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41. 发明申请

WO2008025492A1 A METHOD AND A SYSTEM FOR REDUCING OVERLAY ERRORS WITHIN EXPOSURE FIELDS BY APC CONTROL STRATEGIES 审中-公开
标题翻译：用于减少APC控制策略在接触场中的覆盖误差的方法和系统
公开(公告)号：WO2008025492A1
公开(公告)日：2008-03-06
申请号：PCT/EP2007/007453
申请日：2007-08-24
申请人： ADVANCED MICRO DEVICES INC , SELTMANN, Rolf , SCHULZ, Bernd , HEMPEL, Fritjof , SCHULZE, Uwe
发明人： SELTMANN, Rolf , SCHULZ, Bernd , HEMPEL, Fritjof , SCHULZE, Uwe
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70458 , G03F7/70633 , G03F9/7011 , G03F9/7019 , G03F9/7046
摘要： By taking into consideration tool specific distortion signatures and reticle specific placement characteristics in an alignment control system the control quality of sophisticated APC strategies may significantly be enhanced. Respective correction data may be established on the basis of any combinations of tool/reticles and layers to be aligned to each other, which may modify the respective target values of alignment parameters used for controlling the alignment process on the basis of standard overlay measurement data obtained from dedicated overlay marks.
摘要翻译：通过考虑到对准控制系统中的工具特定失真特征和掩模版特定放置特性，可以显着提高复杂APC策略的控制质量。可以基于要彼此对准的工具/掩模版和层的任何组合来建立各自的校正数据，这可以基于获得的标准覆盖测量数据来修改用于控制对准过程的对准参数的各个目标值从专用的重叠标记。

42. 发明申请

WO2006126569A1 露光方法及びリソグラフィシステム审中-公开
标题翻译：曝光方法和光刻系统
公开(公告)号：WO2006126569A1
公开(公告)日：2006-11-30
申请号：PCT/JP2006/310314
申请日：2006-05-24
申请人：株式会社ニコン , 川久保昌治
发明人：川久保昌治
IPC分类号： H01L21/027
CPC分类号： G03F7/70458 , G03F7/70425
摘要： Highly accurate overlay exposure is performed at the time of hierarchically performing overlay exposure by using a plurality of projection exposure apparatuses. Reference layers for obtaining information relating to overlay exposure are separately specified in an X axis direction and a Y axis direction, respectively, and X axis direction component of the information is extracted from the reference layer in the X axis direction and a Y axis direction component of the information is extracted from the reference layer in the Y axis direction. Based on the extracted information, exposure statuses of the projection exposure apparatus to be used for overlay exposure of a subsequent layer are adjusted by axis, and overlay exposure is performed. As the information relating to the overlay exposure, a projection image distortion component and a nonlinear component of a positional shift quantity of a plurality of demarcated regions formed on a photosensitive substance are used.
摘要翻译：通过使用多个投影曝光装置在分层执行重叠曝光时执行高精度重叠曝光。在X轴方向和Y轴方向分别指定用于获得与重叠曝光有关的信息的参考层，并且从参考层在X轴方向和Y轴方向分量中提取信息的X轴方向分量在Y轴方向上从参考层提取信息。基于所提取的信息，通过轴来调整用于后续层的重叠曝光的投影曝光装置的曝光状态，并进行叠加曝光。作为与覆盖曝光有关的信息，使用形成在感光性物质上的多个分界区域的投影图像失真分量和位置偏移量的非线性分量。

43. 发明申请

WO1997034319A1 MANUFACTURE OF SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件的制造
公开(公告)号：WO1997034319A1
公开(公告)日：1997-09-18
申请号：PCT/JP1996000542
申请日：1996-03-06
申请人： HITACHI, LTD. , SATOH, Hidetoshi , NAKAYAMA, Yoshinori , OKUMURA, Masahide , OOTA, Hiroya , SAITOU, Norio
发明人： HITACHI, LTD.
IPC分类号： H01L21/30
CPC分类号： G03F7/70616 , G03F7/70433 , G03F7/70458 , G03F7/70633 , H01J37/3045 , H01J2237/3175 , Y10S430/143
摘要： A semiconductor device manufacturing process in which a reduction projection aligner and an electron beam aligner are both used. The pattern registration accuracy is improved by measuring the misregistration of the pattern of each aligner and correcting the misregistration before drawing the pattern by the electron beam aligner. First, misregistration measuring patterns are exposed by means of a stepper and the electron beam aligner. Then the misregistrations are measured by the same coordinate measuring instrument. The measurement data are averaged arithmetically using data on the surroundings and smoothed. The signs of the data on the misregistration are inverted and stored as correcting data. Date are transferred to the electron beam aligner with reference to the pattern used for exposure by the stepper. The correcting data of the two apparatuses are transferred to the electron beam aligner, and two sets of correcting data are added to the detected mark position. The pattern misregistration in the wafer plane in the position after the addition is determined. Exposure in the position designated by the subtraction of the correcting data from the determined misregistration is effected.
摘要翻译：使用还原投影对准器和电子束对准器的半导体器件制造工艺。通过测量每个对准器的图案的对准，并通过电子束对准器在绘制图案之前校正不对准，从而改善了图案配准精度。首先，通过步进器和电子束对准器曝光不对准测量图案。然后通过相同的坐标测量仪器测量误排列。测量数据使用围绕周围环境的数据进行平均平均化。反映配准数据的标志，并作为校正数据存储。参考用于步进曝光的图案将日期传送到电子束对准器。将两个装置的校正数据传送到电子束对准器，并将两组校正数据添加到检测到的标记位置。确定添加后的晶片平面上的图案重合。实现从确定的重合失调中减去校正数据指定的位置的曝光。

44. 发明申请

WO2009148974A1 MODEL-BASED SCANNER TUNING METHODS 审中-公开
标题翻译：基于模型的扫描仪调谐方法
公开(公告)号：WO2009148974A1
公开(公告)日：2009-12-10
申请号：PCT/US2009/045729
申请日：2009-05-29
申请人： BRION TECHNOLOGIES, INC.
发明人： YE, Jun , CAO, Yu , GOOSSENS, Ronald , SHAO, Wenjin , KOONMEN, Jim
IPC分类号： G03F7/20
CPC分类号： B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
摘要： Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior.
摘要翻译：描述用于调整光刻工艺的系统和方法。保持目标扫描仪的型号，参考一组可调谐参数来定义目标扫描仪的灵敏度。差分模型表示目标扫描器与参考值的偏差。可以基于参考扫描仪和差分模型的设置来调整目标扫描仪。可以相对于参考扫描仪的性能来表征相关扫描仪系列的性能。差分模型可能包括诸如参数偏移和可能用于模拟成像行为差异的其他差异的信息。

45. 发明申请

WO2007031105A1 ALIGNMENT METHOD WITH COMPENSATION OF NON LINEAR ERRORS 审中-公开
标题翻译：非线性误差校正方法
公开(公告)号：WO2007031105A1
公开(公告)日：2007-03-22
申请号：PCT/EP2005/009975
申请日：2005-09-16
申请人： MICRONIC LASER SYSTEMS AB , ÖSTRÖM, Tomas
发明人： ÖSTRÖM, Tomas
IPC分类号： G03F7/20 , G03F9/00 , H01L21/00
CPC分类号： G03F9/7003 , G03F7/70383 , G03F7/7045 , G03F7/70458
摘要： The present invention relates to alignment of a writing system and a workpiece (11). In particular, it relates to alignment to write a second layer pattern on a workpiece (11) that has a first layer pattern, using an SLM (21). It extends to producing a mask or reticle, and to producing a layer of a device using the mask or reticle. Particular aspects of the present invention are described in the claims, specification and drawings.
摘要翻译：本发明涉及书写系统和工件（11）的对准。特别地，涉及使用SLM（21）在具有第一层图案的工件（11）上写入第二层图案的对准。它延伸到产生掩模或掩模版，并且使用掩模或掩模版产生设备层。在权利要求书，说明书和附图中描述了本发明的特定方面。

46. 发明申请

WO9819214A3 METHOD AND APPARATUS FOR TRANSFER OF A RETICLE PATTERN ONTO A SUBSTRATE BY SCANNING 审中-公开
标题翻译：通过扫描将基板转移到基板上的方法和装置
公开(公告)号：WO9819214A3
公开(公告)日：1998-07-02
申请号：PCT/US9718676
申请日：1997-10-14
申请人： MEGAPANEL CORP
发明人： KNIRCK JEFFREY G , SWANSON PAUL A
IPC分类号： G03F7/20 , G03C
CPC分类号： G03F7/70691 , G03F7/20 , G03F7/70358 , G03F7/70425 , G03F7/70458
摘要： A system and method for reproducing isolated images over an entire substrate (1), by creating multiple adjacent scanned strips of whole images using a unity magnification scanning photolithographic system (6).

47. 发明申请

WO1998019214A2 METHOD AND APPARATUS FOR TRANSFER OF A RETICLE PATTERN ONTO A SUBSTRATE BY SCANNING 审中-公开
标题翻译：通过扫描将基板转移到基板上的方法和装置
公开(公告)号：WO1998019214A2
公开(公告)日：1998-05-07
申请号：PCT/US1997018676
申请日：1997-10-14
申请人： MEGAPANEL CORPORATION
发明人： MEGAPANEL CORPORATION , KNIRCK, Jeffrey, G. , SWANSON, Paul, A.
IPC分类号： G03C00/00
CPC分类号： G03F7/70691 , G03F7/20 , G03F7/70358 , G03F7/70425 , G03F7/70458
摘要： A system and method for reproducing isolated images over an entire substrate, by creating multiple adjacent scanned strips of whole images using a unity magnification scanning photolithographic system.
摘要翻译：一种用于通过使用单位倍率扫描光刻系统通过创建整个图像的多个相邻扫描条带来在整个基板上再现隔离图像的系统和方法。

48. 发明申请

WO2017060273A1 METHOD FOR DETERMINING THE DOSE CORRECTIONS TO BE APPLIED TO AN IC MANUFACTURING PROCESS BY A MATCHING PROCEDURE 审中-公开
标题翻译：用于通过匹配程序确定应用于IC制造过程的剂量校正的方法
公开(公告)号：WO2017060273A1
公开(公告)日：2017-04-13
申请号：PCT/EP2016/073744
申请日：2016-10-05
申请人： ASELTA NANOGRAPHICS
发明人： SAIB, Mohamed , SCHIAVONE, Patrick , FIGUEIRO, Thiago , BAYLE, Sébastien
IPC分类号： G03F7/20
CPC分类号： G03F7/705 , G03F7/70458 , G03F7/70516
摘要： The invention discloses a method to easily determine the parameters of a second process for manufacturing from the parameters of a first process. Metrics representative of the differences between the two processes are computed from a number of values of the parameters, which can be measured for the two processes on a calibration layout, or which can be determined from pre-existing values for layouts or reference data for the two processes by an interpolation/extrapolation procedure. The number of metrics is selected so that their combination gives a precise representation of the differences between the two processes in all areas of a design. Advantageously, the metrics are calculated as a product of convolution of the target design and a compound of a kernel function and a deformation function. A reference physical model of the reference process is determined. A sizing correction to be applied to the edges of the design produced by the reference process is calculated. It is then converted, totally or partially, into a dose correction.
摘要翻译：本发明公开了一种从第一过程的参数容易地确定第二制造工艺的参数的方法。代表两个过程之间的差异的度量是根据参数的数值计算的，这些参数值可以在校准布局上测量两个过程，或者可以根据布局的预先存在的值或者为通过插值/外推程序进行两个处理。选择度量的数量，使得它们的组合给出了在设计的所有区域中的两个过程之间的差异的精确表示。有利地，度量被计算为目标设计的卷积与核函数和变形函数的化合物的乘积。确定参考过程的参考物理模型。计算应用于由参考过程产生的设计边缘的尺寸校正。然后将其全部或部分转化为剂量校正。

49. 发明申请

WO2015092570A1 MULTISCALE PATTERNING OF A SAMPLE WITH APPARATUS HAVING BOTH THERMO-OPTICAL LITHOGRAPHY CAPABILITY AND THERMAL SCANNING PROBE LITHOGRAPHY CAPABILITY 审中-公开
标题翻译：具有两个热光学平移能力和热扫描探针能力的装置的样品的多尺度图案
公开(公告)号：WO2015092570A1
公开(公告)日：2015-06-25
申请号：PCT/IB2014/066007
申请日：2014-11-13
申请人： INTERNATIONAL BUSINESS MACHINES CORPORATION , IBM RESEARCH GMBH , SWISSLITHO AG
发明人： DUERIG, Urs T. , FRINGES, Stefan , HOLZNER, Felix , KNOLL, Armin
IPC分类号： G03F7/20
CPC分类号： G03F7/70591 , G03F7/70383 , G03F7/7045 , G03F7/70458
摘要： The present invention is notably directed to apparatuses and methods for multiscale patterning of a sample (9). Such methods comprise: placing (S10) the sample (9) in an apparatus (10) having both thermo-optical lithography capability (20) and thermal scanning probe lithography capability (30); and patterning (S20, S30) two patterns (200, 300) onto the sample (9), respectively by: thermo-optical lithography (20, S20), wherein light ( l 1 , l 3 ) is emitted (S22) from a light source (2) onto the sample (9) to heat the latter and thereby write (S28) a first pattern (200) that is the largest of the two patterns (200, 300); and thermal scanning probe lithography (30, S30), wherein the sample (9) and a heated probe tip are brought in contact (S34) for writing (S38) a second pattern (300) that has substantially smaller critical dimensions than the first pattern (200).
摘要翻译：本发明特别涉及用于样品（9）的多尺度图案化的装置和方法。这样的方法包括：将样品（9）放置在具有热光学光刻能力（20）和热扫描探针光刻能力（30）的设备（10）中（S10）。以及通过以下方式分别将两个图案（S20,30a）图案化（20,30）到样品（9）上：热光学光刻（20,208），其中从（1），将光源（2）加载到样品（9）上以加热样品（9），从而写入（S28）两个图案（200,300）中最大的第一图案（200）; 和热扫描探针光刻（30,301），其中样品（9）和加热的探针针尖与第一图案（S38）接触（S34），第二图案（300）具有基本上小于第一图案的临界尺寸（200）。

50. 发明申请

WO2009148972A1 METHODS FOR MODEL-BASED PROCESS SIMULATION 审中-公开
标题翻译：基于模型的过程模拟的方法
公开(公告)号：WO2009148972A1
公开(公告)日：2009-12-10
申请号：PCT/US2009/045726
申请日：2009-05-29
申请人： BRION TECHNOLOGIES, INC.
发明人： YE, Jun , CAO, Yu , GOOSSENS, Ronald , SHAO, Wenjin , KOONMEN, Jim
IPC分类号： G03F7/20
CPC分类号： B29C67/0088 , B29C64/386 , G03F7/70091 , G03F7/70458 , G03F7/705 , G03F7/70516 , G03F7/70525 , G06F17/50 , G06F17/5009 , G06F17/5081
摘要： Lithography simulation using a differential model. The differential model describes differences in the imaging characteristics of two scanners related to tunable and non-tunable scanner settings. A model for one of the two scanners is derived by using the model of the other scanner and the differential model. Similarly, a sensitivity model expresses the differences in the imaging characteristics of one scanner related to different scanner settings. Additionally, methods are provided for calibrating the differential model and the sensitivity model by comparison with printing results.
摘要翻译：使用差分模型的平版印刷模拟。差分模型描述了与可调谐和不可调扫描仪设置相关的两台扫描仪的成像特性的差异。通过使用其他扫描仪和差分模型的模型，推导出两种扫描仪之一的模型。类似地，灵敏度模型表示与不同扫描仪设置相关的一个扫描仪的成像特征的差异。另外，提供了与打印结果相比较来校准差分模型和灵敏度模型的方法。

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