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51. 发明申请

US20100073647A1 COATING FILM FORMING APPARATUS AND COATING FILM FORMING METHOD FOR IMMERSION LIGHT EXPOSURE 有权
标题翻译：涂膜成膜装置和涂膜成型方法浸入式曝光
公开(公告)号：US20100073647A1
公开(公告)日：2010-03-25
申请号：US12515368
申请日：2007-11-19
申请人： Hideharu Kyouda , Junichi Kitano , Taro Yamamoto
发明人： Hideharu Kyouda , Junichi Kitano , Taro Yamamoto
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70991 , H01L21/6715
摘要： A coating film forming apparatus for immersion light exposure, for forming a coating film including a resist film or a resist film and an additional film on a substrate to be fed to an immersion light exposure apparatus configured to perform a light exposure process through a liquid, includes: one or more coating units configured to apply the resist film or the resist film and the additional film onto the substrate; one or more thermally processing units configured to perform a thermal process necessary for forming the coating film on the substrate; a checking unit configured to check a state of the coating film at an edge portion of the substrate before the immersion light exposure; and a control section configured to use a check result obtained by the checking unit to make a judgment of whether or not the state of the coating film at the edge portion of the substrate is within an acceptable range, and to permit transfer of the substrate to the light exposure apparatus when the state of the coating film is within the acceptable range.
摘要翻译：一种用于浸没曝光的涂膜形成装置，用于在被配置为通过液体进行曝光处理的浸没曝光装置的基板上形成包括抗蚀剂膜或抗蚀剂膜和附加膜的涂膜，包括：被配置为将抗蚀剂膜或抗蚀剂膜和附加膜施加到基底上的一个或多个涂层单元; 一个或多个热处理单元，被配置为执行在基板上形成涂膜所需的热处理; 检查单元，被配置为在浸没曝光之前检查在所述基板的边缘部分处的所述涂膜的状态; 以及控制部，被配置为使用由所述检查单元获得的检查结果来判断在所述基板的边缘部分处的所述涂膜的状态是否在可接受的范围内，并且允许将所述基板转印到当涂膜的状态在可接受的范围内时的曝光装置。

52. 发明申请

US20090286441A1 POLYURETHANE UREA ELASTIC FIBER 有权
标题翻译：聚氨酯尿素弹性纤维
公开(公告)号：US20090286441A1
公开(公告)日：2009-11-19
申请号：US12307332
申请日：2007-07-03
申请人： Taro Yamamoto , Junichi Kojima
发明人： Taro Yamamoto , Junichi Kojima
IPC分类号： D03D15/08 , D04B1/18 , C08G73/00 , C08K5/5419
CPC分类号： D01F6/94 , Y10T428/2913 , Y10T428/2915 , Y10T442/3024 , Y10T442/413
摘要： Disclosed is a polyurethane urea elastic fiber containing 5-40% by weight of a polyurethane compound, wherein the compression deformation starting temperature determined by thermomechanical analysis (TMA) is not less than 150° C. but not more than 180° C. and time for thermal cutting at 180° C. is not less than 30 seconds.
摘要翻译：公开了含有5-40重量％的聚氨酯化合物的聚氨酯脲弹性纤维，其中通过热机械分析（TMA）测定的压缩变形开始温度不低于150℃，但不超过180℃，时间在180℃下进行热切割不小于30秒。

53. 发明申请

US20090128787A1 SUBSTRATE PROCESSING APPARATUS 失效
标题翻译：基板加工设备
公开(公告)号：US20090128787A1
公开(公告)日：2009-05-21
申请号：US12250902
申请日：2008-10-14
申请人： Taro Yamamoto , Hideo Funakoshi , Yuichiro Inatomi
发明人： Taro Yamamoto , Hideo Funakoshi , Yuichiro Inatomi
IPC分类号： G03B27/52
CPC分类号： H01L21/6715
摘要： A substrate processing apparatus enables an efficient collection of a solvent vapor discharged via a nozzle onto a wafer on which a resist pattern is formed. A retaining base that retains the wafer is moved relative to the nozzle, which includes a nozzle head. A pair of leakage preventing portions are disposed opposite to each other across the nozzle head. Each of the leakage preventing portions has an opening via which the solvent vapor discharged out of the discharge opening can be sucked, or a solvent vapor blocking gas can be discharged selectively. A solvent vapor supply source and a gas supply source are switchably connected to the supply opening of the nozzle head via a first switching valve. An exhaust pump and a solvent-vapor-blocking gas supply source are switchably connected to the openings of the leakage preventing portions via a second switching valve.
摘要翻译：基板处理装置能够有效地收集经由喷嘴排出的溶剂蒸气到形成有抗蚀剂图案的晶片上。保持晶片的保持基座相对于包括喷嘴头的喷嘴移动。一对防漏部分跨越喷嘴头相对设置。每个防漏部分都有一个开口，通过该开口可以吸出从排出口排出的溶剂蒸气，或者可以选择性地排出溶剂蒸汽阻塞气体。溶剂蒸气供应源和气体供应源通过第一切换阀可切换地连接到喷嘴头的供应开口。排气泵和溶剂气体阻断气体供应源经由第二切换阀可切换地连接到防漏部分的开口。

54. 发明授权

US07530749B2 Coater/developer and coating/developing method 失效
标题翻译：涂料/显影剂和涂料/显影方法
公开(公告)号：US07530749B2
公开(公告)日：2009-05-12
申请号：US10581713
申请日：2004-12-03
申请人： Taro Yamamoto , Osamu Hirakawa
发明人： Taro Yamamoto , Osamu Hirakawa
IPC分类号： G03D5/00 , G03B27/52 , G03B27/32
CPC分类号： H01L21/67271 , G03F7/3021 , G03F7/70341 , H01L21/67034 , H01L21/6708 , H01L21/67253
摘要： A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by immersion exposure is placed on a substrate support device and a liquid detector detects at least the liquid formed a liquid film for immersion exposure and remaining on the surface of the substrate. A decision is made as to whether or not the substrate needs to be dried on the basis of the result of detection made by the liquid detector. If it is decided that the substrate needs to be dried, the substrate is dried by a drying means. Thus wetting the interior of the coating and developing system with water can be prevented. Since only substrates that need to be dried are subjected to a drying process, the coating and developing system is able to operate at a high throughput.
摘要翻译：当涂层和显影系统在基底上形成抗蚀剂膜时，涂层和显影系统防止用水润湿其组分单元，并通过显影过程处理通过浸渍曝光处理的基底。具有涂覆有抗蚀剂膜并通过浸渍曝光处理的表面的基板被放置在基板支撑装置上，并且液体检测器至少检测形成用于浸没曝光的液体膜并保留在基板的表面上的液体。基于由液体检测器进行的检测结果确定基板是否需要被干燥。如果确定衬底需要干燥，则通过干燥装置干燥衬底。因此可以防止涂层和显影系统内部的水分润湿。由于仅需要干燥的基材经受干燥处理，所以涂层和显影系统能够以高产量进行操作。

55. 发明授权

US07485364B2 Polyurethane elastic fiber and process for producing same 有权
标题翻译：聚氨酯弹性纤维及其制造方法
公开(公告)号：US07485364B2
公开(公告)日：2009-02-03
申请号：US10591671
申请日：2005-02-28
申请人： Taro Yamamoto , Masanori Doi
发明人： Taro Yamamoto , Masanori Doi
IPC分类号： D02G3/00
CPC分类号： D01F1/10 , D01F6/70 , Y10T428/2927 , Y10T428/2933
摘要： A polyurethane elastic fiber, containing inorganic compound particles that have an average particle size of 0.5 to 5 mm and that show a refractive index of 1.4 to 1.6, having at least one protruded portion that has a maximum width of 0.5 to 5 μm, in the fiber surface, per 120-μm length in the fiber axis direction.
摘要翻译：一种聚氨酯弹性纤维，其含有平均粒径为0.5〜5mm，折射率为1.4〜1.6的无机化合物粒子，其具有至少一个最大宽度为0.5〜5μm的突出部，纤维表面，纤维轴方向每120m长。

56. 发明申请

US20080124489A1 COATING FILM FORMING APPARATUS AND METHOD 有权
标题翻译：涂膜成型设备和方法
公开(公告)号：US20080124489A1
公开(公告)日：2008-05-29
申请号：US11944557
申请日：2007-11-23
申请人： Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
发明人： Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
IPC分类号： C23C14/28 , B05C11/00
CPC分类号： H01L21/6715 , H01L21/67178 , H01L21/67276
摘要： A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.
摘要翻译：涂膜形成装置包括具有一个或多个涂布单元和一个或多个热处理单元的处理部分; 构造成在基板的背面和边缘部分上进行清洗的预涂层清洁单元; 以及配置为检查基板的背面和边缘部分的状态的预涂层检查单元。控制部被配置为通过预涂清洁单元实现清洁基板的顺序，通过预涂单元检查基板，基于由此获得的检查结果判断颗粒的状态在基板的后表面和边缘部分处于可接受的范围内，并且允许将基板转移到颗粒状态在可接受范围内的处理部分中。

57. 发明授权

US07284917B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07284917B2
公开(公告)日：2007-10-23
申请号：US11346430
申请日：2006-02-03
申请人： Seiki Ishida , Masahiro Nakaharada , Taro Yamamoto
发明人： Seiki Ishida , Masahiro Nakaharada , Taro Yamamoto
IPC分类号： G03D5/00 , G03B27/32 , G03B27/52
CPC分类号： H01L21/67184 , H01L21/67051 , H01L21/67178 , H01L21/67742 , H01L21/67745 , Y10S134/902
摘要： A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit. Thus the contamination of the substrate with external particles can be prevented and hence the spread of contamination with particles over the processing units of the processing block and substrates processed by the processing units can be prevented.
摘要翻译：涂覆和显影系统能够防止具有颗粒的基底污染，同时用抗蚀剂膜涂覆基材的表面，并且在通过浸渍曝光处理基板之后显影抗蚀剂膜。该涂布显影系统包括：处理块，其包括用于在基板的表面上形成抗蚀剂膜的涂覆单元和用显影剂处理形成在基板上的抗蚀剂膜的显影单元，以及连接到处理块的界面块用于进行浸没曝光处理的曝光系统。接口块包括：用于清洗通过浸没曝光工艺处理的基板的基板清洁单元，第一承载机构和第二承载机构。第一携带机构携带通过浸没曝光处理的基板到基板清洁单元。第二承载机构承载由基板清洁单元清洁的基板。因此，可以防止基板与外部颗粒的污染，因此可以防止在处理块的处理单元和由处理单元处理的基板上的颗粒污染的扩散。

58. 发明申请

US20070012339A1 Cleaning apparatus, coating and developing apparatus, and cleaning method 失效
标题翻译：清洗装置，涂装和显影装置以及清洗方法
公开(公告)号：US20070012339A1
公开(公告)日：2007-01-18
申请号：US11345529
申请日：2006-02-02
申请人： Masahiro Fukuda , Taro Yamamoto
发明人： Masahiro Fukuda , Taro Yamamoto
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , H01L21/68742
摘要： A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front surface of the wafer W through a fluid supply port 40 which is an end of a fluid supply path 5, and is discharged through a fluid discharge portion 44 arranged in the bottom portion of the airtight container 41 in a form of a groove running along a circle having its center located on the center axis of the wafer W. The cleaning liquid flows and spreads from the center portion of the wafer W toward the peripheral portion while removing particles adhered to the wafer W, and is discharged through the fluid discharge portion 44. This arrangement allows the particles to be uniformly and reliably removed without rotating the wafer W. The entire cleaning apparatus 4 has a small size.
摘要翻译：通过真空吸盘42将晶片W保持在气密容器41内的水平姿态，使得在晶片W和气密容器41的内表面之间形成小的间隙。通过作为流体供给路径5的端部的流体供给口40朝向晶片W的前表面的中央部供给清洗液，通过配置在流体供给路径5的底部的流体排出部44排出气密容器41是沿其圆周方向延伸的凹槽的形式，其中心位于晶片W的中心轴线上。清洗液体从晶片W的中心部向周边部分流动并扩散，同时除去附着在晶片W上的颗粒晶片W，并通过流体排出部分44排出。这种布置允许在不旋转晶片W的情况下均匀且可靠地除去颗粒。整个清洁装置4具有小尺寸。

59. 发明授权

US08770111B2 Transport vehicle and transport system 有权
标题翻译：运输车辆和运输系统
公开(公告)号：US08770111B2
公开(公告)日：2014-07-08
申请号：US13877278
申请日：2011-09-08
申请人： Taro Yamamoto , Yusuke Fujiwara
发明人： Taro Yamamoto , Yusuke Fujiwara
IPC分类号： B61B3/00
CPC分类号： H01L21/677 , B61B3/02 , H01L21/6773 , H01L21/67733
摘要： A transport vehicle that reduces shaking of a transport article includes a travelling unit, a transport unit, a fall prevention member, and a shaking reduction member. The travelling unit travels along a rail provided on a ceiling. The transport unit transports a transport article. The fall prevention member is rotatably supported such that it can rotate between a fall prevention position and a retracted position. The fall prevention member is, at the fall prevention position, below the transport article. A pushing portion of the shaking reduction member pushes against a side surface of the transport article with a pushing surface thereof in conjunction with the rotating of the fall prevention member from the retracted position to the fall prevention position. A lever portion of the shaking reduction member has one end supporting the pushing portion and the other end rotatably supported in a manner coaxial with the fall prevention member.
摘要翻译：减少运输物品晃动的运送车辆包括行驶单元，运送单元，防跌落构件和减震构件。旅行单位沿着设在天花板上的轨道行进。运输单位运输运输物品。防坠落构件被可旋转地支撑，使得其能够在防坠落位置和缩回位置之间旋转。防坠落成员在防坠落位置处在运输物品的下面。摇动减速部件的推动部分随着其推动表面与防倒下部件从缩回位置的旋转到防止摔倒位置一起推动输送物品的侧表面。减震构件的杠杆部分具有支撑推动部分的一端，而另一端以与防坠落构件同轴的方式可旋转地支撑。

60. 发明授权

US08636915B2 Liquid processing apparatus and liquid processing method 有权
标题翻译：液体处理装置和液体处理方法
公开(公告)号：US08636915B2
公开(公告)日：2014-01-28
申请号：US13811522
申请日：2011-07-12
申请人： Yasushi Takiguchi , Taro Yamamoto , Tsutomu Yamahata , Akihiro Fujimoto , Kouji Fujimura
发明人： Yasushi Takiguchi , Taro Yamamoto , Tsutomu Yamahata , Akihiro Fujimoto , Kouji Fujimura
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00
CPC分类号： B08B3/04 , G03F7/3021 , H01L21/6715 , H01L21/6719
摘要： To provide a liquid processing apparatus capable of processing substrates with a high throughput with the lesser number of nozzles for chemical-liquid, when the substrates that are horizontally held in cup bodies are liquid-processed by supplying a chemical liquid to the substrates. Taking a developing process as an example of a liquid process, two-types of developing nozzles are prepared for two types of developing methods. The developing nozzle, which is used in the method in which the nozzle is engaged with the process for a longer period of time, is individually disposed on each of a first processing module 1 and a second processing module 2. On the other hand, the developing nozzle, which is used in the method in which the nozzle is engaged with the process for a shorter period of time, is used in common in the first liquid processing module 1 and the second liquid processing module 2. The common developing nozzle is configured to wait on an intermediate position between the modules 1 and 2.
摘要翻译：为了提供一种液体处理装置，当水平保持在杯体中的基板通过向基板供应化学液体进行液体处理时，能够以较少数量的用于液体的喷嘴来处理具有高产量的基板的液体处理装置。以液体工艺为例的显影过程，为两种显影方法准备了两种类型的显影喷嘴。在喷嘴与该处理接合较长时间的方法中使用的显影喷嘴被单独地设置在第一处理模块1和第二处理模块2的每一个上。另一方面，在第一液体处理模块1和第二液体处理模块2中共同使用在喷嘴与该工艺相比较短时间接合的方法中使用的显影喷嘴。公知的显影喷嘴被配置等待模块1和2之间的中间位置。

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