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    • 51. 发明授权
    • Method and apparatus for plasma processing
    • 等离子体处理方法和装置
    • US08366870B2
    • 2013-02-05
    • US13103666
    • 2011-05-09
    • Ryoji NishioTadamitsu KanekiyoYoshiyuki OotaTsuyoshi Matsumoto
    • Ryoji NishioTadamitsu KanekiyoYoshiyuki OotaTsuyoshi Matsumoto
    • C23F1/08H01L21/66
    • G06F17/5081G06F17/5086H01J37/32082H01J37/32642H01J37/32935H01L21/67069H01L21/6875
    • The invention provides a plasma processing apparatus capable of minimizing the non-uniformity of potential distribution around wafer circumference, and providing a uniform process across the wafer surface. The apparatus is equipped with a focus ring formed of a dielectric, a conductor or a semiconductor and having RF applied thereto, the design of which is optimized for processing based on a design technique clarifying physical conditions for flattening a sheath-plasma interface above a wafer and the sheath-plasma interface above the focus ring. A surface voltage of the focus ring is determined to be not less than a minimum voltage for preventing reaction products caused by wafer processing from depositing thereon. The surface height, surface voltage, material and structure of the focus ring are optimized so that the height of an ion sheath formed on the focus ring surface is either equal or has a height difference within an appropriate tolerance range to the height of the ion sheath formed on the wafer surface. Optimization of the structure is realized by setting up an appropriate tolerance range taking into consideration the variation caused by consumption of the focus ring.
    • 本发明提供一种等离子体处理装置,其能够最小化晶片周边周围的电位分布的不均匀性,并且跨晶片表面提供均匀的工艺。 该装置配备有由电介质,导体或半导体形成的并且施加RF的聚焦环,其设计被优化用于基于澄清用于使晶片上的鞘等离子体界面平坦化的物理条件的设计技术进行处理 以及聚焦环上方的鞘 - 等离子体界面。 聚焦环的表面电压被确定为不低于用于防止由晶片加工引起的反应产物沉积在其上的最小电压。 聚焦环的表面高度,表面电压,材料和结构被优化,使得形成在聚焦环表面上的离子鞘的高度相等或具有在离子鞘高度适当的公差范围内的高度差 形成在晶片表面上。 通过考虑由聚焦环的消耗引起的变化,建立适当的公差范围来实现结构的优化。
    • 55. 发明授权
    • Shooting lens having vibration reducing function and camera system for same
    • 具有减震功能的拍摄镜头及相机系统
    • US08259183B2
    • 2012-09-04
    • US13064323
    • 2011-03-18
    • Hiroyuki TomitaKazutoshi UsuiTsuyoshi Matsumoto
    • Hiroyuki TomitaKazutoshi UsuiTsuyoshi Matsumoto
    • H04N5/228G03B17/00
    • H04N5/23248H04N5/23254H04N5/23258H04N5/23287
    • The invention includes a vibration reduction mechanism, a vibration detecting part, a reference signal generating part, a target drive position calculating part, and a driving part. The vibration reduction mechanism reduces a vibration of a subject image. The vibration detecting part outputs a vibration detection signal. The reference signal generating part estimates a reference signal of the vibration detection part. The target drive position calculating part obtains a vibration component from a difference between the vibration detection signal and the estimated reference signal to obtain a target position to which the vibration reduction mechanism is driven. The driving part controls the vibration reduction mechanism to follow the target position. Particularly, the reference signal generating part corrects the reference signal according to a motion signal obtained from a captured image. An accurate reference signal can be obtained by the correction, thereby improving the performance of the vibration reduction.
    • 本发明包括减振机构,振动检测部分,参考信号产生部分,目标驱动位置计算部分和驱动部分。 减振机构减少被摄体图像的振动。 振动检测部输出振动检测信号。 基准信号生成部估计振动检测部的基准信号。 目标驱动位置计算部分根据振动检测信号和估计的参考信号之间的差异获得振动分量,以获得驱动减振机构的目标位置。 驱动部件控制减振机构跟随目标位置。 特别地,参考信号生成部根据从拍摄图像获得的运动信号来校正参考信号。 通过校正可以获得准确的参考信号,从而提高振动降低的性能。
    • 57. 发明申请
    • MICRO MOVABLE ELEMENT ARRAY AND A COMMUNICATION APPARATUS
    • 微移动元件阵列和通讯装置
    • US20120057214A1
    • 2012-03-08
    • US13225097
    • 2011-09-02
    • Osamu TsuboiNorinao KoumaTsuyoshi Matsumoto
    • Osamu TsuboiNorinao KoumaTsuyoshi Matsumoto
    • G02B26/08
    • G02B26/0841
    • A micro movable element array includes a first frame; a second frame; a first movable part row including plural first movable parts and a second movable part row including plural second movable parts. The first movable parts include first movable main parts. The second movable parts include second movable main parts. The first and second frames are stacked such that the first and second movable part rows are opposed to each other. In the first movable part row, the first movable parts are located such that the first movable main parts are arranged in a first direction and the first movable main parts and gaps are disposed alternately. In the second movable part row, the second movable parts are located such that the second movable main parts are arranged in the first direction and the second movable main parts are opposed to the corresponding gaps.
    • 微型可移动元件阵列包括第一框架; 第二帧; 包括多个第一可移动部分的第一可移动部分行和包括多个第二可移动部分的第二可移动部分行。 第一可移动部件包括第一可移动主要部件。 第二可移动部件包括第二可移动主体部件。 第一和第二框架被堆叠成使得第一和第二可移动部件行彼此相对。 在第一可动部分行中,第一可移动部分被定位成使得第一可移动主体部分沿第一方向布置,并且第一可移动主体部分和间隙交替设置。 在第二可移动部分行中,第二可移动部分被定位成使得第二可移动主体部分沿第一方向布置,并且第二可移动主体部分与相应的间隙相对。
    • 58. 发明授权
    • Plasma processing apparatus
    • 等离子体处理装置
    • US08083888B2
    • 2011-12-27
    • US12041741
    • 2008-03-04
    • Tatehito UsuiTsuyoshi YoshidaTsuyoshi MatsumotoSatoru MutoKenetsu Yokogawa
    • Tatehito UsuiTsuyoshi YoshidaTsuyoshi MatsumotoSatoru MutoKenetsu Yokogawa
    • H01L21/00C23C14/00C23C16/00
    • H01J37/32972G01N21/68H01J37/32091H01J37/32935
    • The invention provides a plasma processing apparatus for measuring the etching quantity of the material being processed and detecting the end point of etching using optical interference on the surface of a sample being processed, so as to simultaneously realize long life and ensure sufficient light to be received via a light transmitting unit, to enable long term stable operation and to improve the processing accuracy via accurate etching quantity detection. In a plasma processing apparatus for processing a sample being processed by generating plasma between a shower plate and a lower electrode, a detector for detecting light from a surface of the sample being processed via the shower plate includes a light transmitting unit composed of a light guide into which light is entered and a spectroscope for analyzing the light obtained by the light transmitting unit, wherein the end surface of the light transmitting unit through which light is entered is arranged at a distance of five times or greater of the mean free path of gas molecules within the vacuum reactor from the end surface of the shower plate facing the plasma.
    • 本发明提供了一种用于测量被处理材料的蚀刻量的等离子体处理装置,并且利用正在处理的样品表面上的光学干涉来检测蚀刻终点,以同时实现长寿命并确保足够的光被接收 通过光发射单元,能够进行长期稳定的操作,并通过精确的蚀刻量检测来提高加工精度。 在用于通过在淋浴板和下部电极之间产生等离子体来处理被处理样品的等离子体处理装置中,用于检测经由淋浴板处理的样品的表面的光的检测器包括:光导体, 进入光的分光器和用于分析由光发射单元获得的光的分光镜,其中进入光的光透射单元的端面布置在气体的平均自由程的五倍或更大的距离 真空反应器内的分子从淋浴板的端面朝向等离子体。
    • 59. 发明申请
    • Sound recording device, imaging device, photographing device, optical device, and program
    • 录音装置,成像装置,拍摄装置,光学装置和程序
    • US20110234848A1
    • 2011-09-29
    • US12913907
    • 2010-10-28
    • Tsuyoshi MATSUMOTOMitsuhiro OKAZAKI
    • Tsuyoshi MATSUMOTOMitsuhiro OKAZAKI
    • H04N5/225G06F17/00
    • H04N5/2328H04N5/23254
    • A sound recording device includes an input unit, a timing detection unit, a section setting unit that sets a first section including a section in which an operation unit operates in a sound signal, a reference signal determination unit that determines, as a first reference signal, the sound signal corresponding to a second section following the first section, a signal detection unit that detects, as a second reference signal, a sound signal with the highest correlation with the first reference signal, an interpolation signal detection unit that detects, as an interpolation signal, a sound signal that follows the second reference signal detected by the signal detection unit in the sound signal and has the same time length as the first section, a signal replacement unit that replaces the sound signal in the first section with the interpolation signal, and a recording unit that records the sound signal replaced by the signal replacement unit.
    • 声音记录装置包括输入单元,定时检测单元,设置包括操作单元在声音信号中进行操作的区间的第一区间的区间设定单元,将基准信号决定单元确定为第一基准信号 所述声音信号对应于在所述第一部分之后的第二部分,信号检测单元,其检测与所述第一参考信号具有最高相关性的声音信号作为第二参考信号;插值信号检测单元, 插补信号,跟随由信号检测单元在声音信号中检测到的第二参考信号的声音信号,并且具有与第一部分相同的时间长度;信号替换单元,用第一部分替换第一部分中的声音信号, 以及记录单元,其记录由信号更换单元替换的声音信号。