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41. 发明授权

US08551000B2 Ultrasound 3D imaging system 有权
公开(公告)号：US08551000B2
公开(公告)日：2013-10-08
申请号：US12286555
申请日：2008-09-30
申请人： Alice Chiang , Xingbai He , William Wong , Noah Berger
发明人： Alice Chiang , Xingbai He , William Wong , Noah Berger
IPC分类号： A61B8/00
CPC分类号： A61B8/4477 , A61B8/145 , A61B8/4483 , A61B8/483 , G01S7/5208 , G01S7/52082 , G01S7/52085 , G01S7/52095 , G01S15/8925 , G01S15/8927 , G01S15/8959 , G01S15/8961 , G01S15/8993 , G10K11/346
摘要： The present invention relates to an ultrasound imaging system in which the scan head either includes a beamformer circuit that performs far field subarray beamforming or includes a sparse array selecting circuit that actuates selected elements. When used with second stage beamforming system, three dimensional ultrasound images can be generated.

42. 发明授权

US08353634B2 Mounting a planar light wave circuit in a housing 有权
标题翻译：将平面光波电路安装在外壳中
公开(公告)号：US08353634B2
公开(公告)日：2013-01-15
申请号：US10455947
申请日：2003-06-06
申请人： Tsung-Ein Tsai , William Wong
发明人： Tsung-Ein Tsai , William Wong
IPC分类号： G02B6/00 , G02B6/36
CPC分类号： G02B6/4292 , G02B6/12
摘要： A planar light circuit may be mounted in the housing a one-point mounting. The one-point mounting may reduce the tendency of thermal deformations in the housing to be transmitted to the planar light circuit.
摘要翻译：平面光电路可以安装在壳体中的一点安装。一点安装可以减小壳体中热变形的趋势，以将其传递到平面光电路。

43. 发明授权

US07884361B2 Pattern-print thin-film transistors with top gate geometry 有权
标题翻译：具有顶栅几何形状的图案印刷薄膜晶体管
公开(公告)号：US07884361B2
公开(公告)日：2011-02-08
申请号：US12817127
申请日：2010-06-16
申请人： William Wong , Rene Lujan , Eugene Chow
发明人： William Wong , Rene Lujan , Eugene Chow
IPC分类号： H01L21/00
CPC分类号： H01L29/41733 , H01L27/124 , H01L27/1285 , H01L27/1288 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66757
摘要： A self-aligned, thin-film, top-gate transistor and method of manufacturing same are disclosed. A first print-patterned mask is formed over a metal layer by digital lithography, for example by printing with a phase change material using a droplet ejector. The metal layer is then etched using the first print-patterned mask to form source and drain electrodes. A semiconductive layer and an insulative layer are formed thereover. A layer of photosensitive material is then deposited and exposed through the substrate, with the source and drain electrodes acting as masks for the exposure. Following development of the photosensitive material, a gate metal layer is deposited. A second print-patterned mask is then formed over the device, again by digital lithography. Etching and removal of the photosensitive material leaves the self-aligned top-gate electrode.
摘要翻译：公开了一种自对准薄膜顶栅晶体管及其制造方法。通过数字光刻在金属层上形成第一印刷图案掩模，例如通过使用液滴喷射器用相变材料进行印刷。然后使用第一印刷图案化掩模蚀刻金属层以形成源极和漏极。在其上形成半导体层和绝缘层。然后将一层感光材料沉积并暴露通过基底，源极和漏极用作曝光的掩模。在感光材料的显影之后，沉积栅极金属层。然后再次通过数字光刻法在器件上形成第二印刷图案掩模。蚀刻和去除感光材料离开自对准顶栅电极。

44. 发明申请

US20100322575A1 SINGLE MODE PROPAGATION IN FIBERS AND RODS WITH LARGE LEAKAGE CHANNELS 有权
标题翻译：具有大泄漏通道的纤维和绳索中的单模式传播
公开(公告)号：US20100322575A1
公开(公告)日：2010-12-23
申请号：US12820950
申请日：2010-06-22
申请人： Liang Dong , William Wong , Martin E. Fermann
发明人： Liang Dong , William Wong , Martin E. Fermann
IPC分类号： G02B6/02
CPC分类号： G02B6/02357 , G02B6/00 , G02B6/02 , G02B6/02009 , G02B6/02033 , G02B6/02361 , G02B6/02366 , G02B6/02371 , G02B6/024 , G02B6/036 , G02B6/03633 , G02B6/03694 , G02B6/24 , G02B6/26 , G02B6/262 , G02B6/32 , G02F1/0134 , H01S3/0057 , H01S3/02 , H01S3/06708 , H01S3/06729 , H01S3/06745 , H01S3/06754 , H01S3/094007 , H01S3/1618 , H01S3/2308 , H01S3/302 , H01S2302/00
摘要： Various embodiments include large cores fibers that can propagate few modes or a single mode while introducing loss to higher order modes. Some of these fibers are holey fibers that comprising cladding features such as air-holes. Additional embodiments described herein include holey rods. The rods and fibers may be used in many optical systems including optical amplification systems, lasers, short pulse generators, Q-switched lasers, etc. and may be used for example for micromachining.
摘要翻译：各种实施例包括可以传播少数模式或单模的大芯纤维，同时将损耗引入高阶模式。这些纤维中的一些是包含诸如气孔的包层特征的多孔纤维。本文所述的另外的实施例包括多孔棒。棒和纤维可用于许多光学系统，包括光学放大系统，激光器，短脉冲发生器，Q开关激光器等，并且可以用于例如微加工。

45. 发明授权

US07849259B1 Disk controller response handler for write commands 有权
标题翻译：用于写命令的磁盘控制器响应处理程序
公开(公告)号：US07849259B1
公开(公告)日：2010-12-07
申请号：US12030162
申请日：2008-02-12
申请人： William Wong , Kha Nguyen , Huy Tu Nguyen , William Dennin, III , Roger Baldwin
发明人： William Wong , Kha Nguyen , Huy Tu Nguyen , William Dennin, III , Roger Baldwin
IPC分类号： G06F12/00 , G06F13/00 , G06F13/28 , G06F3/00 , G06F5/00
CPC分类号： G06F3/0659 , G06F3/061 , G06F3/0676
摘要： An execution queue stores a write command from the host in response to issuance of the write command from the host, and is removed from the execution queue in response to a signal indicating that data designated by the write command has been written to the hard disk. A holding queue stores the write command removed from the execution queue. In response to the command being stored in the holding queue, a request is issued for an acknowledgment from the host. The write command is removed from the holding queue in response to the acknowledgment being received from the host. An outgoing queue stores the write command removed from the holding queue for deletion. The queues are controlled by queue management hardware, the request is issued by the queue management hardware, and the signal and acknowledgment are received by the queue management hardware.
摘要翻译：执行队列响应于从主机发出写入命令而存储来自主机的写命令，并且响应于指示由写命令指定的数据已被写入硬盘的信号而从执行队列中移除。持有队列存储从执行队列中删除的写命令。响应于存储在保持队列中的命令，发出来自主机的确认的请求。响应于从主机接收到确认，将写命令从保持队列中移除。传出队列存储从保留队列中删除的写入命令以进行删除。队列由队列管理硬件控制，请求由队列管理硬件发出，信号和确认由队列管理硬件接收。

46. 发明申请

US20090156936A1 Ultrasound 3D imaging system 有权
标题翻译：超声三维成像系统
公开(公告)号：US20090156936A1
公开(公告)日：2009-06-18
申请号：US12286555
申请日：2008-09-30
申请人： Alice Chiang , Xingbai He , William Wong , Noah Berger
发明人： Alice Chiang , Xingbai He , William Wong , Noah Berger
IPC分类号： A61B8/00
CPC分类号： A61B8/4477 , A61B8/145 , A61B8/4483 , A61B8/483 , G01S7/5208 , G01S7/52082 , G01S7/52085 , G01S7/52095 , G01S15/8925 , G01S15/8927 , G01S15/8959 , G01S15/8961 , G01S15/8993 , G10K11/346
摘要： The present invention relates to an ultrasound imaging system in which the scan head either includes a beamformer circuit that performs far field subarray beamforming or includes a sparse array selecting circuit that actuates selected elements. When used with second stage beamforming system, three dimensional ultrasound images can be generated.
摘要翻译：本发明涉及一种超声成像系统，其中扫描头还包括执行远场子阵列波束成形的波束形成器电路，或者包括致动所选元件的稀疏阵列选择电路。当与第二级波束成形系统一起使用时，可以生成三维超声波图像。

47. 发明授权

US07356210B2 Variable optical attenuator multiplexer with a thermal isolating optical joint 有权
标题翻译：具有热隔离光学接头的可变光衰减器多路复用器
公开(公告)号：US07356210B2
公开(公告)日：2008-04-08
申请号：US10877413
申请日：2004-06-25
申请人： William Wong , Tsung-Ein Tsai , Ping Qu
发明人： William Wong , Tsung-Ein Tsai , Ping Qu
IPC分类号： G02B6/12
CPC分类号： G02B6/12026 , G02B6/266 , G02B6/2938 , G02B6/29395 , H04J14/02
摘要： A variable optical attenuator multiplexer having at least one thermal isolating optical joint. The variable optical attenuator multiplexer including a plurality of planar lightwave circuit components, such as, for example a combination of an array waveguide grating, a variable optical attenuator, and/or a power monitor. The planar lightwave circuit components are joined with an optical adhesive. The components may be thermally isolated by the formation of a widened space or gap between the component joints, and/or by creating a trench in the optical adhesive.
摘要翻译：一种具有至少一个热隔离光学接头的可变光衰减器多路复用器。可变光衰减器多路复用器包括多个平面光波电路部件，例如阵列波导光栅，可变光衰减器和/或功率监视器的组合。平面光波电路部件与光学粘合剂接合。可以通过在组件接头之间形成加宽的空间或间隙来和/或通过在光学粘合剂中形成沟槽来将部件热隔离。

48. 发明申请

US20080056656A1 LARGE CORE HOLEY FIBERS 有权
标题翻译：大芯孔纤维
公开(公告)号：US20080056656A1
公开(公告)日：2008-03-06
申请号：US11851270
申请日：2007-09-06
申请人： Liang Dong , Donald Harter , William Wong
发明人： Liang Dong , Donald Harter , William Wong
IPC分类号： G02B6/036 , G02B6/032
CPC分类号： G02B6/032 , G02B6/02009 , G02B6/02047 , G02B6/02328 , G02B6/02338 , G02B6/02342 , G02B6/02357 , G02B6/02361 , G02B6/02366 , G02B6/024 , G02B6/14 , G02B6/32 , H01S3/06716 , H01S3/06729 , H01S3/06733 , H01S3/06741 , H01S3/06754
摘要： Various types of holey fiber provide optical propagation. In various embodiments, for example, a large core holey fiber comprises a cladding region formed by large holes arranged in few layers. The number of layers or rows of holes about the large core can be used to coarse tune the leakage losses of the fundamental and higher modes of a signal, thereby allowing the non-fundamental modes to be substantially eliminated by leakage over a given length of fiber. Fine tuning of leakage losses can be performed by adjusting the hole dimension and/or the hole spacing to yield a desired operation with a desired leakage loss of the fundamental mode. Resulting holely fibers have a large hole dimension and spacing, and thus a large core, when compared to traditional fibers and conventional fibers that propagate a single mode. Other loss mechanisms, such as bend loss and modal spacing can be utilized for selected modes of operation of holey fibers. Other embodiments are also provided.
摘要翻译：各种有孔光纤提供光学传播。在各种实施例中，例如，大的核心多孔纤维包括由几个布置成几层的大孔形成的包层区域。可以使用围绕大芯的多个层或多排的孔来粗调基本信号和较高模式的信号的泄漏损耗，从而通过在给定长度的光纤上的泄漏来基本上消除非基本模式。泄漏损失的微调可以通过调整孔尺寸和/或孔间距来实现，以产生所需的基本模式的泄漏损失的操作。与传统单模式的传统纤维和传统纤维相比，所产生的多孔纤维具有较大的孔尺寸和间距，因而具有较大的纤芯。诸如弯曲损耗和模态间隔的其它损耗机制可以用于多孔纤维的选定操作模式。还提供了其他实施例。

49. 发明申请

US20070046705A1 Detecting defective ejector in digital lithography system 失效
标题翻译：在数字光刻系统中检测有缺陷的喷射器
公开(公告)号：US20070046705A1
公开(公告)日：2007-03-01
申请号：US11218416
申请日：2005-09-01
申请人： William Wong , Steven Ready , Ana Arias
发明人： William Wong , Steven Ready , Ana Arias
IPC分类号： B41J29/38
CPC分类号： B41J29/393
摘要： A digital lithography system prints a large-area electronic device by dividing the overall device printing process into a series of discrete feature printing sub-processes, where each feature printing sub-process involves printing both a predetermined portion (feature) of the device in a designated substrate area, and an associated test pattern in a designated test area that is remote from the feature. At the end of each feature printing sub-process, the test pattern is analyzed, e.g., using a camera and associated imaging system, to verify that the test pattern has been successfully printed. A primary ejector is used until an unsuccessfully printed test pattern is detected, at which time a secondary (reserve) ejector replaces the primary ejector and reprints the feature associated with the defective test pattern. When multiple printheads are used in parallel, analysis of the test pattern is used to efficiently identify the location of a defective ejector.
摘要翻译：数字光刻系统通过将整个设备打印过程划分成一系列离散特征打印子过程来打印大面积电子设备，其中每个特征打印子过程涉及将设备的预定部分（特征）打印在一个指定的基板区域以及远离该特征的指定测试区域中的关联测试图案。在每个特征打印子过程结束时，分析测试图案，例如使用相机和相关联的成像系统来验证测试图案是否已被成功打印。使用初级喷射器，直到检测到未成功打印的测试图案，此时次要（预留）喷射器取代主喷射器并重印与缺陷测试图案相关的特征。当并行使用多个打印头时，使用测试图案的分析来有效地识别有缺陷的喷射器的位置。

50. 发明申请

US20070026585A1 Patterned-print thin-film transistors with top gate geometry 有权
标题翻译：具有顶栅几何形状的图案印刷薄膜晶体管
公开(公告)号：US20070026585A1
公开(公告)日：2007-02-01
申请号：US11193847
申请日：2005-07-28
申请人： William Wong , Rene Lujan , Eugene Chow
发明人： William Wong , Rene Lujan , Eugene Chow
IPC分类号： H01L21/84
CPC分类号： H01L29/41733 , H01L27/124 , H01L27/1285 , H01L27/1288 , H01L27/1292 , H01L29/42384 , H01L29/4908 , H01L29/66757
摘要： A self-aligned, thin-film, top-gate transistor and method of manufacturing same are disclosed. A first print-patterned mask is formed over a metal layer by digital lithography, for example by printing with a phase change material using a droplet ejector. The metal layer is then etched using the first print-patterned mask to form source and drain electrodes. A semiconductive layer and an insulative layer are formed thereover. A layer of photosensitive material is then deposited and exposed through the substrate, with the source and drain electrodes acting as masks for the exposure. Following development of the photosensitive material, a gate metal layer is deposited. A second print-patterned mask is then formed over the device, again by digital lithography. Etching and removal of the photosensitive material leaves the self-aligned top-gate electrode.
摘要翻译：公开了一种自对准薄膜顶栅晶体管及其制造方法。通过数字光刻在金属层上形成第一印刷图案掩模，例如通过使用液滴喷射器用相变材料进行印刷。然后使用第一印刷图案化掩模蚀刻金属层以形成源极和漏极。在其上形成半导体层和绝缘层。然后将一层感光材料沉积并暴露通过基底，源极和漏极用作曝光的掩模。在感光材料的显影之后，沉积栅极金属层。然后再次通过数字光刻法在器件上形成第二印刷图案掩模。蚀刻和去除感光材料离开自对准顶栅电极。

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