专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20070247885A1 Content addressable memory 审中-公开
标题翻译：内容可寻址内存
公开(公告)号：US20070247885A1
公开(公告)日：2007-10-25
申请号：US11730969
申请日：2007-04-05
申请人： Naoya Watanabe , Isamu Hayashi , Teruhiko Amano , Fukashi Morishita , Kenji Yoshinaga , Mihoko Akiyama , Shinya Miyazaki , Masakazu Ishibashi , Katsumi Dosaka
发明人： Naoya Watanabe , Isamu Hayashi , Teruhiko Amano , Fukashi Morishita , Kenji Yoshinaga , Mihoko Akiyama , Shinya Miyazaki , Masakazu Ishibashi , Katsumi Dosaka
IPC分类号： G11C15/00
CPC分类号： G11C15/043 , G11C7/06 , G11C7/12 , G11C7/14 , G11C7/22 , G11C15/04 , G11C15/046
摘要： An entry including multiple bits of unit cells each storing data bit is coupled to a match line. The match line is supplied with a charging current having a restricted current value smaller than a match line current flowing in a one-bit miss state in one entry, but larger than a match line current flowing in an all-bit match state in one entry. A precharge voltage level of a match line is restricted to a voltage level of half a power supply voltage or smaller. Power consumption in a search cycle of a content addressable memory can be reduced, and a search operation speed can be increased.
摘要翻译：包括存储数据位的单位单元的多个比特的条目耦合到匹配线。匹配线具有一个充电电流，该充电电流的限制电流值小于在一个条目中以一位未命中状态流动的匹配线电流，但大于在一个条目中以全位匹配状态流动的匹配线电流。匹配线的预充电电压电平被限制为电源电压的一半或更小的电压电平。可以减少内容可寻址存储器的搜索周期中的功耗，并且可以提高搜索操作速度。

42. 发明授权

US07285792B2 Scratch repairing processing method and scanning probe microscope (SPM) used therefor 有权
标题翻译：刮擦修复处理方法和扫描探针显微镜（SPM）
公开(公告)号：US07285792B2
公开(公告)日：2007-10-23
申请号：US11086812
申请日：2005-03-21
申请人： Naoya Watanabe , Osamu Takaoka
发明人： Naoya Watanabe , Osamu Takaoka
IPC分类号： G01B5/28
CPC分类号： G03F1/72 , G01Q80/00
摘要： A sample to be processed is disposed within a processing cell which contains a liquid. Scratch processing using a scanning probe microscope is performed within the liquid so that chips or shavings removed from the sample scatter within the liquid rather than collecting on the surface of the sample. The processing cell has a supply port and a discharge port so that new liquid can be supplied within the cell through the supply port after the termination of the scratch processing to clean the cell. In this manner, chips or shavings generated by scratch processing a defect portion of the sample can be removed completely without being collected at the surface of a sample despite the surface tension of adsorbed water existing on the sample surface and/or electrostatic charges caused by friction.
摘要翻译：要处理的样品设置在含有液体的处理单元内。在液体内进行使用扫描探针显微镜的划痕处理，使得从样品中除去的碎屑或碎屑在液体内分散而不是收集在样品的表面上。处理单元具有供给口和排出口，使得能够在暂时处理结束之后通过供给口在电池内供给新的液体，以清洁电池。以这种方式，尽管样品表面存在吸附水的表面张力和/或由摩擦引起的静电电荷，但是通过刮擦处理产生的切屑或刨屑可以被完全去除而不被收集在样品的表面。

43. 发明申请

US20060268636A1 Semiconductor device and entry into test mode without use of unnecessary terminal 有权
标题翻译：半导体器件进入测试模式，不使用不必要的端子
公开(公告)号：US20060268636A1
公开(公告)日：2006-11-30
申请号：US11207935
申请日：2005-08-22
申请人： Yoshiaki Nagatomi , Kenichi Kawabata , Norihiro Nakatsuhama , Tetsuya Yoshida , Naoya Watanabe , Tomohiro Wada , Tomohide Yamamoto
发明人： Yoshiaki Nagatomi , Kenichi Kawabata , Norihiro Nakatsuhama , Tetsuya Yoshida , Naoya Watanabe , Tomohiro Wada , Tomohide Yamamoto
IPC分类号： G11C29/00
CPC分类号： G11C29/46 , G11C29/1201
摘要： A semiconductor device includes a first power supply terminal, a second power supply terminal, a comparison circuit coupled to the first power supply terminal and the second power supply terminal to produce at an output node thereof a signal responsive to a difference between a potential of the first power supply terminal and a potential of the second power supply terminal, and a core circuit coupled to the output node of the comparison circuit to perform a test operation in response to the signal.
摘要翻译：半导体器件包括第一电源端子，第二电源端子，耦合到第一电源端子和第二电源端子的比较电路，以在其输出节点处产生响应于电位第一电源端子和第二电源端子的电位，以及耦合到比较电路的输出节点的核心电路，以响应于该信号执行测试操作。

44. 发明申请

US20060219901A1 Working method using scanning probe 有权
标题翻译：使用扫描探头的工作方法
公开(公告)号：US20060219901A1
公开(公告)日：2006-10-05
申请号：US11370006
申请日：2006-03-04
申请人： Masatoshi Yasutake , Takuya Nakaue , Kazutoshi Watanabe , Osamu Takaoka , Atsushi Uemoto , Naoya Watanabe , Yoshiteru Shikakura
发明人： Masatoshi Yasutake , Takuya Nakaue , Kazutoshi Watanabe , Osamu Takaoka , Atsushi Uemoto , Naoya Watanabe , Yoshiteru Shikakura
IPC分类号： G01N23/00 , G21K7/00
CPC分类号： G01N23/225 , G01Q60/34
摘要： The present invention provides a working method using a scanning probe which can enhance a working speed and prolong a lifetime of the probe. The present invention provides the working method using a scanning probe which works a sample by performing the relative scanning of a probe supported on a cantilever on the sample at a predetermined scanning speed. The working method can work the object to be worked while forcibly and relatively vibrating the probe in the direction orthogonal to or parallel to a working surface of the sample at low frequency of 100 to 1000 Hz.
摘要翻译：本发明提供一种使用扫描探针的工作方法，其可以提高工作速度并延长探针的寿命。本发明提供了使用扫描探针的工作方法，该扫描探针通过以预定扫描速度执行支撑在样品上的悬臂上的探针的相对扫描来对样品进行工作。该工作方法可以在100至1000Hz的低频下，以与样品的工作表面正交或平行的方向强制地相对振动探针，从而对被加工物进行加工。

45. 发明授权

US07107826B2 Scanning probe device and processing method by scanning probe 有权
标题翻译：通过扫描探头扫描探针装置和处理方法
公开(公告)号：US07107826B2
公开(公告)日：2006-09-19
申请号：US11096875
申请日：2005-04-01
申请人： Naoya Watanabe , Osamu Takaoka
发明人： Naoya Watanabe , Osamu Takaoka
IPC分类号： H01J37/352
CPC分类号： G01Q60/32 , G01Q80/00 , G03F1/72
摘要： There is provided a device in which a probe can be used for both of observation and correction, and which can, even if a next generation photomask of ultra minute structure is made an object, perform a desired processing without injuring a normal portion in a process of obtaining information of a position and a shape of a defect part, and without impairing the probe also at a processing time. It has been adapted such that, at an observation time, a contact pressure between a probe and a mask is reduced to 0.1 nN by applying a vibration of 1 kHz to 1 MHz to the probe. It has been adapted such that a cantilever used in the present invention is formed by a silicon material of 100–600 μm in length and 5–50 μm in thickness and, at the observation time, the probe contacts with the mask at the contact pressure of 0.1 nN and, at the processing time, a defect correction can be performed by causing the probe to contact with the mask at the contact pressure of 10 nN to 1 mN.
摘要翻译：提供了一种可以将探头用于观察和校正的装置，并且即使下一代超微小结构的光掩模被制成物体也可以进行所需的处理而不损害处理中的正常部分获得缺陷部分的位置和形状的信息，并且在处理时间也不损害探针。已经适应使得在观察时间，通过向探针施加1kHz至1MHz的振动，将探针和掩模之间的接触压力降低至0.1nN。已经适应使得本发明中使用的悬臂由长度为100〜600μm，厚度为5-50μm的硅材料形成，并且在观察时刻，探针以接触压力与掩模接触 0.1nN，并且在处理时间，可以通过使探针以10nN至1mN的接触压力与掩模接触来进行缺陷校正。

46. 发明授权

US07009906B2 Semiconductor memory device having easily redesigned memory capacity 失效
标题翻译：半导体存储器件具有容易重新设计的存储容量
公开(公告)号：US07009906B2
公开(公告)日：2006-03-07
申请号：US10721999
申请日：2003-11-26
申请人： Naoya Watanabe
发明人： Naoya Watanabe
IPC分类号： G11C8/00
CPC分类号： G11C8/12
摘要： Sub-blocks SBA0–SBA3, SBB0–SBB3, SBC0–SBC3, SBD0–SBD3 respectively form four groups. In each group, a refresh end signal REF_END is successively transferred to the next sub-block. Therefore, when a refresh counter of the number of bits corresponding to the number of word lines present in a sub-block is provided in a central control circuit, a memory capacity can easily be redesigned by changing the number of sub-blocks and changing a group configuration of sub-blocks. As a result, there can be provided a memory core for embedded memory in which a memory capacity can easily be changed and a refresh control-related circuitry can easily be changed.
摘要翻译：子块SBA 0 -SBA 3，SBB 0 -SBB 3，SBC 0 -SBC 3，SBD 0 -SBD 3分别形成四组。在每组中，刷新结束信号REF_END被依次传送到下一个子块。因此，当在中央控制电路中设置与子块中存在的字线数相对应的位数的刷新计数器时，可以通过改变子块的数量并改变一个位置来容易地重新设计存储容量子组的组配置。结果，可以提供一种用于嵌入式存储器的存储器核，其中存储器容量可以容易地改变，并且刷新控制相关电路可以容易地改变。

47. 发明申请

US20050262685A1 Method of processing vertical cross-section using atomic force microscope 失效
标题翻译：使用原子力显微镜处理垂直横截面的方法
公开(公告)号：US20050262685A1
公开(公告)日：2005-12-01
申请号：US11135075
申请日：2005-05-23
申请人： Osamu Takaoka , Masatoshi Yasutake , Shigeru Wakiyama , Naoya Watanabe
发明人： Osamu Takaoka , Masatoshi Yasutake , Shigeru Wakiyama , Naoya Watanabe
IPC分类号： G01B21/22 , B23Q17/00 , B82B3/00 , B82Y15/00 , B82Y35/00 , B82Y40/00 , G01B5/28 , G01Q60/24 , G01Q60/38 , G01Q80/00 , G03F1/08 , G03F1/68 , G03F1/72 , G03F7/00
CPC分类号： G01Q30/06 , G01Q40/00 , G01Q80/00 , G03F1/72 , G03F7/0002 , Y10T29/49004 , Y10T29/49771 , Y10T29/49822 , Y10T29/49824
摘要： An indentation is formed by thrusting a probe of a scanning probe microscope for processing, which has a vertical surface or a vertical ridge and is harder than sample material, into sample for measuring the indentation. A high-fidelity AFM observation is performed on the shape of the formed indentation with a thin probe with high aspect ratio, the direction of the vertical surface or the vertical ridge is inspected, and the angle error θ is stored. By rotating a sample stage by an angle corresponding to the measured mounting angle error θ of the probe, the mounting angle error of the probe is corrected in advance.
摘要翻译：通过将具有垂直表面或垂直脊并且比样品材料更硬的扫描探针显微镜的探针推入用于测量凹陷的样品中来形成凹陷。使用具有高纵横比的薄探针对垂直表面或垂直脊的方向进行形成的压痕的形状的高保真AFM观察，并且存储角度误差θ。通过将样品台旋转与测量的测量的安装角度误差θ相对应的角度，预先校正探针的安装角度误差。

48. 发明申请

US20050205805A1 Scratch repairing processing method and scanning probe microscope (SPM) used therefor 有权
标题翻译：刮擦修复处理方法和扫描探针显微镜（SPM）
公开(公告)号：US20050205805A1
公开(公告)日：2005-09-22
申请号：US11086812
申请日：2005-03-21
申请人： Naoya Watanabe , Osamu Takaoka
发明人： Naoya Watanabe , Osamu Takaoka
IPC分类号： G01Q90/00 , A61N5/00 , G01B5/28 , G01Q30/14 , G01Q70/00 , G01Q80/00 , G03F1/72 , G03F9/00 , G21G5/00 , H01L21/027
CPC分类号： G03F1/72 , G01Q80/00
摘要： To provide a technique in which chips generated by a defect portion scraping processing using a scanning probe microscope can be removed completely without being collected at the surface of a sample despite of the surface tension of adsorbed water existing on the sample surface and/or electrostatic charges caused by friction. A subject to be processed is disposed within a cell in which liquid is reserved. The scratch processing using a canning probe microscope is performed within the liquid so that chips or shavings scatter within the liquid, not remaining on the surface of the sample. Further, the processing cell is provided with a supply port and an discharge port for the liquid so that new liquid is supplied within the cell through the supply port after the termination of the scratch processing to clean within the cell.
摘要翻译：为了提供这样一种技术，其中尽管存在于样品表面上的吸附水的表面张力和/或静电电荷，但是通过使用扫描探针显微镜的缺陷部分刮擦处理产生的碎片可以被完全去除而不被收集在样品的表面造成摩擦。待处理对象设置在保留液体的单元内。在液体中进行使用罐头探针显微镜的划痕处理，使得碎屑或刨屑在液体内散射，而不残留在样品的表面上。此外，处理单元设置有用于液体的供给口和排出口，使得在暂时处理结束之后通过供给口在单元内提供新的液体，以在单元内进行清洁。

49. 发明授权

US06442252B1 Communication apparatus 有权
标题翻译：通讯设备
公开(公告)号：US06442252B1
公开(公告)日：2002-08-27
申请号：US09144063
申请日：1998-08-31
申请人： Shunichi Fujise , Makoto Mikuni , Takahiro Kiyohara , Fumio Shoji , Atsushi Ikeda , Naoya Watanabe
发明人： Shunichi Fujise , Makoto Mikuni , Takahiro Kiyohara , Fumio Shoji , Atsushi Ikeda , Naoya Watanabe
IPC分类号： H04M1100
CPC分类号： H04N1/3201 , H04M1/663 , H04N1/32005 , H04N1/32363 , H04N1/32379 , H04N1/32614 , H04N1/32635
摘要： A communication apparatus includes a main unit and a communication control unit. The communication control unit informs the main unit of an incoming call. The main unit makes a judgement on whether the incoming call should be accepted. In accordance with this judgement, the main unit instructs the communication control unit to respond to the incoming call. The communication control unit responds to the incoming call in accordance with the judgement by the main unit. In accordance with the state of a memory for storing received signals or with the called party number, the main unit makes a judgement on whether the incoming call should be rejected or ignored.
摘要翻译：通信装置包括主单元和通信控制单元。通信控制单元向主机通知来电。主机判断来电是否接受。根据该判断，主单元指示通信控制单元响应来电。通信控制单元根据主单元的判断来响应来电。根据用于存储接收到的信号或与被叫方号码的存储器的状态，主单元判断来电是否应被拒绝或忽略。

50. 发明授权

US06392897B1 Circuit module 失效
标题翻译：电路模块
公开(公告)号：US06392897B1
公开(公告)日：2002-05-21
申请号：US09131688
申请日：1998-08-10
申请人： Yasunobu Nakase , Tsutomu Yoshimura , Yoshikazu Morooka , Naoya Watanabe
发明人： Yasunobu Nakase , Tsutomu Yoshimura , Yoshikazu Morooka , Naoya Watanabe
IPC分类号： H01R1216
CPC分类号： H05K1/14 , H05K1/117 , H05K3/403 , H05K2201/09481 , H05K2201/10159 , H05K2201/10689 , H05K2203/1572
摘要： A circuit module includes a connector terminal (4A) provided on a front surface of a printed wiring board (2) and connected to a data pin (DQt) of a memory IC (3) through an interconnect line (5a). A conductive connector terminal (4c) corresponds to the connector terminal (4a) and is provided on a back surface of the printed wiring board (2). A through hole (16) extends between part of the front surface of the printed wiring board (2) where the connector terminal (4a) is formed and part of the back surface thereof where the conductive connector terminal (4c) is formed. A conductor fills the through hole (16), thereby suppressing skews resulting from a difference in interconnect line length on the circuit module and decreasing a stub capacitance to achieve the reduction in power consumption.
摘要翻译：电路模块包括设置在印刷电路板（2）的前表面并通过互连线（5a）连接到存储器IC（3）的数据引脚（DQt）的连接器端子（4A）。导电连接器端子（4c）对应于连接器端子（4a）并且设置在印刷电路板（2）的背面上。在形成有连接器端子（4a）的印刷电路板（2）的前表面的一部分和形成导电连接器端子（4c）的背面的一部分之间延伸有一个通孔（16）。导体填充通孔（16），从而抑制由电路模块上的互连线长度的差异引起的偏移，并且减小短截线电容以实现功耗的降低。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式