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41. 发明申请

US20080266561A1 OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYSTEMS PERFORMANCE 失效
标题翻译：增强覆盖和对准系统性能的光学增益方法
公开(公告)号：US20080266561A1
公开(公告)日：2008-10-30
申请号：US12108364
申请日：2008-04-23
申请人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
发明人： Daniel Kandel , Vladimir Levinski , Michael Adel , Joel Seligson
IPC分类号： G01B11/14
CPC分类号： G01B11/272 , G03F7/70633
摘要： A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.
摘要翻译：可以通过将目标图像划分成第一和第二部分并光学地修改第一和/或第二部分使得由其组合形成的最终图像由莫尔图案表征来获得光栅目标的合成图像。可以分析所得到的图像以确定光栅目标从莫尔图案的偏移中的偏移。光学对准装置可以包括第一分束器，光耦合到第一分束器的图像变换元件和第二分束器。第一分束器将光栅靶的图像分成第一和第二部分。第二分束器组合第一部分和第二部分。图像变换元件光学地修改第一和/或第二部分，使得由它们的组合形成的最终图像的特征在于莫尔图案。

42. 发明申请

US20050195398A1 Continuously varying offset mark and methods of determining overlay 有权
标题翻译：不断变化的偏移标记和确定叠加的方法
公开(公告)号：US20050195398A1
公开(公告)日：2005-09-08
申请号：US11060588
申请日：2005-02-16
申请人： Michael Adel , Joel Seligson , Daniel Kandel
发明人： Michael Adel , Joel Seligson , Daniel Kandel
IPC分类号： G01B11/00 , G03F7/00 , G03F7/20 , H01L21/66
CPC分类号： G03F7/70683 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/70633 , H01L22/12
摘要： The present invention relates to overlay marks and methods for determining overlay error. One aspect of the present invention relates to a continuously varying offset mark. The continuously varying offset mark is a single mark that includes over laid periodic structures, which have offsets that vary as a function of position. By way of example, the periodic structures may correspond to gratings with different values of a grating characteristic such as pitch. Another aspect of the present invention relates to methods for determining overlay error from the continuously varying offset mark. The method generally includes determining the center of symmetry of the continuously varying offset mark and comparing it to the geometric center of the mark. If there is zero overlay, the center of symmetry tends to coincide with the geometric center of the mark. If overlay is non zero (e.g., misalignment between two layers), the center of symmetry is displaced from the geometric center of the mark. The displacement in conjunction with the preset gain of the continuously varying offset mark is used to calculate the overlay error.
摘要翻译：本发明涉及覆盖标记和确定覆盖误差的方法。本发明的一个方面涉及连续变化的偏移标记。连续变化的偏移标记是包括过度周期性结构的单个标记，其具有作为位置的函数而变化的偏移。作为示例，周期性结构可以对应于具有诸如间距的光栅特性的不同值的光栅。本发明的另一方面涉及用于从连续变化的偏移标记确定覆盖误差的方法。该方法通常包括确定连续变化的偏移标记的对称中心并将其与标记的几何中心进行比较。如果有零覆盖，则对称中心倾向于与标记的几何中心重合。如果覆盖层不为零（例如，两层之间的未对准），则对称中心从标记的几何中心位移。使用与连续变化的偏移标记的预设增益相结合的位移来计算重叠误差。

43. 发明授权

US06419361B2 Spectral bio-imaging of the eye 失效
标题翻译：眼睛的光谱生物成像
公开(公告)号：US06419361B2
公开(公告)日：2002-07-16
申请号：US09752833
申请日：2001-01-03
申请人： Dario Cabib , Michael Adel , Robert A. Buckwald
发明人： Dario Cabib , Michael Adel , Robert A. Buckwald
IPC分类号： A61B310
CPC分类号： A61B5/14555 , A61B3/10 , A61B5/411 , A61B5/7257 , C12Q1/6816 , C12Q1/6841 , C12Q1/6883 , G01J3/02 , G01J3/12 , G01J3/1256 , G01J3/26 , G01J3/2823 , G01J3/4406 , G01J3/453 , G01J3/4535 , G01J2003/2866 , G01N21/6428 , G01N21/6456 , G01N21/6458 , G01N33/5005 , G01N33/56966 , G01N33/582 , G01N2021/6417 , G01N2021/6423 , G01N2021/6441 , G06K9/00127 , G06K9/76
摘要： A spectral bio-imaging method for enhancing pathologic, physiologic, metabolic and health related spectral signatures of an eye tissue, the method comprising the steps of (a) providing an optical device for eye inspection being optically connected to a spectral imager; (b) illuminating the eye tissue with light via the iris, viewing the eye tissue through the optical device and spectral imager and obtaining a spectrum of light for each pixel of the eye tissue; and (c) attributing each of the pixels a color according to its spectral signature, thereby providing an image enhancing the spectral signatures of the eye tissue.
摘要翻译：一种用于增强眼组织的病理，生理，代谢和健康相关光谱特征的光谱生物成像方法，所述方法包括以下步骤：（a）提供用于眼睛检查的光学装置，光学连接到光谱成像器; （b）通过光圈照射眼组织，通过光学装置和光谱成像器观察眼组织，并为眼组织的每个像素获得光谱; 以及（c）根据其光谱特征将每个像素归因于颜色，由此提供增强眼睛组织的光谱特征的图像。

44. 发明授权

US09151712B1 Rule checking for metrology and inspection 有权
标题翻译：计量检验规则检查
公开(公告)号：US09151712B1
公开(公告)日：2015-10-06
申请号：US12130685
申请日：2008-05-30
申请人： Michael Adel , Ellis Chang
发明人： Michael Adel , Ellis Chang
IPC分类号： G01N21/47 , G01N21/892
CPC分类号： G01N21/47 , G01N21/892 , G01N21/93 , G01N21/956 , G03F1/84 , G03F7/70625
摘要： A design feature in a design file including a pattern to be formed on a substrate may be selected as a metrology target, alignment target or inspection proxy. Metrology or inspection may be performed on the substrate using a printed feature on the substrate that corresponds to the design feature as a metrology target or inspection proxy.
摘要翻译：可以选择包括要在基板上形成的图案的设计文件中的设计特征作为度量目标，对准目标或检查代理。可以在基板上使用与设计特征相对应的基板上的印刷特征作为计量目标或检验代理来执行计量或检查。

45. 发明申请

US20100175033A1 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 有权
标题翻译： SCATTERMETRY计量学目标设计优化
公开(公告)号：US20100175033A1
公开(公告)日：2010-07-08
申请号：US12350826
申请日：2009-01-08
申请人： Michael Adel , Amnon Manassen , Daniel Kandel
发明人： Michael Adel , Amnon Manassen , Daniel Kandel
IPC分类号： G06F17/50
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

46. 发明授权

US07684039B2 Overlay metrology using the near infra-red spectral range 有权
标题翻译：使用近红外光谱范围覆盖测量
公开(公告)号：US07684039B2
公开(公告)日：2010-03-23
申请号：US11557880
申请日：2006-11-08
申请人： Michael Adel , Aviv Frommer
发明人： Michael Adel , Aviv Frommer
IPC分类号： G01B11/00
CPC分类号： G01N21/956 , G01N2021/213 , G03F7/70633
摘要： A method and tool for conducting NIR overlay metrology is disclosed. Such methods involve generating a filtered illumination beam including NIR radiation and directing that illumination beam onto an overlay target to produce an optical signal that is detected and used to generate overlay metrology measurements. The method is particularly suited to substrate applications having layers of opaque material that are transmissive in the NIR range (e.g., amorphous carbon) and where NIR imaging is used to obtain overlay measurements. A tool implementation includes a means for generating a filtered illumination beam extending into the NIR range and a detector for receiving NIR signal from an NIR illuminated target and a computer for processing the signal data to obtain overlay metrology measurements.
摘要翻译：公开了一种用于进行NIR重叠测量的方法和工具。这样的方法涉及生成包括NIR辐射的滤波照明光束并将照明光束引导到覆盖目标上以产生被检测并用于生成覆盖度量测量的光信号。该方法特别适用于具有在NIR范围（例如无定形碳）中透射的不透明材料层的衬底应用，并且其中使用NIR成像来获得覆盖测量。工具实现包括用于生成延伸到NIR范围内的滤波照明光束的装置和用于从NIR照明目标接收NIR信号的检测器和用于处理信号数据以获得覆盖度量测量的计算机。

47. 发明授权

US07571422B2 Method for generating a design rule map having spatially varying overlay budget 有权
标题翻译：用于生成具有空间变化的覆盖预算的设计规则图的方法
公开(公告)号：US07571422B2
公开(公告)日：2009-08-04
申请号：US11857301
申请日：2007-09-18
申请人： Michael Adel , Ellis Chang
发明人： Michael Adel , Ellis Chang
IPC分类号： G06F17/50
CPC分类号： G03F7/70633 , G03F7/70533
摘要： The invention is a method for generating a design rule map having a spatially varying overlay error budget. Additionally, the spatially varying overlay error budget can be employed to determine if wafers are fabricated in compliance with specifications. In one approach a design data file that contains fabrication process information and reticle information is processed using design rules to obtain a design map with a spatially varying overlay error budget that defines a localized tolerance to overlay errors for different spatial locations on the design map. This spatially varying overlay error budget can be used to disposition wafers. For example, overlay information obtained from measured metrology targets on a fabricated wafer are compared with the spatially varying overlay error budget to determine if the wafer overlay satisfies the required specification.
摘要翻译：本发明是一种用于生成具有空间变化的重叠误差预算的设计规则图的方法。此外，可以采用空间上可变的重叠误差预算来确定晶片是否符合规格制造。在一种方法中，使用设计规则处理包含制造过程信息和掩模版信息的设计数据文件，以获得具有空间上变化的重叠误差预算的设计图，其定义对设计图上不同空间位置的重叠误差的局部容差。这种空间上可变的重叠误差预算可用于配置晶片。例如，将从制造的晶片上的测量的测量目标获得的覆盖信息与空间上变化的重叠误差预算进行比较，以确定晶片覆盖是否满足要求的规范。

48. 发明申请

US20080077894A1 METHOD FOR GENERATING A DESIGN RULE MAP HAVING SPATIALLY VARYING OVERLAY BUDGET 有权
标题翻译：用于生成具有空间变化的覆盖预算的设计规则地图的方法
公开(公告)号：US20080077894A1
公开(公告)日：2008-03-27
申请号：US11857301
申请日：2007-09-18
申请人： Michael Adel , Ellis Chang
发明人： Michael Adel , Ellis Chang
IPC分类号： G06F17/50
CPC分类号： G03F7/70633 , G03F7/70533
摘要： The invention is a method for generating a design rule map having a spatially varying overlay error budget. Additionally, the spatially varying overlay error budget can be employed to determine if wafers are fabricated in compliance with specifications. In one approach a design data file that contains fabrication process information and reticle information is processed using design rules to obtain a design map with a spatially varying overlay error budget that defines a localized tolerance to overlay errors for different spatial locations on the design map. This spatially varying overlay error budget can be used to disposition wafers. For example, overlay information obtained from measured metrology targets on a fabricated wafer are compared with the spatially varying overlay error budget to determine if the wafer overlay satisfies the required specification.
摘要翻译：本发明是一种用于生成具有空间变化的重叠误差预算的设计规则图的方法。此外，可以采用空间上可变的重叠误差预算来确定晶片是否符合规格制造。在一种方法中，使用设计规则处理包含制造过程信息和掩模版信息的设计数据文件，以获得具有空间上变化的重叠误差预算的设计图，该设计图定义了设计图上不同空间位置的重叠误差的局部容差。这种空间上可变的重叠误差预算可用于配置晶片。例如，将从制造的晶片上的测量的测量目标获得的覆盖信息与空间上变化的重叠误差预算进行比较，以确定晶片覆盖是否满足要求的规范。

49. 发明申请

US20070187606A1 OVERLAY METROLOGY USING THE NEAR INFRA-RED SPECTRAL RANGE 有权
标题翻译：使用近红外光谱范围的覆盖度量
公开(公告)号：US20070187606A1
公开(公告)日：2007-08-16
申请号：US11557880
申请日：2006-11-08
申请人： Michael Adel , Aviv Frommer
发明人： Michael Adel , Aviv Frommer
IPC分类号： G01N21/35
CPC分类号： G01N21/956 , G01N2021/213 , G03F7/70633
摘要： A method and tool for conducting NIR overlay metrology is disclosed. Such methods involve generating a filtered illumination beam including NIR radiation and directing that illumination beam onto an overlay target to produce an optical signal that is detected and used to generate overlay metrology measurements. The method is particularly suited to substrate applications having layers of opaque material that are transmissive in the NIR range (e.g., amorphous carbon) and where NIR imaging is used to obtain overlay measurements. A tool implementation includes a means for generating a filtered illumination beam extending into the NIR range and a detector for receiving NIR signal from an NIR illuminated target and a computer for processing the signal data to obtain overlay metrology measurements.
摘要翻译：公开了一种用于进行NIR重叠测量的方法和工具。这样的方法涉及生成包括NIR辐射的滤波照明光束并将照明光束引导到覆盖目标上以产生被检测并用于生成覆盖度量测量的光信号。该方法特别适用于具有在NIR范围（例如无定形碳）中透射的不透明材料层的衬底应用，并且其中使用NIR成像来获得覆盖测量。工具实现包括用于生成延伸到NIR范围内的滤波照明光束的装置和用于从NIR照明目标接收NIR信号的检测器和用于处理信号数据以获得覆盖度量测量的计算机。

50. 发明授权

US06198532B1 Spectral bio-imaging of the eye 失效
标题翻译：眼睛的光谱生物成像
公开(公告)号：US06198532B1
公开(公告)日：2001-03-06
申请号：US08942122
申请日：1997-10-01
申请人： Dario Cabib , Michael Adel , Robert A. Buckwald
发明人： Dario Cabib , Michael Adel , Robert A. Buckwald
IPC分类号： G01B902
CPC分类号： A61B5/14555 , A61B3/10 , A61B5/411 , A61B5/7257 , C12Q1/6816 , C12Q1/6841 , C12Q1/6883 , G01J3/02 , G01J3/12 , G01J3/1256 , G01J3/26 , G01J3/2823 , G01J3/4406 , G01J3/453 , G01J3/4535 , G01J2003/2866 , G01N21/6428 , G01N21/6456 , G01N21/6458 , G01N33/5005 , G01N33/56966 , G01N33/582 , G01N2021/6417 , G01N2021/6423 , G01N2021/6441 , G06K9/00127 , G06K9/76
摘要： A spectral bio-imaging method for enhancing pathologic, physiologic, metabolic and health related spectral signatures of an eye tissue, the method comprising the steps of (a) providing an optical device for eye inspection being optically connected to a spectral imager; (b) illuminating the eye tissue with light via the iris, viewing the eye tissue through the optical device and spectral imager and obtaining a spectrum of light for each pixel of the eye tissue; and (c) attributing each of the pixels a color according to its spectral signature, thereby providing an image enhancing the spectral signatures of the eye tissue.
摘要翻译：一种用于增强眼组织的病理，生理，代谢和健康相关光谱特征的光谱生物成像方法，所述方法包括以下步骤：（a）提供用于眼睛检查的光学装置，光学连接到光谱成像器; （b）通过光圈照射眼组织，通过光学装置和光谱成像器观察眼组织，并为眼组织的每个像素获得光谱; 以及（c）根据其光谱特征将每个像素归因于颜色，由此提供增强眼睛组织的光谱特征的图像。

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