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    • 51. 发明授权
    • Method and system for inspecting electronic circuit pattern
    • 检查电路图的方法和系统
    • US07231079B2
    • 2007-06-12
    • US10050519
    • 2002-01-18
    • Hirohito OkudaYuji TakagiMasahiro WatanabeShunji MaedaMinori NoguchiYoshimasa OoshimaMakoto Ono
    • Hirohito OkudaYuji TakagiMasahiro WatanabeShunji MaedaMinori NoguchiYoshimasa OoshimaMakoto Ono
    • G06K9/00
    • G01N21/956G01N21/9501G01N2021/8854G01N2021/8861
    • For the purpose of reducing a false report and shortening inspection time, an area to be inspected is locally inspected under optimum inspection conditions. In order to avoid the number of detected defects from increasing explosively, and thereby to facilitate control of a critical defect, general-purpose layout data, which is used for producing a mask of a semiconductor wafer, is accumulated in a design information server 2. With reference to the layout data, an area to be inspected, which is inspected by a pattern inspecting apparatus 1, is divided into partial inspection areas including a cell portion and a non-cell portion. Inspection parameters are set for each of the partial inspection areas. In addition, the defect reviewing apparatus 8 obtains an inspection result of the pattern inspecting apparatus 1. When obtaining a defect image, the defect reviewing apparatus 8 identifies a position, where the defect occurred, from among a cell portion, a non-cell portion, a pattern dense portion, and the like according to layout data. Moreover, the defect reviewing apparatus 8 sets inspection parameters, such as pickup magnification of this defect, in response to a result of the identification to set a control criterion of criticality.
    • 为了减少虚假报告和缩短检查时间,在最佳检查条件下对被检查区域进行局部检查。 为了避免检测到的缺陷数量爆炸性增加,从而有利于控制关键缺陷,用于制造半导体晶片的掩模的通用布局数据被累积在设计信息服务器2中。 参照布局数据,由图案检查装置1检查的被检查区域被划分为包括单元部分和非单元部分的局部检查区域。 为每个部分检查区域设置检查参数。 另外,缺陷检查装置8获得图案检查装置1的检查结果。 当获得缺陷图像时,缺陷检查装置8根据布局数据从单元部分,非单元部分,图案密集部分等中识别发生缺陷的位置。 此外,缺陷检查装置8响应于识别的结果设置检查参数,例如该缺陷的拾取倍率,以设置关键性的控制标准。
    • 57. 发明授权
    • Visualization apparatus and method
    • 可视化装置和方法
    • US09324187B2
    • 2016-04-26
    • US13565842
    • 2012-08-03
    • Masahiro Watanabe
    • Masahiro Watanabe
    • G06T15/00G06T19/00
    • G06T19/00
    • A visualization process visualizes a visualization range of a three-dimensional model based on physical values of regions of the model. The visualization process may include setting the visualization range, projecting the physical values corresponding to the visualization range onto a visualization plane, designating a coloring range for the projected physical values within the visualization range based on the physical values, defining color information that determines a relationship of the physical values and colors based on the coloring range, and coloring the visualization range based on the color information and the coloring range.
    • 可视化过程基于模型区域的物理值可视化三维模型的可视化范围。 可视化过程可以包括设置可视化范围,将对应于可视化范围的物理值投影到可视平面上,基于物理值指定可视化范围内的投影物理值的着色范围,定义确定关系的颜色信息 基于着色范围的物理值和颜色,以及基于颜色信息和着色范围着色可视化范围。