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41. 发明授权

US06696218B2 Chemical amplification type positive resist composition 失效
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06696218B2
公开(公告)日：2004-02-24
申请号：US10107488
申请日：2002-03-28
申请人： Kunihiro Ichimura , Tsugio Okudaira , Masumi Suetsugu , Yasunori Uetani , Katsuhiko Namba
发明人： Kunihiro Ichimura , Tsugio Okudaira , Masumi Suetsugu , Yasunori Uetani , Katsuhiko Namba
IPC分类号： G03F7038
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A chemical amplification type positive resist composition that enables a resist pattern free from deformation in a side wall thereof and excellent in evenness and is excellent in sensitivity as well as resolution is provided and the chemical amplification type positive resist composition comprises a resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and is insoluble or hardly soluble in an alkaline medium itself but becoming alkaline-soluble after the acid-unstable group being cleaved by the action of the generated acid; an acid generating agent; and a compound represented by the following formula (I): wherein R1 and R2 each independently represents an alkyl group having 1 to 15 carbon atoms, an alkyl group having 1 to 8 carbon atoms wherein at least 3 hydrogen atoms are substituted by fluorine atoms, or an aryl group having 6 to 10 carbon atoms.
摘要翻译：化学增幅型正性抗蚀剂组合物使得能够在其侧壁中没有变形的抗蚀剂图案具有优异的均匀性并且具有优异的灵敏度和分辨率，并且化学放大型正性抗蚀剂组合物包含具有聚合性的树脂衍生自对羟基苯乙烯的单元和具有对酸不稳定的基团的聚合单元，并且在酸性不稳定基团被所产生的酸的作用下裂解后，在碱性介质中本身不溶或几乎不溶解，但变得碱溶性; 酸产生剂; 和由下式（I）表示的化合物：其中R 1和R 2各自独立地表示具有1至15个碳原子的烷基，具有1至8个碳原子的烷基，其中至少3个氢原子被氟原子取代，或具有6〜10个碳原子的芳基。

42. 发明授权

US06677102B2 Chemical amplifying type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06677102B2
公开(公告)日：2004-01-13
申请号：US10093399
申请日：2002-03-11
申请人： Yoshiko Miya , Yasunori Uetani , Hiroaki Fujishima
发明人： Yoshiko Miya , Yasunori Uetani , Hiroaki Fujishima
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.
摘要翻译：一种化学放大型正性抗蚀剂组合物，其分辨率和灵敏度性能的平衡优异，具有高的耐干蚀刻性，并且包括：具有源自由下式（I）表示的单体的聚合单元的树脂：其中R1和R2独立地表示氢或碳原子数1〜4的烷基，R 3表示氢或甲基，该树脂本身不溶于碱，但由于酸的作用而成为碱溶性的; 并提供酸生成剂。

43. 发明授权

US06579659B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US06579659B2
公开(公告)日：2003-06-17
申请号：US09824227
申请日：2001-04-03
申请人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
发明人： Yasunori Uetani , Airi Yamada , Yoshiko Miya , Yoshiyuki Takata
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/111
摘要： A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent. (A): At least one polymeric unit of an alicyclic lactcone selected from polymeric units represented by the following formulae (Ia) and (Ib): (B): At least one polymeric unit selected from a polymeric unit of 3-hydroxy-1-adamantyl (meth)acrylate represented by the following formula (II), a polymeric unit of a combination of a unit represented by the following formula (III) and a unit derived from unsaturated dicarboxylic acid anhydride selected from maleic anhydride and itaconic anhydride and a polymeric unit of (&agr;)&bgr;-(meth)acryloyloxy-&ggr;-butyrolactone represented by the following formula (IV):
摘要翻译：包含具有以下聚合单元（A），（B）和（C）的树脂的性能如分辨率，轮廓，灵敏度，耐干蚀刻性，粘附性等的平衡优异的化学增幅型正光刻胶组合物; （A）：选自由下式（Ia）和（Ib）表示的聚合单元的脂环族内聚焦的至少一种聚合单元:( B）：至少一种选自聚合单元的聚合单元由下式（II）表示的3-羟基-1-金刚烷基（甲基）丙烯酸酯，由下式（III）表示的单元的组合的单体和来自选自马来酸酐的不饱和二羧酸酐的单元酸酐和衣康酸酐以及由下式（IV）表示的（α）β-（甲基）丙烯酰氧基-γ-丁内酯的聚合单元：

44. 发明授权

US06548221B2 Chemical amplification type positive resist composition 失效
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06548221B2
公开(公告)日：2003-04-15
申请号：US10003441
申请日：2001-12-06
申请人： Yasunori Uetani , Hiroki Inoue
发明人： Yasunori Uetani , Hiroki Inoue
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： A positive resist composition is provided which comprises a resin having 2-alkyl-2-adamantyl (meth)acrylate polymerization unit represented by the following formula (I): wherein R1 represents hydrogen or methyl and R2 represents an alkyl, and being insoluble or barely soluble in alkali, but being converted to soluble in alkali by the action of an acid; and an acid generator represented by the following formula (V): wherein Q1, Q2 and Q3 independently represent hydrogen, a hydroxyl group, an alkyl having 1 to 6 carbon atoms or an alkoxy having 1 to 6 carbon atoms, and n is an integer of 4 to 8; and gives a good resolution upon exposure by ArF excimer laser and has little substrate dependency.
摘要翻译：提供一种正型抗蚀剂组合物，其包含具有由下式（I）表示的（甲基）丙烯酸2-烷基-2-金刚烷基酯聚合单元的树脂：其中R1表示氢或甲基，R2表示烷基，并且不溶或几乎不溶可溶于碱，但通过酸的作用转化为可溶于碱;和由下式（V）表示的酸发生剂：其中Q1，Q2和Q3独立地表示氢，羟基，具有1〜 6个碳原子或1〜6个碳原子的烷氧基，n为4〜8的整数。并且通过ArF准分子激光曝光时给出良好的分辨率，并且基板依赖性很小。

45. 发明授权

US06245478B1 Resist composition 有权
标题翻译：抗蚀组成
公开(公告)号：US06245478B1
公开(公告)日：2001-06-12
申请号：US09398998
申请日：1999-09-17
申请人： Yasunori Uetani , Ichiki Takemoto
发明人： Yasunori Uetani , Ichiki Takemoto
IPC分类号： G03F7023
CPC分类号： G03F7/0045 , G03F7/0085 , G03F7/0226 , G03F7/038 , G03F7/039 , Y10S430/121
摘要： A resist composition exhibiting an improved profile performance without impairing the resolution, the sensitivity, etc. which comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I): wherein Q1 represents an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group; and Q2, which may be the same as or different from Q1, represents hydrogen, an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group.
摘要翻译：抗蚀剂组合物，其表现出改进的轮廓性能，而不损害包括粘结剂成分的分辨率，灵敏度等; 辐射敏感组件; 和由下式（I）表示的琥珀酰亚胺化合物：其中Q1表示可任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基; 和可以与Q1相同或不同的Q2表示氢，可以任选被烷氧基，卤素或硝基取代的烷基，脂环族烃残基，芳基或芳烷基。

46. 发明授权

US6068962A Positive resist composition 失效
标题翻译：正抗蚀剂组成
公开(公告)号：US6068962A
公开(公告)日：2000-05-30
申请号：US934226
申请日：1997-09-19
申请人： Yasunori Uetani , Hiroshi Moriuma , Jun Tomioka
发明人： Yasunori Uetani , Hiroshi Moriuma , Jun Tomioka
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0226 , Y10S430/121 , Y10S430/127
摘要： A non-chemically enhanced type positive resist composition includes an alkali-soluble novolak resin, a quinonediazide type sensitizer and at least one of the following compounds (a) and (b):(a) an acid-generator which is decomposed by the action of an alkali developer and generates an acid, and(b) compounds represented by the following formula (IV) or (V): ##STR1## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 independently represents hydrogen, halogen, hydroxy, alkyl, alkoxy, aryl or nitro, each of R.sup.9 and R.sup.10 independently represents hydrogen, halogen, alkyl, aryl, nitro, a group of --(CH.sub.2).sub.n --OR.sup.11 or a group of --(CH.sub.2).sub.n --COOR.sup.12 in which R.sup.11 represents hydrogen, alkyl, aryl or alkanoyl and R.sup.12 represents hydrogen, alkyl or aryl, and n is a number from 0 to 3 and R.sup.13 represents hydrogen, halogen, alkyl, alkoxy or aryl.
摘要翻译：非化学增强型正型抗蚀剂组合物包括碱溶性酚醛清漆树脂，醌二叠氮化物型增感剂和至少一种以下化合物（a）和（b））：（a）通过动作分解的酸发生剂的碱显影剂，并产生酸，和（b）由下式（IV）或（V）表示的化合物：其中R1，R2，R3，R4，R5，R6，R7和R8各自独立地表示氢，卤素，羟基，烷基，烷氧基，芳基或硝基，R 9和R 10各自独立地表示氢，卤素，烷基，芳基，硝基， - （CH 2）n -OR 11或 - （CH 2）n -COOR 12基团其中R 11表示氢，烷基，芳基或烷酰基，R 12表示氢，烷基或芳基，n为0至3的数，R 13表示氢，卤素，烷基，烷氧基或芳基。

47. 发明授权

US5395727A Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol 失效
标题翻译：含有由醛形成的酚醛清漆树脂和异丙烯基苯酚二聚体的正性抗蚀剂组合物
公开(公告)号：US5395727A
公开(公告)日：1995-03-07
申请号：US158817
申请日：1993-11-29
申请人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
发明人： Yasunori Uetani , Haruyoshi Osaki , Naoki Takeyama , Yuji Ueda , Hiromi Ueki , Takehiro Kusumoto
IPC分类号： C08G8/08 , C08G8/20 , G03F7/023 , G03F7/30
CPC分类号： C08G8/08 , C08G8/20 , G03F7/0236
摘要： A novolak resin made from a carbonyl compound and a specific phenol compound, which resin has good properties, in particular, as a base resin of a photoresist.
摘要翻译：由羰基化合物和特定酚化合物制成的酚醛清漆树脂，该树脂具有良好的性能，特别是光致抗蚀剂的基础树脂。

48. 发明授权

US5326665A Positive type resist composition 失效
标题翻译：正型抗蚀剂组合物
公开(公告)号：US5326665A
公开(公告)日：1994-07-05
申请号：US24499
申请日：1993-03-01
申请人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
发明人： Haruyoshi Osaki , Hiroshi Moriuma , Yasunori Uetani
IPC分类号： C08G8/04 , G03F7/023 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： C08G8/04 , G03F7/0236
摘要： A positive type resist composition comprising an alkali-soluble resin and a quinonediazide compound, wherein the alkali-soluble resin containing resin (A) is obtainable through a condensation reaction with at least one phenol compound represented by the following general formula (I): ##STR1## wherein R.sub.1 to R.sub.3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one compound represented by the following general formula (II): ##STR2## wherein R.sub.4 represents a hydrogen atom, an alkyl group having 1-4 carbon atoms or a phenyl group, R.sub.5 to R.sub.7 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and n represents 1 or 2, and an aldehyde compound. This composition is excellent in the balance between performances such as sensitivity, heat resistance and profile, and is free from scum.
摘要翻译：包含碱溶性树脂和醌二叠氮化合物的正型抗蚀剂组合物，其中所述含碱树脂（A）的树脂可通过与至少一种由以下通式（I）表示的酚化合物的缩合反应获得：（I）其中R1至R3彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基，k表示1或2，至少一种由以下通式（II）表示的化合物：：其中R 4表示氢原子，具有1-4个碳原子的烷基或苯基，R 5至R 7彼此独立地表示氢原子或具有1-4个碳原子的烷基或烷氧基碳原子，n表示1或2，醛化合物。该组合物在灵敏度，耐热性和轮廓性能之间的平衡方面是优异的，并且没有浮渣。

49. 发明授权

US5290657A Positive working quinone diazide and alkali soluble resin resist composition with select polyhydroxy additive compound 失效
标题翻译：正选择多羟基添加剂化合物的正性醌醌二氮化物和碱溶性树脂抗蚀剂组合物
公开(公告)号：US5290657A
公开(公告)日：1994-03-01
申请号：US743299
申请日：1991-08-15
申请人： Yasunori Uetani , Hirotoshi Nakanishi
发明人： Yasunori Uetani , Hirotoshi Nakanishi
IPC分类号： G03F7/022 , G03F7/023 , G03F7/039 , H01L21/027 , G03C1/61
CPC分类号： G03F7/039 , G03F7/0226
摘要： A positive resist composition comprising an alkali-soluble resin, a quinone diazide compound and a specific hydroxyl group-containing compound can improve sensitivity without deterioration of heat resistance and film thickness retention.
摘要翻译： PCT No.PCT / JP90 / 01659 Sec。 371日期1991年8月15日 102（e）日期1991年8月15日PCT 1990年12月20日PCT PCT。公开号WO91 / 09346 日本1991年6月27日。包含碱溶性树脂，醌二叠氮化合物和特定含羟基化合物的正型抗蚀剂组合物可以提高灵敏度，而不会降低耐热性和膜厚保持性。

50. 发明授权

US09362515B2 Photoelectric conversion element 有权
标题翻译：光电转换元件
公开(公告)号：US09362515B2
公开(公告)日：2016-06-07
申请号：US13002584
申请日：2009-07-07
申请人： Yasunori Uetani , Yoshiaki Honda , Yukiko Takenaka
发明人： Yasunori Uetani , Yoshiaki Honda , Yukiko Takenaka
IPC分类号： H01L31/102 , H01L51/42 , B82Y10/00 , H01L51/00
CPC分类号： H01L51/4253 , B82Y10/00 , H01L51/0036 , H01L51/0039 , H01L51/0043 , H01L51/0047 , Y02E10/549
摘要： Disclosed is a photoelectric conversion element comprising an anode, a cathode, and an active layer between the anode and the cathode, wherein the active layer includes an n-type semiconductor and a p-type semiconductor, and an area of a p-n junction between the n-type semiconductor and the p-type semiconductor is 100 μm2 or more per 1 μm3 of the active layer.
摘要翻译：公开了一种光电转换元件，其包括在阳极和阴极之间的阳极，阴极和有源层，其中有源层包括n型半导体和p型半导体，以及p型结的区域 n型半导体和p型半导体为每1μm3活性层为100μm2以上。

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