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41. 发明公开

EP1200344A1 METHOD OF RECOVERING FUMED SILICA FROM SPENT POTLINER 审中-公开
标题翻译：一种从废内衬材料RECOVERING气相二氧化硅
公开(公告)号：EP1200344A1
公开(公告)日：2002-05-02
申请号：EP00923082.2
申请日：2000-03-21
申请人： Goldendale Aluminum Company
发明人： BARNETT, Robert, J. , MEZNER, Michael, B.
IPC分类号： C01B33/12 , C01B7/19 , C01B33/08 , C22B21/00
CPC分类号： C01B7/191 , C01B7/193 , C01B33/18 , C01C1/244 , C01F7/141 , C01F7/50 , C01F7/56 , C01F11/24 , C01F11/46 , C03C1/002 , C04B7/24 , C04B18/0481 , C04B33/1324 , C04B35/185 , C04B35/62204 , C22B21/0015 , C22B21/0046 , C22B21/0069 , Y02P10/234 , Y02P40/145 , Y02P40/69 , Y02W30/91
摘要： Spent potliner from an aluminum reduction cell is subjected to an acid digest (24) and the digest may be adjusted to produce a first gas component comprised of at least one material selected from silicon tetrafluoride, hydrogen fluoride, hydrogen cyanide gas and water vapor (26) and a slurry component comprised of at least one material selected from carbon, silica, alumina, and sodium, iron, calcium and magnesium compounds. The first gas component is removed from the digester and heated to a temperature sufficiently high in a heater/oxidizer (38). Heat produced is recovered in a boiler (42). Hydrogen fluoride gas is water scrubbed (44) and formed into liquid hydrofluoric acid. Gases (56) from the water scrubber are then passed to a caustic scrubber (58) as a polishing step prior to release to the atmosphere.

42. 发明公开

EP0054530A1 Process and apparatus for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties 失效
标题翻译：用于生产细碎的二氧化硅具有高的增稠效果和良好的触变性质的方法和装置。
公开(公告)号：EP0054530A1
公开(公告)日：1982-06-23
申请号：EP81850241.1
申请日：1981-12-11
申请人： Flemmert, Gösta Lennart
发明人： Flemmert, Gösta Lennart
IPC分类号： C01B33/18 , C01B13/24
CPC分类号： C01B7/193 , B01J12/005 , C01B33/183 , C01B33/184 , C01P2006/12 , C01P2006/22
摘要： Process and apparatus are provided for preparing finely-divided silicon dioxide having high thickening capacity and good thixotropic properties by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to form silicon dioxide and hydrogen fluoride while cooling the gaseous reaction mixture in that portion of the reaction zone adjacent the base of the flame by contact with a cooling surface maintained at a temperature below 500°C but above the dew point of the reaction waste gases generated in the flame reaction.

43. 发明授权

US07163897B2 Method for assaying elements in a substrate for optics, electronics, or optoelectronics 有权
标题翻译：用于光学，电子学或光电子学的衬底中的元件的测定方法
公开(公告)号：US07163897B2
公开(公告)日：2007-01-16
申请号：US10637073
申请日：2003-08-06
申请人： Laurent Viravaux
发明人： Laurent Viravaux
IPC分类号： H01L21/461
CPC分类号： G01N1/32 , C01B7/193 , C01B33/10705 , G01N1/40 , G01N1/4044 , G01N2001/4027 , G01N2033/0095
摘要： The invention provides a method of assaying at least one element in a material including silicon. The method includes the steps of decomposing a portion of the material with an etching agent to form a solution containing hexafluorosilicic acid and at least one element to be assayed, heating the solution to a temperature sufficient to transform a substantial portion of the hexafluorosilicic acid into silicon tetrafluoride and to cause at least some of the silicon tetrafluoride to evaporate, such that a solution for assaying is obtained in which the silicon content is reduced while and the elements to be assayed are conserved; and assaying at least one element contained in the solution. The invention is applicable to the field of manufacturing substrates or components for optics, electronics, or optoelectronics, and in particular to the field of quality control.
摘要翻译：本发明提供一种测定包括硅的材料中的至少一种元素的方法。该方法包括以下步骤：用蚀刻剂分解材料的一部分以形成含有六氟硅酸的溶液和至少一种要测定的元素，将该溶液加热至足以将大部分六氟硅酸转化为硅的温度并使至少一些四氟化硅蒸发，从而得到其中硅含量降低同时待分析元素保守的用于测定的溶液; 并测定溶液中包含的至少一种元素。本发明可应用于制造用于光学，电子学或光电子学的衬底或组件的领域，特别是涉及质量控制领域。

44. 发明授权

US4599156A Electrodialysis process for preparing hydrogen fluoride 失效
标题翻译：用于制备氟化氢的电渗析方法
公开(公告)号：US4599156A
公开(公告)日：1986-07-08
申请号：US781016
申请日：1985-09-27
申请人： Viswanathan Srinivasan , Carl O. Quicksall
发明人： Viswanathan Srinivasan , Carl O. Quicksall
IPC分类号： C01B7/19 , B01D13/02
CPC分类号： B01D61/44 , C01B7/191 , C01B7/193 , C01B7/194 , B01D2311/2642 , B01D2311/2673
摘要： Hydrogen fluoride is produced by the electrodialysis of an alkali metal fluoride salt solution or an ammonium fluoride solution in an electrodialysis cell having an anode compartment and a cathode compartment spaced from one another by an inner electrodialysis compartment bounded by spaced cation exchange membranes.
摘要翻译：通过在具有通过间隔开的阳离子交换膜界定的内部电渗析室彼此间隔开的电渗析池中的碱金属氟化物盐溶液或氟化铵溶液的电渗析来制备氟化氢。

45. 发明授权

US4572827A Process for preparing finely-divided silicon dioxide in good yield 失效
标题翻译：以高产率制备细碎二氧化硅的方法
公开(公告)号：US4572827A
公开(公告)日：1986-02-25
申请号：US594150
申请日：1984-10-18
申请人： Gosta Flemmert
发明人： Gosta Flemmert
IPC分类号： C01B33/16 , B01J12/00 , C01B7/19 , C01B33/18
CPC分类号： C01B33/184 , B01J12/005 , C01B33/183 , C01B7/193 , C01P2006/12 , C01P2006/22 , C01P2006/80
摘要： Process and apparatus are provided for preparing finely-divided silicon dioxide in good yield by reaction of silicon fluoride in the vapor phase with water vapor, combustible gas and free oxygen-containing gas in a flame reaction zone to form hydrogen fluoride and silicon dioxide entrained in a gaseous reaction mixture; withdrawing the gaseous reaction mixture from the flame reaction zone; and then immediately and rapidly cooling the gaseous reaction mixture and entrained silicon dioxide to a temperature below 700.degree. C. by passing the gaseous reaction mixture in a turbulent flow at a Reynolds number above 300 under constraint through a straight narrow passage in alignment with the gas flow, the passage having a diameter within the range from about 20 to about 150 mm and smooth walls constituting a cooling surface.
摘要翻译：提供了工艺和装置，用于通过在气相中的氟化硅与水蒸气，可燃气体和游离含氧气体在火焰反应区中反应来以良好的收率制备细分二氧化硅，以形成氟化氢和二氧化碳气态反应混合物; 从火焰反应区取出气态反应混合物; 然后立即并快速地将气态反应混合物和夹带的二氧化硅冷却至低于700℃的温度，通过使气态反应混合物在雷诺数高于300的湍流中在约束条件下通过与气体对准的直的窄通道流动，通道具有在约20至约150mm的范围内的直径和构成冷却表面的平滑壁。

46. 发明授权

US4059680A Method of preparing fumed SiO.sub.2 失效
标题翻译：制备热解法SiO（HD 2）的方法
公开(公告)号：US4059680A
公开(公告)日：1977-11-22
申请号：US724683
申请日：1976-09-20
申请人： Joel F. M. Leathers , Donald W. Calvin
发明人： Joel F. M. Leathers , Donald W. Calvin
IPC分类号： C01B7/19 , C01B33/10 , C01B33/18 , C01B33/12 , C01B7/22
CPC分类号： C01B33/183 , C01B33/103 , C01B33/184 , C01B7/193 , C01P2004/62
摘要： Fluorosilicic acid solutions, which normally undergo decomposition when distilled, thereby creating unwanted forms of SiO.sub.2, are rendered stable during distillation by providing in the fluorosilicic acid solution an amount of HF which is at least about 10 parts of HF per 36 parts of H.sub.2 SiF.sub.6 and an amount of H.sub.2 O which is at least about 54 parts of H.sub.2 O per 36 parts of H.sub.2 SiF.sub.6. The mixture is distilled to remove any excess H.sub.2 O and excess HF that is present, without encountering formation of SiO.sub.2, until an azeotropic solution containing about 36% H.sub.2 SiF.sub.6, about 10% HF and about 54% H.sub.2 O is reached. The ternary azeotrope, being of constant quality and concentration, is more suitable for use in various processes, such as processes for making fumed SiO.sub.2, than H.sub.2 SiF.sub.6 solutions which are not of constant quality or concentration.
摘要翻译：通常在蒸馏过程中经历分解，从而产生不想要的形式的SiO 2的氟硅酸溶液在蒸馏期间通过在氟硅酸溶液中提供一定量的HF，每36个H 2 SiF 6和至少约10份HF，每36份H 2 SiF 6至少约54份H 2 O的量。将混合物蒸馏以除去存在的任何过量的H 2 O和过量的HF，而不会形成SiO 2，直到达到含有约36％H 2 SiF 6，约10％HF和约54％H 2 O的共沸溶液。具有恒定质量和浓度的三元共沸物比不具有恒定质量或浓度的H 2 SiF 6溶液更适合用于各种工艺中，例如制造热解法SiO 2的方法。

47. 发明授权

US3971845A Recovery of hydrofluoric acid from aqueous fluosilicic acid 失效
标题翻译：从氟硅酸水溶液中回收氢氟酸
公开(公告)号：US3971845A
公开(公告)日：1976-07-27
申请号：US400810
申请日：1973-09-26
申请人： Wolf Becker , Wolfgang Weiss
发明人： Wolf Becker , Wolfgang Weiss
IPC分类号： C01B7/19 , C01B33/08 , C01B33/18 , C02F1/02 , C01B7/22 , C01B33/10 , C01B33/12
CPC分类号： C01B33/186 , C01B33/08 , C01B7/193 , C01P2006/80 , C01P2006/82
摘要： Recovery of hydrofluoric acid from aqueous fluosilicic acid by treating said aqueous fluosilicic acid at a temperature of from 100.degree. to 300.degree.C. and under a pressure of from 3 to 80 atmospheres and separating resulting hydrogen fluoride containing aqueous phase and silicon tetrafluoride containing gaseous phase and optionally hydrolyzing the silicon tetrafluoride containing gaseous phase in aqueous medium and recycling the aqueous fluosilicic acid to the process as starting material.
摘要翻译：通过在100℃至300℃的温度和3至80个大气压的压力下处理所述氟硅酸水溶液从氟硅酸水溶液中回收氢氟酸，并分离得到的含氟化氢水相和含四氟化硅的气相并任选地在含水介质中水解含有四氟化硅的气相，并将氟硅酸水溶液再循环至该方法作为起始原料。

48. 发明授权

US3421853A Production of hydrogen fluoride from alkali- and alkaline earth fluosilicates 失效
标题翻译：从碱性和碱性土壤氟化物生产氟化氢
公开(公告)号：US3421853A
公开(公告)日：1969-01-14
申请号：US3421853D
申请日：1967-02-24
申请人： ALLIED CHEM
发明人： HENNIG RALPH R
IPC分类号： C01B7/19 , C01B7/22
CPC分类号： C01B7/193

49. 发明授权

US3218125A Process of producing hydrogen fluoride from fluosilicic acid in a two-stage procedure 失效
标题翻译：在两步法中由氟硅酸生产氟化氢的方法
公开(公告)号：US3218125A
公开(公告)日：1965-11-16
申请号：US22252762
申请日：1962-09-10
申请人： TENNESSEE CORP
发明人： HOUSTON THEODORE T , WILKINSON GERALD E G
IPC分类号： C01B7/19 , C01B25/22 , C01B33/18
CPC分类号： C01B33/186 , C01B7/193 , C01B25/22 , C01P2006/10 , C01P2006/12 , C01P2006/80

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