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    • 51. 发明公开
    • Plasma sterilizer and method
    • Plasmasterilisationsvorrichtung und Verfahren。
    • EP0570898A1
    • 1993-11-24
    • EP93108048.5
    • 1993-05-18
    • ABTOX, INC.
    • Campbell, Bryant A.Moulton, Kern A.
    • A61L2/14
    • H05H1/46A61L2/14Y10S422/906
    • A plasma sterilizer and method employ essentially uncharged, highly reactive free radicals, atoms and excited molecules of a gas mixture to sterilize articles. The gas mixture includes oxidizing and/or reducing agents and is ionized into a plasma having ionization products that include highly destructive components in the form of charged particles and ultraviolet radiation. A plasma distribution device blocks the ultra-violet radiation and facilitates the recombination of the charged particles such that essentially uncharged, highly reactive free radicals, atoms and excited molecules of the gas mixture is delivered to the articles.
    • 等离子体灭菌器和方法使用基本上不带电的,高反应性的自由基,气体混合物的原子和激发分子来对制品进行灭菌。 气体混合物包括氧化和/或还原剂,并且被离子化成具有电离产物的等离子体,其包括带电粒子和紫外线辐射形式的高度破坏性的组分。 等离子体分配装置阻挡紫外辐射并促进带电粒子的复合,使得气体混合物的基本上不带电的,高反应性的自由基,原子和激发的分子被递送到制品中。
    • 52. 发明公开
    • PLASMA CYCLING STERILIZING PROCESS
    • 法随循环的等离子体灭菌。
    • EP0547105A1
    • 1993-06-23
    • EP91915834.0
    • 1991-08-09
    • ABTOX, INC.
    • MOULTEN, Kern, A.CAMPBELL, Bryant, A.CAPUTO, Ross, A.
    • A61L2H05H1
    • H05H1/46A61L2/14Y10S422/906
    • Méthode de stérilisation au plasma dans un éventail de températures régulé consistant à exposer un article dans une chambre de stérilisation (4) à un plasma gazeux s'écoulant d'une chambre de génération de plasma (2) jusqu'au moment où la température dans la chambre de stérilisation (4) atteint un niveau maximal présélectionné. L'écoulement du plasma gazeux dans la chambre de stérilisation (4) prend fin quand la température dans la chambre de stérilisation (4) tombe à un niveau inférieur à une température maximale présélectionnée. Ces étapes sont répétées jusqu'au moment où la stérilisation de l'article est achevée. La température au-dessous de la température maximale présélectionnée à laquelle l'écoulement de plasma gazeux est à nouveau déclenché n'est de préférence pas inférieure de plus de 3 °C à la température maximale présélectionnée. Le plasma gazeux peut être généré à partir d'un mélange de gaz comprenant essentiellement de l'argon, de l'hélium, de l'azote ou des mélanges de ces gaz. De préférence, la pression de la chambre de stérilisation (4) augmente de 0,1 à 10 torrs quand le plasma gazeux s'écoule dans la chambre (4) et la pression de la chambre de stérilisation (4) tombe à une pression plus basse quand l'écoulement de plasma gazeux dans la chambre de stérilisation (4) prend fin.
    • 55. 发明公开
    • Sterilizing with hydrogen peroxide and plasma
    • 灭菌剂Wasserstoffperoxid和einem等离子体。
    • EP0456135A2
    • 1991-11-13
    • EP91107228.8
    • 1991-05-03
    • ABTOX, INC.
    • Campbell, Bryant A.Moulton, Kern A.Caputo, Ross A.
    • A61L2/14A61L2/20
    • A61L2/20A61L2/14
    • A process for plasma sterilization comprising exposing an article to be sterilized to pretreatment with hydrogen peroxide, and optionally a peracid antimicrobial agent, and to a plasma generated from gases. The gases can be selected from the group consisting essentially of argon, helium, nitrogen, oxygen, hydrogen and mixtures thereof; and the exposure to the plasma can be carried out at a pressure of from 0.1 to 10 torr and a chamber temperature of less than 80°C. The peracid antimicrobial agent can be a member selected from the group consisting of saturated and unsaturated peralkanoic acids having from 1 to 8 carbon atoms and halogenated derivatives thereof and is preferably peracetic acid. The article is preferably treated with plasma generated in a plasma generator separate from the sterilizing chamber.
    • 一种用于等离子体灭菌的方法,包括将待消毒的物品暴露于用过氧化氢预处理,以及任选的过酸性抗微生物剂,以及由气体产生的血浆。 气体可以选自基本上由氩,氦,氮,氧,氢及其混合物组成的组; 并且暴露于等离子体可以在0.1至10托的压力和小于80℃的室温下进行。过酸性抗微生物剂可以是选自饱和和不饱和的全烷基酸的成员,其具有 1至8个碳原子及其卤代衍生物,优选为过乙酸。 该制品优选用与灭菌室分离的等离子体发生器中产生的等离子体处理。
    • 58. 发明授权
    • Apparatus for plasma sterilizing with pulsed antimicrobial agent
treatment
    • 用脉冲抗菌剂处理等离子体灭菌的装置
    • US5413758A
    • 1995-05-09
    • US65859
    • 1993-05-21
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • A61L2/14A61L2/20
    • A61L2/20A61L2/14Y10S422/906Y10S422/907
    • A process and equipment for plasma sterilization in which articles in a sterilizing chamber are taken through at least one combination sterilizing cycle. The articles to be sterilized may include the interior of a vessel or chamber. In that case, the vessel or chamber itself may serve as a sterilizing chamber and connects to the plasma generating chamber. Each combination sterilizing cycle includes a pulsed treatment with gaseous antimicrobial agent, removal of the gaseous antimicrobial agent, and a plasma treatment. The pulsed treatment includes one or more pulse-vacuum cycles, each pulse-vacuum cycle includes the steps of evacuating the sterilizing chamber and exposing the article to the gaseous antimicrobial agent with a predetermined pressure profile during a predetermined time. The gaseous antimicrobial agent is preferably carried in a gas mixture with a nonreactive carrier gas. In one embodiment, the predetermined pressure is pulsed. In another embodiment, it is ramped. After the pulsed treatment, the antimicrobial agent is removed by evacuating the sterilizing chamber. The plasma treatment includes exposure of the article to a plasma having essentially uncharged, highly reactive free radicals, molecules and atoms.
    • 用于等离子体灭菌的方法和设备,其中消毒室中的物品通过至少一个组合灭菌循环。 待消毒的物品可以包括容器或室的内部。 在这种情况下,容器或室本身可以用作灭菌室并连接到等离子体产生室。 每个组合灭菌循环包括用气体抗微生物剂进行脉冲处理,去除气态抗微生物剂和等离子体处理。 脉冲处理包括一个或多个脉冲真空循环,每个脉冲真空循环包括在预定时间内以预定的压力分布排空灭菌室并将制品暴露于气态抗微生物剂的步骤。 气态抗微生物剂优选在与非反应性载气的气体混合物中携带。 在一个实施例中,预定压力是脉冲的。 在另一个实施例中,它是斜坡的。 脉冲处理后,通过抽空灭菌室除去抗菌剂。 等离子体处理包括将物品暴露于具有基本上不带电的,高反应性的自由基,分子和原子的等离子体。
    • 59. 发明授权
    • Plasma cycling sterilizing process
    • 血浆循环灭菌过程
    • US5288460A
    • 1994-02-22
    • US962895
    • 1992-10-19
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • Ross A. CaputoJeffrey JonesKern A. MoultonBryant A. Campbell, deceased
    • A61L2/14H05H1/46A61L2/00
    • H05H1/46A61L2/14
    • A method for plasma sterilization within a controlled temperature range includes exposing the interior of a chamber and any articles therein to a gas plasma flowing from a plasma generating chamber until the temperature in the chamber rises to a preselected maximum temperature. The flow of the plasma gas to the chamber is terminated when the temperature in the chamber falls to a temperature below the preselected maximum temperature. These steps are repeated until sterilization of the interior of the chamber or any articles therein is effected. The temperature below the preselected maximum temperature when gas plasma flow is again initiated is preferably not more than 3.degree. C. below the preselected maximum temperature. The gas plasma can be generated from a gas mixture that includes oxidizing and/or reducing agents. Preferably the pressure in the sterilizing chamber rises to from 0.1 to 10 torr when the gas plasma is flowing into the chamber, and the pressure in the sterilizing chamber falls to a lower pressure when the gas plasma flow into the sterilizing chamber is terminated. The articles to be sterilized include the interior of a vessel or chamber. The vessel or chamber itself serves as a sterilizing chamber and connects to the plasma generating chamber.
    • 在受控温度范围内的等离子体灭菌的方法包括将室内和其中的任何物品暴露于从等离子体发生室流出的气体等离子体,直到室内的温度上升到预选的最高温度。 当室内的温度下降到低于预选的最高温度的温度时,等离子体气体流到室的流动被终止。 重复这些步骤,直到对室内或其中的任何物品进行杀菌。 当再次启动气体等离子体流时,低于预选最大温度的温度优选不低于预选最高温度3摄氏度。 气体等离子体可以由包括氧化和/或还原剂的气体混合物产生。 当气体等离子体流入室时,灭菌室中的压力优选上升至0.1〜10乇,当终止气体等离子体流入灭菌室时,灭菌室内的压力下降到较低的压力。 待灭菌的物品包括容器或室的内部。 容器或室本身用作灭菌室并连接到等离子体产生室。
    • 60. 发明授权
    • Plasma sterilizing process with pulsed antimicrobial agent treatment
    • 脉冲灭菌方法采用脉冲抗菌剂处理
    • US5084239A
    • 1992-01-28
    • US576235
    • 1990-08-31
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • Kern A. MoultonBryant A. CampbellRoss A. Caputo
    • A61L2/14A61L2/20
    • A61L2/14A61L2/20
    • A process for plasma sterilization comprising exposing an article in a sterilizing chamber to at least one cycle comprising a pulsed treatment with gaseous antimicrobial agent and a plasma treatment. The pulsed treatment comprises at least two pulse-vacuum cycles, each pulse-vacuum cycle comprising the steps of exposing the article to the gaseous antimicrobial agent at a pressure of from 4 to 18 torr and reducing the pressure in the sterilizing chamber to from 0.1 to 4 torr. The plasma treatment comprising exposing the article to a plasma generated from gases selected from the group consisting essentially of argon, helium, nitrogen, oxygen, hydrogen and mixtures thereof, the exposure to the plasma being carried out at a pressure of from 0.1 to 10 torr and a temperature of less than 80.degree. C. The antimicrobial agent is selected from the group consisting of hydrogen peroxide, a peracid antimicrobial agent, and mixtures thereof, the peracid antimicrobial agent being selected from the group consisting of saturated and unsaturated peralkanoic acids having from 1 to 8 carbon atoms and halogenated derivatives thereof.
    • 一种用于等离子体灭菌的方法,包括将消毒室中的物品暴露于至少一个循环,包括用气态抗微生物剂进行脉冲处理和等离子体处理。 脉冲处理包括至少两个脉冲真空循环,每个脉冲真空循环包括以4至18托的压力将制品暴露于气态抗微生物剂的步骤,并将灭菌室中的压力降至0.1至 4托 等离子体处理包括将制品暴露于从基本上由氩,氦,氮,氧,氢及其混合物组成的组中选出的气体产生的等离子体中,暴露于等离子体的压力为0.1至10托 并且温度低于80℃。抗微生物剂选自过氧化氢,过酸性抗微生物剂及其混合物,所述过酸抗微生物剂选自饱和和不饱和的过氧烷酸,其具有 1至8个碳原子及其卤化衍生物。