专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US06734103B2 Method of polishing a semiconductor device 失效
标题翻译：抛光半导体器件的方法
公开(公告)号：US06734103B2
公开(公告)日：2004-05-11
申请号：US10081212
申请日：2002-02-25
申请人： Souichi Katagiri , Ui Yamaguchi , Seiichi Kondo , Kan Yasui , Yoshio Kawamura
发明人： Souichi Katagiri , Ui Yamaguchi , Seiichi Kondo , Kan Yasui , Yoshio Kawamura
IPC分类号： H01L21302
CPC分类号： B24B7/228 , B24B53/02 , C23F3/00 , H01L21/3212 , H01L21/7684
摘要： A method of manufacturing is described wherein a semiconductor device has a substrate as workpiece with an insulation film formed on the substrate, openings formed inside the insulation film, a first conductive film is formed inside the openings and on a surface of the insulation film, a second conductive film is formed on the first conductive film, and the first and the second conductive films are formed inside openings by planarizing a surface of second conductive film and a surface part of the first conductive film with a fixed abrasive tool. The method includes supplying a first processing liquid, planarizing the surface of the second conductive film with the first processing liquid and the fixed abrasive tool, switching the supply of liquid from a first processing liquid to a second processing liquid, and planarizing the surface of second conductive film and the surface of part of the first conductive film with the second processing liquid and the fixed abrasive tool.
摘要翻译：描述了一种制造方法，其中半导体器件具有作为工件的基板，在基板上形成绝缘膜，形成在绝缘膜内部的开口，第一导电膜形成在开口内部和绝缘膜的表面上，第二导电膜形成在第一导电膜上，并且通过用固定的研磨工具平面化第二导电膜的表面和第一导电膜的表面部分，在开口内形成第一和第二导电膜。该方法包括提供第一处理液体，将第二导电膜的表面与第一处理液体和固定研磨工具平坦化，将液体从第一处理液体切换到第二处理液体，并将第二处理液体的表面平坦化导电膜和第一导电膜的部分表面与第二处理液和固定研磨工具。

42. 发明授权

US06663468B2 Method for polishing surface of semiconductor device substrate 有权
标题翻译：半导体器件基板的研磨方法
公开(公告)号：US06663468B2
公开(公告)日：2003-12-16
申请号：US09754193
申请日：2001-01-05
申请人： Yoshio Kawamura , Kan Yasui , Masahiko Sato , Souichi Katagiri , Masayuki Nagasawa , Kunio Harada , Satoshi Osabe , Ui Yamaguchi
发明人： Yoshio Kawamura , Kan Yasui , Masahiko Sato , Souichi Katagiri , Masayuki Nagasawa , Kunio Harada , Satoshi Osabe , Ui Yamaguchi
IPC分类号： B24B100
CPC分类号： B24B37/32 , H01L21/31053 , H01L21/3212
摘要： The problem of non-uniform polishing properties of a circumferential surface area of a substrate, so-called edge sagging phenomenon, is solved. When a thin film formed on a top surface of the substrate is polished while holding a back surface of the substrate, local stress at a circumferential end of the substrate is reduced by a guide installed so as to surround the substrate. Also, a deformation of the outer circumferential end portion of the substrate is reduced by a recessed groove provided on the guide. Since a thin film formed on the surface can be polished to be flat throughout the surface of the substrate without an occurrence of non-uniform polishing properties of the outer circumferential surface area of the substrate, so-called edge sagging phenomenon, a high-performance semiconductor device can be manufactured at a high yield and low costs.
摘要翻译：解决了基板的圆周表面积的不均匀抛光性能，所谓的边缘下垂现象的问题。当在保持基板的后表面的同时抛光形成在基板的顶表面上的薄膜时，通过安装成围绕基板的引导件来减小基板周向端部的局部应力。此外，通过设置在引导件上的凹槽来减小基板的外周端部的变形。由于形成在表面上的薄膜可以在基板的整个表面上被抛光成平坦的，而不会发生基板的外周表面积的不均匀的抛光性能，所谓的边缘下垂现象，高性能可以以高产率和低成本制造半导体器件。

43. 发明授权

US06565424B2 Method and apparatus for planarizing semiconductor device 失效
公开(公告)号：US06565424B2
公开(公告)日：2003-05-20
申请号：US09863264
申请日：2001-05-24
申请人： Souichi Katagiri , Yoshio Kawamura , Kan Yasui , Masayuki Nagasawa , Ui Yamaguchi
发明人： Souichi Katagiri , Yoshio Kawamura , Kan Yasui , Masayuki Nagasawa , Ui Yamaguchi
IPC分类号： B24B100
CPC分类号： B24B37/30 , B24B37/042 , B24B37/32
摘要： The invention provides a process apparatus including a wafer holder, and a process method, in which high planarization performance, scratch free process, narrow edge exclusion and high uniformity can be maintained for more than 10,000 processed wafers. The invention is achieved by providing a unit for keeping a retainer and surface of a polishing wheel non-contact with each other and controlling the gap within a certain range and by setting compression strength of the retainer at more than 3,000 kg/cm2.

44. 发明授权

US6091219A Structure of robot control system 有权
标题翻译：机器人控制系统结构
公开(公告)号：US6091219A
公开(公告)日：2000-07-18
申请号：US168348
申请日：1998-10-08
申请人： Satoshi Maruo , Takamitsu Inagaki , Yoshio Kawamura , Akira Ogawa , Noritaka Yatsuya , Masatoshi Kojima
发明人： Satoshi Maruo , Takamitsu Inagaki , Yoshio Kawamura , Akira Ogawa , Noritaka Yatsuya , Masatoshi Kojima
IPC分类号： G05B19/18 , B25J13/08 , G05B19/31 , G05B19/414 , G05D3/12 , G05B11/32 , G05B9/02
CPC分类号： G05B19/31 , G05B2219/33236 , G05B2219/37149 , G05B2219/42284 , G05B2219/42291
摘要： A robot control system is provided which controls a plurality of servomotors for moving a hand and articulated arms of a robot. The robot control system includes a plurality of position detectors, a motor control driver, and a serial communication path. The position detectors detect rotational positions of the servomotors and output the rotational positions in the form of serial data, respectively. The serial communication path is disposed between the motor control driver and the position detectors to transmit request signals provided by the motor control driver to the position detectors to request the position detectors to output the rotational positions.
摘要翻译：提供了一种机器人控制系统，其控制用于移动机器人的手和铰接臂的多个伺服电动机。机器人控制系统包括多个位置检测器，马达控制驱动器和串行通信路径。位置检测器检测伺服电机的旋转位置并分别以串行数据的形式输出旋转位置。串行通信路径设置在马达控制驱动器和位置检测器之间，以将由马达控制驱动器提供的请求信号发送到位置检测器，以请求位置检测器输出旋转位置。

45. 发明授权

US5858863A Fabrication system and method having inter-apparatus transporter 失效
标题翻译：具有装置间输送器的制造系统和方法
公开(公告)号：US5858863A
公开(公告)日：1999-01-12
申请号：US722944
申请日：1996-09-27
申请人： Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
发明人： Natsuki Yokoyama , Yoshifumi Kawamoto , Eiichi Murakami , Fumihiko Uchida , Kenichi Mizuishi , Yoshio Kawamura
IPC分类号： B65G49/07 , B23Q41/00 , B23Q41/02 , C23C14/56 , C23C16/54 , G05B19/418 , H01L21/00 , H01L21/02 , H01L21/027 , H01L21/205 , H01L21/285 , H01L21/304 , H01L21/3065 , H01L21/3205 , H01L21/677 , H01L21/68
CPC分类号： C23C14/568 , C23C16/54 , G05B19/41865 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67184 , H01L21/67276 , H01L21/67727 , H01L21/67745 , G05B2219/45031 , Y02P90/14 , Y02P90/20 , Y02P90/28 , Y10S414/135 , Y10S414/137 , Y10S438/908 , Y10T29/41
摘要： Disclosed is a fabricating system including a plurality of processing apparatuses connected to each other by means of an inter-apparatus transporter, wherein one group of semiconductor wafers are processed in processing apparatuses and other group of wafers are transported to specified processing apparatuses for a time interval from (To+T) to a time To; and another group of wafers are processed and the remaining group of wafers are transported for a time interval from (To+T) to (To+2T). Since processing apparatuses can receive at least one of works from the inter-apparatus transporter for a time interval T min, the distribution of works from the transporter to processing apparatuses is completed for the time interval T min. The transporter is emptied for each time interval T min, and works are unloaded to the emptied transporter, which makes easy the scheduling, control and management of the transporting of a plurality of works in the fabricating system. Moreover, since the fabricating system including processing apparatuses is periodically controlled at a cycle time T min, the scheduling of a plurality of works can be made easy, to enhance the level of optimization, thus improving the productivity.
摘要翻译：公开了一种制造系统，其包括通过机构间传送器彼此连接的多个处理装置，其中一组半导体晶片在处理装置中被处理，并且其他组的晶片被传送到指定的处理装置一段时间间隔从（To + T）到一个时间To; 并且处理另一组晶片，并且剩余的晶片组从（To + T）到（To + 2T）的时间间隔被传输。由于处理装置可以从时间间隔T min接收来自装置间运送装置的作品中的至少一个，因此在时间间隔T min内完成从运送装置到处理装置的作品的分配。在每个时间间隔T min内运输运输车被清空，并且卸载到排空运输车，这使得在制造系统中运输多个作业的调度，控制和管理变得容易。此外，由于包括处理装置的制造系统在周期时间T min周期性地进行控制，因此能够容易地进行多个作业的调度，提高优化等级，提高生产率。

46. 发明授权

US5736824A Motor control apparatus 失效
标题翻译：电机控制装置
公开(公告)号：US5736824A
公开(公告)日：1998-04-07
申请号：US741108
申请日：1996-10-30
申请人： Tetsuya Sato , Yoshio Kawamura
发明人： Tetsuya Sato , Yoshio Kawamura
IPC分类号： G05B13/02 , G05B19/416 , G05D3/00 , G05D3/12 , H02P29/00 , G05B13/04 , G05B13/00
CPC分类号： G05B19/416 , G05B2219/41123
摘要： A motor control apparatus comprises a speed command signal generating section generating a speed command signal for accelerating or decelerating a control object in accordance with a predetermined pattern. A position control section controls the position of the control object and a speed control section controls the speed of the control object by accelerating or decelerating the control object in accordance with the speed pattern. An encoder observes the present position of the control object. The load inertia of the control object is identified based on a positional deviation between the command position of the control object and the present position obtainable from the encoder at the time the speed command generated from the speed command signal generating means becomes a predetermined speed.
摘要翻译：电动机控制装置包括：速度指令信号生成部，根据规定的模式生成用于使控制对象加速或减速的速度指令信号。位置控制部分控制控制对象的位置，速度控制部分根据速度模式通过加速或减速控制对象来控制控制对象的速度。编码器观察控制对象的当前位置。基于从速度指令信号发生装置产生的速度指令变为预定速度时控制对象的指令位置与从编码器获得的当前位置之间的位置偏差来识别控制对象的负载惯量。

47. 发明授权

US5548454A Information recording disk, its production method and recording apparatus 失效
标题翻译：信息记录盘，其制作方法和记录装置
公开(公告)号：US5548454A
公开(公告)日：1996-08-20
申请号：US470335
申请日：1990-01-25
申请人： Youichi Kawakubo , Yoshio Kawamura , Yosuke Seo
发明人： Youichi Kawakubo , Yoshio Kawamura , Yosuke Seo
IPC分类号： G11B5/55 , G11B5/82 , G11B7/24 , G11B17/038 , G11B23/00 , G11B15/18 , G11B5/596
CPC分类号： G11B23/0042 , G11B17/038 , G11B5/5526 , G11B5/82 , G11B23/0035
摘要： In the information recording disk, the positioning signal of the information convertor is provided permanently, as a change in shape or material, to the front and reverse surfaces of the disk substrate and their eccentric distances from the center position is made to be smaller than half the repeating unit length of the positioning signal of the information convertor in the radial direction. The start position of the positioning signal in the circumferential direction is preferably made to be coincident on the front and reverse surfaces of the disk substrate within 10 .mu.m. The position reference for aligning the position in the radial direction or the position reference for aligning the rotation angle position in the circumferential direction is preferably disposed on the inner diameter portion or outer diameter portion of the disk substrate, respectively, and these position references can be accomplished by disposing at least one notch on the inner or outer peripheral edge portion of the disk substrate.
摘要翻译：在信息记录盘中，信息转换器的定位信号作为形状或材料的变化被永久地设置到盘基片的正面和反面，并且它们与中心位置的偏心距离被制成小于一半信息转换器的定位信号在径向上的重复单位长度。定位信号在圆周方向上的起始位置优选在10微米内在盘基片的前表面和反面上重合。用于使径向位置对准的位置参考或用于对准圆周方向上的旋转角度位置的位置参考优选分别设置在盘基片的内径部分或外径部分上，并且这些位置参考可以是通过在盘基板的内周缘部或外周缘部配置至少一个切口来实现。

48. 发明授权

US5380396A Valve and semiconductor fabricating equipment using the same 失效
标题翻译：阀门和半导体制造设备使用相同
公开(公告)号：US5380396A
公开(公告)日：1995-01-10
申请号：US138051
申请日：1993-10-19
申请人： Mitsuhiro Shikida , Kazuo Sato , Yoshio Kawamura , Shinji Tanaka , Yasuaki Horiuchi , Akira Koide , Toshimitsu Miyada
发明人： Mitsuhiro Shikida , Kazuo Sato , Yoshio Kawamura , Shinji Tanaka , Yasuaki Horiuchi , Akira Koide , Toshimitsu Miyada
IPC分类号： F16K31/02 , F04B43/04 , F15C5/00 , F16K99/00 , H01L21/205 , B44C1/22 , C23C16/00 , C23F1/00
CPC分类号： F16K99/0001 , F04B43/043 , F15C5/00 , F16K99/0015 , F16K99/0051 , F16K2099/0074 , F16K2099/0082 , Y10S251/901 , Y10T137/6416 , Y10T137/87249
摘要： Disclosed is a gas valve capable of switching gases to be introduced within a vacuum chamber with high speed thereby enhancing the controllability of the composion of a semiconducting thin film growing on a substrate and shortening the time required for growth of the thin film. The gas valve comprises a bendable film between a pair of parallel plate electrodes whereby operating the film by an electrostatic force and opening and closing a port for releasing gas to a substrate mounted on the wall surface of a gas chamber and a port for exhausting an unnecessary gas to an exhaust passage. The gas valve is mounted in the vicinity of the substrate within the vacuum chamber for supplying a working gas in a minimum amount required for the film growth.
摘要翻译：公开了一种能够以高速切换在真空室内被引入的气体的气阀，从而提高了生长在基板上的半导体薄膜的组合的可控性，并缩短了薄膜生长所需的时间。气阀包括一对平行板电极之间的可弯曲膜，由此通过静电力操作膜，并且打开和关闭用于将气体释放到安装在气室的壁表面上的基板的端口和用于排出不必要的端口气体到排气通道。气体阀安装在真空室内的基板附近，用于以薄膜生长所需的最小量供应工作气体。

49. 发明授权

US4894343A Chamber plate for use in cell fusion and a process for production thereof 失效
标题翻译：用于细胞融合的腔室板及其制造方法
公开(公告)号：US4894343A
公开(公告)日：1990-01-16
申请号：US122269
申请日：1987-11-18
申请人： Shinji Tanaka , Kazuo Sato , Tsuneo Terasawa , Yoshio Kawamura , Hisashi Tsuruoka
发明人： Shinji Tanaka , Kazuo Sato , Tsuneo Terasawa , Yoshio Kawamura , Hisashi Tsuruoka
IPC分类号： C12M1/00 , C12M1/32 , C12M1/34 , C12M3/00 , C12N13/00 , G01N15/14
CPC分类号： C12N13/00 , C12M23/20 , C12M35/02 , G01N2015/149
摘要： There are disclosed a chamber plate for use in cell fusion comprising a plate of single crystal silicon on which a plurality of chambers for holding at least a pair of unit cells are formed in array, said chamber having at the bottom a plate having slits which do not pass cells to be held; and a process for producing a chamber plate for use in cell fusion which comprises forming chambers for holding cells in a plate of single crystal silicon by anisotropic etching or isotropic etching by chemical etching.
摘要翻译：公开了一种用于细胞融合的室板，其包括单晶硅板，其上形成有用于保持至少一对单元电池的多个室，所述室在底部具有切口的板不通过细胞被保持; 以及用于生产用于细胞融合的室板的方法，其包括通过各向异性蚀刻或通过化学蚀刻的各向同性蚀刻形成用于将单元硅保持在单元硅板中的室。

50. 发明授权

US4820928A Lithography apparatus 失效
标题翻译：平版印刷设备
公开(公告)号：US4820928A
公开(公告)日：1989-04-11
申请号：US106499
申请日：1987-10-09
申请人： Mitsuo Ooyama , Kimiaki Ando , Yoshio Kawamura , Norio Saitou , Takanori Simura , Hiroyuki Kohida
发明人： Mitsuo Ooyama , Kimiaki Ando , Yoshio Kawamura , Norio Saitou , Takanori Simura , Hiroyuki Kohida
IPC分类号： G02B5/18 , H01J37/302 , H01J37/305 , H01J37/317 , H01L21/027
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/302 , H01J37/3174 , H01J2237/31762
摘要： A lithography apparatus in which a charged particle ray such as an electron beam or an ion beam is controlled to scan a desired region of a sample and thereby draw a pattern, including a framing pattern memory for storing therein closed framing lines of a pattern to be drawn in the form of dot images, a framing pattern generator for writing the framing lines of the pattern to be drawn into said framing pattern memory in the form of dot images, and a raster scanning circuit for scanning the framing pattern memory having stored therein closed framing lines of the pattern to be drawn and for generating a beam deflection address for drawing the pattern and a beam blanking control signal.
摘要翻译：其中控制诸如电子束或离子束的带电粒子扫描样品的期望区域并由此绘制图案的光刻设备，包括用于存储图案的闭合框线的框架图案存储器以点图像的形式绘制的帧图案生成器，用于以点图像的形式将要绘制的图案的成帧线写入所述成帧图案存储器的成像模式生成器，以及用于扫描已存储在其中的成帧模式存储器的光栅扫描电路闭合要绘制的图案的成帧线和用于产生用于绘制图案的光束偏转地址和光束消隐控制信号。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式