segments beyond the first segment. The generated voltage is adjusted so that the voltage measured across the second and third commutator segments equals the previous measurement, and the voltages are remeasured. With the voltages measured across the second and third commutator segments being equal, the connection and coil resistances for the first commutator segment are calculated from the voltage measurements and the value of the generated current. The armature is then indexed, and the measurements repeated, to determine the coil and connection resistance of subsequent segments.
    • 一种用于确定电动机的电枢中的线圈和换向器连接的电阻的方法和装置,其中在第一换向器段和位于超过所述第一段的至少三个段的换向器段之间产生电流,测量第一电压 跨越第一换向器段和相邻的第二换向器段,跨越第二换向器段和相邻的第三换向器段测量第二电压,并且跨越与第一换向器段相邻的一对换向器段测量第三电压。 在测量三个电压之后,电流被断开,并且跨越跨越第一段的至少三个段的两个换向器段产生电压。 调整所产生的电压,使得在第二和第三换向器片段上测量的电压等于先前的测量值,并重新测量电压。 利用在第二和第三换向器段上测量的电压相等,根据电压测量值和所产生的电流的值来计算第一换向器段的连接和线圈电阻。 然后将电枢分度,并重复测量,以确定后续段的线圈和连接电阻。
    • 53. 发明授权
    • Method of manufacturing semiconductor device
    • 制造半导体器件的方法
    • US5290709A
    • 1994-03-01
    • US865961
    • 1992-04-09
    • Akira Sato
    • Akira Sato
    • H01L21/265H01L21/266H01L21/426
    • H01L21/266Y10S148/076Y10S148/082Y10S148/083
    • According to the present invention, in the ion implantation step in manufacturing a semiconductor device, a resist of a resist pattern formed on a portion of a semiconductor wafer is removed from the outer peripheral portion of the semiconductor wafer, and ion implantation is performed through the resist pattern.Since the resist is removed from the outer peripheral portion, a contact portion between a semiconductor wafer fixing portion of an ion implantation unit and the semiconductor wafer is conductive. Therefore, charges generated by the ion implantation escape from the wafer fixing portion, and the semiconductor wafer is not charged, thereby preventing electrostatic breakdown.
    • 根据本发明,在制造半导体器件的离子注入步骤中,从半导体晶片的外周部分去除形成在半导体晶片的一部分上的抗蚀剂图案的抗蚀剂,并且通过 抗蚀图案 由于抗蚀剂从外周部分去除,离子注入单元的半导体晶片固定部分和半导体晶片之间的接触部分是导电的。 因此,由离子注入产生的电荷从晶片固定部分逸出,并且半导体晶片不被充电,从而防止静电击穿。
    • 56. 发明授权
    • Snowstorm guard fence structures and jet roofs
    • 暴风雪护栏篱笆结构和喷气式屋顶
    • US4958806A
    • 1990-09-25
    • US284310
    • 1988-12-14
    • Akira SatoMasatoshi Ono
    • Akira SatoMasatoshi Ono
    • E01F7/02
    • E01F7/025
    • A snowstorm guard fence structure is constructed by anchoring a wall, which overhangs at an upward slope to a road side, to a supporting wall disposed along one side of the road. The constructed structure can be placed on sides of roads, has a space to discard the snow removed from the road, and also is effective for preventing snow accumulation on the road regardless of the degree of wind velocity and the presence of shelter structures. A jet roof is constructed by disposing a plurality of props on a slant and providing a plurality of panels between the props at spaces for jet openings so that jet openings are gradually narrowed toward the road side. The constructed jet roof is effective for preventing snow accumulation on the road regardless of the condition of wind velocity and the presence of shelter structures.
    • 通过将沿着向上倾斜的一侧的墙壁锚固在一侧的路侧的支撑壁上,构成一个暴风雪护栏围栏结构。 构造的结构可以放置在道路的两侧,具有放弃从道路上除去的积雪的空间,并且也可以有效地防止道路上的积雪,而不管风速和风挡结构的存在。 通过将多个道具设置在斜面上并且在用于喷射开口的空间处的道具之间的道具之间提供多个面板,使得射流开口朝向路侧逐渐变窄而构成喷射屋顶。 建造的喷射屋顶有效防止道路上的积雪,无论风速和住房结构的存在如何。