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    • 57. 发明申请
    • METHOD OF MANUFACTURING SEMICONDUCTOR WAFER, AND COMPOSITE BASE AND COMPOSITE SUBSTRATE FOR USE IN THAT METHOD
    • 制造半导体波形的方法以及用于该方法的复合基底和复合基板
    • US20120228613A1
    • 2012-09-13
    • US13107286
    • 2011-05-13
    • Yuki SEKIIssei SatohKoji UematsuYoshiyuki Yamamoto
    • Yuki SEKIIssei SatohKoji UematsuYoshiyuki Yamamoto
    • H01L29/04B32B3/00H01L27/12H01L29/02H01L21/762H01L29/22
    • H01L29/0684B32B2264/102B32B2307/704B32B2457/14H01L21/76254
    • A method of manufacturing a semiconductor wafer of the present invention includes the steps of: obtaining a composite base by forming a base surface flattening layer having a surface RMS roughness of not more than 1.0 nm on a base; obtaining a composite substrate by attaching a semiconductor crystal layer to a side of the composite base where the base surface flattening layer is located; growing at least one semiconductor layer on the semiconductor crystal layer of the composite substrate; and obtaining the semiconductor wafer including the semiconductor crystal layer and the semiconductor layer by removing the base surface flattening layer by wet etching and thereby separating the semiconductor crystal layer from the base. Thus, a method of manufacturing a semiconductor wafer capable of efficiently manufacturing the semiconductor wafer regardless of the type of a base, and a composite base and a composite substrate suitably used in that manufacturing method are provided to efficiently manufacture a semiconductor device.
    • 本发明的制造半导体晶片的方法包括以下步骤:通过在基底上形成表面RMS粗糙度不大于1.0nm的基面平坦化层来获得复合基底; 通过将半导体晶体层附着到所述复合基底的所述基面平坦化层所在的一侧来获得复合基板; 在复合衬底的半导体晶体层上生长至少一个半导体层; 以及通过湿法蚀刻去除基底表面平坦化层,从而将半导体晶体层与基底分离,从而获得包括半导体晶体层和半导体层的半导体晶片。 因此,提供一种制造半导体晶片的方法,而不管基底的类型如何,以及适用于该制造方法的复合基底和复合基底都能有效地制造半导体晶片,以有效地制造半导体器件。
    • 58. 发明申请
    • Nitride Semiconductor Crystal Manufacturing Apparatus, Nitride Semiconductor Crystal Manufacturing Method, and Nitride Semiconductor Crystal
    • 氮化物半导体晶体制造装置,氮化物半导体晶体制造方法和氮化物半导体晶体
    • US20110171462A1
    • 2011-07-14
    • US13060276
    • 2010-01-20
    • Issei SatohMichimasa MiyanagaYoshiyuki YamamotoHideaki Nakahata
    • Issei SatohMichimasa MiyanagaYoshiyuki YamamotoHideaki Nakahata
    • C01B21/072C23C16/448C23C16/34C30B23/00B32B5/00
    • C30B23/066C30B29/403
    • Affords nitride semiconductor crystal manufacturing apparatuses that are durable and that are for manufacturing nitride semiconductor crystal in which the immixing of impurities from outside the crucible is kept under control, and makes methods for manufacturing such nitride semiconductor crystal, and the nitride semiconductor crystal itself, available.A nitride semiconductor crystal manufacturing apparatus (100) is furnished with a crucible (101), a heating unit (125), and a covering component (110). The crucible (101) is where, interiorly, source material (17) is disposed. The heating unit (125) is disposed about the outer periphery of the crucible (101), where it heats the crucible (101) interior. The covering component (110) is arranged in between the crucible (101) and the heating unit (125). The covering component (110) includes a first layer (111) formed along the side opposing the crucible (101), and made of a metal whose melting point is higher than that of the source material (17), and a second layer (112) formed along the outer periphery of the first layer (111), and made of a carbide of the metal that constitutes the first layer (111).
    • 使氮化物半导体晶体制造装置耐久,并且用于制造氮化物半导体晶体,其中坩埚外部杂质的固定被控制,并且制造这种氮化物半导体晶体的方法和氮化物半导体晶体本身可用 。 氮化物半导体晶体制造装置(100)具有坩埚(101),加热单元(125)和覆盖部件(110)。 坩埚(101)内部设置有源材料(17)。 加热单元(125)围绕坩埚(101)的外周设置,其中坩埚(101)内部加热。 覆盖部件(110)布置在坩埚(101)和加热单元(125)之间。 覆盖部件(110)包括沿与坩埚(101)相对的一侧形成的由熔点高于源材料(17)的金属制成的第一层(111)和第二层(112) )沿着第一层(111)的外周形成,并且由构成第一层(111)的金属的碳化物构成。