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51. 发明专利

JP2010049018A Pattern drawing method and laser direct drawing device 有权
标题翻译：图案绘图方法和激光直接绘图装置
公开(公告)号：JP2010049018A
公开(公告)日：2010-03-04
申请号：JP2008213048
申请日：2008-08-21
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , SUZUKI MITSUHIRO , KATO TOMOTSUGU , HARADA SHIGERU , TSUKAMOTO SATOSHI
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To accurately determine a position on the back face of a photosensitive material with respect to the top face regardless to the type of the photosensitive material.
SOLUTION: A pattern drawing method includes: obtaining the coordinates of vertexes A, D on one side AD of a drawing object 10 along a main scanning direction based on the XY coordinate axes of a laser direct drawing device; rotating a table 12 to render the side AD into parallel to the X axis of the laser direct drawing device, followed by moving the drawing object parallel to the XY coordinate axes of the laser direct drawing device to position the vertex A at a designed vertex A0 of the drawing object; exposing the top face of the object; then turning over the drawing object 10 to reverse faces around an axis in a sub-scanning direction; obtaining the coordinates of the reversed vertexes A, D based on the XY coordinate axes of the laser direct drawing device; rendering the reversed side AD into parallel to the X axis of the laser direct drawing device, followed by moving the drawing object parallel to the XY coordinate axes of the laser direct drawing device to position the reversed vertex A at the other designed vertex D0 on the top face; and exposing the back face.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：无论感光材料的类型如何，精确地确定感光材料的背面相对于顶面的位置。解决方案：图案描绘方法包括：基于激光直接牵引装置的XY坐标轴，沿着主扫描方向获得绘图对象10的一侧AD上的顶点A，D的坐标; 旋转桌子12以使侧面AD平行于激光直接绘制装置的X轴，然后移动绘图对象平行于激光直接绘图装置的XY坐标轴，以将顶点A定位在设计的顶点A0 的绘图对象; 露出物体的顶面; 然后翻转绘图对象10以沿副扫描方向绕轴转动面; 基于激光直接牵引装置的XY坐标轴获得反转顶点A，D的坐标; 使反转侧AD平行于激光直接牵引装置的X轴，然后将绘制对象平行于激光直接牵引装置的XY坐标轴移动，以将反转的顶点A定位在另一个设计的顶点D0上顶面并露出背面。版权所有（C）2010，JPO＆INPIT

52. 发明专利

JP2010034165A Marking device and pattern forming device 审中-公开
标题翻译：标记装置和图案形成装置
公开(公告)号：JP2010034165A
公开(公告)日：2010-02-12
申请号：JP2008192775
申请日：2008-07-25
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： HARADA SHIGERU , TSUKAMOTO SATOSHI , NAITO YOSHITATSU , SUZUKI MITSUHIRO
IPC分类号： H05K3/00 , B23K26/00 , B23K26/06 , B23K101/42 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a marking device that improves pattern-position accuracy between both sides of a printed circuit board, and to provide a pattern forming device. SOLUTION: The marking device 10 is a marking device that marks positioning marks for pattern-drawing onto a printed circuit board W in a pre-step of pattern-drawing of the printed circuit board in which a photosensitizing-agent layer is provided on both sides and to which pattern drawing is executed by irradiating laser light thereto. The device includes a first-side marking part, which marks positioning marks M1-M4 onto a first side W1 being one side of the printed circuit board W by exposing the photosensitizing-agent layer while being irradiated with light, and a second-side marking part that marks positioning marks M5-M8, positioned to the marks M1-M4, onto a second side W2 being the side on the side opposite to the first side W1 by exposing the photosensitizing-agent layer while being irradiated with light. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种提高印刷电路板的两面之间的图案位置精度的标记装置，并提供图案形成装置。解决方案：标记装置10是在其中设置有感光剂层的印刷电路板的图案的前置步骤中标记用于图案绘制到印刷电路板W上的定位标记的标记装置并且通过向其照射激光来执行图案图形。该装置包括第一侧标记部分，其通过在被光照射下曝光光敏剂层而将定位标记M1-M4标记在作为印刷电路板W的一侧的第一侧W1上，并且第二侧标记通过在照射光的同时曝光光敏剂层，将定位在标记M1-M4上的定位标记M5-M8标记在与第一侧W1相反的一侧的第二侧W2上。版权所有（C）2010，JPO＆INPIT

53. 发明专利

JP2009244616A Laser direct drawing method and laser direct drawing device 审中-公开
标题翻译：激光直接绘图方法和激光直接绘图设备
公开(公告)号：JP2009244616A
公开(公告)日：2009-10-22
申请号：JP2008091354
申请日：2008-03-31
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , OSHIDA YOSHITADA , SUZUKI MITSUHIRO , KATO TOMOTSUGU
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a laser direct drawing method and device which has an LD as a light source and is capable of drawing an inexpensive DFR requiring a light amount of 20 to 100mJ/cm
2 .
SOLUTION: In the laser direct drawing device wherein an object to be drawn is moved in a sub-scanning direction while deflecting laser beams arrayed in a line direction and a column direction, in a main scanning direction and the laser beams modulated on the basis of raster data are condensed in the sub-scanning direction using a cylindrical lens to draw a desired pattern on the object, a setting means which sets the number of optical axes of laser beams in the line direction to p which is a positive integer and is a product of q and s and which sets a light amount in a drawing position and a rotating means which rotates the cylindrical lens in a matrix plane are provided, and the position of the cylindrical lens is determined in accordance with the light amount set by the setting means, and laser beams are radiated to the object while shifting s line at a time in the line direction, so that q-exposure of a light quantity in the drawing position which is q times single exposure is carried out.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有LD作为光源并且能够绘制需要20至100mJ / cm 2的光量的廉价的DFR的激光直接拉制方法和装置。解决方案：在激光直接拉制装置中，其中待拉制物体在副扫描方向上移动，同时沿主扫描方向偏转沿线方向和列方向排列的激光束，并且激光束被调制在光栅数据的基础使用柱面透镜在副扫描方向上聚集在物体上画出期望的图案，设置装置将激光束的线轴方向的数量设为p，其为正整数并且是q和s的乘积，并且设置在绘图位置的光量和使矩阵平面旋转柱面透镜的旋转装置，并且根据设定的光量确定柱面透镜的位置通过设定装置，激光束被照射到物体上，同时沿着线方向一次移动s线，使得在单次曝光q次的绘图位置上的光量的q曝光为c 到了版权所有（C）2010，JPO＆INPIT

54. 发明专利

JP2009128499A Laser direct drawing method and laser direct drawing device 审中-公开
标题翻译：激光直接绘图方法和激光直接绘图设备
公开(公告)号：JP2009128499A
公开(公告)日：2009-06-11
申请号：JP2007301699
申请日：2007-11-21
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , OSHIDA YOSHITADA , SUZUKI MITSUHIRO
IPC分类号： G03F7/20 , G02B26/10 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a laser direct drawing method and a laser direct drawing device, improving drawing quality and work efficiency in assembling. SOLUTION: The position in the sub-scanning direction of the optical axis of a laser beam 5 emitted from an LD (a laser diode) is aligned in advance with the position in the sub-scanning direction of the optical axis in design, a shift amount ΔLx in the main scanning direction to the optical axis in design of each optical axis is obtained, and the obtained shift amount ΔLx is stored as a correction time Δt of each laser beam, which is converted into the scanning time. In drawing, the correction time Δt is added to the irradiation time (ON-state time of each LD1) of each laser beam 5 designated based on the design data to obtain the irradiation time of each LD1. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供激光直接拉拔方法和激光直接拉拔装置，提高组装中的拉拔质量和工作效率。解决方案：从LD（激光二极管）发射的激光束5的光轴的副扫描方向上的位置与设计中的光轴的副扫描方向上的位置预先对齐，获得每个光轴的设计中的主扫描方向相对于光轴的偏移量ΔLx，并且将获得的偏移量ΔLx存储为转换为扫描时间的每个激光束的校正时间Δt。在图中，基于设计数据指定的每个激光束5的照射时间（每个LD1的导通时间）加上校正时间Δt，以获得每个LD1的照射时间。版权所有（C）2009，JPO＆INPIT

55. 发明专利

JP2009122597A Laser direct drawing apparatus 有权
标题翻译：激光直接绘图设备
公开(公告)号：JP2009122597A
公开(公告)日：2009-06-04
申请号：JP2007299304
申请日：2007-11-19
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , OSHIDA YOSHITADA , SUZUKI MITSUHIRO , YAMAGUCHI TAKESHI
IPC分类号： G03F7/20 , G02B26/10 , H04N1/113
摘要： PROBLEM TO BE SOLVED: To provide a laser direct drawing apparatus that requires only a small installation area and can improve the process efficiency, even if images are drawn on both of top and back surfaces of a drawing object. SOLUTION: The apparatus is provided with polygon mirrors (deflecting means) 6u, 6d and a holding frame (holding means) 30 holding a drawing object 10, while the top and back surfaces of the object 10 are exposed. Images are drawn simultaneously, on both the top and back surfaces of the drawing object 10, by scanning the top surface of the object 10 with a laser beam 5au by the polygon mirror 6u, and by scanning the back surface of the object 10 with a laser beam 5ad by the polygon mirror 6d. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：即使图像被绘制在绘制对象的顶表面和后表面上，提供仅需要小的安装面积并且可以提高处理效率的激光直接绘图设备。解决方案：该装置设有多边形反射镜（偏转装置）6u，6d以及保持着绘制对象10的保持框架（保持装置）30，同时对象物10的顶面和背面露出。通过用多面反射镜6u用激光束5au扫描物体10的上表面，并且通过用物体10的背面扫描物体10的背面，同时在绘图对象10的顶表面和后表面上同时绘制图像激光束5ad由多面镜6d。版权所有（C）2009，JPO＆INPIT

56. 发明专利

JP2009075359A Laser direct imaging apparatus 有权
标题翻译：激光直射成像装置
公开(公告)号：JP2009075359A
公开(公告)日：2009-04-09
申请号：JP2007244142
申请日：2007-09-20
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： NAITO YOSHITATSU , OSHIDA YOSHITADA , SUZUKI MITSUHIRO
IPC分类号： G03F7/20
CPC分类号： G03F7/2006 , G03F7/70383
摘要： PROBLEM TO BE SOLVED: To provide a laser direct imaging apparatus capable of exposing photosensitive materials of various sensitivities and correcting an imaging position in accordance with deformation of a workpiece. SOLUTION: The laser direct imaging apparatus images a desired pattern on an object 10 to be imaged by deflecting a laser beam 5a modulated based on raster data to the main scanning direction while condensing the beam to the sub-scanning direction by a cylindrical lens 9 and by moving the object 10 in the sub-scanning direction, wherein the cylindrical lens 9 is configured in such a manner that the center P of the lens can rotate in a horizontal direction and the angle of the center axis P with respect to the main scanning direction can be changed. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够曝光各种感光度的感光材料并根据工件的变形校正成像位置的激光直接成像装置。解决方案：激光直接成像设备通过将基于光栅数据调制的激光束5a偏转到主扫描方向，将待成像的物体10上的期望图案成像，同时将光束与副扫描方向聚光成圆柱形透镜9，并且通过沿副扫描方向移动物体10，其中柱面透镜9被配置成使得透镜的中心P能够在水平方向上旋转，并且中心轴线P的角度相对于可以改变主扫描方向。版权所有（C）2009，JPO＆INPIT

57. 发明专利

JP2006267719A Method and device for pattern exposure 有权
标题翻译：用于图案曝光的方法和装置
公开(公告)号：JP2006267719A
公开(公告)日：2006-10-05
申请号：JP2005087240
申请日：2005-03-24
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITSUHIRO , YAMAGUCHI TAKESHI , MARUYAMA SHIGENOBU
IPC分类号： G03F7/20
CPC分类号： G02B26/12 , G02B26/123 , G03F7/70383 , G03F7/70466 , G03F7/70575 , G03F7/70791
摘要： PROBLEM TO BE SOLVED: To provide a method and a device for maskless exposure that can perform efficient maskless exposure with illumination light having high directivity, and to provide a method and a device for maskless exposure that can improve exposure efficiency of solder resist.
SOLUTION: A violet semiconductor laser 12A which emits a laser beam 1a of 405 nm in wavelength and an ultraviolet-light semiconductor laser 12B which emits a laser beam 1b of 375 nm in wavelength are provided to irradiate a substrate 8 with the laser beams 1a and 1b whose optical axes are made coaxial. At this time, the same place on the substrate 8 is irradiated with the laser beams 1a and 1b for a plurality of times to make variance in strength between the laser beams 1a and 1b uniform.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种无掩模曝光的方法和装置，其可以通过具有高方向性的照明光进行有效的无掩模曝光，并且提供可以提高阻焊剂的曝光效率的无掩模曝光的方法和装置。解决方案：提供发射波长为405nm的激光束1a的紫外半导体激光器12A和发射波长为375nm的激光束1b的紫外光半导体激光器12B以照射激光器其光轴同轴的光束1a和1b。此时，基板8上的相同位置用激光束1a和1b多次照射，使激光束1a和1b之间的强度变化均匀。版权所有（C）2007，JPO＆INPIT

58. 发明专利

JP2005316349A Pattern exposure method and pattern exposure apparatus 有权
标题翻译：图案曝光方法和图案曝光装置
公开(公告)号：JP2005316349A
公开(公告)日：2005-11-10
申请号：JP2004189017
申请日：2004-06-25
申请人： Hitachi Via Mechanics Ltd , 日立ビアメカニクス株式会社
发明人： OSHIDA YOSHITADA , NAITO YOSHITATSU , SUZUKI MITSUHIRO , UCHIYAMA BUNJI , YAMAGUCHI TAKESHI
IPC分类号： G02B26/10 , G02B26/12 , G03B27/54 , G03F7/20 , G03F7/22
CPC分类号： G03F7/70791 , G02B26/123 , G03F7/70383 , G03F7/70391 , G03F7/70466
摘要： PROBLEM TO BE SOLVED: To provide a pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. SOLUTION: Output faces 5 of a plurality of laser beams 1a emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror 27 while the other is a direction crossing the scanning direction of the polygon mirror 27. In this event, the array pitch of the output faces 15 arranged in the direction crossing the scanning direction of the polygon mirror 27 is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种图案曝光方法和图案曝光装置，其中通过廉价的装置提高生产量并且不降低运行成本。解决方案：从多个半导体激光器分别发射的多个激光束1a的输出面5分别布置在两个方向上。方向之一是与多面镜27的扫描方向相同的方向，而另一方向是与多面镜27的扫描方向相交的方向。在这种情况下，排列在交叉方向上的输出面15的阵列间距使多面镜27的扫描方向等于曝光图案的分辨率。在这种情况下，每个激光器的波长可以不超过410nm。版权所有（C）2006，JPO＆NCIPI

59. 发明专利

JP2002110725A METHOD FOR MOUNTING CONDUCTIVE BALL IN MOUNTER 失效
公开(公告)号：JP2002110725A
公开(公告)日：2002-04-12
申请号：JP2000300366
申请日：2000-09-29
申请人： HITACHI VIA MECHANICS LTD
发明人： OSAKA YOSHIHISA , MURAKAMI TETSUO , ARAI TOSHIHIRO , ONO NOBUFUSA , NAITO YOSHITATSU
IPC分类号： B23K3/06 , H01L21/60 , H05K3/34
摘要： PROBLEM TO BE SOLVED: To provide a method for mounting a ball in a mounter, in which the ball can be mounted efficiently, even if it is difficult to measure a mounting position (electric device) in a work. SOLUTION: When the position of an electronic device 13i can be located through measurement, the obtained data is memorized and a conductor ball is mounted as well. In other cases, the processing for recording that, location specifying could not be carried out with respect to all the electronic devices 13i is carried out. Upon the completion of the processing, when there is an electronic device 13i that cannot be located and when these are more than two electronic devices 13i that can be located, the position of the electronic device 13i that cannot be located is found through an operation, using data of the electronic device 13I that can be located. Then, the conductor ball is mounted by positioning the electronic device 13i and a holder 1 at a position found by the operation.

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