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    • 44. 发明授权
    • Spare tire retaining structure
    • 备胎保留结构
    • US07077448B2
    • 2006-07-18
    • US11196057
    • 2005-08-03
    • Kazuki MaeshimaRyuichi Murai
    • Kazuki MaeshimaRyuichi Murai
    • B62D43/08
    • B62D43/08
    • A structure for retaining a spare tire at a sidewall of a rear body of a vehicle is disclosed. A vertically extending bracket is weld connected to an outer surface of an inner panel forming the sidewall. A rod extending through the inner panel into a luggage space is attached to a distal end of the bracket. The rod has a front end exposed to the luggage space for retaining the spare tire in an upright position. When a forwardly directed load arising from a collision in a rear of the vehicle is applied to the spare tire, the bracket is deformed through the rod to rupture the inner panel at the weld connection.
    • 公开了一种用于将备用轮胎保持在车辆后车体侧壁的结构。 垂直延伸的支架焊接连接到形成侧壁的内板的外表面。 延伸穿过内板进入行李箱的杆连接到支架的远端。 杆具有暴露于行李空间的前端,用于将备用轮胎保持在直立位置。 当车辆后部发生碰撞引起的向前的负载被施加到备用轮胎时,支架通过杆变形,从而在焊接连接处破裂内板。
    • 49. 发明授权
    • Electron gun, CRT with electron gun
    • 电子枪,CRT电子枪
    • US06328621B2
    • 2001-12-11
    • US09845302
    • 2001-05-01
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • H01J2962
    • H01J9/02H01J9/42H01J2229/48
    • Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance distribution. Then, a first process loop is executed to select another resistance distribution that provides an approximate minimum value of the beam spot coefficient. It is then determined whether the beam spot coefficient is an approximate minimum value. The first process loop is repeatedly executed until the beam spot coefficient is determined to be equal to the approximate minimum value. At this point, a second process loop is executed to confirm the minimum value of the beam spot coefficient using an aberration-independent function that is dependent upon the electrostatic lens magnification and is not dependent upon the spherical aberration coefficient. Processing returns to the first process loop using still another resistance distribution as a selected resistance distribution when the beam spot coefficient is not the approximate minimum value.
    • 电子枪制造方法及装置。 从静电透镜放大率和设定的电阻分布的球面像差系数获得束斑系数。 然后,执行第一处理循环以选择提供束斑系数的近似最小值的另一电阻分布。 然后确定束斑系数是否是近似最小值。 重复执行第一处理循环,直到确定束斑系数等于近似最小值。 此时,执行第二处理循环,以使用取决于静电透镜倍率的像差独立函数来确认束斑系数的最小值,并且不依赖于球面像差系数。 当光斑系数不是近似最小值时,处理返回到第一处理循环,使用另一个电阻分布作为选择的电阻分布。
    • 50. 发明授权
    • Method for making electron gun
    • 电子枪制作方法
    • US06270390B1
    • 2001-08-07
    • US09593137
    • 2000-06-14
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • Masatoshi KudohRyuichi MuraiMitsuhiro OhtaniKatuyoshi YamashitaHideharu OhmaeMasahiko Konda
    • H01J902
    • H01J9/02H01J9/42H01J2229/48
    • Method and apparatus for manufacturing an electron gun. A beam spot coefficient is obtained from an electrostatic lens magnification and a spherical aberration coefficient of a set resistance distribution. Then, a first process loop is executed to select another resistance distribution that provides an approximate minimum value of the beam spot coefficient. It is then determined whether the beam spot coefficient is an approximate minimum value. The first process loop is repeatedly executed until the beam spot coefficient is determined to be equal to the approximate minimum value. At this point, a second process loop is executed to confirm the minimum value of the beam spot coefficient using an aberration-independent function that is dependent upon the electrostatic lens magnification and is not dependent upon the spherical aberration coefficient. Processing returns to the first process loop using still another resistance distribution as a selected resistance distribution when the beam spot coefficient is not the approximate minimum value.
    • 电子枪制造方法及装置。 从静电透镜放大率和设定的电阻分布的球面像差系数获得束斑系数。 然后,执行第一处理循环以选择提供束斑系数的近似最小值的另一电阻分布。 然后确定束斑系数是否是近似最小值。 重复执行第一处理循环,直到确定束斑系数等于近似最小值。 此时,执行第二处理循环,以使用取决于静电透镜倍率的像差独立函数来确认束斑系数的最小值,并且不依赖于球面像差系数。 当光斑系数不是近似最小值时,处理返回到第一处理循环,使用另一个电阻分布作为选择的电阻分布。