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    • 49. 发明授权
    • Semiconductor device and method of manufacturing semiconductor device
    • 半导体装置及其制造方法
    • US08735906B2
    • 2014-05-27
    • US13259344
    • 2010-04-05
    • Yuki Nakano
    • Yuki Nakano
    • H01L29/15
    • H01L29/7813H01L29/0623H01L29/0696H01L29/1608H01L29/42368H01L29/45H01L29/66068
    • The semiconductor device according to the present invention includes a semiconductor layer of a first conductivity type made of SiC, a body region of a second conductivity type formed on a surface layer portion of the semiconductor layer, a gate trench dug down from a surface of the semiconductor layer with a bottom surface formed on a portion of the semiconductor layer under the body region, source regions of the first conductivity type formed on a surface layer portion of the body region adjacently to side surfaces of the gate trench, a gate insulating film formed on the bottom surface and the side surfaces of the gate trench so that the thickness of a portion on the bottom surface is greater than the thickness of portions on the side surfaces, a gate electrode embedded in the gate trench through the gate insulating film, and an implantation layer formed on a portion of the semiconductor layer extending from the bottom surface of the gate trench to an intermediate portion of the semiconductor layer in the thickness direction by implantation of a second conductivity type impurity.
    • 根据本发明的半导体器件包括由SiC制成的第一导电类型的半导体层,形成在半导体层的表面层部分上的第二导电类型的体区,从 半导体层,其具有形成在所述体区域的所述半导体层的一部分上的底面,所述第一导电型的源极区域形成在所述主体区域的与所述栅极沟槽的侧面相邻的表面层部分上,形成栅极绝缘膜 在栅极沟槽的底表面和侧表面上,使得底表面上的部分的厚度大于侧表面上的部分的厚度,通过栅极绝缘膜嵌入栅极沟槽中的栅电极,以及 所述注入层形成在所述半导体层的从所述栅极沟槽的底表面延伸到所述半导体的中间部分的部分上 通过注入第二导电型杂质在厚度方向上的导体层。
    • 50. 发明授权
    • Compound for organic thin film transistor and organic thin film transistor using the same
    • 用于有机薄膜晶体管的化合物和使用其的有机薄膜晶体管
    • US08575599B2
    • 2013-11-05
    • US13057820
    • 2009-08-05
    • Yuki NakanoMasatoshi SaitoHiroaki Nakamura
    • Yuki NakanoMasatoshi SaitoHiroaki Nakamura
    • H01L35/24
    • C07C15/20C07C43/2055C07C2603/52H01L51/0055H01L51/0541H01L51/0545H01L51/0558
    • A compound for an organic thin film transistor having a structure of the following formula (1): wherein R1 to R6 are independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 30 carbon atoms, a haloalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a haloalkoxy group having 1 to 30 carbon atoms, an alkylthio group having 1 to 30 carbon atoms, a haloalkylthio group having 1 to 30 carbon atoms, an alkylamino group having 1 to 30 carbon atoms, a dialkylamino group having 2 to 60 carbon atoms (the alkyl groups may be combined with each other to form a ring structure containing the nitrogen atom), an alkylsulfonyl group having 1 to 30 carbon atoms, a haloalkylsulfonyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 60 carbon atoms, an aromatic heterocyclic group having 3 to 60 carbon atoms, an alkylsilyl group having 3 to 20 carbon atoms, an alkylsilylacetylene group having 5 to 60 carbon atoms or a cyano group, which each may have a substituent, provided that the compound in which all of R1 to R6 are a hydrogen atom is excluded.
    • 一种具有下式(1)结构的有机薄膜晶体管的化合物:其中R 1至R 6独立地为氢原子,卤素原子,具有1至30个碳原子的烷基,具有1至30个碳原子的卤代烷基 碳原子,碳原子数1〜30的烷氧基,碳原子数1〜30的卤代烷氧基,碳原子数1〜30的烷硫基,碳原子数1〜30的卤代烷硫基,碳原子数为1〜30的烷基氨基 碳原子,碳原子数2〜60的二烷基氨基(烷基可以相互结合形成含有氮原子的环结构),碳原子数1〜30的烷基磺酰基,碳原子数1〜30的卤代烷基磺酰基 碳原子数为6〜60的芳香族烃基,碳原子数3〜60的芳香族杂环基,碳原子数3〜20的烷基甲硅烷基,碳原子数5〜60的烷基甲硅烷基乙炔基或氰基, 其各自可以具有取代基,条件是其中R1至R6全部为氢原子的化合物被排除。