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51. 发明授权

US09080991B2 Illuminating a specimen for metrology or inspection 有权
标题翻译：照亮样本进行计量或检查
公开(公告)号：US09080991B2
公开(公告)日：2015-07-14
申请号：US13073986
申请日：2011-03-28
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性光的脉冲。照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。照明子系统被配置为将来自电光调制器的光脉冲引导到样本。

52. 发明申请

US20080252889A1 SYSTEMS AND METHODS FOR MEASUREMENT OF A SPECIMEN WITH VACUUM ULTRAVIOLET LIGHT 有权
标题翻译：用真空紫外线灯测量样品的系统和方法
公开(公告)号：US20080252889A1
公开(公告)日：2008-10-16
申请号：US12103320
申请日：2008-04-15
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

53. 发明授权

US07070476B2 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
公开(公告)号：US07070476B2
公开(公告)日：2006-07-04
申请号：US11115835
申请日：2005-04-26
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： B24B49/00
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.

54. 发明申请

US20050194971A1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
公开(公告)号：US20050194971A1
公开(公告)日：2005-09-08
申请号：US11115835
申请日：2005-04-26
申请人： Kurt Lehman , Shing Lee , Walter Johnson , John Fielden
发明人： Kurt Lehman , Shing Lee , Walter Johnson , John Fielden
IPC分类号： G01N27/72 , G01B7/06
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.

55. 发明授权

US5323110A Technique for compensating for patient motion in magnetic resonance imaging 失效
标题翻译：磁共振成像补偿患者运动的技术
公开(公告)号：US5323110A
公开(公告)日：1994-06-21
申请号：US927321
申请日：1992-08-10
申请人： John Fielden , Li-Hsin Zang , Jacob Wilbrink
发明人： John Fielden , Li-Hsin Zang , Jacob Wilbrink
IPC分类号： A61B5/055 , G01R33/48 , G01R33/567 , G01V3/00
CPC分类号： G01R33/56509 , G01R33/4835
摘要： In a magnetic resonance imaging system, object movement along an axis associated with readout magnetic gradient pulses is detected, quantized and compensated for in reconstructing an image slice. Phase-encoding magnetic gradient pulses in the sequence are arranged so that low-order phase-encoding pulses are distributed substantially uniformly during scanning time. In an N-slice acquisition, object movement is determined y arranging each of the N sets of phase-encoding gradient pulses comprising a multi-slice sequence such that at each scan time, at least one of the N sets contains a low-order phase-encoding gradient pulse. During data acquisition, echoes returned from low-order phase-encoding gradient pulses have sufficient signal-to-noise ratios to identify object position along the readout axis. Identification of object movement from one slice may be valid for other slices relatively adjacent physically in the object, so that all N slices are movement corrected during image reconstruction. Two-dimensional object position may also be identified and corrected by suitably exchanging the axes of N sets of pulses within a sequence. For a single slice acquisition, object position may be identified when scans associated with low-order phase-encoding gradient pulses are distributed evenly during imaging. After one-dimensional Fourier transformation, object position relative to a reference box function is determined using cross-correlation.
摘要翻译：在磁共振成像系统中，在重建图像切片时，检测，量化和补偿沿与读出磁梯度脉冲相关联的轴的物体运动。序列中的相位编码磁梯度脉冲被布置成使得在扫描时间期间低阶相位编码脉冲基本均匀地分布。在N切片获取中，确定对象移动，y排列包括多片段序列的N组相位编码梯度脉冲中的每一个，使得在每个扫描时间，N个集合中的至少一个包含低阶相位编码梯度脉冲。在数据采集期间，从低阶相位编码梯度脉冲返回的回波具有足够的信噪比，以识别读出轴上的物体位置。从一个切片的物体运动的识别对于物体中物理相对相邻的其它切片可能是有效的，使得在图像重建期间所有N个切片都被移动校正。也可以通过适当地交换序列内的N组脉冲的轴来识别和校正二维对象位置。对于单片采集，当与低阶相位编码梯度脉冲相关联的扫描在成像期间均匀分布时，可以识别对象位置。在一维傅里叶变换之后，使用互相关来确定相对于参考框函数的对象位置。

56. 发明授权

US08873596B2 Laser with high quality, stable output beam, and long life high conversion efficiency non-linear crystal 有权
标题翻译：激光质量高，输出光束稳定，寿命长，转换效率高的非线性晶体
公开(公告)号：US08873596B2
公开(公告)日：2014-10-28
申请号：US13412564
申请日：2012-03-05
申请人： Vladimir Dribinski , Yung-Ho Alex Chuang , J. Joseph Armstrong , John Fielden
发明人： Vladimir Dribinski , Yung-Ho Alex Chuang , J. Joseph Armstrong , John Fielden
IPC分类号： H01S3/098 , G01N21/94 , C30B29/10 , G02F1/37 , C30B33/02 , G01N21/95 , H01S3/00 , G01N21/88 , G02F1/35 , G02F1/355
CPC分类号： H01S5/0092 , C03B33/02 , C30B1/02 , C30B29/10 , C30B29/14 , C30B29/22 , C30B29/30 , C30B33/02 , G01N21/88 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2201/06113 , G01N2201/0637 , G01N2201/068 , G02F1/353 , G02F1/3551 , G02F1/3553 , G02F1/37 , G02F2001/3505 , G02F2001/3507 , G02F2001/354 , G02F2202/20 , H01S3/0092 , H01S3/10 , H01S3/10038 , H01S3/10046 , H01S3/11
摘要： A mode-locked laser system operable at low temperature can include an annealed, frequency-conversion crystal and a housing to maintain an annealed condition of the crystal during standard operation at the low temperature. In one embodiment, the crystal can have an increased length. First beam shaping optics can be configured to focus a beam from a light source to an elliptical cross section at a beam waist located in or proximate to the crystal. A harmonic separation block can divide an output from the crystal into beams of different frequencies separated in space. In one embodiment, the mode-locked laser system can further include second beam shaping optics configured to convert an elliptical cross section of the desired frequency beam into a beam with a desired aspect ratio, such as a circular cross section.
摘要翻译：可在低温下操作的模式锁定激光系统可以包括退火的频率转换晶体和壳体，以在低温下的标准操作期间保持晶体的退火状态。在一个实施例中，晶体可以具有增加的长度。第一光束整形光学元件可以被配置成将来自光源的光束聚焦到位于或接近晶体的光束腰部处的椭圆形横截面。谐波分离块可以将来自晶体的输出分成在空间中分离的不同频率的波束。在一个实施例中，锁模激光系统还可以包括第二光束整形光学器件，其被配置为将期望的频率波束的椭圆形横截面转换成具有期望的纵横比的光束，例如圆形横截面。

57. 发明授权

US07764376B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07764376B2
公开(公告)日：2010-07-27
申请号：US12506019
申请日：2009-07-20
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G03F7/70933 , G03F7/70916
摘要： Various systems for measurement of a specimen are provided. One system includes a first optical subsystem, which is disposed within a purged environment. The purged environment may be provided by a differential purging subsystem. The first optical subsystem performs measurements using vacuum ultraviolet light. This system also includes a second optical subsystem, which is disposed within a non-purged environment. The second optical subsystem performs measurements using non-vacuum ultraviolet light. Another system includes two or more optical subsystems configured to perform measurements of a specimen using vacuum ultraviolet light. The system also includes a purging subsystem configured to maintain a purged environment around the two or more optical subsystems. The purging subsystem is also configured to maintain the same level of purging in both optical subsystems. Some systems also include a cleaning subsystem configured to remove contaminants from a portion of a specimen prior to measurements at vacuum ultraviolet wavelengths.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括设置在净化环境中的第一光学子系统。净化的环境可以由差动清洗子系统提供。第一个光学子系统使用真空紫外线进行测量。该系统还包括第二光学子系统，其被布置在非净化环境中。第二光学子系统使用非真空紫外光进行测量。另一系统包括两个或更多个配置成使用真空紫外光进行样本测量的光学子系统。该系统还包括净化子系统，该净化子系统配置为保持围绕两个或更多个光学子系统的净化环境。清洗子系统还被配置为在两个光学子系统中保持相同的清洗水平。一些系统还包括清洁子系统，被配置为在真空紫外线波长测量之前从试样的一部分去除污染物。

58. 发明申请

US20100017005A1 METROLOGY THROUGH USE OF FEED FORWARD FEED SIDEWAYS AND MEASUREMENT CELL RE-USE 有权
标题翻译：通过使用饲料前进饲料的方法和测量细胞再次使用
公开(公告)号：US20100017005A1
公开(公告)日：2010-01-21
申请号：US12502112
申请日：2009-07-13
申请人： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
发明人： Michael Adel , Leonid Poslavsky , John Fielden , John Madsen , Robert Peters
IPC分类号： G06F19/00 , H01L21/66 , H01L23/58
CPC分类号： H01L22/12 , H01L22/20 , H01L22/30 , H01L2924/0002 , H01L2924/00
摘要： Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
摘要翻译：可以在半导体器件制造期间通过以下步骤来实现计量：a）对形成在部分制造的器件的层中的第一测试单元上的第一测量进行建模; b）对所述层中的第二测试单元执行第二测量; c）将第二测量中的信息馈送到第一测量的建模中; 并且在包括第一和第二测试单元的层上形成光刻图案之后，d）分别使用来自a）和b）的信息对第一和第二测试单元上的第三和第四测量进行建模。

59. 发明授权

US07623239B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07623239B2
公开(公告)日：2009-11-24
申请号：US12103320
申请日：2008-04-15
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

60. 发明授权

US09116442B2 Feedforward/feedback litho process control of stress and overlay 有权
标题翻译：前馈/反馈光刻过程控制应力和覆盖
公开(公告)号：US09116442B2
公开(公告)日：2015-08-25
申请号：US13336370
申请日：2011-12-23
申请人： Michael Adel , John Fielden , Amir Widmann , John Robinson , Dongsub Choi
发明人： Michael Adel , John Fielden , Amir Widmann , John Robinson , Dongsub Choi
IPC分类号： G03F7/20
CPC分类号： G03F7/70258 , G03F7/705 , G03F7/70525 , G03F7/70616 , G03F7/70783
摘要： A method and apparatus for process control in a lithographic process are described. Metrology may be performed on a substrate either before or after performing a patterning process on the substrate. One or more correctables to the lithographic patterning process may be generated based on the metrology. The patterning process performed on the substrate (or a subsequent substrate) may be adjusted with the correctables.
摘要翻译：描述了光刻工艺中的工艺控制的方法和装置。可以在对基板进行图案化处理之前或之后在基板上进行计量。可以基于计量产生光刻图案化过程的一个或多个可校正的方法。可以用可校正物调整在基板（或随后的基板）上执行的图案化工艺。

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