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51. 发明申请

WO2018166637A1 DEPOSITION SYSTEM, DEPOSITION APPARATUS, AND METHOD OF OPERATING A DEPOSITION SYSTEM 审中-公开
公开(公告)号：WO2018166637A1
公开(公告)日：2018-09-20
申请号：PCT/EP2017/058829
申请日：2017-04-12
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , KREBS, Matthias
发明人： BANGERT, Stefan , KREBS, Matthias
IPC分类号： C23C14/24 , C23C14/56 , H01L51/00
摘要： A deposition system (100) for depositing evaporated material on a substrate is described. The deposition system (100) includes a vapor source (120) having one or more vapor outlets (125); a shield (110); and a cooling device (112) for cooling the shield, wherein the vapor source (120) is movable to an idle position (I) in which the one or more vapor outlets (125) are directed toward the shield (110). Further, a deposition apparatus (1000) with a deposition system (100) as well as a method of operating a deposition system are described.

52. 发明申请

WO2018153482A1 DEPOSITION SOURCE 审中-公开
公开(公告)号：WO2018153482A1
公开(公告)日：2018-08-30
申请号：PCT/EP2017/054359
申请日：2017-02-24
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan
IPC分类号： C23C14/24
CPC分类号： C23C14/243 , C23C14/24
摘要： A deposition source (100) for depositing evaporated material on a substrate (10) is described. The deposition source includes a distribution pipe assembly (120) with a plurality of nozzles (130) configured for directing the evaporated material toward the substrate, wherein at least one nozzle (131) of the plurality of nozzles is provided with a closing mechanism (151) configured for opening and closing the at least one nozzle. Further, a deposition apparatus (1000) with a deposition source (100) as well as a method of depositing evaporated material on a substrate are described.

53. 发明申请

WO2018153480A1 POSITIONING ARRANGEMENT FOR A SUBSTRATE CARRIER AND A MASK CARRIER, TRANSPORTATION SYSTEM FOR A SUBSTRATE CARRIER AND A MASK CARRIER, AND METHODS THEREFOR 审中-公开
公开(公告)号：WO2018153480A1
公开(公告)日：2018-08-30
申请号：PCT/EP2017/054356
申请日：2017-02-24
申请人： APPLIED MATERIALS, INC. , HEYMANNS, Matthias , HEIMEL, Oliver , BANGERT, Stefan , HENRICH, Jürgen , SAUER, Andreas
发明人： HEYMANNS, Matthias , HEIMEL, Oliver , BANGERT, Stefan , HENRICH, Jürgen , SAUER, Andreas , VERCESI, Tommaso
IPC分类号： C23C14/04 , C23C14/50 , C23C14/56 , H01L21/67 , H01L21/677
摘要： A positioning arrangement (100) for positioning a substrate carrier (150) and a mask carrier (160) in a vacuum chamber is described. The positioning arrangement (100) comprising a first track (110) extending in a first direction and configured transportation of the substrate carrier (150) configured for holding a substrate having a substrate surface, a second track (120) extending in the first direction and configured for transportation of the mask carrier (160), wherein the first track (110) and the second track (120) are offset by an offset distance (D) in a plane coplanar with the substrate surface, and a holding arrangement (130) configured for holding the mask carrier (160), wherein the holding arrangement (130) is arranged between the first track (110) and the second track (120)..

54. 发明申请

WO2017194097A1 EVAPORATION SOURCE FOR DEPOSITING AN EVAPORATED MATERIAL, AND METHOD FOR DEPOSITING AN EVAPORATED MATERIAL 审中-公开
标题翻译：用于沉积蒸发材料的蒸发源以及沉积蒸发材料的方法
公开(公告)号：WO2017194097A1
公开(公告)日：2017-11-16
申请号：PCT/EP2016/060439
申请日：2016-05-10
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
发明人： DIEGUEZ-CAMPO, Jose Manuel , BANGERT, Stefan , WURSTER, Harald , LOPP, Andreas , HAAS, Dieter
IPC分类号： C23C14/04 , C23C14/12 , C23C14/24 , H01L51/00
CPC分类号： C23C14/24 , C23C14/04 , C23C14/042 , C23C14/12 , C23C14/243 , H01L51/001 , H01L51/50
摘要： Embodiments described herein relate to an evaporation source (20) for depositing an evaporated source material on a substrate. The evaporation source (20) comprises one or more distribution pipes (106) with a plurality of nozzles (22), wherein each nozzle of the plurality of nozzles (22) is configured for directing a plume of evaporated source material toward the substrate (10); and a shielding device (30) comprising a plurality of apertures (32), wherein at least one aperture of the plurality of apertures (32) is configured to shape the plume (318) of evaporated source material emitted from a single associated nozzle. According to a further aspect, a shielding device for an evaporation source as well as methods of depositing an evaporated source material on a substrate are described.
摘要翻译：这里描述的实施例涉及用于将蒸发的源材料沉积在基底上的蒸发源（20）。所述蒸发源（20）包括具有多个喷嘴（22）的一个或多个分配管（106），其中所述多个喷嘴（22）中的每个喷嘴被配置用于将蒸发源材料的羽流朝向所述衬底（10 ）; 以及包括多个孔（32）的防护装置（30），其中所述多个孔（32）中的至少一个孔配置成对从单个相关联的喷嘴发射的蒸发源材料的羽流（318）进行成形。根据另一方面，描述了用于蒸发源的屏蔽装置以及在基底上沉积蒸发的源材料的方法。

55. 发明申请

WO2017121491A1 EVAPORATION SOURCE, APPARATUS AND METHOD FOR DEPOSITING ORGANIC MATERIAL 审中-公开
标题翻译：用于沉积有机材料的蒸发源，装置和方法
公开(公告)号：WO2017121491A1
公开(公告)日：2017-07-20
申请号：PCT/EP2016/050824
申请日：2016-01-15
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , LOPP, Andreas
发明人： BANGERT, Stefan , LOPP, Andreas
IPC分类号： C23C14/04 , C23C14/24
CPC分类号： C23C14/042 , C23C14/24 , C23C14/243
摘要： An evaporation source (100) for depositing a source material on a substrate (10) is described. The evaporation source includes an evaporation crucible (104), wherein the evaporation crucible is configured to evaporate the source material; a distribution unit (130) with one or more outlets (212), wherein the distribution unit is in fluid communication with the evaporation crucible, and wherein the one or more outlets are configured for providing the source material to the substrate in a deposition direction (101); a first cooling shield arrangement (201) provided including one or more openings (221); a heated shield arrangement (202) provided at a distance from the first cooling shield arrangement (201), wherein the heated shield arrangement (202) includes one or more apertures (222). The first cooling shield arrangement (201)is arranged between the distribution unit (130) and the heated shield arrangement (202) and the evaporation source (100) is configured to define a path for the source material in the deposition direction (101) from the one or more outlets (212) through the one or more openings (221) and the one or more apertures (222) to the substrate.
摘要翻译：描述用于在衬底（10）上沉积源材料的蒸发源（100）。蒸发源包括蒸发坩埚（104），其中蒸发坩埚配置为蒸发源材料; 具有一个或多个出口（212）的分配单元（130），其中所述分配单元与所述蒸发坩埚流体连通，并且其中所述一个或多个出口被配置用于沿着沉积方向将所述源材料提供给所述衬底 101）; 提供包括一个或多个开口（221）的第一冷却屏蔽装置（201）; 加热的屏蔽装置（202），其设置在与第一冷却屏蔽装置（201）相距一段距离处，其中加热的屏蔽装置（202）包括一个或多个孔（222）。第一冷却屏蔽装置（201）布置在分配单元（130）和加热的屏蔽装置（202）之间，并且蒸发源（100）被配置成限定来自沉积方向（101）的源材料的路径所述一个或多个出口（212）穿过所述一个或多个开口（221）并且所述一个或多个孔（222）通向所述衬底。

56. 发明申请

WO2017005290A8 CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE 审中-公开
标题翻译：用于在至少一个基板上支撑至少一个基板的载体，用于至少一个基板上的溅射沉积的设备以及用于在至少一个基板上溅射沉积的方法
公开(公告)号：WO2017005290A8
公开(公告)日：2017-01-12
申请号：PCT/EP2015/065366
申请日：2015-07-06
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , BRÜNING, Andre , SCHÜßLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
发明人： KELLER, Stefan , BRÜNING, Andre , SCHÜßLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
IPC分类号： C23C14/50 , C23C14/56 , H01J37/32 , C23C14/34
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
摘要翻译：提供了用于在溅射沉积过程期间支撑至少一个衬底的载体（100）。载体（100）包括载体主体（102）和设置在载体主体（102）处的绝缘部分。绝缘部分提供电绝缘材料的表面（103），其中表面（103）被配置为在溅射沉积工艺期间面向一个或多个溅射沉积源。

57. 发明申请

WO2016202388A1 MEASUREMENT ASSEMBLY FOR MEASURING A DEPOSITION RATE AND METHOD THEREFORE 审中-公开
标题翻译：用于测量沉积速率的测量装置及其方法
公开(公告)号：WO2016202388A1
公开(公告)日：2016-12-22
申请号：PCT/EP2015/063637
申请日：2015-06-17
申请人： APPLIED MATERIALS, INC. , DIEGUEZ-CAMPO, Jose Manuel , KEIM, Karl-Albert , BANGERT, Stefan , LANDGRAF, Heike
发明人： DIEGUEZ-CAMPO, Jose Manuel , KEIM, Karl-Albert , BANGERT, Stefan , LANDGRAF, Heike
IPC分类号： C23C14/24 , C23C14/54 , G01N29/02
CPC分类号： C23C14/546 , C23C14/243 , G01N29/022 , G01N29/036 , G01N2291/014 , G01N2291/0256
摘要： A measurement assembly (100) for measuring a deposition rate of an evaporated material is described. The measurement assembly (100) includes an oscillation crystal (110) for measuring the deposition rate, and a holder (120) for holding the oscillation crystal (110), wherein the holder comprises a material having a thermal conductivity k above k=30 W/(m K).
摘要翻译：描述了用于测量蒸发材料的沉积速率的测量组件（100）。测量组件（100）包括用于测量沉积速率的振荡晶体（110）和用于保持振荡晶体（110）的保持器（120），其中保持器包括热导率k高于k = 30W的材料 /（m K）。

58. 发明申请

WO2016082874A1 CRUCIBLE ASSEMBLY FOR EVAPORATION PURPOSES 审中-公开
标题翻译：用于蒸发目的的大会
公开(公告)号：WO2016082874A1
公开(公告)日：2016-06-02
申请号：PCT/EP2014/075686
申请日：2014-11-26
申请人： APPLIED MATERIALS, INC. , SCHÜSSLER, Uwe , BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , LOPP, Andreas
发明人： SCHÜSSLER, Uwe , BANGERT, Stefan , DIEGUEZ-CAMPO, Jose Manuel , LOPP, Andreas
IPC分类号： C23C14/24 , C23C14/12 , C23C14/54 , F27B14/10 , F27B14/00
CPC分类号： C23C14/243 , C23C14/12 , C23C14/542 , F27D5/0037
摘要： In general, the present disclosure relates to systems, apparatuses and methods for depositing materials. In particular, the present disclosure relates to a crucible for evaporating a source material. The crucible has a wall with an inner surface surrounding an inner volume for receiving the source material and one or more heat transfer elements arranged within the inner volume of the crucible.
摘要翻译：通常，本公开涉及用于沉积材料的系统，装置和方法。特别地，本公开涉及用于蒸发源材料的坩埚。坩埚具有壁，内壁包围着用于容纳源材料的内部容积和布置在坩埚的内部容积内的一个或多个传热元件。

59. 发明申请

WO2016070942A1 MATERIAL DEPOSITION ARRANGEMENT AND MATERIAL DISTRIBUTION ARRANGEMENT FOR VACUUM DEPOSITION 审中-公开
标题翻译：真空沉积物的材料沉积布置和材料分配布置
公开(公告)号：WO2016070942A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074089
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , LOPP, Andreas , GEBELE, Thomas , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel
发明人： BANGERT, Stefan , LOPP, Andreas , GEBELE, Thomas , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： C23C14/12 , C23C14/24 , C23C16/455 , C23C14/04 , H05B33/10
CPC分类号： C23C14/12 , C23C14/042 , C23C14/24 , C23C16/45578
摘要： A material deposition arrangement (100) for depositing evaporated materials on a substrate (121) in a vacuum chamber (110) is described. The material deposition arrangement includes two material deposition sources (100a, 100b), each having a distribution pipe (106a, 106b) and one or more nozzles (712). Further, a vacuum deposition chamber including a material deposition arrangement and a method for depositing an evaporated material on a substrate in a vacuum deposition chamber is described.
摘要翻译：描述了用于在真空室（110）中的衬底（121）上沉积蒸发材料的材料沉积装置（100）。材料沉积装置包括两个材料沉积源（100a，100b），每个具有分配管（106a，106b）和一个或多个喷嘴（712）。此外，描述了包括材料沉积装置的真空沉积室和用于在真空沉积室中在基板上沉积蒸发材料的方法。

60. 发明申请

WO2016070941A1 MATERIAL SOURCE ARRANGMENT AND NOZZLE FOR VACUUM DEPOSITION 审中-公开
标题翻译：用于真空沉积的材料来源安装和喷嘴
公开(公告)号：WO2016070941A1
公开(公告)日：2016-05-12
申请号：PCT/EP2014/074088
申请日：2014-11-07
申请人： APPLIED MATERIALS, INC. , BANGERT, Stefan , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel
发明人： BANGERT, Stefan , SCHÜSSLER, Uwe , DIEGUEZ-CAMPO, Jose Manuel
IPC分类号： C23C14/12 , C23C14/56 , C23C16/455 , C23C14/24
CPC分类号： C23C14/24 , C23C14/12 , C23C14/562 , C23C16/45578
摘要： A material source arrangement (100) for depositing a material on a substrate (121) in a vacuum deposition chamber (110) is described. The material source arrangement includes a distribution pipe (106) being configured to be in fluid communication with a material source (102) providing the material to the distribution pipe (106); and at least one nozzle (200; 712) configured for guiding the material provided in the distribution pipe (106) to the vacuum deposition chamber (110). The nozzle (200; 712) includes a thread for repeatedly connecting and disconnecting the nozzle to the distribution pipe. Further, a deposition apparatus (300) for depositing material on a substrate (121) including a material source arrangement, a nozzle for a material source arrangement, and a method for providing a distribution pipe (106) and a nozzle (200; 712) for a material source arrangement (100) are described.
摘要翻译：描述了用于在真空沉积室（110）中的衬底（121）上沉积材料的材料源装置（100）。所述材料源装置包括分配管（106），其配置成与将所述材料提供给所述分配管（106）的材料源（102）流体连通; 以及至少一个喷嘴（200; 712），其构造成将设置在分配管（106）中的材料引导到真空沉积室（110）。喷嘴（200; 712）包括用于将喷嘴重复地连接和分离到分配管的螺纹。此外，用于在包括材料源装置的基板（121）上沉积材料的沉积装置（300），用于材料源装置的喷嘴和用于提供分配管（106）和喷嘴（200; 712）的方法，描述了材料源装置（100）。

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