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    • 57. 发明申请
    • Full wave rectified power water treatment device
    • 全波整流动力水处理装置
    • US20070080588A1
    • 2007-04-12
    • US11248776
    • 2005-10-11
    • Richard MerrillJohn Lane
    • Richard MerrillJohn Lane
    • H05K7/14
    • C02F1/48C02F2201/483
    • A fluid treatment device includes an AC power source connected to first, second and third conductors. A electromagnetic field generating device is positioned adjacent to a fluid conduit, electrically connected to the first and third conductors to form a first circuit. A second electromagnetic field generating device is positioned adjacent to a second fluid conduit, electrically connected to the second and third electrical conductors to form a second circuit. A circuit element in the first circuit initiates a high frequency electromagnetic field at said first electromagnetic field generating device during a first half of the AC wave form in the first circuit, and a circuit element in the second circuit initiates a high frequency electromagnetic field at said first electromagnetic field generating device during a second half of the AC wave form in the second circuit.
    • 流体处理装置包括连接到第一,第二和第三导体的AC电源。 电磁场产生装置邻近流体导管定位,电连接到第一和第三导体以形成第一电路。 第二电磁场产生装置邻近第二流体导管定位,电连接到第二和第三电导体以形成第二电路。 第一电路中的电路元件在第一电路的AC波形的前半部分期间在所述第一电磁场产生装置处发起高频电磁场,并且第二电路中的电路元件在所述第一电路中启动高频电磁场 在第二电路中的交流波形的第二半期间的第一电磁场产生装置。
    • 60. 发明申请
    • Method and apparatus for substrate temperature control
    • 基板温度控制方法和装置
    • US20050120805A1
    • 2005-06-09
    • US10838175
    • 2004-05-03
    • John LaneRalph StraubeChris Melcer
    • John LaneRalph StraubeChris Melcer
    • C23C16/455G01M9/00H01J37/32
    • H01J37/32449C23C16/45557C23C16/466H01J37/3244
    • A method and apparatus for gas control is provided. The apparatus may be used for controlling gases delivered to a chamber, controlling the chamber pressure, controlling the delivery of backside gas between a substrate and substrate support and the like. In one embodiment, an apparatus for controlling gas control includes at least a first flow sensor having a control valve, a first pressure sensor and at least a second pressure sensor. An inlet of the first flow sensor is adapted for coupling to a gas supply. A control valve is coupled to an outlet of the flow sensor. The first pressure sensor is adapted to sense a metric indicative of the pressure upstream of the first flow sensor. The second pressure sensor is adapted to sense a metric indicative of the pressure downstream of the control valve.
    • 提供了一种用于气体控制的方法和装置。 该装置可以用于控制输送到室的气体,控制室压力,控制衬底和衬底支撑件之间的背面气体的传送等。 在一个实施例中,用于控制气体控制的装置包括至少第一流量传感器,其具有控制阀,第一压力传感器和至少第二压力传感器。 第一流量传感器的入口适于联接到气体供应。 控制阀联接到流量传感器的出口。 第一压力传感器适于感测指示第一流量传感器上游的压力的度量。 第二压力传感器适于感测指示控制阀下游的压力的量度。