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51. 发明申请

US20190088448A1 Method for Irradiating a Target Using Restricted Placement Grids 审中-公开
公开(公告)号：US20190088448A1
公开(公告)日：2019-03-21
申请号：US16133578
申请日：2018-09-17
申请人： IMS Nanofabrication GmbH
发明人： Elmar Platzgummer , Christoph Spengler , Wolf Naetar
IPC分类号： H01J37/317
摘要： A method for irradiating a target with a beam of energetic electrically charged particles, wherein the target comprises an exposure region where an exposure by said beam is to be performed, and the exposure of a desired pattern is done employing a multitude of exposure positions on the target. Each exposure position represents the location of one of a multitude of exposure spots of uniform size and shape, with each exposure spot covering at least one pattern pixel of the desired pattern. The exposure positions are located within a number of mutually separate cluster areas which are defined at respective fixed locations on the target. In each cluster area the exposure position are within a given neighboring distance to a next neighboring exposure position, while the cluster areas are separated from each other by spaces free of exposure positions, which space has a width, which is at least the double of the neighboring distance.

52. 发明授权

US07388217B2 Particle-optical projection system 有权
标题翻译：粒子投影系统
公开(公告)号：US07388217B2
公开(公告)日：2008-06-17
申请号：US11700468
申请日：2007-01-31
申请人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
发明人： Herbert Buschbeck , Gertraud Lammer , Alfred Chalupka , Robert Nowak , Elmar Platzgummer , Gerhard Stengl
IPC分类号： H01J37/302 , H01L21/027
CPC分类号： H01J37/3177 , B82Y10/00 , B82Y40/00 , H01J37/21 , H01J37/304 , H01J2237/024 , H01J2237/10 , H01J2237/216 , H01J2237/30455
摘要： In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.
摘要翻译：在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

53. 发明授权

US07199373B2 Particle-optic electrostatic lens 有权
标题翻译：粒子静电透镜
公开(公告)号：US07199373B2
公开(公告)日：2007-04-03
申请号：US10951087
申请日：2004-09-27
申请人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
发明人： Gerhard Stengl , Herbert Buschbeck , Gertraud Lammer
IPC分类号： G21K1/08 , H01J3/14
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/12 , H01J2237/3175
摘要： In a charged-particle beam exposure device, an electrostatic lens (ML) comprises several (at least three) electrodes with rotational symmetry (EFR, EM, EFN) surrounding a particle beam path; the electrodes are arranged coaxially on a common optical axis representing the center of said particle beam path and are fed different electrostatic potentials through electric supplies. At least a subset of the electrodes (EM) form an electrode column realized as a series of electrodes of substantially equal shape arranged in consecutive order along the optical axis, wherein outer portions of said electrodes (EM) of the electrode column have outer portions (OR) of corresponding opposing surfaces (f1, f2) facing toward the next and previous electrodes, respectively. Preferably, the length of the electrode column is at least 4.1 times (3 times) the inner radius (ri1) of said surfaces (f1, f2).
摘要翻译：在带电粒子束曝光装置中，静电透镜（ML）包括围绕粒子束路径的旋转对称（EFR，EM，EFN）的几个（至少三个）电极; 电极同轴地布置在表示所述粒子束路径的中心的公共光轴上，并且通过电源馈送不同的静电电位。电极（EM）的至少一个子集形成电极柱，其实现为沿着光轴以连续顺序布置的基本相同形状的一系列电极，其中电极柱的所述电极（EM）的外部部分具有外部部分 OR）分别面向下一个和前一个电极的对应的相对表面（f 1，f 2）。优选地，电极柱的长度为所述表面（f 1，f 2）的内半径（ri 1）的至少4.1倍（3倍）。

54. 发明授权

US07084411B2 Pattern-definition device for maskless particle-beam exposure apparatus 有权
标题翻译：无掩模粒子束曝光装置的图案定义装置
公开(公告)号：US07084411B2
公开(公告)日：2006-08-01
申请号：US10974276
申请日：2004-10-27
申请人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
发明人： Wolfgang Lammer-Pachlinger , Gertraud Lammer , Alfred Chalupka
IPC分类号： H01J37/08
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/15 , H01J37/3177 , H01J2237/0453 , H01J2237/31774 , H01J2237/31776
摘要： In a pattern-definition device (102) for use in a particle-beam exposure apparatus, a beam of electrically charged particles is patterned through a plurality of apertures. The device comprises at least one deflector array means having a plurality of openings surrounding the beamlets, wherein for each opening are provided at least two deflecting electrodes to which different electrostatic potentials are appliable, thus correcting the path of the beamlet(s) passing through the respective opening according to a desired path through the device (102). According to a partition of the plurality of apertures into a set of subfields (Aij), the deflecting electrodes belonging to the same subfield (Aij) have common electric supplies. Thus, the electrostatic potentials of the deflecting electrodes belonging to the same subfield (Aij) are constant or linearly interpolated between basic potentials fed at basic points (Pij) of the respective subfield.
摘要翻译：在用于粒子束曝光装置的图案定义装置（102）中，通过多个孔将带电粒子束形成图案。该装置包括至少一个偏转器阵列装置，其具有围绕子束的多个开口，其中对于每个开口设置有至少两个偏转电极，不同的静电电位可施加到该偏转电极，从而校正通过该子束的子束的路径根据通过设备（102）的期望路径的相应开口。根据多个孔的分割成一组子场（Aij），属于同一子场（Aij）的偏转电极具有共同的电源。因此，属于相同子场（Aij）的偏转电极的静电电位在各子场的基点（Pij）馈送的基本电位之间是恒定的或线性内插的。

55. 发明申请

US20050242302A1 Advanced pattern definition for particle-beam processing 有权
标题翻译：粒子束加工的高级图案定义
公开(公告)号：US20050242302A1
公开(公告)日：2005-11-03
申请号：US11119025
申请日：2005-04-29
申请人： Elmar Platzgummer , Stefan Cernusca
发明人： Elmar Platzgummer , Stefan Cernusca
IPC分类号： G03F7/20 , G21K1/04 , G21K1/08 , G21K5/04 , G21K5/10 , H01J37/04 , H01J37/08 , H01J37/30 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , G21K1/08 , H01J37/045 , H01J37/3174 , H01J2237/31774
摘要： In a pattern definition device for use in a particle-beam processing apparatus a plurality of apertures (21) are arranged within a pattern definition field (pf) wherein the positions of the apertures (21) in the pattern definition field (pf) taken with respect to a direction (X, Y) perpendicular, or parallel, to the scanning direction are offset to each other by not only multiple integers of the effective width (w) of an aperture taken along said direction, but also multiple integers of an integer fraction of said effective width. The pattern definition field (pf) may be segmented into several domains (D) composed of a many staggered lines (pl) of apertures; along the direction perpendicular to the scanning direction, the apertures of a domain are offset to each other by multiple integers of the effective width (w), whereas the offsets of apertures of different domains are integer fractions of that width.
摘要翻译：在用于粒子束处理装置的图案定义装置中，多个孔（21）布置在图案定义区（pf）内，其中，图案定义区（pf）中的孔（21）的位置与垂直于或平行于扫描方向的方向（X，Y）不仅通过沿着所述方向所取的孔的有效宽度（w）的多个整数而彼此偏移，而且也是整数的多个整数所述有效宽度的分数。图案定义字段（pf）可以被分割成由许多交错的线（pl）组成的几个域（D）; 沿着与扫描方向垂直的方向，域的孔径相互偏移有效宽度（w）的多个整数，而不同域的孔的偏移量是该宽度的整数分数。

56. 发明申请

US20050195551A1 Compensation of magnetic fields 有权
标题翻译：磁场补偿
公开(公告)号：US20050195551A1
公开(公告)日：2005-09-08
申请号：US11070439
申请日：2005-03-02
申请人： Herbert Buschbeck , Gerhard Stengl
发明人： Herbert Buschbeck , Gerhard Stengl
IPC分类号： H01J37/20 , G05F7/00 , H01H47/00 , H01L21/027
CPC分类号： G05F7/00
摘要： For compensation of a magnetic field in an operating region a number of magnetic field sensors (S1, S2) and an arrangement of compensation coils (Hh) surrounding said operating region is used. The magnetic field is measured by at least two sensors (S1, S2) located at different positions outside the operating region, preferably at opposing positions with respect to a symmetry axis of the operating region, generating respective sensor signals (s1, s2), the sensor signals of said sensors are superposed to a feedback signal (ms, fs), which is converted by a controlling means to a driving signal (d1), and the driving signal is used to steer at least one compensation coil (Hh). To further enhance the compensation, the driving signal is also used to derive an additional input signal (cs) for the superposing step to generate the feedback signal (fs).
摘要翻译：为了补偿工作区域中的磁场，使用多个磁场传感器（S1，S2）和围绕所述操作区域的补偿线圈（Hh）的布置。磁场由位于工作区域外部的不同位置的至少两个传感器（S1，S2）测量，优选地在相对于操作区域的对称轴线的相对位置处产生相应的传感器信号（s 1，s 2） 2），所述传感器的传感器信号被叠加到由控制装置转换为驱动信号（d 1）的反馈信号（ms，fs），并且驱动信号用于转向至少一个补偿线圈（Hh）。为了进一步增强补偿，驱动信号还用于导出叠加步骤的附加输入信号（cs）以产生反馈信号（fs）。

57. 发明公开

US20240304407A1 Device and Method for Calibrating a Charged-Particle Beam 审中-公开
公开(公告)号：US20240304407A1
公开(公告)日：2024-09-12
申请号：US18596468
申请日：2024-03-05
申请人： IMS Nanofabrication GmbH
发明人： Elmar Platzgummer
IPC分类号： H01J37/147 , H01J37/244 , H01J37/317
CPC分类号： H01J37/1474 , H01J37/244 , H01J37/3177 , H01J2237/24564 , H01J2237/30444 , H01J2237/3045
摘要： A beam calibration device is presented for calibrating a charged-particle beam in a charged-particle processing apparatus in relation to a positioning of the beam with respect to a target. The beam calibration device includes a detector for the charged particles that are arriving at a registering structure of said device. The beam is deflected from a designated target position towards the device, by means of a lateral initial deflection, thus allowing the beam to impinge on at least one of the registering structures. The beam is scanned over the beam calibration device, thus covering a pre-defined region on this device including the registering structure, and using the detector, an electric current is measured as a current signal and is evaluated, to determine a central relative position of the beam with respect to an optimal position predefined on the beam calibration device surface. Using this optimal position, the beam is deflected back to the designated target position by a reverse lateral deflection which is an inverse of said initial deflection combined with a deflection correction, which represents a correction of the lateral beam position to compensate the central relative position.

58. 发明授权

US12040157B2 Pattern data processing for programmable direct-write apparatus 有权
公开(公告)号：US12040157B2
公开(公告)日：2024-07-16
申请号：US17664812
申请日：2022-05-24
申请人： IMS Nanofabrication GmbH
发明人： Elmar Platzgummer , Christoph Spengler , Michael Haberler
IPC分类号： H01J37/147 , H01J37/30 , H01J37/302 , H01J37/317
CPC分类号： H01J37/3177 , H01J37/147 , H01J37/3007 , H01J37/3026
摘要： In a writing process in a charged-particle multi-beam apparatus, a desired pattern is written onto a target wherein said desired pattern is provided as input pattern data (INPDAT) in a vector format and processed through a pattern data processing flow. A data preprocessing system receives the input pattern data (INPDAT) and preprocesses the input pattern data independently of the writing process, preferably in advance to it, using writing parameter data provided to the data preprocessing system, and writes the intermediate pattern data (IMDAT) thus obtained to a data storage. When a writing process is carried out using the apparatus, its writing control system reads the intermediate pattern data from the data storage, converts them into pattern streaming data (SBUF), and streams the pattern streaming data to the apparatus for writing the pattern to the target.

59. 发明公开

US20240145212A1 ELECTRON BEAM LITHOGRAPHY APPARATUS, ELECTRON BEAM LITHOGRAPHY METHOD, AND RECORDING MEDIUM 审中-公开
公开(公告)号：US20240145212A1
公开(公告)日：2024-05-02
申请号：US18572776
申请日：2021-12-24
申请人： NIPPON CONTROL SYSTEM CORPORATION , IMS Nanofabrication GmbH
发明人： Masakazu HAMAJI , Issei MASUMOTO , Natsuki SUZUKI
IPC分类号： H01J37/153 , G03F7/00 , G03F7/20 , H01J37/317
CPC分类号： H01J37/153 , G03F7/2037 , G03F7/2061 , G03F7/70008 , G03F7/70508 , G03F7/7065 , H01J37/3174 , H01J2237/22
摘要： An electron beam lithography apparatus-includes: a density set storage unit that stores, for each of pieces of figure information, a set of pieces of first density information corresponding to areas occupied by a figure in first small regions divided from a figure region specified by the piece of figure information; a density set acquisition unit that acquires first density sets respectively corresponding to the pieces of figure information from the density set storage unit; a correction amount acquisition unit that acquires correction amounts corresponding to the first density sets for each of the pieces of figure information, and are for the second small regions; an emission amount acquisition unit that acquires, for the second small regions, emission amounts of an electron beam with intensities corresponding to the correction amounts for the second small regions; and a drawing unit that emits an electron beam according to the emission amounts.

60. 发明公开

US20240021403A1 Adjustable Permanent Magnetic Lens Having Thermal Control Device 审中-公开
公开(公告)号：US20240021403A1
公开(公告)日：2024-01-18
申请号：US18344720
申请日：2023-06-29
申请人： IMS Nanofabrication GmbH
发明人： Dietmar Puchberger , Johannes Leitner , Patrick Mayrhofer
IPC分类号： H01J37/141 , H01J37/143 , H01J37/317
CPC分类号： H01J37/141 , H01J37/143 , H01J37/3177 , H01J2237/1415
摘要： A fine-adjustable charged particle lens comprises a magnetic circuit assembly including permanent magnets and a yoke body, surrounding a beam passage extending along the longitudinal axis. The permanent magnet is arranged between an inner yoke component and an outer yoke component so as to form a magnetic circuit having at least two gaps, generating a magnetic field reaching inwards into the beam passage, into which a sleeve insert having electrostatic electrodes can be inserted, which may also generate an electric field spatially overlapping said magnetic field. In order to modify the magnetic flux and thus the magnetic field in the gaps, a thermal control element located in the yoke body introduces or extracts heat to or from components of the of the magnetic circuit assembly so as to thermally control or modulate the magnetic behavior of said components.

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